JPS6355361U - - Google Patents
Info
- Publication number
- JPS6355361U JPS6355361U JP14939786U JP14939786U JPS6355361U JP S6355361 U JPS6355361 U JP S6355361U JP 14939786 U JP14939786 U JP 14939786U JP 14939786 U JP14939786 U JP 14939786U JP S6355361 U JPS6355361 U JP S6355361U
- Authority
- JP
- Japan
- Prior art keywords
- frequency
- nozzle
- inductively coupled
- coupled plasma
- generate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000009616 inductively coupled plasma Methods 0.000 claims description 3
- 230000006698 induction Effects 0.000 claims description 2
- 230000001154 acute effect Effects 0.000 claims 1
- 150000002500 ions Chemical class 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 3
Landscapes
- Electron Tubes For Measurement (AREA)
Description
第１図は本考案実施例の要部構成説明図、第２
図は本考案実施例の全体的な構成説明図、第３図
は従来例の要部構成説明図である。
１…プラズマトーチ、２…高周波誘導コイル、
４…高周波誘導結合プラズマ、５，５′…ノズル
、６…スキマー。
Figure 1 is an explanatory diagram of the main part configuration of the embodiment of the present invention, Figure 2
The figure is an explanatory diagram of the overall configuration of the embodiment of the present invention, and FIG. 3 is an explanatory diagram of the main part configuration of the conventional example. 1... Plasma torch, 2... High frequency induction coil,
4... High frequency inductively coupled plasma, 5,5'... Nozzle, 6... Skimmer.
Claims (1)
高周波磁界を形成して高周波誘導結合プラズマを
生じさせ、該プラズマを用いて試料を励起してイ
オンを生じさせ、該イオンをノズルとスキマーか
らなるインターフエイスを介して質量分析計に導
いて検出し、前記試料中の被測定元素を分析する
分析計において、前記ノズルは先端部と根もとの
平坦部の距離が長く形状が鋭角となつていること
を特徴とする高周波誘導結合プラズマ・質量分析
計。 High-frequency energy is supplied to a high-frequency induction coil to form a high-frequency magnetic field to generate high-frequency inductively coupled plasma, and the plasma is used to excite the sample to generate ions, which are then transferred through an interface consisting of a nozzle and a skimmer. The nozzle is characterized in that the distance between the tip and the flat part of the base is long and the shape of the nozzle is an acute angle. A high-frequency inductively coupled plasma mass spectrometer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14939786U JPS6355361U (en) | 1986-09-29 | 1986-09-29 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14939786U JPS6355361U (en) | 1986-09-29 | 1986-09-29 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6355361U true JPS6355361U (en) | 1988-04-13 |
Family
ID=31064565
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14939786U Pending JPS6355361U (en) | 1986-09-29 | 1986-09-29 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6355361U (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59105257A (en) * | 1982-12-08 | 1984-06-18 | エムデイ−エス・ヘルス・グル−プ・リミテツド | Plasma sampling device and method |
-
1986
- 1986-09-29 JP JP14939786U patent/JPS6355361U/ja active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59105257A (en) * | 1982-12-08 | 1984-06-18 | エムデイ−エス・ヘルス・グル−プ・リミテツド | Plasma sampling device and method |
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