JPH0480377B2 - - Google Patents

Info

Publication number
JPH0480377B2
JPH0480377B2 JP59182589A JP18258984A JPH0480377B2 JP H0480377 B2 JPH0480377 B2 JP H0480377B2 JP 59182589 A JP59182589 A JP 59182589A JP 18258984 A JP18258984 A JP 18258984A JP H0480377 B2 JPH0480377 B2 JP H0480377B2
Authority
JP
Japan
Prior art keywords
resist
pattern
vinylphenol
dry etching
etching resistance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59182589A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6161154A (ja
Inventor
Yoshio Yamashita
Takaharu Kawazu
Takateru Asano
Kenji Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Yakuhin Kogyo KK
Oki Electric Industry Co Ltd
Original Assignee
Fuji Yakuhin Kogyo KK
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Yakuhin Kogyo KK, Oki Electric Industry Co Ltd filed Critical Fuji Yakuhin Kogyo KK
Priority to JP59182589A priority Critical patent/JPS6161154A/ja
Publication of JPS6161154A publication Critical patent/JPS6161154A/ja
Publication of JPH0480377B2 publication Critical patent/JPH0480377B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP59182589A 1984-09-03 1984-09-03 微細ネガレジストパターン形成方法 Granted JPS6161154A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59182589A JPS6161154A (ja) 1984-09-03 1984-09-03 微細ネガレジストパターン形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59182589A JPS6161154A (ja) 1984-09-03 1984-09-03 微細ネガレジストパターン形成方法

Publications (2)

Publication Number Publication Date
JPS6161154A JPS6161154A (ja) 1986-03-28
JPH0480377B2 true JPH0480377B2 (en, 2012) 1992-12-18

Family

ID=16120931

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59182589A Granted JPS6161154A (ja) 1984-09-03 1984-09-03 微細ネガレジストパターン形成方法

Country Status (1)

Country Link
JP (1) JPS6161154A (en, 2012)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH678897A5 (en, 2012) * 1986-05-10 1991-11-15 Ciba Geigy Ag
JPH0821532B2 (ja) * 1986-09-16 1996-03-04 松下電子工業株式会社 半導体装置の製造方法
JPH0821533B2 (ja) * 1986-11-26 1996-03-04 松下電子工業株式会社 半導体装置の製造方法
JPH0740543B2 (ja) * 1987-02-17 1995-05-01 松下電子工業株式会社 半導体装置の製造方法
GB8715435D0 (en) * 1987-07-01 1987-08-05 Ciba Geigy Ag Forming images
JPS6489424A (en) * 1987-09-30 1989-04-03 Matsushita Electronics Corp Resist-pattern forming method

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1375461A (en, 2012) * 1972-05-05 1974-11-27
JPS5241050B2 (en, 2012) * 1974-03-27 1977-10-15
JPS50141404A (en, 2012) * 1974-04-30 1975-11-13

Also Published As

Publication number Publication date
JPS6161154A (ja) 1986-03-28

Similar Documents

Publication Publication Date Title
JP2881969B2 (ja) 放射線感光レジストとパターン形成方法
CN111948904B (zh) 光刻胶组合物、用它形成光刻图案的方法及其用途
JPS6116972B2 (en, 2012)
JPS5949536A (ja) 微細パタ−ン形成方法
JPH0480377B2 (en, 2012)
US4476217A (en) Sensitive positive electron beam resists
JPH02251962A (ja) 微細パターン形成材料およびパターン形成方法
JPS62235943A (ja) リソグラフイ−法を利用した電子デバイスの製造方法
JPS63216044A (ja) パタ−ン形成材料
JPH0727211B2 (ja) レジスト構造体の製造方法
JPS617835A (ja) レジスト材料
JPS58214148A (ja) レジスト材料および微細パタ−ン形成方法
JPH0334053B2 (en, 2012)
JPS60119549A (ja) パタ−ン形成材料及びパタ−ン形成法
JPH0334052B2 (en, 2012)
JPS59121042A (ja) ネガ型レジスト組成物
JPS61159633A (ja) ネガ型レジスト組成物及びネガ型レジストパタ−ンの形成方法
JPH0328852A (ja) 感光性樹脂組成物およびこれを用いたパターン形成方法
JP2618978B2 (ja) レジスト材料およびこのレジスト材料を使用するパターン形成方法
JPS63273856A (ja) レジストパタ−ンの形成方法
JPS6070443A (ja) 微細パタ−ンの形成方法
JPS592038A (ja) ネガ型レジスト組成物
JPS6240449A (ja) ネガ型レジスト材料及びレジストパタ−ンの形成方法
JPS5915243A (ja) レジスト材料
JPS649613B2 (en, 2012)

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term