JPH0479685B2 - - Google Patents
Info
- Publication number
- JPH0479685B2 JPH0479685B2 JP59223370A JP22337084A JPH0479685B2 JP H0479685 B2 JPH0479685 B2 JP H0479685B2 JP 59223370 A JP59223370 A JP 59223370A JP 22337084 A JP22337084 A JP 22337084A JP H0479685 B2 JPH0479685 B2 JP H0479685B2
- Authority
- JP
- Japan
- Prior art keywords
- membrane
- porous
- solvent
- polymer
- resins
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000012528 membrane Substances 0.000 claims description 48
- 229920000642 polymer Polymers 0.000 claims description 46
- 239000012510 hollow fiber Substances 0.000 claims description 32
- 239000002904 solvent Substances 0.000 claims description 25
- 239000011248 coating agent Substances 0.000 claims description 22
- 238000000576 coating method Methods 0.000 claims description 22
- 239000007788 liquid Substances 0.000 claims description 13
- 239000002131 composite material Substances 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 9
- 239000000463 material Substances 0.000 claims description 8
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 238000005345 coagulation Methods 0.000 claims description 2
- 230000015271 coagulation Effects 0.000 claims description 2
- 239000011261 inert gas Substances 0.000 claims description 2
- 230000000717 retained effect Effects 0.000 claims 2
- -1 polyxylene oxide Polymers 0.000 description 24
- 239000010419 fine particle Substances 0.000 description 22
- 239000000243 solution Substances 0.000 description 21
- 229920005989 resin Polymers 0.000 description 19
- 239000011347 resin Substances 0.000 description 19
- 239000011148 porous material Substances 0.000 description 16
- 229920002492 poly(sulfone) Polymers 0.000 description 13
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 12
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 11
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 229910001873 dinitrogen Inorganic materials 0.000 description 8
- 239000010408 film Substances 0.000 description 8
- 239000000203 mixture Substances 0.000 description 8
- 229920005597 polymer membrane Polymers 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 238000000926 separation method Methods 0.000 description 7
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 6
- 125000000217 alkyl group Chemical group 0.000 description 6
- 229910052731 fluorine Inorganic materials 0.000 description 6
- 239000011737 fluorine Substances 0.000 description 6
- 230000035699 permeability Effects 0.000 description 6
- 125000004432 carbon atom Chemical group C* 0.000 description 5
- 229920001577 copolymer Polymers 0.000 description 5
- 239000000428 dust Substances 0.000 description 5
- 229910052739 hydrogen Inorganic materials 0.000 description 5
- 239000001257 hydrogen Substances 0.000 description 5
- 125000002950 monocyclic group Chemical group 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 239000004695 Polyether sulfone Substances 0.000 description 4
- 239000004698 Polyethylene Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 4
- 239000012535 impurity Substances 0.000 description 4
- 239000010410 layer Substances 0.000 description 4
- 238000000465 moulding Methods 0.000 description 4
- 229920001197 polyacetylene Polymers 0.000 description 4
- 229920006393 polyether sulfone Polymers 0.000 description 4
- 229920000573 polyethylene Polymers 0.000 description 4
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 3
- MQIUGAXCHLFZKX-UHFFFAOYSA-N Di-n-octyl phthalate Natural products CCCCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCCC MQIUGAXCHLFZKX-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 3
- 125000001931 aliphatic group Chemical group 0.000 description 3
- 150000001412 amines Chemical group 0.000 description 3
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 3
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 3
- 229910052794 bromium Inorganic materials 0.000 description 3
- 229920002301 cellulose acetate Polymers 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 239000011247 coating layer Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 125000005843 halogen group Chemical group 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- 239000012456 homogeneous solution Substances 0.000 description 3
- 150000002431 hydrogen Chemical class 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 229920001223 polyethylene glycol Polymers 0.000 description 3
- 229920000139 polyethylene terephthalate Polymers 0.000 description 3
- 239000005020 polyethylene terephthalate Substances 0.000 description 3
- 229920005672 polyolefin resin Polymers 0.000 description 3
- 229920001955 polyphenylene ether Polymers 0.000 description 3
- 238000009987 spinning Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 229910052717 sulfur Inorganic materials 0.000 description 3
- 239000011593 sulfur Substances 0.000 description 3
- UWHCKJMYHZGTIT-UHFFFAOYSA-N tetraethylene glycol Chemical compound OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 238000000108 ultra-filtration Methods 0.000 description 3
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- VXNZUUAINFGPBY-UHFFFAOYSA-N 1-Butene Chemical compound CCC=C VXNZUUAINFGPBY-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- 239000004962 Polyamide-imide Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 125000001309 chloro group Chemical group Cl* 0.000 description 2
- 125000001033 ether group Chemical group 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 229920001903 high density polyethylene Polymers 0.000 description 2
- 239000004700 high-density polyethylene Substances 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 2
- 125000001476 phosphono group Chemical group [H]OP(*)(=O)O[H] 0.000 description 2
- 229920002312 polyamide-imide Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 229920001225 polyester resin Polymers 0.000 description 2
- 239000004645 polyester resin Substances 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 229920001021 polysulfide Polymers 0.000 description 2
- 239000005077 polysulfide Substances 0.000 description 2
- 150000008117 polysulfides Polymers 0.000 description 2
- 229920002620 polyvinyl fluoride Polymers 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 239000011550 stock solution Substances 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- CYFLXLSBHQBMFT-UHFFFAOYSA-N sulfamoxole Chemical group O1C(C)=C(C)N=C1NS(=O)(=O)C1=CC=C(N)C=C1 CYFLXLSBHQBMFT-UHFFFAOYSA-N 0.000 description 2
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 2
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 2
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- MIZLGWKEZAPEFJ-UHFFFAOYSA-N 1,1,2-trifluoroethene Chemical group FC=C(F)F MIZLGWKEZAPEFJ-UHFFFAOYSA-N 0.000 description 1
- BQCIDUSAKPWEOX-UHFFFAOYSA-N 1,1-Difluoroethene Chemical compound FC(F)=C BQCIDUSAKPWEOX-UHFFFAOYSA-N 0.000 description 1
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- 229910002012 Aerosil® Inorganic materials 0.000 description 1
- 239000004953 Aliphatic polyamide Substances 0.000 description 1
- 239000005995 Aluminium silicate Substances 0.000 description 1
- 239000004709 Chlorinated polyethylene Substances 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 239000005909 Kieselgur Substances 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- 229920000459 Nitrile rubber Polymers 0.000 description 1
- 229920000571 Nylon 11 Polymers 0.000 description 1
- 229920001007 Nylon 4 Polymers 0.000 description 1
- 229920002292 Nylon 6 Polymers 0.000 description 1
- 229920002302 Nylon 6,6 Polymers 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 239000002033 PVDF binder Substances 0.000 description 1
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical group OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229920002319 Poly(methyl acrylate) Polymers 0.000 description 1
- 229930182556 Polyacetal Natural products 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004693 Polybenzimidazole Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 229910006069 SO3H Inorganic materials 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- YKTSYUJCYHOUJP-UHFFFAOYSA-N [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] Chemical compound [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] YKTSYUJCYHOUJP-UHFFFAOYSA-N 0.000 description 1
- 150000001242 acetic acid derivatives Chemical class 0.000 description 1
- 125000002252 acyl group Chemical group 0.000 description 1
- 229920003231 aliphatic polyamide Polymers 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000004760 aramid Substances 0.000 description 1
- 229920003235 aromatic polyamide Polymers 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 239000010425 asbestos Substances 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 125000002619 bicyclic group Chemical group 0.000 description 1
- 125000002618 bicyclic heterocycle group Chemical group 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- NTXGQCSETZTARF-UHFFFAOYSA-N buta-1,3-diene;prop-2-enenitrile Chemical compound C=CC=C.C=CC#N NTXGQCSETZTARF-UHFFFAOYSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000000378 calcium silicate Substances 0.000 description 1
- 229910052918 calcium silicate Inorganic materials 0.000 description 1
- OYACROKNLOSFPA-UHFFFAOYSA-N calcium;dioxido(oxo)silane Chemical compound [Ca+2].[O-][Si]([O-])=O OYACROKNLOSFPA-UHFFFAOYSA-N 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 229920006217 cellulose acetate butyrate Polymers 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 229910052570 clay Inorganic materials 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 230000001112 coagulating effect Effects 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- IOKFJYJJRJYRCZ-UHFFFAOYSA-N dimethyl(2-phenylethyl)silicon Chemical compound C[Si](C)CCC1=CC=CC=C1 IOKFJYJJRJYRCZ-UHFFFAOYSA-N 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 229920000840 ethylene tetrafluoroethylene copolymer Polymers 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- XUCNUKMRBVNAPB-UHFFFAOYSA-N fluoroethene Chemical compound FC=C XUCNUKMRBVNAPB-UHFFFAOYSA-N 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 239000010954 inorganic particle Substances 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 125000005647 linker group Chemical group 0.000 description 1
- 229920001684 low density polyethylene Polymers 0.000 description 1
- 239000004702 low-density polyethylene Substances 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- 238000002074 melt spinning Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 229920013653 perfluoroalkoxyethylene Polymers 0.000 description 1
- FVZVCSNXTFCBQU-UHFFFAOYSA-N phosphanyl Chemical group [PH2] FVZVCSNXTFCBQU-UHFFFAOYSA-N 0.000 description 1
- 235000021317 phosphate Nutrition 0.000 description 1
- 125000002467 phosphate group Chemical class [H]OP(=O)(O[H])O[*] 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002627 poly(phosphazenes) Polymers 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920002480 polybenzimidazole Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 229920013716 polyethylene resin Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920006380 polyphenylene oxide Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 229920001290 polyvinyl ester Polymers 0.000 description 1
- 229920000131 polyvinylidene Polymers 0.000 description 1
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 1
- 229920002717 polyvinylpyridine Polymers 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000005956 quaternization reaction Methods 0.000 description 1
- 238000001223 reverse osmosis Methods 0.000 description 1
- 229910052895 riebeckite Inorganic materials 0.000 description 1
- 125000006413 ring segment Chemical group 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 125000001174 sulfone group Chemical group 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 125000004665 trialkylsilyl group Chemical group 0.000 description 1
- AOXOMZYRICNLQZ-UHFFFAOYSA-N trimethyl-[2-[2-(2-trimethylsilylethynyl)phenyl]ethynyl]silane Chemical compound C[Si](C)(C)C#CC1=CC=CC=C1C#C[Si](C)(C)C AOXOMZYRICNLQZ-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
- B01D69/10—Supported membranes; Membrane supports
- B01D69/106—Membranes in the pores of a support, e.g. polymerized in the pores or voids
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
- B01D69/12—Composite membranes; Ultra-thin membranes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
- B01D69/08—Hollow fibre membranes
Description
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[Industrial Field of Application] The present invention relates to a method for producing a composite membrane for liquid separation for separating at least one type of liquid molecule from a liquid mixture. [Prior art and its problems] Microfilter ultrafiltration membranes, reverse osmosis membranes, alcohol separation membranes, etc. have been developed using various membrane manufacturing methods, but as the molecular weight cutoff of the membranes becomes smaller, Also, the more precise the filtration, the more inconvenient the large pore diameter portion, especially at the base of the pore size distribution. The question of why such large holes exist and how the number of such holes can be reduced has become a major problem. When the thickness of the layer that contributes to separation on the membrane surface becomes less than 10 ÎŒm or even less than 1 ÎŒm, the dust present there can no longer be ignored, and the part with the dust becomes a pinhole, and this pinhole causes separation. It is a major cause of bad sex. However, the number of dust and impurities contained in the polymer is extremely large, for example, from spinning from a single stock solution to forming a flat membrane to melt spinning. When forming a film from a polymer containing these dusts and impurities,
Ideally, the polymer solution should not contain dirt or impurities that are larger than the average pore size of the membrane to be formed. However, as a practical matter, 1ÎŒm
It is difficult to remove the following dirt because the viscosity of the polymer solution is high and the filtration pressure actually increases. However, when it comes to particles of 0.1 ÎŒm, there is no easy way to remove them. The present invention was developed as a result of intensive research into these problems.
By using a support porous hollow fiber with an average pore diameter of 0.5 ÎŒm or less, dust of a desired size contained in the coating liquid is removed, concentrated to a desired concentration, and then a composite having a desired molecular weight cut-off is formed. It was possible to obtain membrane hollow fibers, and the present invention was completed. [Means for Solving the Problems] That is, the present invention provides the following steps: (1) One surface of a porous hollow fiber support is coated with a dilute polymer solution containing a non-solvent, and the coating liquid is introduced into the porous membrane support. After holding
A method for forming a composite membrane, which comprises concentrating a coating liquid in a heated inert air stream and then coagulating the coating material by bringing it into contact with a coagulation liquid. (2) After coating one surface of the porous hollow fiber support with a dilute polymer solution containing a non-solvent and retaining the coating liquid in the porous membrane support,
A composite membrane forming method characterized by evaporating a solvent using heated inert gas. It is related to. The present invention will be explained in detail below. The hollow fiber support in the present invention may have an average pore diameter of 0.5 ÎŒm or less, preferably 0.1 ÎŒm or less, as observed by a scanning electron microscope, a molecular weight cut-off of 8000 or more, and a porosity of 10 to 80%. Any of these can be used. Support hollow fibers with a pore size exceeding 0.5 ÎŒm generally have weak pressure resistance, and during coating, a large amount of dust contained in the coating solution
This is not preferable because it is difficult to create a defect-free coating film because it incorporates the following: On the other hand, a molecular weight cut-off of 1000 or less is not preferred because the permeation resistance of the support is high and the permeability of the resulting composite membrane is low. The hollow fiber support may be made of any material that satisfies the above conditions, and includes polymers, inorganic materials such as alumina, glass, other metals, and sintered porous ceramics. Among these, polymeric materials are preferred. Polymer materials are generally known as porous membrane materials, and preferred examples include polysulfone, polyethersulfone, polyacrylonitrile, polystyrene, polymethyl methacrylate, polymethyl acrylate, vinyl chloride, vinylidene chloride, Chlorinated polyethylene, polycarbonate, cellulose acetate esters such as cellulose acetate and cellulose acetate butyrate, polyamides such as nylon 6, nylon 66, nylon 4, and nylon 11, polyimides such as polybenzimidazole, polyamideimide, polyacetal, polyphenylene oxide , polyxylene oxide, polyurethane, polyethylene terephthalate, polyalkyl methacrylate, polyalkyl acrylate, polyphenylene terephthalate, polysulfide, polyvinyl fluoride, polyvinylidene fluoride, polytri- or tetrafluoroethylene, and other fluorine-based polymers, polysulfide, Polyacetylene derivatives with trimethylsilyl groups such as polyphosphazene, polyvinyl alcohol, polyvinyl ester, polyvinyl acetate, polypropion vinyl, polyvinylpyridine, polycarbodiimide, polyacetylene, polytrimethylsilylpropylene, etc., with the following chemical formula:
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[Formula] (where R 1 and R 2 are trimethylsilyl group (Si(CH 3 ) 3 ), phenyl group,
Polymers having repeating units of aliphatic substituents such as methyl, ethyl, and propyl groups, and
This and ditrimethylsilyldiethynylbenzene,
Copolymer with dimethylphenylethylsilane, etc.
and those containing some of these crosslinks. Further, block polymers having the above polymers as repeating units, block polymers having the above polymers as main backbone chains, all of the above polymers and polymers have halogen groups (-F, -Cl, -Br, -I), methyl,
It also includes derivatives into which substituents such as ethyl, propyl, -COOH, -SO3H , and -NH4 + have been introduced, and crosslinked products with divinylbenzene. Also included are mixtures of different combinations of the above polymers. More preferable examples include a method in which inorganic fine particles are mixed and formed into hollow fibers using a known polymer melt molding method, and then stretched to a certain extent under appropriate temperature conditions, or a method in which a polymer and an inorganic It is manufactured by mixing the fine particles and an appropriate organic liquid, molding the mixture into a hollow state using a known polymer solvent molding technique, and then extracting the organic liquid from the molded product. Examples of these products and their manufacturing methods are disclosed in publications such as JP-A-52-70988 and JP-A-52-156776. In these porous polymer membranes containing inorganic fine particles, the amount of inorganic fine particles is preferably 10% to 80% by weight. If it is less than 10% by weight, the amount of plasticizer is large and even if it is uniformly dispersed in the polymer, it is difficult to form continuous pores, and a practical porous membrane cannot be obtained. If it exceeds 80% by weight, the strength of the membrane will be low and it will not be possible to obtain a practical porous membrane. Examples of inorganic fine particles include carbon black,
silicon oxide, calcium silicate, aluminum silicate,
Examples include aluminum oxide, titanium oxide, kaolin clay, calcium carbonate, magnesium carbonate, diatomaceous earth, talc, barium sulfate, mica, and asbestos, and these may be used alone or in a mixture of two or more thereof. Further, the particle shape of the inorganic fine particles used in the present invention is not particularly limited, but may be fine particles with an average particle size of 0.005 to 1 ÎŒm and a specific surface area of 30 to 800 m 2 /g, or porous particles. This is preferable when obtaining a porous polymer membrane containing inorganic fine particles with uniform properties and excellent performance. The polymer constituting the porous polymer membrane containing inorganic fine particles is not particularly limited, but for example, polymers such as ethylene, propylene, butene-1, etc., or one or more of these as the main Consisting of a group of polyolefin resins such as copolymers contained as components, polymers such as vinyl fluoride, vinylidene fluoride, trifluoroethylene, or tetrafluoroethylene, or copolymers containing these as constituent components. Fluorocarbon resins, polyester resins such as polyethylene terephthalate and polybutylene terephthalate, polyamide resins, polystyrene resins, polyvinyl chloride, and many other thermoplastic resins that can be extruded, either alone or in combination. You can choose from a mixture of resins. Furthermore, after molding, these resins are processed to produce fluorine,
halogens and hydroxyl groups such as chlorine and bromine,
It is also possible to add functional groups such as alkoxy groups, acyl groups, amide groups, and sulfone groups. Examples of particularly preferable polymers for producing a porous polymer membrane containing inorganic fine particles include polyolefin resins and fluorine resins. Various polyethylenes, polypropylenes, and copolymers thereof, ranging from low-density polyethylene to high-density polyethylene, have excellent strength, chemical resistance, flexibility, etc., and are easy to mix and knead with inorganic fine particles. Sheets, films, hollow fibers, etc. can be formed very easily from the resulting mixture by ordinary forming processing means. Fluorine-based resins are superior to polyolefin-based resins in terms of chemical resistance, strength, and heat resistance. Examples of fluorocarbon resins include tetrafluoroethylene-hexafluoropropylene copolymer, tetrafluoroethylene-perfluoroalkoxyethylene copolymer, polytrifluoroethylene resin, and tetrafluoroethylene-ethylene copolymer. There are polymerized and polyvinylidene resins. The porous polymer membrane containing inorganic fine particles in the present invention has an average pore diameter of 0.5 ÎŒm or less, preferably at the interface between the polymer and inorganic fine particles in the membrane and/or between the inorganic fine particles.
The porosity of the network structure is imparted by fine voids of 0.1 ÎŒm, more preferably 0.07 ÎŒm or less.
In the present invention, it is extremely desirable to use a porous membrane having such a fine average pore system. The usefulness of using such a porous polymer membrane containing inorganic fine particles can also be seen in the following coating film formation process. A method for forming a thin layer of a polymer on a porous support membrane is to thinly coat (laminate) a solution of the polymer dissolved in an appropriate solvent on the porous membrane using known means, and then It is practical to remove it by evaporation. The presence of inorganic fine particles makes the porous film containing inorganic fine particles extremely wettable by the polymer solution, making it possible to coat the polymer solution in a thin and relatively constant thickness. . Furthermore, since the pores of the porous polymer membrane containing inorganic fine particles form a fine network structure consisting mainly of gaps between the inorganic fine particles, the solvent in the coated polymer solution not only evaporates from the surface; It penetrates extremely quickly through the network structure of the gaps between the inorganic particles and is evaporated from the back side. The resulting thin polymer film is an extremely thin film that has a relatively uniform thickness with little penetration into the pores and is also homogeneous in the thickness direction. Furthermore, the anchor effect between the inorganic fine particles and the coating layer improves the adhesion between the support membrane and the gas separation active thin membrane, or the porous membrane used as the support membrane can withstand compression under severe operating conditions such as temperature and pressure. This results in important practical improvements for gas separation membranes, such as improved properties. In this sense, the blending of inorganic fine particles is an important requirement for extremely high effectiveness. Alternatively, a porous polymer membrane containing inorganic fine particles may be immersed in an alkaline aqueous solution to dissolve and remove the inorganic matter, thereby increasing the porosity and may be used in the same manner. The coating material in the present invention is limited to a polymer and a solvent that does not dissolve the hollow fibers of the porous support. Various resins are used, and representative examples include polysulfone resins, cellulose acetate, polyvinyl fluoride, polyester resins represented by polyethylene terephthalate, polyamideimide resins, aliphatic or aromatic polyamide resins, and polycarbonates. resins, polyimide resins, polyphenylene ether resins, butadiene-acrylonitrile copolymers, and the like. Among these, polysulfone resins and polyphenylene ether resins are preferred because they are easy to form a thin film during solution coating. Some of the polysulfones that can be used include repeating structural units. (wherein R and Râ² may be the same or different aliphatic or aromatic hydrocarbyl-containing moieties,
For example, some have polymeric backbones containing from 1 to about 40 carbon atoms, with the sulfur in the sulfonyl group attached to an aliphatic or aromatic carbon atom. This polysulfone preferably has an average molecular weight of 10,000 or more, which is suitable for forming a thin film. When the polysulfone is not cross-linked, the molecular weight of the polysulfone is generally less than about 500,000. R and R may be linked by carbon-carbon bonds or by various linking groups, e.g.
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At least one of R' includes an aromatic hydrocarbyl-containing moiety and the sulfonyl moiety is bonded to at least one aromatic carbon atom. Common aromatic hydrocarbyl-containing moieties include phenylene and substituted phenylene moieties, bisphenyl and substituted bisphenyl moieties, formula Bisphenylmethane and substituted bisphenylmethane moieties with a nucleus of, formula Substituted and unsubstituted bisphenyl ethers (wherein X is oxygen or sulfur) and others are included. In the above bisphenylmethane and bisphenyl ether moieties, R 1 to R 10 may be the same or different, and the structure [In the formula, X 1 and X 2 are the same or different hydrogen or halogen (fluorine, chlorine, bromine), p is 0 or an integer from 1 to about 6, and Z is hydrogen, halogen (fluorine, chlorine, Bromine), (-Y) -q R 11 (where q is 0
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èšã®äžè¬åŒ[Formula] and R 11 is hydrogen, e.g. substituted or unsubstituted alkyl containing from 1 to about 8 carbon atoms, or monocyclic or bicyclic substitution containing e.g. about 6 to 15 carbon atoms. or unsubstituted aryl groups), monocyclic or bicyclic heterocycles having a heteroatom of at least one of nitrogen, oxygen and sulfur and having about 5 to 15 ring atoms, sulfate and Sulfono, especially those containing lower alkyl or containing monocyclic or bicyclic aryls, and sulfono, phosphorus-containing moieties such as phosphino and phosphonates and phosphono, especially containing lower alkyl or containing monocyclic or bicyclic aryls. Phosphates and phosphonos containing
Primary, secondary, tertiary and quaternary amines (secondary, tertiary and quaternary amines often contain lower alkyl or monocyclic or bicyclic aryl moieties) ) containing amines, isothioureyls,
thiouryl, guanidyl, trialkylsilyl, trialkylstannyl, dialkylstivinyl, etc.
Substituents on the phenyl group of bisphenylmethane and bisphenyl ether moieties are often in the ortho position. That is, R7 to R10 are hydrogen. Polysulfones with aromatic hydrocarbyl-containing moieties are
They generally have good thermal stability, are resistant to attack by chemical reagents, and have an excellent combination of toughness and flexibility. Useful polysulfones are commercially available from Union Carbide, such as "Udel P-
1700" and "Udel P-3500." Both of these products have the general formula (In the formula, n representing the degree of polymerization is about 50 to 80.) Poly(arylene ether)
Sulfones are also advantageous. structure Also useful is polyether sulfone, available under the trade name "100P" from ICI Corporation. Still other useful polysulfones can be prepared by modification of the polymers, such as by cross-linking, grafting, quaternization, and the like. As polyphelene ether, the following general formula is used. (In the formula, R 1 and R 3 independently represent an alkyl group having 1 to 4 carbon atoms or a halogen atom, R 2 represents hydrogen, an alkyl group having 1 to 4 carbon atoms, or a halogen atom, and n is 50 to 300 , preferably 6 to 280,
More preferably, it is an integer in the range of 70 to 250. ) may be preferably used. Typical examples of polyphenylene ether represented by the above general formula include poly(2,6-dimethylphenylene-1,4-ether), poly(2,6-diethylphenylene-1,4-ether), Poly(2-methyl-6-ethylphenylene-1,4-
ether), poly(2-methyl-6-chlorophenylene-1,4-ether), poly(2,6-dichlorophenylene-1,4-ether), poly(2,6-di-n-propylphenylene) -1,4
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methyl-6-bromophenylene-1,4-ether), poly(2,3,6-trimethylphenol)
Examples include. More preferred are polyacetylene resins. For polyacetylene resin, the following general formula is used:
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Examples are shown below. Example 1 23% by weight of silicon oxide (Aerosil #200 (trade name), specific surface area 175m 2 /g, average particle size 16mΌ) and 54% by weight dioctyl phthalate (DOP) were mixed in a Henshil mixer, and this was mixed with high density Polyethylene resin [Suntec S-360 (registered trademark) manufactured by Asahi Kasei Corporation]
23% by weight was added and mixed again in the Henschel mixer. Nitrogen gas was mixed into the mixture through a hollow fiber spinning nozzle to spin hollow fibers. The formed hollow fibers were immersed in 1,1,1-trichloroethane (chlorocene) for 5 minutes to extract DOP. The inner and outer diameters of the obtained hollow fibers were 0.75 mm and 1.35 mm, respectively, and the composition of the porous membrane was polyethylene resin 50.
Weight%, fine silicic acid 50% by weight, average pore diameter of porous membrane
It was 0.02 ÎŒm and the porosity was 58%. Next, the following coating operation was performed on this hollow fiber. Polysulfone (UCC Cordel P-3500,
(trade name), N-methylpyrrolidone as a solvent,
Tetraethylene glycol as a non-solvent,
They were mixed at a ratio of 5.90% and 5% by weight, respectively, to form a uniform solution. After setting the solvent temperature to 25°C, sealing one end of the porous hollow fiber support by fusion and immersing it in the solution,
From the other end of the hollow fiber, a vacuum pump was used to create a pressure gradient of 150 mmHg from the inside to the outside of the hollow fiber, and the dilute polymer solution was sucked into the outer surface of the hollow fiber and into the cells of the porous body. After shaking off the excess polymer solution with nitrogen gas, a nitrogen stream heated to 120°C was introduced onto the hollow fiber for 30 minutes to evaporate the solvent, and then water at 30°C was introduced onto the hollow fiber. , the polymer on the hollow fiber was coagulated by microphase separation. The molecular weight cutoff of this composite membrane is 3000, and the water permeability is 30.
(m 3 /m 2 Kg/cm 2 Day). Note that the above operation was performed under a nitrogen atmosphere because water is disliked. Example 2 Using a porous membrane support similar to Example 1, polyether sulfone (manufactured by ICI), solvent N-methylpyrrolidone, and non-solvent tetraethylene glycol were mixed in proportions of 5, 90, and 5% by weight, respectively. A homogeneous solution was obtained. Thereafter, in the same manner as in Example 1, polyether sulfone was coated on the polyethylene porous hollow fiber support. The resulting composite membrane has a molecular weight cutoff of 2000 and a water permeability of
40 (m 3 /m 2 Kg/m 2 Day). Example 3 A polyethylene porous hollow fiber support similar to that used in Example 1 was used, and the porosity was increased by eluting the fine powdered silicic acid contained in the membrane with a hot alkali. I coated the soil. The resulting porous membrane had an average pore diameter of 0.05 Όm and a porosity of 65%. Polysulfone (P-3500) as a polymer, dichloromethane as a solvent, and methanol as a non-solvent were mixed in proportions of 5, 90, and 5% by weight, respectively, to form a homogeneous solution, and then applied onto a hollow fiber in the same manner as in Example 1. Infiltrated. Thereafter, the insoluble polymer solution was removed using nitrogen gas, and the solvent was completely evaporated by continuing to flow nitrogen gas heated to 60°C. The average pore diameter of the obtained hollow fibers was 0.02 Όm, and the water permeability was 200 (m 3 /m 2 Kg/cm 2 Day). Example 4 A homogeneous solvent obtained by mixing polytrimethylsilylpropylene, solvent dimethylacetamide, and non-solvent tetraethylene glycol in proportions of 8, 84, and 8% by weight, respectively, was prepared in the same manner as in Example 1 to form a porous polyethylene hollow fiber. The membrane was infiltrated into the cell. After removing excess polymer with nitrogen gas, nitrogen gas at 120°C was introduced for 30 minutes to evaporate the solvent, and then water was introduced onto the hollow fibers to solidify the polymer. The resulting composite membrane has a molecular weight cutoff of 100 and a water permeability of
50 (m 2 /m 2 Kg/cm 2 Day). Example 5 Di(trimethylsilylethynyl)benzene, cyclohexane solution, and non-solvent methanol were each mixed with 8:
A homogeneous solution mixed at a ratio of 84:8% by weight was infiltrated into the outer surface of the ultrafiltration membrane hollow fiber SI-1 (trade name) manufactured by Asahi Kasei Industries, Ltd. in the same manner as in Example 1. Afterwards, excess polymer solution was removed using nitrogen gas, and heated nitrogen gas at 60°C was introduced onto the surface of the ultrafiltration membrane to evaporate the solvent. After 30 minutes, methanol was introduced onto the membrane to completely solidify the polymer. The resulting composite membrane has a molecular weight cutoff of 1000 and a water permeability of
10 (m 3 /m 2 Kg/cm 2 Day). [Effects of the Invention] The effects of the present invention can be summarized as follows. (1) There is no need to filter the hollow fiber spinning stock solution in advance. (2) The coating solution can be used to form a film without any impurity contamination while keeping it clean. (3) Therefore, there are fewer pinholes in the composite membrane. (4) The coating layer is located in the porous pores of the support and is firmly anchored, so even if the coating layer is made thin, it has high strength. (5) Therefore, a large flux can be obtained. (6) Even if the surface skin layer is scratched, there is little damage because the surface skin layer exists within the porous cells. (7) Since any dilute solution can be used, even polymers with low solubility can be used in coating solutions. (8) Polymers that tend to crack easily when made into films can also be used. Also, those with a small molecular weight,
Polymers that are difficult to form into films and that are easily crystallized can also be used. (9) Porous membrane supports with various pore sizes can be selected to control the cleanliness of the coating solution. In addition, a porous membrane support that has good affinity with the coating material can be selected.
Claims (1)
å«ãããªããŒåžè溶液ãã³ãŒãã€ã³ã°ããã³ãŒã
ã€ã³ã°æ¶²ãæ¯æäœå€åèäžã«ä¿æãããåŸãå ç±
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åŸãååºæ¶²ãšæ¥è§Šãããããšã«ããã³ãŒãã€ã³ã°
ææãååºãããããšãç¹åŸŽãšããè€åè補èæ¹
æ³ã ïŒ æ¯æäœå€åæ§äžç©ºç³žã®çåŽè¡šé¢ã«ãé溶åªã
å«ãããªããŒåžè溶液ãã³ãŒãã€ã³ã°ããã³ãŒã
ã€ã³ã°æ¶²ãæ¯æäœå€åèäžã«ä¿æãããåŸãå ç±
äžæŽ»æ§æ°äœã«ããã溶åªãèžçºãããããšãç¹åŸŽ
ãšããè€åè補èæ¹æ³ã[Scope of Claims] 1 One surface of a porous hollow fiber support is coated with a dilute polymer solution containing a non-solvent, and the coating solution is retained in the porous support membrane, and then heated in a heated inert air stream. A method for forming a composite membrane, characterized in that the coating material is solidified by concentrating the coating liquid and then bringing the coating material into contact with a coagulation liquid. 2. One surface of the porous hollow fiber support is coated with a dilute polymer solution containing a non-solvent, and after the coating liquid is retained in the porous support membrane, the solvent is evaporated using heated inert gas. Composite membrane manufacturing method.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59223370A JPS61101211A (en) | 1984-10-24 | 1984-10-24 | Formation of novel composite membrane |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59223370A JPS61101211A (en) | 1984-10-24 | 1984-10-24 | Formation of novel composite membrane |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61101211A JPS61101211A (en) | 1986-05-20 |
JPH0479685B2 true JPH0479685B2 (en) | 1992-12-16 |
Family
ID=16797076
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59223370A Granted JPS61101211A (en) | 1984-10-24 | 1984-10-24 | Formation of novel composite membrane |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61101211A (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101851361B (en) * | 2010-05-25 | 2012-05-09 | åæèªç©ºå€§åŠ | Hollow fiber damping material of nitrile butadiene rubber and preparation method thereof |
US9776142B2 (en) * | 2014-02-28 | 2017-10-03 | Pall Corporation | Porous polymeric membrane with high void volume |
-
1984
- 1984-10-24 JP JP59223370A patent/JPS61101211A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS61101211A (en) | 1986-05-20 |
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