JPH0470626B2 - - Google Patents
Info
- Publication number
- JPH0470626B2 JPH0470626B2 JP58153818A JP15381883A JPH0470626B2 JP H0470626 B2 JPH0470626 B2 JP H0470626B2 JP 58153818 A JP58153818 A JP 58153818A JP 15381883 A JP15381883 A JP 15381883A JP H0470626 B2 JPH0470626 B2 JP H0470626B2
- Authority
- JP
- Japan
- Prior art keywords
- resist
- substrate
- pattern
- film
- resist pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15381883A JPS6045242A (ja) | 1983-08-23 | 1983-08-23 | パターン形成方法 |
US06/594,481 US4609615A (en) | 1983-03-31 | 1984-03-27 | Process for forming pattern with negative resist using quinone diazide compound |
DE8484302145T DE3466741D1 (en) | 1983-03-31 | 1984-03-29 | Process for forming pattern with negative resist |
EP84302145A EP0124265B1 (en) | 1983-03-31 | 1984-03-29 | Process for forming pattern with negative resist |
CA000450963A CA1214679A (en) | 1983-03-31 | 1984-03-30 | Process for forming pattern with negative resist |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15381883A JPS6045242A (ja) | 1983-08-23 | 1983-08-23 | パターン形成方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6045242A JPS6045242A (ja) | 1985-03-11 |
JPH0470626B2 true JPH0470626B2 (enrdf_load_stackoverflow) | 1992-11-11 |
Family
ID=15570756
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15381883A Granted JPS6045242A (ja) | 1983-03-31 | 1983-08-23 | パターン形成方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6045242A (enrdf_load_stackoverflow) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS625241A (ja) * | 1985-06-29 | 1987-01-12 | Oki Electric Ind Co Ltd | フオトマスクの製造方法 |
JPH0246046Y2 (enrdf_load_stackoverflow) * | 1986-09-02 | 1990-12-05 | ||
JPH02250006A (ja) * | 1989-03-24 | 1990-10-05 | Fujitsu Ltd | レジストの剥離方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6029936B2 (ja) * | 1979-12-27 | 1985-07-13 | 富士通株式会社 | パタ−ン形成法 |
-
1983
- 1983-08-23 JP JP15381883A patent/JPS6045242A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6045242A (ja) | 1985-03-11 |
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