JPH0470626B2 - - Google Patents

Info

Publication number
JPH0470626B2
JPH0470626B2 JP58153818A JP15381883A JPH0470626B2 JP H0470626 B2 JPH0470626 B2 JP H0470626B2 JP 58153818 A JP58153818 A JP 58153818A JP 15381883 A JP15381883 A JP 15381883A JP H0470626 B2 JPH0470626 B2 JP H0470626B2
Authority
JP
Japan
Prior art keywords
resist
substrate
pattern
film
resist pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58153818A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6045242A (ja
Inventor
Yoshio Yamashita
Takaharu Kawazu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP15381883A priority Critical patent/JPS6045242A/ja
Priority to US06/594,481 priority patent/US4609615A/en
Priority to DE8484302145T priority patent/DE3466741D1/de
Priority to EP84302145A priority patent/EP0124265B1/en
Priority to CA000450963A priority patent/CA1214679A/en
Publication of JPS6045242A publication Critical patent/JPS6045242A/ja
Publication of JPH0470626B2 publication Critical patent/JPH0470626B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C5/00Photographic processes or agents therefor; Regeneration of such processing agents

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
JP15381883A 1983-03-31 1983-08-23 パターン形成方法 Granted JPS6045242A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP15381883A JPS6045242A (ja) 1983-08-23 1983-08-23 パターン形成方法
US06/594,481 US4609615A (en) 1983-03-31 1984-03-27 Process for forming pattern with negative resist using quinone diazide compound
DE8484302145T DE3466741D1 (en) 1983-03-31 1984-03-29 Process for forming pattern with negative resist
EP84302145A EP0124265B1 (en) 1983-03-31 1984-03-29 Process for forming pattern with negative resist
CA000450963A CA1214679A (en) 1983-03-31 1984-03-30 Process for forming pattern with negative resist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15381883A JPS6045242A (ja) 1983-08-23 1983-08-23 パターン形成方法

Publications (2)

Publication Number Publication Date
JPS6045242A JPS6045242A (ja) 1985-03-11
JPH0470626B2 true JPH0470626B2 (enrdf_load_stackoverflow) 1992-11-11

Family

ID=15570756

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15381883A Granted JPS6045242A (ja) 1983-03-31 1983-08-23 パターン形成方法

Country Status (1)

Country Link
JP (1) JPS6045242A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS625241A (ja) * 1985-06-29 1987-01-12 Oki Electric Ind Co Ltd フオトマスクの製造方法
JPH0246046Y2 (enrdf_load_stackoverflow) * 1986-09-02 1990-12-05
JPH02250006A (ja) * 1989-03-24 1990-10-05 Fujitsu Ltd レジストの剥離方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6029936B2 (ja) * 1979-12-27 1985-07-13 富士通株式会社 パタ−ン形成法

Also Published As

Publication number Publication date
JPS6045242A (ja) 1985-03-11

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