JPH0452243A - Precision electrical resistance alloy having high electrical resistance and low temperature coefficient and its manufacture - Google Patents

Abstract

PURPOSE:To obtain a precision electrical resistance alloy having good cold workability by adding specified amounts of Co, Mn, W or the like to an Ni-Cr-Cu-Al series alloy having a specified compsn. CONSTITUTION:An alloy constituted of, by weight, total 25 to 40% of 10 to 26% Cr, 2.5 to 15% Cu and 2.5 to 10% Al, 0.01 to 20% of one or more kinds among 0.01 to 20% Co, 0.01 to 15% Mn, 0.01 to 5% W, 0.01 to 5% Ti and 0.01 to 5% Si and the balance Ni is melted and cast. This alloy is inserted into a heat resistant container having an inside face slightly larger than the cross-sectional area of the alloy, is heated to 300 to 1200 deg.C for 1min to 50hr and is thereafter subjected to furnace cooling of 50 to 300 deg.C/hr, preferably by forced cooling of 300 to 2000 deg.C/hr. Next, this stock as in the container is subjected to cold working at 20 to 90% working ratio and is formed into a desired dimension. After the removal of the container, the stock is subjected to heat treatment of heating to 300 to l200 deg.C for 1min to 50hr and executing furnace cooling or air cooling. In this way, the precision electrical resistance allay in which the specific electrical resistance is regulated to >=130muOMEGA.cm and the temp. coefficient of the electrical resistance at about room temp. is regulated to +100X10<-6> to -100X10<-6> deg.C<-1> can be obtd.

Description

DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to precision resistance alloys, and more particularly to N1-Cr-Cu-Af precision resistance alloys having high electrical resistance and low temperature coefficient. .

(Prior Art) In recent years, the development of variable resistance functional elements such as strain sensors and temperature sensors has been remarkable, but these are sometimes used in quite harsh environments. In order to fully demonstrate the performance of these functional elements, it is important to suppress output drift due to temperature changes as much as possible. A more practical method is to achieve high reliability and stability by incorporating precision resistance materials such as compensation resistors and reference resistors into the circuit.

Conventionally, these precision resistance materials include Cu-Mn alloys, Ni-Cu alloys, and N
In addition to i-Cr alloys and amorphous alloys, these metal foil film resistors are used.

(Problem to be solved by the invention) Nowadays, with the development of electronics, various devices are becoming ultra-precise, smaller, and more sophisticated.
In line with this trend, there is a growing demand for even better precision resistance materials. The requirements are that the electrical resistance is large, the temperature coefficient of electrical resistance is small, that cold working such as thinning of wires and plates is easy, that it is easy to form thin films, and that it is inexpensive. etc.

The aforementioned Cu-Mn-based alloys and Ni-Cu-based alloys have extremely small temperature coefficients of electrical resistance of ±20×10-6°c-1, are highly workable, and are inexpensive; Not only is it small (50 μΩ·cam), but it also has drawbacks such as a complicated manufacturing process.

In addition, Ni-Cu alloy has a specific electrical resistance of 100 to 130μ.
Although it has a large Ω·cs, it has the disadvantage of somewhat poor workability.

In addition, amorphous alloys have a specific electrical resistance of 100 to 180.
Extremely large μΩ・cam, and its temperature coefficient is also ±2
Although excellent properties of 0.times.10.degree. C.-8 have been obtained, the reproducibility of the properties is poor, workability is extremely difficult, and crystallization progresses during heat treatment, resulting in rapid deterioration of the properties.

Furthermore, although metal foil film resistors are superior to the above-mentioned alloy materials in terms of specific electrical resistance and temperature coefficient, they have a disadvantage that they have poor response to fluctuations in high voltage and surge voltage, and cannot be manufactured for high power applications. There is.

As mentioned above, these materials have advantages and disadvantages, so they are forced to be used depending on their purpose or with conditions.

(Means for solving the problem) Among the above materials, Ni-Cu alloys not only have relatively high electrical resistance, but also have excellent stability of electrical properties and oxidation resistance at high temperatures. . In this alloy, C
Alloys with improved temperature coefficients of electrical resistance by adding a few percent of u, A2, etc. have already been put into practical use, but on the other hand, the highest value of specific electrical resistance is about 130 μΩ・cm, which is even higher! Negative resistance is currently not available.

The reason is that by adding a large amount of Aj2 and Cu,
This is because workability is significantly deteriorated and oxidation is significant due to heat treatment in the atmosphere. Therefore, in practical materials, the maximum content of A2 and Cu is approximately 3%.
It is.

The purpose of the present invention is to have a specific electrical resistance and a temperature coefficient of 130 μΩ・C11 or more and ±50×10−6°, respectively.
Ni-Cr-Cu-A with electrical properties of cm1
The present invention is characterized by providing a novel manufacturing method for obtaining an I-based alloy and for solving the problem of oxidation countermeasures and good workability at high temperatures of the alloy.

The present invention was made in view of these points, and as a result of many experiments and detailed research, chromium (Cr
) 10-26%, copper (Cu) 2.5-15%,
Aluminum (Af) 2: 5-10%, Cobalt (Co) 0.01-20%, Manganese (Mn) 0
．． 01-15%, tungsten (W) 0.01-5%
, titanium (Ti) 0.01-5%, silicon (St) 0
．． 01-5%, and the total of Cr, Cu and Affi is 25-40%.

Total of Mn, W, Ti and Si is 0.01-20%
, and the balance essentially consisting of nickel (Ni), has a high specific electrical resistance of 130 μΩ·cm or more and an extremely low temperature coefficient of electrical resistance of ±50×10-b″c-1. An Al-based precision resistance alloy was obtained. Furthermore, in the processing method of this alloy, βCr
A1. , Ni3Af, AlzO* or CrzO= as much as possible.

Incidentally, the compound βCrAf! and N i 3 Al are stable from room temperature to about 860° C. and about 1400° C., respectively, and are extremely hard and brittle, making it impossible to process them at all. However, by heating to as high a temperature as possible, the compound decomposes and forms a solid solution in the mother alloy, making processing easier.

A/ again! ,0. Compounds such as and CrtO8 are N i 3
A Like Q, it deteriorates workability, but it has the property of being easier to work with by preventing oxidation at high temperatures.

Therefore, in the manufacturing process of the alloy of the present invention, as a means to solve the above problem, the alloy is processed at a processing rate of 20% or more.
1 at 0% or less cold working and 300°C or more and 1200°C or less
50-2000"C/h after heating for more than 50 hours
By alternately repeating heat treatment of furnace cooling or forced cooling of r, βCrA j! , N i3A l
.

It was found that the formation of compounds such as /1.03 or Cr z 03 was suppressed and good processability was achieved.

Here, cold working was used as the processing method for the alloys of the present invention. The reason for this is that high-temperature heat treatment in the atmosphere or hot working causes oxidation to penetrate deep into the alloy, making processing difficult.

(for production) The present invention will be explained in detail below.

In order to produce the alloy of the present invention, the weight ratio of chromium 10 to 2
6%, copper 2.5-15% and aluminum 2.5-1
0% total 25-40%, cobalt 0.01-20%,
Manganese 0.01-15%, Tungsten 0.01-5
%, titanium 0.01-5% and silicon 0.01-5%
Total of one or more types selected from %0.01
An alloy consisting of ~20% nickel and the remainder substantially nickel is melted in a non-oxidizing atmosphere or in a vacuum using a suitable melting furnace and thoroughly stirred to form a uniform molten alloy.

Next, pour this into a mold of an appropriate shape and size,
Obtain a healthy ingot. After carefully removing the scratches on the surface of this ingot and performing cold working at a processing rate of 20 to 90%,
Seal the material in a container or use any method to prevent oxidation of the material, and heat at 300 to 1200°C for 1 minute or more.
Heat for 0 hours or less. Thereafter, it is forcedly cooled at 50 to 300°C/hr, preferably 300 to 2000"C/hr. By repeating these operations, the desired shape, such as wire rod, plate material, foil material, etc., can be obtained. These molded products are further heated at the same temperature as above (300°C or above 12°C).
00°C or less) and time (1 minute to 50 hours), followed by furnace cooling or air cooling, the specific electrical resistance is 130 μΩ・cm and the temperature coefficient of electrical resistance near room temperature is +100 ×10-”c
Characteristics of m' to 1100XIO-6°C-1 or more can be obtained.

Furthermore, in the present invention, chromium 10 to 26% by weight,
4-15% copper and 2.5-9% aluminum total 3
0-35%, further selected from 0.01-20% cobalt, 0.01-15% manganese, 0.01-5% tungsten, 0.01-5% titanium and 0.01-5% silicon. Total of 1 or 2 or more types: 0.01 to 2
By processing and heat treating an alloy consisting of 0% nickel and the remainder substantially nickel, the specific electrical resistance was reduced to 130μ.
Ω・cm or more and the temperature coefficient of electrical resistance is +50X10
Extremely excellent characteristics of -'°c-1 to -50X 10-6°c-1 can be obtained.

In the method for manufacturing the alloy of the present invention, if the content of the main components Cu and Af in the alloy increases, the oxidation resistance due to high temperature heating in the atmosphere will be impaired, so normal hot working is impossible.

Therefore, all forming processing was done only by cold working, but of course strain relief annealing is required. However, if the general heat treatment method used for conventional Ni-Cr alloys is applied to the alloy of the present invention, the alloy material will be oxidized and intermetallic compounds will be formed, resulting in poor workability. . Methods to solve these problems require steps such as heat treatment to improve workability, cold working for molding, and finally heat treatment to obtain desired properties. Next, two important types of heat treatment methods in each process will be explained in detail.

4P Process A The alloy of the present invention is melted in a suitable melting furnace, and after casting, scratches and the like on the ingot surface are removed, and the surface is further carefully polished. Next, the alloy is inserted into a suitable heat-resistant container having a cross-sectional area slightly larger than the cross-sectional area of the alloy, and the entire container is heated in an electric furnace at a temperature of 300 to 1200°C for 1 minute to 50 hours. , furnace cooling at 50 to 300"C/hr or forced cooling at 300 to 300"C/hr. Next, the material taken out from the container is processed by swaging or a wire drawing machine to a processing rate of 2.
It is subjected to cold working of 0% or more and 90% or less and molded into desired dimensions. Other processing methods include processing the alloy material and the container as one body, removing the container after forming it to the desired dimensions, and finally passing the formed wire rod, plate, etc. into a continuous heating furnace, and subjecting it to the heat treatment conditions described above. Heat treatment is performed.

-B The alloy of the present invention is melted in a suitable melting furnace, and after casting, flaws etc. on the ingot surface are removed, and the surface is further carefully polished. Next, the alloy is heated in a suitable electric furnace in a vacuum, in an inert gas atmosphere, or wrapped in a gas absorbing material such as titanium sponge at a temperature of 300 to 1200°C for 1 minute to 50 hours. , 50-300°C/h
The material is cooled in a furnace at a temperature of 300 to 300 mm, preferably cold-worked using a wire drawing machine or the like at a processing rate of 20% to 90% to form desired dimensions. The formed wire rod, plate material, etc. are further wrapped in a vacuum, an inert gas atmosphere, or a gas absorbing material such as titanium sponge, and finally subjected to the same heat treatment as described above.

Thus, as a result of the above two types of heat treatment, the material had metallic luster and extremely small grain size, hardly any malignant intermetallic compounds were produced, and was ductile and exhibited good workability. For example, it was easy to process ultrafine wires with a wire diameter of 0.06 mm or less.

Therefore, the manufacturing method of the present invention not only produces the alloy of the present invention, but also
It can also be applied to alloys containing a large amount of copper, aluminum, etc., and is often removed industrially.

The alloy of the present invention obtained by the above-mentioned novel manufacturing method has a specific electrical resistance of 130 μΩ·0111 or more and a temperature coefficient of electrical resistance near room temperature of +50×10−6°c−1 to −50×10−6°c−1 Shows excellent properties.

Figures 1, 2 and 3 show Ni-0~30%Cr
Processing -0~20%Cu-0~10%A1 alloy at 000°C
Changes in specific electrical resistance ρ at 20°C and average temperature coefficient TCR of electrical resistance from 0 to 50°C with respect to Cr content, Cu content, and Af content when cooling at 300°C/hr after heating for 1 hour at show. Also, Figures 4 and 5
The figure shows Ni-20%Cr-10%Cu-5Aj! The alloy contains Co25% or less, Mn15% or less, W5% or less, Ti
Changes in ρ and TCR with respect to the amount of CO, the amount of Mn, and the amount of W, the amount of Ti, or the amount of Si are shown when 5% or less of Si or 5% or less of Si is added.

The raw materials used were electrolytic nickel and electrolytic chromium with a purity of 99.9% or higher, and oxygen-free copper and electrolytic aluminum with a purity of 99.99% or higher.

To prepare the sample, raw materials having a total weight of Log were placed in a crucible and melted in a vacuum using a high frequency induction electric furnace.

Thereafter, the mixture was thoroughly stirred to obtain a homogeneous molten alloy. Next, this was cast according to the iron rule that the inner diameter was 10+++a+ and the height was 120 as to obtain a sound ingot. Scratches on the surface of this ingot were carefully removed using a lathe, and a round bar with a diameter of about 9IllI11 was made.

This round bar was cold worked (processing rate: 69%) to a diameter of 5Il1m using a swaging machine to obtain an original sample.

This original sample was subjected to heat treatment (
Process I), Cold processing to form into various shapes (Process ■
) and heat treatment to obtain the required characteristics (step ①).

The reason why only cold working was performed in this experiment in step (3) is that when the alloy of the present invention is heat treated at high temperatures, oxidation penetrates deeply into the alloy, making it brittle and making hot working difficult.

Next, these manufacturing steps will be explained.

A round bar with a knee size of 5 mm+ is enclosed in a dry quartz tube (inner diameter 6 mm) slightly larger than its cross-sectional area, and this is placed in an electric furnace (inner diameter 3 m, length 1 m). And 300-1 in advance
Electric furnace (inner diameter 30°C) set at various temperatures of 200°C
mm, length 1 m) and heated in the atmosphere for 2 minutes, 1 hour, and 10 hours, then the electric furnace was heated at an arbitrary speed of 50 to 300.
By using a furnace cooling method that cools at ℃/hr, using an electric furnace with a fan, or by moving the quartz tube inside the electric furnace,
Cool to room temperature using a forced cooling method that cools at 00°C/hr. After heat treatment using the method described above, the round bars were removed from the quartz tube, and as a result, metallic luster was observed in all of them. What has become clear is that the processability of the alloy deteriorates when heated at relatively low temperatures and for long periods of time, or when cooled very slowly.

Knee degree ↓ The round bar that has been heat treated in step
■ Obtain the wire rod. The processing rate in this case is 84%. Next, heat treatment similar to step (2) and this step are repeated to finally obtain a thin wire with a wire diameter of 0.5 m+11. Processing rates during this period are 20%, 50%, 75%, 80% and 93%
There were five types. However, in the method for manufacturing the alloy of the present invention, processing at a processing rate of 93% was difficult due to extremely advanced work hardening. Therefore, it was found that the limit value of the processing rate was about 90%.

Knee distance l Length 100 from the fine wire with a wire diameter of 0.51 obtained in step ①
After cutting the tube into a straight line, it was placed in a quartz tube with an inner diameter of 1 mm or less, sealed in vacuum, and subjected to various heat treatments at the same heating temperature and time as in manufacturing process I above, and then cooled at various speeds. do. Furthermore, in the case of heat treatment at temperatures below 800°C, by wrapping the entire sample in a titanium sponge or the like and then evacuating the gas, no oxidation was observed as in the case of ultra-vacuum, and it was found to be extremely effective. Through the above steps, a desired thin wire sample can be obtained.

For various samples obtained by the above-mentioned method, 20
Specific electrical resistance ρ at °C, average temperature coefficient of electrical resistance TCR (-ΔR/R, /ΔT) at 0 to 50 °C, structure, etc. were evaluated. Here, ΔR=R3゜−R
o and ΔT=50.

Figures 6 and 7 show changes in ρ and TCP with respect to heating temperature and heating time, respectively. Figure 8 shows evaluation of workability or electrical properties with respect to cooling rate and heating temperature. From Figure 1. As you can see, ρ is the heating time of 2
1200℃ or higher for minutes or 30℃ for 1 hour
High values of 130 μΩ・cat or more are obtained at temperatures above 0°C, but in the case of comparative alloy A (dotted line), the maximum value is 128 μΩ・cm at 600°C, and the TCR is ±50XIQ at any heating time. It can be seen that a low value of 130μΩ・am or higher can be obtained by heating at a temperature of 300℃ or higher.
A TCR of less than 50×10 cm′ can be obtained.

The characteristics corresponding to the heat treatment conditions of the samples are shown in Table 1.

Table 1] Tsuji 1 Raw materials of the same purity as in Example 1 were used. The sample manufacturing method involved placing a total weight of 10 g in a high-purity alumina crucible (SSA-H,
T-2) and melted in a Tammann furnace while blowing high-purity argon gas onto the metal surface to prevent oxidation, and stirred well to obtain a homogeneous molten alloy. Next, this was sucked up into a quartz tube with an inner diameter of 3.6 am, and for homogenization treatment, it was inserted into a quartz tube sealed at one end with an inner diameter slightly larger than the diameter of the sample, and heated at 1000°C for 10 minutes. Take it out of the furnace and cool it in the air. Next, the above-mentioned heat treatment is performed to obtain various processing rates to obtain fine wires having a wire diameter of 0.5 + am. Finally, the thin wire is heated at various temperatures of 300° C. or more and 1200° C. or less for 1 minute or more and 50 hours or less, and then cooled at various cooling rates to prepare samples. The experimental method is Example 1
It was the same. The heat treatment conditions of the samples and the corresponding properties are shown in Table 2.

Table 2 Table 3 The raw materials used had the same purity as in Example 2, but the purity of silicon was 99.99% or higher. The sample manufacturing method and experimental method were the same as in Example 2.

The heat treatment conditions of the samples and the corresponding properties are shown in Table 3.

In addition, representative alloys belonging to the alloy area of the present invention and comparative alloy A
, B, C, and D are shown in Tables 4 and 5 when they are heated at 1000''C for 1 hour and then cooled in a furnace at 300°C/hr.

As can be seen from FIGS. 1 to 8, Examples 1 to 3, and Tables 4 and 5, the present invention has a
26%, Cu 2.5-15% and Al22.5-1
0% total 25-40%, Co O, 01-20%, M
n O, 01-15%, W 0.01-5%, Ti 0
．． The alloy is composed of one or more selected from 0.01 to 5% Si and 0.01 to 5% Si, with a total of 0.01 to 20%, and the balance substantially consisting of Ni.

In addition, the present invention provides a method for heating the above-mentioned alloy at 300°C or more and 1200°C or less for 1 minute or more and 50 hours or less using an appropriate atmosphere blocking method or atmosphere treatment method, followed by furnace cooling at 50 to 300°C/hr, preferably 300°C or less. The present invention provides a manufacturing method in which forced cooling is performed at ~2000°C/hr and further cold working is performed at a working rate of 20% or more and 90% or less to form desired dimensions.

Furthermore, the present invention provides a heat treatment in which the alloy obtained by the above manufacturing method is heated at 300°C or more and 1200°C or less for 1 minute or more and 50 hours or less, and then furnace-cooled or air-cooled. The temperature coefficient of electrical resistance at 130 μΩ・cm or more and around room temperature is +100 × 1
0-1 to -1 to -100×10-6°c-', or +50X10-"cm' to 150XlO-6°c
- Has excellent letter features.

Next, the reasons for limiting the numerical values of the composition, heat treatment, processing rate, etc. of the alloy of the present invention will be described. First, the alloy composition is Cr
10-24%, Cu 2.5-15%, A12.5-1
0 and a total of 25-40% of Cr, Cu and AN.

Co 0.01-20%, Mn 0.01-15%,
The reason for limiting the total amount to 0.01 to 20% of one or more selected from W 0.01 to 5%, Ti 0.01 to 5%, and Si 0.01 to 5%, and the balance Ni is as follows. As is clear from FIGS. 1 to 3, each example, and Table 4, when the composition is outside these ranges, the specific electrical resistance ρ becomes 130 μΩ・CII+ or less, and the temperature coefficient of electrical resistance TCR becomes +100 × 10 -'°c-1 to -100 x 10-"cm' range, workability deteriorates, crystal grains grow coarsely, and other requirements cannot be met, making it unsuitable as a precision resistance alloy. This is because Tables 6 and 7 show the relationship between the composition and the properties.

Table 6 Table 7 ◎: Improved ○: Slightly improved △: Slightly worse ×: Worsened ◎: Improved O: Slightly improved Δ: Slightly worse ×: Worsened -
: No change In addition, in the method for producing the alloy of the present invention, the heating temperature is 300°C or more and the heating time is 1 minute or more and 50 hours or less, and the cooling rate is furnace cooling at 50 to 300°C/hr, or The reason why we limited the forced cooling at 300 to 2000°C/hr and the processing rate to 20% or more and 90% or less is that if it deviates from each of the above ranges, it is clear from Figures 6 to 8 and each example. This is because, in addition to oxidation resistance, workability, and electrical properties, these methods also pose major problems in manufacturing cost, making them inappropriate as a method for manufacturing precision resistance alloys.

(Effect of the invention) According to the invention, Ni-10-26% Cr-2,5-1
5%Cu-2,5~10%A f -0,01~20%
Co-0,01~15%Mn-0,01~5%W-0,
The 01-5% Ti-0,01-5% Si alloy has a high specific electrical resistance of 130 μΩ・C11 or more, and has an extremely small temperature coefficient of electrical resistance of ±50×10−6°C−1 near room temperature. Therefore, it is clear that electronics-related devices using the alloy of the present invention will be further miniaturized, and will also contribute to high stability and high performance.

That is, by using the alloy of the present invention, it is possible to not only suppress the temperature drift and heat generation of the device under severe temperature environments as much as possible, but also to prevent the destruction of the device even under large voltage fluctuations.

Furthermore, according to the method for producing the alloy of the present invention, Co.

The addition of Mn, W, Ti, and Si not only improves electrical properties, but also suppresses the coarsening of recrystallization.Furthermore, the new heat treatment method produces almost no malignant compounds, and oxidation does not penetrate inside. It also has the effect of improving workability.

The manufacturing method of the present invention not only produces the alloy of the present invention but also Cr.

Cu9A/! It is fully applicable to high content alloys such as
It costs a lot of money for industrial production.

[Brief explanation of the drawing]

Figures 1, 2, and 3 show Ni-0 to 30%C heated at 1000°C for 1 hour and then cooled at 300°C/hr.
r-0~20%Cu-0~10%A! Each of the alloys C
Characteristic diagrams 4 and 5 showing changes in the specific electrical resistance ρ at 20°C and the average temperature coefficient TCR of the electrical resistance from 0 to 50°C with respect to the amount of Ni-20 %Cr-10%Cu-5%A1 alloy with Co
, a characteristic diagram showing the changes in ρ and TCR with respect to the amount of Co or Mn, and the amount of W, Ti or Si when , Mn, W, Ti or St was added. For ρ and TCP of Comparative Alloy A and Invention Alloy No. 14, 2 minutes;
Figure 7 is a characteristic diagram showing changes in heating temperature when heated for 1 hour or 10 hours.
FIG. 8 is a characteristic diagram showing the change in heating time when heated at 00° C., and FIG. 8 is a characteristic diagram showing the relationship between the workability and characteristics of Alloy No. 14 and the heating temperature or cooling rate. Figure 1 (:ry”A to Figure 2, Figure 4, or tt Mn /'1 Figure 3

Claims (1)

[Claims] 1. Chromium 10-26%, copper 2.5-15% by weight
% and aluminum 2.5-10% total 25-40
%, cobalt 0.01-20%, manganese 0.01-1
5%, tungsten 0.01~5%, titanium 0.01~
5% and one or more selected from 0.01 to 5% silicon and a total of 0.01 to 20% of nickel, with a specific electrical resistance of 130 μΩ・cm or more and a temperature of electrical resistance near room temperature. The coefficient is +100×10^-^6℃^-^1 to -
A precision resistance alloy characterized by having a temperature of 100×10^-^6℃^-^1. 2. By weight, a total of 30-35% of chromium 10-26%, copper 4-15% and aluminum 2.5-9%, cobalt 0.01-20%, manganese 0.01-15%,
Consists of a total of 0.01 to 20% of one or more selected from 0.01 to 5% of tungsten, 0.01 to 5% of titanium, and 0.01 to 5% of silicon, and the remainder of nickel. The electrical resistance is 130μΩ・cm or more and the temperature coefficient of electrical resistance near room temperature is +50×10^
-＾6℃＾-＾1～-50×10＾-＾6℃＾-＾1
A precision resistance alloy characterized by having. 3. Chromium 10-26%, copper 3.5-15% by weight
% and aluminum 2.5-10% total 25-40
%, cobalt 0.01-20%, manganese 0.01-1
5%, tungsten 0.01~5%, titanium 0.01~
1 selected from 5% and silicon 0.01-5%
An alloy consisting of a total of 0.01% to 20% of two or more species is melted and cast, inserted into a heat-resistant container with an inner surface slightly larger than the cross-sectional area of the alloy, and heated at 300°C to 1200°C for 1 minute to 50°C. After heating for less than 50 to 300℃/h
Furnace cooling at R, preferably forced cooling at 300-2000°C/hr, to achieve a processing rate of 20% or more of 90% for the raw material and container.
The container is molded to the desired size by the following cold working, and the container is removed according to the appropriate size.
By applying heat treatment to a temperature of 1 minute or more and 50 hours at a temperature of 1 minute or more, followed by furnace cooling or air cooling, a specific electrical resistance of 130"Ω・cm or more and a temperature coefficient of electrical resistance near room temperature of +100 x 10^ -＾5℃＾-＾1
~-100×10^-^6℃^-^1 or +50
×10＾-＾6℃＾-＾1～-50×10＾-＾6℃
A method for producing a precision resistance alloy characterized by obtaining ^-^1. 4. Chromium 10-26%, copper 2.5-15% by weight
% and aluminum 2.5-10% total 25-40
%, cobalt 0.01-20%, manganese 0.01-1
5%, tungsten 0.01~5%, titanium 0.01~
1 selected from 5% and silicon 0.01-5%
An alloy consisting of a total of 0.01 to 20% of a seed or two or more types and a residual nickel is melted and cast, and the molded product is wrapped in a vacuum, in an inert gas atmosphere, or with a sponge titanium or nickel plate, and then heated at 300°C or more at 1200°C. After heating for 1 minute or more and 50 hours or less at ℃ or below, 50-300℃/hr
After furnace cooling or forced cooling at 300 to 2000°C/hr, cold working is performed at a working rate of 20% to 90% to form the desired dimensions, and the molded product is further heated at 300°C to 1200°C. By performing heat treatment at the following temperature and for 1 minute or more for 50 hours, followed by furnace cooling or air cooling, the specific electrical resistance will be 130 μΩ・cm or more and the temperature coefficient of electrical resistance near room temperature will be +100×10^-
＾6℃＾-＾1～-100×10＾-＾6℃＾-＾1
Or +50×10^-^6℃^-^1 to -50×
A method for producing a precision resistance alloy characterized by obtaining a temperature of 10^-^6°C^-^1.