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Priority to JP57151568ApriorityCriticalpatent/JPS5942548A/ja
Publication of JPS5942548ApublicationCriticalpatent/JPS5942548A/ja
Publication of JPH045184B2publicationCriticalpatent/JPH045184B2/ja
G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
Landscapes
Physics & Mathematics
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General Physics & Mathematics
(AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials
(AREA)