JPH045179B2 - - Google Patents

Info

Publication number
JPH045179B2
JPH045179B2 JP58132555A JP13255583A JPH045179B2 JP H045179 B2 JPH045179 B2 JP H045179B2 JP 58132555 A JP58132555 A JP 58132555A JP 13255583 A JP13255583 A JP 13255583A JP H045179 B2 JPH045179 B2 JP H045179B2
Authority
JP
Japan
Prior art keywords
group
ring
carbon atoms
present
acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58132555A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6024542A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP13255583A priority Critical patent/JPS6024542A/ja
Publication of JPS6024542A publication Critical patent/JPS6024542A/ja
Publication of JPH045179B2 publication Critical patent/JPH045179B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
JP13255583A 1983-07-20 1983-07-20 新規な光重合性組成物 Granted JPS6024542A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13255583A JPS6024542A (ja) 1983-07-20 1983-07-20 新規な光重合性組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13255583A JPS6024542A (ja) 1983-07-20 1983-07-20 新規な光重合性組成物

Publications (2)

Publication Number Publication Date
JPS6024542A JPS6024542A (ja) 1985-02-07
JPH045179B2 true JPH045179B2 (enrdf_load_stackoverflow) 1992-01-30

Family

ID=15084021

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13255583A Granted JPS6024542A (ja) 1983-07-20 1983-07-20 新規な光重合性組成物

Country Status (1)

Country Link
JP (1) JPS6024542A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2644898B2 (ja) * 1989-11-16 1997-08-25 旭化成工業株式会社 レリーフ形成用感光性樹脂組成物
JP5258237B2 (ja) * 2006-09-14 2013-08-07 富士フイルム株式会社 インク組成物、インクジェット記録方法、平版印刷版の製造方法、及び平版印刷版

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5040423B2 (enrdf_load_stackoverflow) * 1972-05-15 1975-12-24
JPS5234490B2 (enrdf_load_stackoverflow) * 1974-02-26 1977-09-03
JPS5810737A (ja) * 1981-07-13 1983-01-21 Sekisui Chem Co Ltd 感光性樹脂組成物

Also Published As

Publication number Publication date
JPS6024542A (ja) 1985-02-07

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