JPH0449934B2 - - Google Patents

Info

Publication number
JPH0449934B2
JPH0449934B2 JP27196084A JP27196084A JPH0449934B2 JP H0449934 B2 JPH0449934 B2 JP H0449934B2 JP 27196084 A JP27196084 A JP 27196084A JP 27196084 A JP27196084 A JP 27196084A JP H0449934 B2 JPH0449934 B2 JP H0449934B2
Authority
JP
Japan
Prior art keywords
layout
mask
image data
range
trimming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP27196084A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61149954A (ja
Inventor
Juichiro Fukuda
Shigeru Masuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP59271960A priority Critical patent/JPS61149954A/ja
Publication of JPS61149954A publication Critical patent/JPS61149954A/ja
Publication of JPH0449934B2 publication Critical patent/JPH0449934B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/90—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared by montage processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Editing Of Facsimile Originals (AREA)
JP59271960A 1984-12-25 1984-12-25 印刷製版の自動トリミングレイアウト方法 Granted JPS61149954A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59271960A JPS61149954A (ja) 1984-12-25 1984-12-25 印刷製版の自動トリミングレイアウト方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59271960A JPS61149954A (ja) 1984-12-25 1984-12-25 印刷製版の自動トリミングレイアウト方法

Publications (2)

Publication Number Publication Date
JPS61149954A JPS61149954A (ja) 1986-07-08
JPH0449934B2 true JPH0449934B2 (enrdf_load_stackoverflow) 1992-08-12

Family

ID=17507204

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59271960A Granted JPS61149954A (ja) 1984-12-25 1984-12-25 印刷製版の自動トリミングレイアウト方法

Country Status (1)

Country Link
JP (1) JPS61149954A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS61149954A (ja) 1986-07-08

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