JPH0449257B2 - - Google Patents
Info
- Publication number
- JPH0449257B2 JPH0449257B2 JP58153773A JP15377383A JPH0449257B2 JP H0449257 B2 JPH0449257 B2 JP H0449257B2 JP 58153773 A JP58153773 A JP 58153773A JP 15377383 A JP15377383 A JP 15377383A JP H0449257 B2 JPH0449257 B2 JP H0449257B2
- Authority
- JP
- Japan
- Prior art keywords
- sample
- height
- variation
- stage
- amount
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electron Beam Exposure (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58153773A JPS6045022A (ja) | 1983-08-23 | 1983-08-23 | Ｌｓｉ製造装置における高さ補正方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58153773A JPS6045022A (ja) | 1983-08-23 | 1983-08-23 | Ｌｓｉ製造装置における高さ補正方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6045022A JPS6045022A (ja) | 1985-03-11 |
| JPH0449257B2 true JPH0449257B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1992-08-11 |
Family
ID=15569818
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58153773A Granted JPS6045022A (ja) | 1983-08-23 | 1983-08-23 | Ｌｓｉ製造装置における高さ補正方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6045022A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5536990A (en) * | 1979-07-16 | 1980-03-14 | Toshiba Corp | Apparatus for applying electron beam |
| JPS59188916A (ja) * | 1983-04-11 | 1984-10-26 | Nippon Telegr & Teleph Corp <Ntt> | 偏向歪補正方法 |
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1983
- 1983-08-23 JP JP58153773A patent/JPS6045022A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6045022A (ja) | 1985-03-11 |