JPH0447980Y2 - - Google Patents
Info
- Publication number
- JPH0447980Y2 JPH0447980Y2 JP10980286U JP10980286U JPH0447980Y2 JP H0447980 Y2 JPH0447980 Y2 JP H0447980Y2 JP 10980286 U JP10980286 U JP 10980286U JP 10980286 U JP10980286 U JP 10980286U JP H0447980 Y2 JPH0447980 Y2 JP H0447980Y2
- Authority
- JP
- Japan
- Prior art keywords
- light
- buffer layer
- light receiving
- waveguide
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000003287 optical effect Effects 0.000 claims description 11
- 239000000758 substrate Substances 0.000 claims description 10
- 239000004065 semiconductor Substances 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- 229910052710 silicon Inorganic materials 0.000 description 6
- 239000010703 silicon Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- 239000013307 optical fiber Substances 0.000 description 2
- 230000001902 propagating effect Effects 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10980286U JPH0447980Y2 (en, 2012) | 1986-07-17 | 1986-07-17 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10980286U JPH0447980Y2 (en, 2012) | 1986-07-17 | 1986-07-17 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6316475U JPS6316475U (en, 2012) | 1988-02-03 |
| JPH0447980Y2 true JPH0447980Y2 (en, 2012) | 1992-11-12 |
Family
ID=30988232
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10980286U Expired JPH0447980Y2 (en, 2012) | 1986-07-17 | 1986-07-17 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0447980Y2 (en, 2012) |
-
1986
- 1986-07-17 JP JP10980286U patent/JPH0447980Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6316475U (en, 2012) | 1988-02-03 |
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