JPH044736U - - Google Patents

Info

Publication number
JPH044736U
JPH044736U JP4403890U JP4403890U JPH044736U JP H044736 U JPH044736 U JP H044736U JP 4403890 U JP4403890 U JP 4403890U JP 4403890 U JP4403890 U JP 4403890U JP H044736 U JPH044736 U JP H044736U
Authority
JP
Japan
Prior art keywords
gas
injector
thin film
film forming
forming apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4403890U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0719143Y2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1990044038U priority Critical patent/JPH0719143Y2/ja
Publication of JPH044736U publication Critical patent/JPH044736U/ja
Application granted granted Critical
Publication of JPH0719143Y2 publication Critical patent/JPH0719143Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Electrodes Of Semiconductors (AREA)
JP1990044038U 1990-04-26 1990-04-26 ガス導入装置を有するｃｖｄ装置 Expired - Lifetime JPH0719143Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1990044038U JPH0719143Y2 (ja) 1990-04-26 1990-04-26 ガス導入装置を有するｃｖｄ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1990044038U JPH0719143Y2 (ja) 1990-04-26 1990-04-26 ガス導入装置を有するｃｖｄ装置

Publications (2)

Publication Number Publication Date
JPH044736U true JPH044736U (US07534539-20090519-C00280.png) 1992-01-16
JPH0719143Y2 JPH0719143Y2 (ja) 1995-05-01

Family

ID=31556980

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1990044038U Expired - Lifetime JPH0719143Y2 (ja) 1990-04-26 1990-04-26 ガス導入装置を有するｃｖｄ装置

Country Status (1)

Country Link
JP (1) JPH0719143Y2 (US07534539-20090519-C00280.png)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100230151B1 (ko) * 1996-07-23 1999-11-15 윤종용 저압 화학기상증착 설비의 종형 확산로에서 사용되는 가스노즐 고정장치
JP2009224765A (ja) * 2008-02-20 2009-10-01 Hitachi Kokusai Electric Inc 基板処理装置
JP2013506300A (ja) * 2009-09-25 2013-02-21 フェローテック（ユーエスエー）コーポレイション ハイブリッドガスインジェクタ

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20170167023A1 (en) * 2015-12-09 2017-06-15 Lam Research Corporation Silicon or silicon carbide gas injector for substrate processing systems

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62168638U (US07534539-20090519-C00280.png) * 1986-04-17 1987-10-26
JPS62190335U (US07534539-20090519-C00280.png) * 1986-05-23 1987-12-03

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62168638U (US07534539-20090519-C00280.png) * 1986-04-17 1987-10-26
JPS62190335U (US07534539-20090519-C00280.png) * 1986-05-23 1987-12-03

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100230151B1 (ko) * 1996-07-23 1999-11-15 윤종용 저압 화학기상증착 설비의 종형 확산로에서 사용되는 가스노즐 고정장치
JP2009224765A (ja) * 2008-02-20 2009-10-01 Hitachi Kokusai Electric Inc 基板処理装置
JP2013506300A (ja) * 2009-09-25 2013-02-21 フェローテック（ユーエスエー）コーポレイション ハイブリッドガスインジェクタ

Also Published As

Publication number Publication date
JPH0719143Y2 (ja) 1995-05-01

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term