JPH0446347U - - Google Patents
Info
- Publication number
- JPH0446347U JPH0446347U JP8874090U JP8874090U JPH0446347U JP H0446347 U JPH0446347 U JP H0446347U JP 8874090 U JP8874090 U JP 8874090U JP 8874090 U JP8874090 U JP 8874090U JP H0446347 U JPH0446347 U JP H0446347U
- Authority
- JP
- Japan
- Prior art keywords
- sample chamber
- chamber
- preliminary
- exhaust system
- gate valve
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010894 electron beam technology Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
Description
添付図面は本考案に係る排気系の一実施例を示
す構成概略図である。
1……試料室、2……予備室、3……仕切弁、
4……ウエハ、5,9……第1及び第2の油回転
ポンプ、6,8a,8b,10,11……排気管
、7……ターボ分子ポンプ、12a乃至12f…
…バルブ、13……連通管。
The accompanying drawing is a schematic diagram showing an embodiment of the exhaust system according to the present invention. 1...Sample chamber, 2...Preliminary room, 3...Gate valve,
4... Wafer, 5, 9... First and second oil rotary pumps, 6, 8a, 8b, 10, 11... Exhaust pipe, 7... Turbo molecular pump, 12a to 12f...
...Valve, 13...Communication pipe.
Claims (1)
を出し入れするためにこの試料室と仕切弁を介し
て連通する予備室とを備え、前記予備室内に2つ
の油回転ポンプを並列に接続したことを特徴とす
る電子線装置における排気系。 It is equipped with a sample chamber maintained in a high vacuum, and a preliminary chamber that communicates with this sample chamber via a gate valve in order to take samples into and out of the sample chamber, and two oil rotary pumps are connected in parallel within the preliminary chamber. An exhaust system in an electron beam device characterized by:
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8874090U JPH0446347U (en) | 1990-08-24 | 1990-08-24 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8874090U JPH0446347U (en) | 1990-08-24 | 1990-08-24 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0446347U true JPH0446347U (en) | 1992-04-20 |
Family
ID=31822228
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8874090U Pending JPH0446347U (en) | 1990-08-24 | 1990-08-24 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0446347U (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003016990A (en) * | 2001-06-28 | 2003-01-17 | Seiko Instruments Inc | Inductively coupled plasma mass spectrometer |
JP2010177004A (en) * | 2009-01-29 | 2010-08-12 | Hitachi High-Technologies Corp | Vacuum exhaust device and charged particle beam apparatus equipped with the vacuum exhaust device |
JP2011154922A (en) * | 2010-01-28 | 2011-08-11 | Hitachi High-Technologies Corp | Vacuum device for preliminary exhaust and charged particle beam device |
-
1990
- 1990-08-24 JP JP8874090U patent/JPH0446347U/ja active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003016990A (en) * | 2001-06-28 | 2003-01-17 | Seiko Instruments Inc | Inductively coupled plasma mass spectrometer |
JP2010177004A (en) * | 2009-01-29 | 2010-08-12 | Hitachi High-Technologies Corp | Vacuum exhaust device and charged particle beam apparatus equipped with the vacuum exhaust device |
JP2011154922A (en) * | 2010-01-28 | 2011-08-11 | Hitachi High-Technologies Corp | Vacuum device for preliminary exhaust and charged particle beam device |
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