JPH0444263B2 - - Google Patents

Info

Publication number
JPH0444263B2
JPH0444263B2 JP61302316A JP30231686A JPH0444263B2 JP H0444263 B2 JPH0444263 B2 JP H0444263B2 JP 61302316 A JP61302316 A JP 61302316A JP 30231686 A JP30231686 A JP 30231686A JP H0444263 B2 JPH0444263 B2 JP H0444263B2
Authority
JP
Japan
Prior art keywords
exposure
exposure amount
resist
pattern
amount
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61302316A
Other languages
English (en)
Japanese (ja)
Other versions
JPS63155614A (ja
Inventor
Ryoji Tokari
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP61302316A priority Critical patent/JPS63155614A/ja
Publication of JPS63155614A publication Critical patent/JPS63155614A/ja
Publication of JPH0444263B2 publication Critical patent/JPH0444263B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP61302316A 1986-12-18 1986-12-18 露光量の最適値検知方法 Granted JPS63155614A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61302316A JPS63155614A (ja) 1986-12-18 1986-12-18 露光量の最適値検知方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61302316A JPS63155614A (ja) 1986-12-18 1986-12-18 露光量の最適値検知方法

Publications (2)

Publication Number Publication Date
JPS63155614A JPS63155614A (ja) 1988-06-28
JPH0444263B2 true JPH0444263B2 (enrdf_load_stackoverflow) 1992-07-21

Family

ID=17907481

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61302316A Granted JPS63155614A (ja) 1986-12-18 1986-12-18 露光量の最適値検知方法

Country Status (1)

Country Link
JP (1) JPS63155614A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02153517A (ja) * 1988-12-05 1990-06-13 Mitsubishi Electric Corp 半導体装置の製造装置
JP5082172B2 (ja) * 2001-02-05 2012-11-28 ソニー株式会社 表示装置の製造方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1012822A (en) * 1972-11-13 1977-06-28 American Hoechst Corporation Test film and method of using same

Also Published As

Publication number Publication date
JPS63155614A (ja) 1988-06-28

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term