JPH0439224B2 - - Google Patents
Info
- Publication number
- JPH0439224B2 JPH0439224B2 JP13003386A JP13003386A JPH0439224B2 JP H0439224 B2 JPH0439224 B2 JP H0439224B2 JP 13003386 A JP13003386 A JP 13003386A JP 13003386 A JP13003386 A JP 13003386A JP H0439224 B2 JPH0439224 B2 JP H0439224B2
- Authority
- JP
- Japan
- Prior art keywords
- etching
- pure water
- tank
- semiconductor element
- work holder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Weting (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13003386A JPS62287624A (ja) | 1986-06-06 | 1986-06-06 | 半導体素子のエッチング装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13003386A JPS62287624A (ja) | 1986-06-06 | 1986-06-06 | 半導体素子のエッチング装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62287624A JPS62287624A (ja) | 1987-12-14 |
| JPH0439224B2 true JPH0439224B2 (enrdf_load_stackoverflow) | 1992-06-26 |
Family
ID=15024485
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13003386A Granted JPS62287624A (ja) | 1986-06-06 | 1986-06-06 | 半導体素子のエッチング装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62287624A (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102021116206B3 (de) | 2021-06-23 | 2022-09-29 | Infineon Technologies Bipolar Gmbh & Co. Kg | Verfahren und Vorrichtung zur Herstellung einer Randstruktur eines Halbleiterbauelements |
-
1986
- 1986-06-06 JP JP13003386A patent/JPS62287624A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62287624A (ja) | 1987-12-14 |
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