JPH04366126A - Thermosetting resin composition - Google Patents

Thermosetting resin composition

Info

Publication number
JPH04366126A
JPH04366126A JP16875891A JP16875891A JPH04366126A JP H04366126 A JPH04366126 A JP H04366126A JP 16875891 A JP16875891 A JP 16875891A JP 16875891 A JP16875891 A JP 16875891A JP H04366126 A JPH04366126 A JP H04366126A
Authority
JP
Japan
Prior art keywords
resin composition
parts
thermosetting resin
diaminosiloxane
present
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16875891A
Other languages
Japanese (ja)
Other versions
JPH0776259B2 (en
Inventor
Teru Okunoyama
奥野山 輝
Yasuko Imagawa
今川 康子
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Chemical Corp
Original Assignee
Toshiba Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Chemical Corp filed Critical Toshiba Chemical Corp
Priority to JP3168758A priority Critical patent/JPH0776259B2/en
Publication of JPH04366126A publication Critical patent/JPH04366126A/en
Publication of JPH0776259B2 publication Critical patent/JPH0776259B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Epoxy Resins (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Abstract

PURPOSE:To prepare the title compsn. which exhibits a high humidity resistance, a low-stress property, and a high heat resistance and is useful for sealing a semiconductor, etc., by compounding a specific compd. and a specific epoxy compd. as essential components. CONSTITUTION:The title compsn. is prepd. by compounding a bismaleimide compd. derived from a diaminosiloxane of formula I (wherein R<1> and R<2> are each a divalent hydrocarbon group; R<3> and R<4> are each a monovalent hydrocarbon group; and n is 1-5) and an epoxidized 1,2-polybutadiene of formula II as essential components.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】本発明は、耐湿性、低応力性、耐
熱性等に優れた熱硬化性樹脂組成物に関し、この組成物
は半導体等の電子部品の液状封止用に好適である。
[Field of Industrial Application] The present invention relates to a thermosetting resin composition having excellent moisture resistance, low stress properties, heat resistance, etc., and this composition is suitable for liquid sealing of electronic components such as semiconductors. .

【0002】0002

【従来の技術】従来、半導体等の電子部品の液状封止に
用いられる樹脂組成物としては、エポキシ樹脂が用いら
れていた。このエポキシ樹脂による液状封止は、ガラス
、金属、セラミックを用いたハーメチックシール方式に
比較して経済的に有利なために、広くTAB、ICカー
ド、ハイブリッドIC等の封止に実用化されている。
BACKGROUND OF THE INVENTION Conventionally, epoxy resins have been used as resin compositions for liquid sealing of electronic components such as semiconductors. Liquid sealing using epoxy resin is economically advantageous compared to hermetic sealing methods using glass, metal, and ceramics, so it is widely used for sealing TABs, IC cards, hybrid ICs, etc. .

【0003】しかしながら、近年封止材料の使用条件は
厳しくなる傾向にあり、低応力性、耐湿性、耐熱性及び
密着性が重要な特性となっている。そこで近年、低応力
性、耐湿性、耐熱性あるいは密着性の優れた樹脂組成物
が多く提案されているが、さらに一段と半導体ペレット
は大型化、高集積度化の傾向が高まり、従来のエポキシ
樹脂組成物では対応しきれなくなってきた。すなわち、
この組成物で半導体の液状封止をした場合、ペレットや
リードフレームと封止樹脂との熱膨脹係数の差に基づく
熱応力により、ペレットの反り、クラックが発生する等
の問題が生じるようになった。従って、これらのことか
ら低応力性に優れさらに耐湿性、耐熱性にも優れた液状
封止用の樹脂組成物の開発が望まれていた。
However, in recent years, the usage conditions for sealing materials have tended to become stricter, and low stress, moisture resistance, heat resistance, and adhesion have become important properties. Therefore, in recent years, many resin compositions with excellent low stress, moisture resistance, heat resistance, or adhesion have been proposed. Compositions are no longer able to cope with this problem. That is,
When semiconductors are encapsulated in liquid form using this composition, problems such as warpage and cracking of the pellets occur due to thermal stress due to the difference in coefficient of thermal expansion between the pellets or lead frames and the encapsulating resin. . Therefore, for these reasons, it has been desired to develop a resin composition for liquid sealing that has excellent low stress properties and also has excellent moisture resistance and heat resistance.

【0004】0004

【発明が解決しようとする課題】本発明は、上記の事情
に鑑みてなされたもので、耐湿性、密着性、低応力性と
ともに耐熱性にも優れ、また液状封止をした場合にペレ
ットの反りやクラックの発生のない、改良された熱硬化
性樹脂組成物を提供しようとするものである。
Problems to be Solved by the Invention The present invention has been made in view of the above-mentioned circumstances, and has excellent moisture resistance, adhesion, low stress properties, and heat resistance. The object of the present invention is to provide an improved thermosetting resin composition that is free from warping and cracking.

【0005】[0005]

【課題を解決するための手段】本発明者らは、上記の目
的を達成しようと鋭意研究を重ねた結果、後述する組成
の樹脂組成物が、上記目的を達成する事を見いだし、本
発明を完成したものである。
[Means for Solving the Problems] As a result of intensive research aimed at achieving the above object, the present inventors found that a resin composition having the composition described below achieves the above object, and the present invention has been completed. It is completed.

【0006】すなわち、本発明は、(A)一般式化3で
示されるジアミノシロキサンから誘導されるビスマレイ
ミド
That is, the present invention provides (A) a bismaleimide derived from a diaminosiloxane represented by the general formula 3.

【0007】[0007]

【化3】 (但し、式中R1 及びR2 は2 価の炭化水素基、
R3 及びR4 は1 価の炭化水素基を示しR1 と
R2 、R3 とR4 とは、それぞれ同一でも異なっ
てもよく、nは1〜5 の整数を表す)
[Chemical formula 3] (However, in the formula, R1 and R2 are divalent hydrocarbon groups,
R3 and R4 represent monovalent hydrocarbon groups, R1 and R2, R3 and R4 may be the same or different, and n represents an integer of 1 to 5)

【0008】(B)構造式化4で示される 1,2ポリ
ブタジエンのエポキシ化物
(B) Epoxidized product of 1,2 polybutadiene represented by structural formula 4

【0009】[0009]

【化4】 を必須成分としてなることを特徴とする熱硬化性樹脂組
成物である。
This is a thermosetting resin composition characterized by comprising [Image Omitted] as an essential component.

【0010】以下、本発明を詳細に声明する。The present invention will now be described in detail.

【0011】本発明に用いる(A)成分のジアミノシロ
キサンから誘導されるビスマレイミドは硬化物にイミド
骨格とシロキサン骨格を導入する成分であって、ジアミ
ノシロキサンとマレイン酸とを公知の方法により縮合・
脱水環化反応して、容易に製造することができる。この
ようなジアミノシロキサンの代表例として、次の化5お
よび化6に示すものが挙げられる。
Bismaleimide derived from diaminosiloxane, which is component (A) used in the present invention, is a component for introducing an imide skeleton and a siloxane skeleton into the cured product, and is obtained by condensing diaminosiloxane and maleic acid by a known method.
It can be easily produced by cyclodehydration reaction. Representative examples of such diaminosiloxanes include those shown in the following chemical formulas 5 and 6.

【0012】0012

【化5】[C5]

【0013】[0013]

【化6】[C6]

【0014】本発明の硬化物にポリブタジエン構造を導
入するに用いる(B)1,2−ポリブタジエンのエポキ
シ化物は、分子中にエポキシ基とビニル基とを含有する
反応性の高いオリゴマーであって、その構造は化7のよ
うに推定される。
The epoxidized product of 1,2-polybutadiene (B) used to introduce a polybutadiene structure into the cured product of the present invention is a highly reactive oligomer containing an epoxy group and a vinyl group in the molecule, and Its structure is estimated as shown in chemical formula 7.

【0015】[0015]

【化7】[C7]

【0016】このエポキシ化物は、1,2−ポリブタジ
エンを過酸化水素法によってエポキシ化して得られ、具
体的な化合物としてBF−1000(アデカ・アーガス
化学社製、商品名)等がある。
This epoxidized product is obtained by epoxidizing 1,2-polybutadiene by a hydrogen peroxide method, and specific examples include BF-1000 (manufactured by Adeka Argus Chemical Co., Ltd., trade name).

【0017】上述した(A)のビスマレイミドと(B)
のエポキシ化物の配合割合は、前者50〜95重量部に
対して後者を 5〜50重量部配合することが望ましく
、より好ましくは前者80〜90重量部に対して後者を
10〜20重量部配合する。
[0017] The above-mentioned bismaleimide (A) and (B)
The blending ratio of the epoxide is preferably 5 to 50 parts by weight of the latter to 50 to 95 parts by weight of the former, more preferably 10 to 20 parts by weight of the latter to 80 to 90 parts by weight of the former. do.

【0018】本発明に用いる熱硬化性樹脂組成物は、ビ
スマレイミドとエポキシ化物とを必須成分として配合さ
れ熱硬化させるが、本発明の目的に反しない程度におい
て、また必要に応じてシリカ、炭酸カルシウム、水酸化
アルミニウム等の充填剤、顔料、消泡剤、その他の成分
を配合することができる。この熱硬化性樹脂組成物は、
上述した各成分を配合して均一に混合攪拌して製造する
ことができる。熱硬化性樹脂組成物は硬化剤を用いなく
ても硬化するが、イミダゾール誘導体やマレイン化触媒
を使用することもできる。
The thermosetting resin composition used in the present invention contains bismaleimide and an epoxide as essential components and is thermally cured, but silica and carbonate may be added to an extent that does not contradict the purpose of the present invention and as necessary. Fillers such as calcium and aluminum hydroxide, pigments, antifoaming agents, and other components can be blended. This thermosetting resin composition is
It can be manufactured by blending the above-mentioned components and uniformly mixing and stirring. Although the thermosetting resin composition can be cured without using a curing agent, an imidazole derivative or a maleation catalyst can also be used.

【0019】[0019]

【実施例】次に、本発明を実施例によって具体的に説明
するが、本発明はこれらの実施例によって限定されるも
のではない。実施例及び比較例において「部」とは特に
説明が無い限り「重量部」を意味する。
[Examples] Next, the present invention will be specifically explained by examples, but the present invention is not limited to these examples. In Examples and Comparative Examples, "parts" means "parts by weight" unless otherwise specified.

【0020】実施例1 攪拌機、温度計及びディーンスターク共沸蒸溜トラップ
を装着した反応容器に、化8に示されるジアミノシロキ
サン 100部と無水マレイン酸80部を装入し、窒素
ガスを通気させながら昇温した。容器内温度 100℃
で3時間反応後、 180℃でキシロール還流法により
生成する水を系外に除去した。この状態で 2時間反応
後、減圧蒸溜によりキシロールを系外に除去し冷却する
ことによりジアミノシロキサンから誘導される淡黄色の
ビスマレイミドを合成した。
Example 1 A reaction vessel equipped with a stirrer, a thermometer, and a Dean-Stark azeotropic distillation trap was charged with 100 parts of the diaminosiloxane shown in Chemical Formula 8 and 80 parts of maleic anhydride, and heated while bubbling nitrogen gas. The temperature rose. Container temperature 100℃
After reacting for 3 hours at 180°C, the produced water was removed from the system by xylene reflux method. After reacting in this state for 2 hours, xylene was removed from the system by distillation under reduced pressure, and by cooling, pale yellow bismaleimide derived from diaminosiloxane was synthesized.

【0021】[0021]

【化8】[Chemical formula 8]

【0022】このビスマレイミド85部に、エポキシ化
物BF−1000(アデカ・アーガス化学社製、商品名
)15部、酸化防止剤 0.1部を加えて均一になるま
でよく攪拌して熱硬化性樹脂組成物を製造した。
To 85 parts of this bismaleimide, 15 parts of epoxide BF-1000 (manufactured by Adeka Argus Chemical Co., Ltd., trade name) and 0.1 part of an antioxidant were added, and the mixture was thoroughly stirred until homogeneous. A resin composition was produced.

【0023】実施例2 化9に示したジアミノシロキサン 100部と無水マレ
イン酸70部を用いて実施例1と同様にして反応させ、
ジアミノシロキサンから誘導される淡黄色のビスマレイ
ミドを合成した。
Example 2 100 parts of the diaminosiloxane shown in Chemical Formula 9 and 70 parts of maleic anhydride were reacted in the same manner as in Example 1.
A pale yellow bismaleimide derived from diaminosiloxane was synthesized.

【0024】[0024]

【化9】[Chemical formula 9]

【0025】このビスマレイミド90部に、エポキシ化
物BF−1000(アデカ・アーガス化学社製、商品名
)10部、酸化防止剤 0.1部を加えて均一になるま
でよく攪拌して熱硬化性樹脂組成物を製造した。
To 90 parts of this bismaleimide, 10 parts of epoxide BF-1000 (manufactured by Adeka Argus Chemical Co., Ltd., trade name) and 0.1 part of an antioxidant were added, and stirred well until homogeneous to obtain a thermosetting material. A resin composition was produced.

【0026】実施例3 化10に示したジアミノシロキサン 100部と無水マ
レイン酸40部を用いて実施例1と同様にして反応させ
、ジアミノシロキサンから誘導される淡黄色のビスマレ
イミドを合成した。
Example 3 100 parts of the diaminosiloxane shown in Chemical Formula 10 and 40 parts of maleic anhydride were reacted in the same manner as in Example 1 to synthesize pale yellow bismaleimide derived from the diaminosiloxane.

【0027】[0027]

【化10】[Chemical formula 10]

【0028】このビスマレイミド85部に、エポキシ化
物BF−1000(アデカ・アーガス化学社製、商品名
)15部、酸化防止剤 0.1部を加えて均一になるま
でよく攪拌して熱硬化性樹脂組成物を製造した。
To 85 parts of this bismaleimide, 15 parts of epoxide BF-1000 (manufactured by Adeka Argus Chemical Co., Ltd., trade name) and 0.1 part of an antioxidant were added, and stirred well until homogeneous to obtain a thermosetting material. A resin composition was produced.

【0029】比較例 ビスフェノールA型エポキシ樹脂(イミダゾール触媒硬
化)の液状封止用組成物を入手した。
Comparative Example A liquid sealing composition of bisphenol A type epoxy resin (imidazole catalyst curing) was obtained.

【0030】実施例1〜3及び比較例で得た熱硬化性樹
脂組成物について、熱分解温度、吸水率、硬度、純度を
試験した。本発明はいずれも優れており、本発明の効果
が確認された。また液状封止をした半導体ペレットは、
ペレットの反り、クラックが激減することも認められた
The thermosetting resin compositions obtained in Examples 1 to 3 and Comparative Examples were tested for thermal decomposition temperature, water absorption, hardness, and purity. The present invention was excellent in all cases, and the effects of the present invention were confirmed. In addition, semiconductor pellets with liquid sealing are
It was also observed that pellet warping and cracking were drastically reduced.

【0031】[0031]

【表1】 *1 :TGA法(10℃/min ,10%重量減少
点)、*2 :JIS−K−7209  常温24時間
放置、*3 :塗膜の鉛筆硬度で示した。
[Table 1] *1: TGA method (10° C./min, 10% weight loss point), *2: JIS-K-7209 left at room temperature for 24 hours, *3: Pencil hardness of coating film.

【0032】[0032]

【発明の効果】以上の説明及び表1からも明らかなよう
に本発明の熱硬化性樹脂組成物は、耐湿性、密着性、低
応力性に優れ、かつ耐熱性にも優れ、またこの組成物に
よって液状封止をした半導体ペレットは反りやクラック
の発生のないものである。
Effects of the Invention As is clear from the above explanation and Table 1, the thermosetting resin composition of the present invention has excellent moisture resistance, adhesion, and low stress properties, as well as excellent heat resistance. Semiconductor pellets sealed in liquid form do not warp or crack.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】  (A)一般式化1で示されるジアミノ
シロキサンから誘導されるビスマレイミド【化1】 (但し、式中R1 及びR2 は2 価の炭化水素基を
、R3 及びR4 は1 価の炭化水素基を示し、R1
 とR2 、R3 とR4 とは、それぞれ同一でも異
なってもよく、nは 1〜5 の整数を表す) (B)構造式化2で示される1,2−ポリブタジエンの
エポキシ化物 【化2】 を必須成分としてなることを特徴とする熱硬化性樹脂組
成物。
Claim 1: (A) Bismaleimide derived from a diaminosiloxane represented by the general formula 1 [Chemical formula 1] (wherein, R1 and R2 are divalent hydrocarbon groups, and R3 and R4 are monovalent hydrocarbon groups) represents a hydrocarbon group, R1
and R2, R3 and R4 may be the same or different, and n represents an integer of 1 to 5. A thermosetting resin composition characterized in that it is an essential component.
JP3168758A 1991-06-13 1991-06-13 Thermosetting resin composition Expired - Lifetime JPH0776259B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3168758A JPH0776259B2 (en) 1991-06-13 1991-06-13 Thermosetting resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3168758A JPH0776259B2 (en) 1991-06-13 1991-06-13 Thermosetting resin composition

Publications (2)

Publication Number Publication Date
JPH04366126A true JPH04366126A (en) 1992-12-18
JPH0776259B2 JPH0776259B2 (en) 1995-08-16

Family

ID=15873892

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3168758A Expired - Lifetime JPH0776259B2 (en) 1991-06-13 1991-06-13 Thermosetting resin composition

Country Status (1)

Country Link
JP (1) JPH0776259B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002040490A1 (en) * 2000-11-15 2002-05-23 Andras Varga Substituted disiloxanes, method for the production thereof and the use thereof for reversal of multidrug resistance (mdr)
CN114231230A (en) * 2021-12-30 2022-03-25 黑龙江省科学院石油化学研究院 Adhesive for reducing stress and improving temperature resistance and preparation method thereof

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5573728A (en) * 1978-11-28 1980-06-03 Fujitsu Ltd Heat-resistant resin composition
JPS5573726A (en) * 1978-11-28 1980-06-03 Fujitsu Ltd Heat-resistant resin composition
JPH02238053A (en) * 1989-03-13 1990-09-20 Toshiba Corp Maleimide resin composition and resin sealing type semiconductor device
JPH04175334A (en) * 1990-11-08 1992-06-23 Fujitsu Ltd Epoxy resin composition

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5573728A (en) * 1978-11-28 1980-06-03 Fujitsu Ltd Heat-resistant resin composition
JPS5573726A (en) * 1978-11-28 1980-06-03 Fujitsu Ltd Heat-resistant resin composition
JPH02238053A (en) * 1989-03-13 1990-09-20 Toshiba Corp Maleimide resin composition and resin sealing type semiconductor device
JPH04175334A (en) * 1990-11-08 1992-06-23 Fujitsu Ltd Epoxy resin composition

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002040490A1 (en) * 2000-11-15 2002-05-23 Andras Varga Substituted disiloxanes, method for the production thereof and the use thereof for reversal of multidrug resistance (mdr)
CN114231230A (en) * 2021-12-30 2022-03-25 黑龙江省科学院石油化学研究院 Adhesive for reducing stress and improving temperature resistance and preparation method thereof
CN114231230B (en) * 2021-12-30 2023-10-20 黑龙江省科学院石油化学研究院 Adhesive capable of reducing stress and improving temperature resistance and preparation method thereof

Also Published As

Publication number Publication date
JPH0776259B2 (en) 1995-08-16

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