JPH0434813B2 - - Google Patents
Info
- Publication number
- JPH0434813B2 JPH0434813B2 JP59055815A JP5581584A JPH0434813B2 JP H0434813 B2 JPH0434813 B2 JP H0434813B2 JP 59055815 A JP59055815 A JP 59055815A JP 5581584 A JP5581584 A JP 5581584A JP H0434813 B2 JPH0434813 B2 JP H0434813B2
- Authority
- JP
- Japan
- Prior art keywords
- dimension
- data value
- deflector
- charged
- gain
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000034 method Methods 0.000 claims description 26
- 238000005259 measurement Methods 0.000 claims description 15
- 238000007493 shaping process Methods 0.000 claims description 9
- 230000003287 optical effect Effects 0.000 claims description 8
- 230000008859 change Effects 0.000 claims description 2
- 238000010586 diagram Methods 0.000 description 13
- 238000010894 electron beam technology Methods 0.000 description 9
- 230000007547 defect Effects 0.000 description 3
- 238000010884 ion-beam technique Methods 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 230000004075 alteration Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59055815A JPS60198817A (ja) | 1984-03-23 | 1984-03-23 | 荷電ビ−ム露光方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59055815A JPS60198817A (ja) | 1984-03-23 | 1984-03-23 | 荷電ビ−ム露光方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60198817A JPS60198817A (ja) | 1985-10-08 |
| JPH0434813B2 true JPH0434813B2 (enrdf_load_stackoverflow) | 1992-06-09 |
Family
ID=13009428
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59055815A Granted JPS60198817A (ja) | 1984-03-23 | 1984-03-23 | 荷電ビ−ム露光方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60198817A (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0673343B2 (ja) * | 1985-11-26 | 1994-09-14 | 株式会社東芝 | 荷電ビ−ム描画方法 |
-
1984
- 1984-03-23 JP JP59055815A patent/JPS60198817A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60198817A (ja) | 1985-10-08 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6479201B2 (en) | Optical exposure apparatus of scanning exposure system and its exposing method | |
| US4169230A (en) | Method of exposure by means of corpuscular beam shadow printing | |
| US7759660B2 (en) | Electron beam lithography system | |
| KR20000057743A (ko) | 주사 선폭 변화에 따른 도즈량 보정 방법 및 장치 | |
| JP2002217088A (ja) | 荷電粒子線露光装置、荷電粒子線露光方法及び半導体デバイスの製造方法 | |
| US4396901A (en) | Method for correcting deflection distortion in an apparatus for charged particle lithography | |
| US10345724B2 (en) | Position correction method of stage mechanism and charged particle beam lithography apparatus | |
| JP3508622B2 (ja) | 電子ビーム描画装置および電子ビームを用いた描画方法 | |
| JP3036081B2 (ja) | 電子線描画装置及び方法、及びその試料面高さ測定装置 | |
| JPH0434813B2 (enrdf_load_stackoverflow) | ||
| JPS62159425A (ja) | 荷電ビ−ム描画方法 | |
| US4424450A (en) | Hybrid moving stage and rastered electron beam lithography system employing approximate correction circuit | |
| JP3710422B2 (ja) | 近接露光方式電子ビーム露光装置の副偏向器のゲイン較正方法 | |
| JPH0414490B2 (enrdf_load_stackoverflow) | ||
| JP3461279B2 (ja) | 荷電ビーム描画装置 | |
| JPS60144743A (ja) | パタ−ン描画装置 | |
| JPH048938B2 (enrdf_load_stackoverflow) | ||
| JP3157968B2 (ja) | 荷電粒子ビーム露光方法 | |
| JP2786662B2 (ja) | 荷電ビーム描画方法 | |
| JP2002246303A (ja) | 焦点調整方法及び電子線描画装置 | |
| JP3232583B2 (ja) | 電子線描画装置 | |
| JP3469568B2 (ja) | 荷電ビーム描画方法及び描画装置 | |
| JPH0282514A (ja) | 荷電粒子ビーム描画方法 | |
| JPS60208829A (ja) | 位置検出装置 | |
| JP3198187B2 (ja) | 荷電粒子ビーム露光装置の調整方法 |