JPS60198817A - 荷電ビ−ム露光方法 - Google Patents

荷電ビ−ム露光方法

Info

Publication number
JPS60198817A
JPS60198817A JP59055815A JP5581584A JPS60198817A JP S60198817 A JPS60198817 A JP S60198817A JP 59055815 A JP59055815 A JP 59055815A JP 5581584 A JP5581584 A JP 5581584A JP S60198817 A JPS60198817 A JP S60198817A
Authority
JP
Japan
Prior art keywords
dimension
size
value
data value
deflector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59055815A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0434813B2 (enrdf_load_stackoverflow
Inventor
Kanji Wada
和田　寛次
Toshiya Muraguchi
要也 村口
Mineo Goto
後藤　峰夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP59055815A priority Critical patent/JPS60198817A/ja
Publication of JPS60198817A publication Critical patent/JPS60198817A/ja
Publication of JPH0434813B2 publication Critical patent/JPH0434813B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
JP59055815A 1984-03-23 1984-03-23 荷電ビ−ム露光方法 Granted JPS60198817A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59055815A JPS60198817A (ja) 1984-03-23 1984-03-23 荷電ビ−ム露光方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59055815A JPS60198817A (ja) 1984-03-23 1984-03-23 荷電ビ−ム露光方法

Publications (2)

Publication Number Publication Date
JPS60198817A true JPS60198817A (ja) 1985-10-08
JPH0434813B2 JPH0434813B2 (enrdf_load_stackoverflow) 1992-06-09

Family

ID=13009428

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59055815A Granted JPS60198817A (ja) 1984-03-23 1984-03-23 荷電ビ−ム露光方法

Country Status (1)

Country Link
JP (1) JPS60198817A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62125617A (ja) * 1985-11-26 1987-06-06 Toshiba Corp 荷電ビ−ム描画方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62125617A (ja) * 1985-11-26 1987-06-06 Toshiba Corp 荷電ビ−ム描画方法

Also Published As

Publication number Publication date
JPH0434813B2 (enrdf_load_stackoverflow) 1992-06-09

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