JPH0434813B2 - - Google Patents

Info

Publication number
JPH0434813B2
JPH0434813B2 JP59055815A JP5581584A JPH0434813B2 JP H0434813 B2 JPH0434813 B2 JP H0434813B2 JP 59055815 A JP59055815 A JP 59055815A JP 5581584 A JP5581584 A JP 5581584A JP H0434813 B2 JPH0434813 B2 JP H0434813B2
Authority
JP
Japan
Prior art keywords
dimension
data value
deflector
charged
gain
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59055815A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60198817A (ja
Inventor
Kanji Wada
Tosha Muraguchi
Mineo Goto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP59055815A priority Critical patent/JPS60198817A/ja
Publication of JPS60198817A publication Critical patent/JPS60198817A/ja
Publication of JPH0434813B2 publication Critical patent/JPH0434813B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
JP59055815A 1984-03-23 1984-03-23 荷電ビ−ム露光方法 Granted JPS60198817A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59055815A JPS60198817A (ja) 1984-03-23 1984-03-23 荷電ビ−ム露光方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59055815A JPS60198817A (ja) 1984-03-23 1984-03-23 荷電ビ−ム露光方法

Publications (2)

Publication Number Publication Date
JPS60198817A JPS60198817A (ja) 1985-10-08
JPH0434813B2 true JPH0434813B2 (cg-RX-API-DMAC7.html) 1992-06-09

Family

ID=13009428

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59055815A Granted JPS60198817A (ja) 1984-03-23 1984-03-23 荷電ビ−ム露光方法

Country Status (1)

Country Link
JP (1) JPS60198817A (cg-RX-API-DMAC7.html)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0673343B2 (ja) * 1985-11-26 1994-09-14 株式会社東芝 荷電ビ−ム描画方法

Also Published As

Publication number Publication date
JPS60198817A (ja) 1985-10-08

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