JPH04332141A - Semiconductor container - Google Patents

Semiconductor container

Info

Publication number
JPH04332141A
JPH04332141A JP13041191A JP13041191A JPH04332141A JP H04332141 A JPH04332141 A JP H04332141A JP 13041191 A JP13041191 A JP 13041191A JP 13041191 A JP13041191 A JP 13041191A JP H04332141 A JPH04332141 A JP H04332141A
Authority
JP
Japan
Prior art keywords
recess
bottom plate
storage device
semiconductor storage
cavity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13041191A
Other languages
Japanese (ja)
Inventor
Tsutomu Higuchi
努 樋口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shinko Electric Industries Co Ltd
Original Assignee
Shinko Electric Industries Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinko Electric Industries Co Ltd filed Critical Shinko Electric Industries Co Ltd
Priority to JP13041191A priority Critical patent/JPH04332141A/en
Publication of JPH04332141A publication Critical patent/JPH04332141A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L24/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/27Manufacturing methods
    • H01L2224/27011Involving a permanent auxiliary member, i.e. a member which is left at least partly in the finished device, e.g. coating, dummy feature
    • H01L2224/27013Involving a permanent auxiliary member, i.e. a member which is left at least partly in the finished device, e.g. coating, dummy feature for holding or confining the layer connector, e.g. solder flow barrier
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/83009Pre-treatment of the layer connector or the bonding area
    • H01L2224/83051Forming additional members, e.g. dam structures
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/1515Shape
    • H01L2924/15153Shape the die mounting substrate comprising a recess for hosting the device
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/1517Multilayer substrate

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Die Bonding (AREA)

Abstract

PURPOSE:To prevent adherence of a brazing material leaked in a recess formed on a surface of a bottom plate to the bottom of the recess for die bonding a semiconductor chip when the palate is brazed to the bottom of a device body. CONSTITUTION:A recess 300 is provided at a corner of a surface in a recess 32 in which a brazing material leaked in the recess 32 is easily stop. The material leaked in the recess 32 is fed to the recess 300 formed at the corner of the surface of the recess 32 in which the material is easily stored, cooled, solidified, and adherence of the material to the bottom in the recess 32 for die bonding a semiconductor chip is prevented.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】本発明は、半導体チップを収納す
る、半導体収納装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor storage device for storing semiconductor chips.

【0002】0002

【従来の技術】従来より、図14に示したような、メタ
ライズ層表面にろう材に濡れやすいニッケルめっきを施
してなるろう付け層10を備えたセラミックからなる装
置本体20底面に、高熱伝導性の底板30をろう付けし
て、その底板30で装置本体20に設けた半導体チップ
収容用のキャビティ40底面を封じてなる半導体収納装
置がある。
2. Description of the Related Art Conventionally, as shown in FIG. 14, a device main body 20 made of ceramic and having a brazing layer 10 formed by nickel plating that is easily wetted by a brazing material on the surface of a metallized layer has a high thermal conductivity. There is a semiconductor storage device in which a bottom plate 30 is brazed to seal the bottom surface of a cavity 40 for accommodating semiconductor chips provided in the device main body 20.

【0003】この半導体収納装置には、図14に示した
ような、そのキャビティ40底面に露出した底板30表
面に、半導体チップ嵌入用の凹部32を設けて、その凹
部32に半導体チップ50下部を嵌入した状態で、半導
体チップ50を凹部32内底面にダイボンディングでき
るようにしたタイプの装置がある。
In this semiconductor storage device, as shown in FIG. 14, a recess 32 for inserting the semiconductor chip is provided on the surface of the bottom plate 30 exposed at the bottom of the cavity 40, and the lower part of the semiconductor chip 50 is inserted into the recess 32. There is a type of device in which the semiconductor chip 50 can be die-bonded to the inner bottom surface of the recess 32 in the fitted state.

【0004】このタイプの半導体収納装置では、半導体
チップ50が高集積化された多層構造の丈高のチップで
あっても、その凹部32内底面にダイボンディングする
半導体チップ50の上面高さを、半導体収納装置のキャ
ビティ40周囲の装置本体の階段面22に備えられた接
続線路24内端と同一高さまたはそれに近い位置まで低
めて、半導体チップ上面に備えられた電極52を、ワイ
ヤ60等を介して、接続線路24内端に高周波特性損失
少なく短距離に的確に接続できる。
In this type of semiconductor storage device, even if the semiconductor chip 50 is a tall chip with a highly integrated multilayer structure, the height of the top surface of the semiconductor chip 50 to be die-bonded to the inner bottom surface of the recess 32 is The electrode 52 provided on the top surface of the semiconductor chip is lowered to the same height as or close to the inner end of the connection line 24 provided on the step surface 22 of the device body around the cavity 40 of the semiconductor storage device, and the wire 60 etc. Through this, it is possible to accurately connect to the inner end of the connection line 24 over a short distance with little loss in high frequency characteristics.

【0005】[0005]

【発明が解決しようとする課題】しかしながら、上記凹
部32を設けたタイプの半導体収納装置では、ろう付け
層10を備えた装置本体20底面に底板30をろう付け
した際に、図14に示したように、ろう材70が、底板
30表面に設けた凹部32内に侵入して、その凹部32
内底面のコーナー部周辺等に付着した状態となった。そ
して、半導体チップ50下部を凹部32に嵌入した状態
で、半導体チップ50を凹部32内底面にダイボンディ
ングした際に、凹部32内底面のコーナー部周辺等に付
着したろう材70が、半導体チップ50底面を凹部32
内底面から浮き上がらせてしまった。そして、半導体チ
ップ50底面と凹部32内底面との間に隙間80が生じ
て、半導体チップ50が発する熱を底板30を通して半
導体収納装置外部に効率良く放散できなくなったり、半
導体チップダイボンディング用のボンディング材の引張
力で、脆弱な半導体チップ50にクラックが生じてしま
ったりした。
However, in the semiconductor storage device of the type provided with the recess 32, when the bottom plate 30 is brazed to the bottom surface of the device main body 20 provided with the brazing layer 10, as shown in FIG. As shown, the brazing material 70 enters the recess 32 provided on the surface of the bottom plate 30 and
It became stuck around the corners of the inner bottom surface. When the semiconductor chip 50 is die-bonded to the inner bottom surface of the recess 32 with the lower part of the semiconductor chip 50 fitted into the recess 32, the brazing material 70 attached around the corners of the inner bottom surface of the recess 32 is removed from the semiconductor chip 50. Concave part 32 on the bottom
I let it rise from the inner bottom. Then, a gap 80 is generated between the bottom surface of the semiconductor chip 50 and the inner bottom surface of the recess 32, making it impossible to efficiently dissipate the heat generated by the semiconductor chip 50 to the outside of the semiconductor storage device through the bottom plate 30. The tensile force of the material caused cracks to occur in the fragile semiconductor chip 50.

【0006】なお、装置本体20底部に底板30をろう
付けした際に、ろう材70が底板30表面に設けた凹部
32内に侵入しないように、底板30ろう付け用のろう
材量を調整することは、経験則上、極めて困難である。
[0006] When the bottom plate 30 is brazed to the bottom of the device main body 20, the amount of brazing material for brazing the bottom plate 30 is adjusted so that the brazing material 70 does not enter the recess 32 provided on the surface of the bottom plate 30. As a rule of thumb, this is extremely difficult.

【0007】また、上記難点を排除するために、ステー
ジ板(図示せず)を上記凹部32内底面に敷設すること
も考えられる。しかし、そうした場合は、半導体収納装
置の部品点数が増して、半導体収納装置の製造が困難化
すると共に、ステージ板を介して半導体チップ50を底
板30表面に搭載することとなって、半導体収納装置の
熱放散性が低下してしまう。
[0007] Furthermore, in order to eliminate the above-mentioned difficulties, it is also conceivable to lay a stage plate (not shown) on the inner bottom surface of the recess 32. However, in such a case, the number of parts of the semiconductor storage device increases, making it difficult to manufacture the semiconductor storage device, and the semiconductor chip 50 must be mounted on the surface of the bottom plate 30 via a stage plate. The heat dissipation properties of the

【0008】また、これらと同様なことは、キャビティ
底面に露出した底板表面を、装置本体底面にろう付けし
た底板表面に平面状に連ねた半導体収納装置においても
言え、そのような半導体収納装置においても、底板を装
置本体底面にろう付けした際に、ろう材がキャビティ底
面に露出した底板表面に漏れ出して付着し、その底板表
面にダイボンディングする半導体チップに上記と同様な
悪影響を与えた。
[0008] The same thing can also be said of a semiconductor storage device in which the bottom plate surface exposed at the bottom of the cavity is connected in a planar manner to the bottom plate surface brazed to the bottom of the device main body. Also, when the bottom plate was brazed to the bottom of the device main body, the brazing material leaked out and adhered to the bottom plate surface exposed at the bottom of the cavity, causing the same adverse effect as above on the semiconductor chips die-bonded to the bottom plate surface.

【0009】本発明は、このような難点を解消した、ろ
う付け層を備えた装置本体底面に底板をろう付けした際
に、半導体チップをダイボンディングする凹部内底面や
底板表面にろう材が漏れ出して付着することのない、半
導体収納装置を提供することを目的としている。
[0009] The present invention solves this problem. When the bottom plate is brazed to the bottom of the device main body provided with the brazing layer, the brazing material leaks to the bottom of the recess where the semiconductor chip is die-bonded and to the surface of the bottom plate. The object of the present invention is to provide a semiconductor storage device that does not come out or stick.

【0010】0010

【課題を解決するための手段】上記目的を達成するため
に、本発明の第1の半導体収納装置は、ろう付け層を備
えた装置本体底面に底板をろう付けして、その底板で前
記装置本体に設けた半導体チップ収容用のキャビティ底
面を封じてなる半導体収納装置であって、前記キャビテ
ィ底面に露出した底板表面に半導体チップ嵌入用の凹部
を設けた半導体収納装置において、前記底板を前記装置
本体底面にろう付けした際に前記凹部内に漏れ出したろ
う材が溜まりやすい凹部内表面部分に、ろう材を溜める
窪みを設けたことを特徴としている。
[Means for Solving the Problems] In order to achieve the above object, a first semiconductor storage device of the present invention has a bottom plate brazed to the bottom surface of the device main body provided with a brazing layer, and the bottom plate is used for the semiconductor storage device. A semiconductor storage device in which a bottom surface of a cavity for accommodating a semiconductor chip provided in a main body is sealed, the bottom plate surface exposed at the bottom surface of the cavity being provided with a recess for inserting the semiconductor chip. The present invention is characterized in that a depression for storing the brazing material is provided in the inner surface portion of the recess where the brazing material leaking into the recess tends to accumulate when brazing to the bottom surface of the main body.

【0011】本発明の第1の半導体収納装置においては
、凹部内側面のコーナー部に、窪みを設けたり、または
、凹部内側面とその底面とが交差するコーナー部に、窪
みを設けたりすることを好適としている。
[0011] In the first semiconductor storage device of the present invention, a recess is provided at a corner of the inner surface of the recess, or a recess is provided at a corner where the inner surface of the recess intersects with its bottom surface. is preferred.

【0012】本発明の第2の半導体収納装置は、ろう付
け層を備えた装置本体底面に底板をろう付けして、その
底板で前記装置本体に設けた半導体チップ収容用のキャ
ビティ底面を封じてなる半導体収納装置であって、前記
キャビティ底面に露出した底板表面を前記装置本体底面
にろう付けした底板表面に平面状に連ねた半導体収納装
置において、前記底板を前記装置本体底面にろう付けし
た際に前記キャビティ底面に露出した底板表面に漏れ出
したろう材が溜まりやすい底板表面部分に、ろう材を溜
める窪みを設けたことを特徴としている。
In a second semiconductor storage device of the present invention, a bottom plate is brazed to the bottom of the device main body provided with a brazing layer, and the bottom of a cavity for accommodating semiconductor chips provided in the device main body is sealed with the bottom plate. In the semiconductor storage device, the bottom plate surface exposed at the bottom of the cavity is connected in a planar manner to the bottom plate surface brazed to the bottom of the device main body, when the bottom plate is brazed to the bottom of the device main body. The present invention is characterized in that a recess for storing brazing material is provided in a surface portion of the bottom plate where leaked brazing material tends to accumulate on the surface of the bottom plate exposed at the bottom of the cavity.

【0013】本発明の第2の半導体収納装置においては
、キャビティ底面に露出した底板表面のコーナー部に、
窪みを設けたり、または、キャビティ底面に露出した底
板表面周囲に、窪みを設けたりすることを好適としてい
る。
[0013] In the second semiconductor storage device of the present invention, at the corner portion of the bottom plate surface exposed at the bottom of the cavity,
It is preferable to provide a depression, or to provide a depression around the surface of the bottom plate exposed at the bottom of the cavity.

【0014】また、本発明の第1、第2の半導体収納装
置においては、装置本体のキャビティ内側面のコーナー
部に、切欠きを設けることを好適としている。
[0014] In the first and second semiconductor storage devices of the present invention, it is preferable that a notch be provided in the corner portion of the inner surface of the cavity of the device body.

【0015】[0015]

【作用】上記構成の第1の半導体収納装置においては、
底板を装置本体底面にろう付けした際に、凹部内に漏れ
出したろう材が、ろう材が溜まりやすい凹部内表面部分
に設けられた窪みに流入して、その窪み内に付着する。 詳しくは、凹部内に漏れ出したろう材が、表面張力等を
受けて、ろう材が溜まりやすい凹部内側面のコーナー部
や凹部内側面とその底面とが交差するコーナー部に集ま
って、それらのコーナー部に設けられた窪み内に流入し
、冷却、固化する。そして、それ以外の半導体チップを
ダイボンディングする凹部内底面にろう材が付着するの
が防止される。
[Operation] In the first semiconductor storage device having the above configuration,
When the bottom plate is brazed to the bottom surface of the apparatus main body, the brazing material leaking into the recess flows into the recess provided in the inner surface portion of the recess where the brazing material tends to accumulate, and adheres to the recess. Specifically, the brazing filler metal leaking into the recess is subjected to surface tension, etc., and collects at the corners of the inner surface of the recess where the filler metal tends to accumulate, or at the corners where the inner surface of the recess intersects with the bottom surface. It flows into the depression provided in the section, cools and solidifies. This prevents the brazing material from adhering to the inner bottom surface of the recess where other semiconductor chips are die-bonded.

【0016】上記構成の第2の半導体収納装置において
は、装置本体底面に底板をろう付けした際に、キャビテ
ィ底面に露出した底板表面に漏れ出したろう材が、ろう
材が溜まりやすい底板表面部分に設けられた窪みに流入
して、その窪み内に付着する。詳しくは、キャビティ底
面に露出した底板表面に漏れ出したろう材が、表面張力
等を受けて、ろう材が溜まりやすいその底板表面のコー
ナー部やその底板表面周囲に集まって、それらの底板表
面のコーナー部や底板表面周囲に設けられた窪み内に流
入し、冷却、固化する。そして、それ以外の半導体チッ
プをダイボンディングするキャビティ底面に露出した底
板表面にろう材が付着するのが防止される。
In the second semiconductor storage device having the above configuration, when the bottom plate is brazed to the bottom of the device main body, the brazing material that leaks out onto the bottom plate surface exposed at the bottom of the cavity is deposited on the bottom plate surface where brazing material tends to accumulate. It flows into the depression provided and deposits therein. Specifically, the brazing filler metal that has leaked onto the bottom plate surface exposed at the bottom of the cavity is subjected to surface tension, etc., and collects at the corners and around the bottom plate surface where filler metal tends to accumulate. It flows into the depressions provided around the surface of the bottom plate and the bottom plate, where it cools and solidifies. This prevents the brazing material from adhering to the surface of the bottom plate exposed at the bottom of the cavity to which other semiconductor chips are die-bonded.

【0017】また、装置本体のキャビティ内側面のコー
ナー部に、切欠きを設けた第1、第2の半導体収納装置
にあっては、コーナー部がエッジ状をなす方形状をした
半導体チップを、キャビティ内側面の円弧状にだれる等
したコーナー部に邪魔されずに、キャビティ内側面に近
接させてキャビティ内に隙間少なく収容できる。そして
、半導体チップ上面の電極をキャビティ周囲の階段面に
備えられた接続線路内端に、短いワイヤ等を介して、高
周波特性損失少なく短距離に接続できる。
Furthermore, in the first and second semiconductor storage devices in which a notch is provided in the corner portion of the inner surface of the cavity of the device body, a rectangular semiconductor chip with an edge-like corner portion is provided. It can be accommodated in the cavity in close proximity to the inner surface of the cavity with less clearance without being obstructed by the curved corners of the inner surface of the cavity. Then, the electrode on the upper surface of the semiconductor chip can be connected to the inner end of the connection line provided on the stepped surface around the cavity via a short wire or the like over a short distance with less loss in high frequency characteristics.

【0018】[0018]

【実施例】次に、本発明の実施例を図面に従い説明する
。図1と図3および図2と図4はそれぞれ本発明の第1
の半導体収納装置の好適な実施例を示し、図1と図3は
それらの分解組み立て説明図、図2と図4はそれらの一
部拡大正面断面図を示している。以下、これらの図中の
実施例を説明する。
Embodiments Next, embodiments of the present invention will be described with reference to the drawings. 1 and 3 and FIGS. 2 and 4 respectively show the first embodiment of the present invention.
1 and 3 are exploded and assembled explanatory views, and FIGS. 2 and 4 are partially enlarged front sectional views thereof. The embodiments shown in these figures will be described below.

【0019】図において、20は、半導体収納装置の装
置本体である。この装置本体20は、所定形状に裁断し
たセラミックグリーンシートを複数枚積層して焼成して
形成している。
In the figure, 20 is the main body of the semiconductor storage device. The device main body 20 is formed by laminating and firing a plurality of ceramic green sheets cut into a predetermined shape.

【0020】装置本体20中央には、半導体チップ収容
用の方形状のキャビティ40を透設している。
A rectangular cavity 40 for accommodating a semiconductor chip is transparently provided in the center of the device body 20.

【0021】装置本体20の内外には、1段またはそれ
以上の段数(図では、1段としている)の階段面22,
23をそれぞれ連続して備えている。
Inside and outside of the device main body 20, there are stair surfaces 22 with one or more steps (indicated as one step in the figure).
23 in series.

【0022】装置本体の内外の階段面22,23には、
タングステン等のメタライズからなる接続線路24を、
装置本体20内部を介して、複数本連続して並べて備え
ている。
[0022] The staircase surfaces 22 and 23 inside and outside the main body of the device include
A connection line 24 made of metallization such as tungsten,
A plurality of them are consecutively arranged and provided inside the device main body 20.

【0023】装置本体20底面には、タングステン等の
メタライズ層表面にろう材に濡れやすいニッケルめっき
等のめっきを施してなる、ろう付け層10を備えている
The bottom surface of the device main body 20 is provided with a brazing layer 10 formed by plating the surface of a metallized layer of tungsten or the like with nickel plating or the like which is easily wetted by the brazing material.

【0024】ろう付け層10を備えた装置本体20底面
には、高熱伝導性の銅−タングステン合金等からなる底
板30であって、その表面にろう材に濡れやすいニッケ
ルめっき等のめっきを施した底板30を、銀ろう等のろ
う材を用いて、ろう付けしている。そして、底板30で
、キャビティ40底面を封じている。
On the bottom of the device main body 20 provided with the brazing layer 10 is a bottom plate 30 made of a highly thermally conductive copper-tungsten alloy, the surface of which is plated with nickel plating or the like that is easily wetted by the brazing material. The bottom plate 30 is brazed using a brazing material such as silver solder. The bottom surface of the cavity 40 is sealed with the bottom plate 30.

【0025】キャビティ40底面に露出した底板30表
面には、方形状をした凹部32を設けている。そして、
その凹部32に方形状をした半導体チップ50下部を嵌
入できるようにしている。
A rectangular recess 32 is provided on the surface of the bottom plate 30 exposed at the bottom of the cavity 40. and,
The lower part of the rectangular semiconductor chip 50 can be fitted into the recess 32.

【0026】以上の構成は、従来の半導体収納装置と同
様であるが、図の半導体収納装置では、装置本体20底
面に底板30をろう付けした際に、凹部32内に漏れ出
したろう材が溜まりやすい凹部32内表面部分に、ろう
材を溜める窪み300,302を、底板30周辺に向け
て設けている。
The above configuration is similar to the conventional semiconductor storage device, but in the semiconductor storage device shown in the figure, when the bottom plate 30 is brazed to the bottom surface of the device main body 20, the brazing material leaking into the recess 32 accumulates. Recesses 300 and 302 for storing the brazing material are provided on the inner surface of the recess 32 toward the periphery of the bottom plate 30.

【0027】具体的には、図1と図3に示した半導体収
納装置では、凹部32内側面4方のコーナー部に、上方
から見て一部が欠けた円形状をした窪み300を、底板
30周辺に向けて設けている。
Specifically, in the semiconductor storage device shown in FIGS. 1 and 3, a circular depression 300 with a partially broken part when viewed from above is formed at the four corners of the inner surface of the depression 32. It is set up for people around 30.

【0028】また、図2と図4に示した半導体収納装置
では、凹部32内側面からその内側面と凹部32内底面
とが交差するコーナー部にかけて、断面L字状をした窪
み302を、底板30周辺に向けて設けている。
In the semiconductor storage device shown in FIGS. 2 and 4, a recess 302 having an L-shaped cross section is formed on the bottom plate from the inner surface of the recess 32 to the corner where the inner surface and the inner bottom surface of the recess 32 intersect. It is set up for people around 30.

【0029】そして、図3や図4に示したように、装置
本体20底面に底板30をろう付けした際に凹部32内
に漏れ出したろう材70を、それらの凹部32内側面の
コーナー部や凹部32内側面からその内側面と凹部32
内底面とが交差するコーナー部にかけて設けた窪み30
0,302に流入させて、それらの窪み300,302
内で冷却、固化させている。
As shown in FIGS. 3 and 4, the brazing material 70 that leaked into the recesses 32 when the bottom plate 30 was brazed to the bottom of the device main body 20 is removed from the corners of the inner surfaces of those recesses 32 and From the inner surface of the recess 32 to the inner surface of the recess 32
Recess 30 provided over the corner where the inner bottom surface intersects
0,302, and those depressions 300,302
It is cooled and solidified inside.

【0030】図1と図3および図2と図4に示した半導
体収納装置は、それぞれ以上のように構成している。
The semiconductor storage devices shown in FIGS. 1 and 3 and FIGS. 2 and 4 are each constructed as described above.

【0031】図5と図7および図6と図8はそれぞれ本
発明の第1の半導体収納装置の他の好適な実施例を示し
、図5と図6はそれらの分解組み立て説明図、図7と図
8はそれらの一部拡大正面断面図を示している。以下、
これらの図中の実施例を説明する。
5 and 7 and FIGS. 6 and 8 respectively show other preferred embodiments of the first semiconductor storage device of the present invention, and FIGS. 5 and 6 are exploded and assembled explanatory views thereof, and FIG. and FIG. 8 shows a partially enlarged front sectional view thereof. below,
The embodiments shown in these figures will be explained.

【0032】図の半導体収納装置では、装置本体20底
面に底板30をろう付けした際に凹部32内に漏れ出し
たろう材が溜まりやすい凹部32内表面部分に、ろう材
を溜める窪み304,306を、底板30周辺とその下
方に向けて設けている。
In the semiconductor storage device shown in the figure, depressions 304 and 306 for storing brazing material are provided on the inner surface of the depression 32 where the brazing material leaking into the depression 32 is likely to accumulate when the bottom plate 30 is brazed to the bottom surface of the device main body 20. , are provided around the bottom plate 30 and below.

【0033】具体的には、図5と図7に示した半導体収
納装置では、凹部32内側面4方のコーナー部に、上方
から見て一部が欠けた円形状をした窪み304を、底板
30周辺とその下方に向けて設けている。
Specifically, in the semiconductor storage device shown in FIGS. 5 and 7, a circular depression 304 with a partially broken part when viewed from above is formed in the four corners of the inner surface of the depression 32. It is located around 30 and below.

【0034】また、図6と図8に示した半導体収納装置
では、凹部32内側面からその内側面と凹部32内底面
とが交差するコーナー部にかけて、断面J字状をした窪
み306を、底板30周辺とその下方に向けて設けてい
る。
In the semiconductor storage device shown in FIGS. 6 and 8, a recess 306 having a J-shaped cross section is formed in the bottom plate from the inner surface of the recess 32 to the corner where the inner surface intersects the inner bottom surface of the recess 32. It is located around 30 and below.

【0035】そして、図7や図8に示したように、装置
本体20底面に底板30をろう付けした際に凹部32内
に漏れ出したろう材70を、それらの凹部32内側面の
コーナー部や凹部32内側面からその内側面と凹部32
内底面とが交差するコーナー部にかけて設けた窪み30
4,306に流入させて、それらの窪み304,306
内で冷却、固化させている。
As shown in FIGS. 7 and 8, the brazing material 70 that leaked into the recesses 32 when the bottom plate 30 was brazed to the bottom surface of the apparatus main body 20 is removed from the corners of the inner surfaces of the recesses 32 and From the inner surface of the recess 32 to the inner surface of the recess 32
Recess 30 provided over the corner where the inner bottom surface intersects
4,306, and those depressions 304,306
It is cooled and solidified inside.

【0036】その他は、図1と図3や図2と図4に示し
た前述第1の半導体収納装置と同様に構成していて、そ
の同一部材には同一符号を付し、その説明を省略する。
The rest of the structure is the same as that of the first semiconductor storage device shown in FIGS. 1 and 3, and FIGS. 2 and 4, and the same members are given the same reference numerals and their explanations will be omitted. do.

【0037】図9と図11および図10と図12はそれ
ぞれ本発明の第2の半導体収納装置の好適な実施例を示
し、図9と図10はそれらの分解組み立て説明図、図1
1と図12はそれらの一部拡大正面断面図を示している
。以下、これらの図中の実施例を説明する。
9 and 11 and FIGS. 10 and 12 respectively show preferred embodiments of the second semiconductor storage device of the present invention, and FIGS. 9 and 10 are exploded and assembled explanatory views thereof, and FIG.
1 and FIG. 12 show partially enlarged front sectional views thereof. The embodiments shown in these figures will be described below.

【0038】図の半導体収納装置では、キャビティ40
底面に露出した底板30表面に凹部を設けずに、キャビ
ティ40底面に露出した底板30表面を、装置本体20
底面にろう付けした底板30表面に平面状に連ねている
In the illustrated semiconductor storage device, the cavity 40
Without providing a recess on the surface of the bottom plate 30 exposed on the bottom surface, the surface of the bottom plate 30 exposed on the bottom surface of the cavity 40 is connected to the device main body 20.
They are arranged in a planar manner on the surface of the bottom plate 30 which is brazed to the bottom surface.

【0039】装置本体20底面に底板30をろう付けし
た際にキャビティ40底面に露出した底板30表面に漏
れ出したろう材が溜まりやすい底板30表面部分には、
ろう材を溜める窪み308,310を設けている。
When the bottom plate 30 is brazed to the bottom of the device body 20, the solder material that leaks out onto the surface of the bottom plate 30 exposed at the bottom of the cavity 40 tends to accumulate on the surface of the bottom plate 30.
Recesses 308 and 310 are provided for storing brazing filler metal.

【0040】具体的には、図9と図11に示した半導体
収納装置では、キャビティ40底部に露出した底板30
表面4方のコーナー部に、上方から見て円形状をした窪
み308を、底板30周辺とその下方に向けて設けてい
る。
Specifically, in the semiconductor storage device shown in FIGS. 9 and 11, the bottom plate 30 exposed at the bottom of the cavity 40 is
Recesses 308 having a circular shape when viewed from above are provided at the four corners of the surface toward the periphery of the bottom plate 30 and its downward direction.

【0041】また、図10と図12に示した半導体収納
装置では、キャビティ40底面に露出した底板30表面
周囲に、断面U字状をした窪み310を、底板30周辺
とその下方に向けて設けている。
Further, in the semiconductor storage device shown in FIGS. 10 and 12, a depression 310 having a U-shaped cross section is provided around the surface of the bottom plate 30 exposed at the bottom of the cavity 40, facing around and below the bottom plate 30. ing.

【0042】そして、図11や図12に示したように、
装置本体20底面に底板30をろう付けした際にキャビ
ティ40底面に露出した底板30表面に漏れ出したろう
材70を、キャビティ40底面に露出した底板30表面
のコーナー部や底板30表面周囲に設けた窪み308,
310に侵入させて、それらの窪み308,310内で
冷却、固化させている。
[0042] As shown in FIGS. 11 and 12,
The brazing material 70 that leaked onto the surface of the bottom plate 30 exposed at the bottom of the cavity 40 when the bottom plate 30 was brazed to the bottom of the device main body 20 was provided at the corners of the surface of the bottom plate 30 exposed at the bottom of the cavity 40 and around the surface of the bottom plate 30. Hollow 308,
310 and is cooled and solidified within those depressions 308 and 310.

【0043】その他は、図1と図3や図2と図4に示し
た前述第1の半導体収納装置と同様に構成していて、そ
の同一部材には同一符号を付し、その説明を省略する。
The rest of the structure is the same as that of the first semiconductor storage device shown in FIGS. 1 and 3, and FIGS. 2 and 4, and the same members are designated by the same reference numerals and their explanations will be omitted. do.

【0044】なお、これらの実施例の第1、第2の半導
体収納装置においては、装置本体20のキャビティ40
内側面のコーナー部に、図1と図2、図5と図6、図9
と図10に示したように、円筒状に近い形状をした切欠
き42を設けておくのが良い。これは、そのような切欠
き42を設けておけば、図13に示したように、コーナ
ー部がエッジ状をなす方形状等をした半導体チップ50
を、キャビティ40内側面の円弧状にだれる等したコー
ナー部に邪魔されずに、キャビティ40内側面に近接さ
せてキャビティ40内に隙間少なく収容できるからであ
る。そして、半導体チップ上面の電極52をキャビティ
40周囲の装置本体の階段面22に備えられた接続線路
24内端に、短いワイヤ60等を介して、高周波特性損
失少なく短距離に接続できるからである。ただし、そう
した場合は、第1の半導体収納装置にあっては、図1な
いし図8に示したように、凹部32内側面が、キャビテ
ィ40内側面直下かまたはそれより外方に位置するよう
に、底板30表面に凹部32を広く開口して、凹部32
内側面で半導体チップ50がキャビティ40内側面に接
近することが妨げられないようにする必要がある。
Note that in the first and second semiconductor storage devices of these embodiments, the cavity 40 of the device main body 20
Figures 1 and 2, Figures 5 and 6, and Figure 9 are attached to the corners of the inner surface.
As shown in FIG. 10, it is preferable to provide a notch 42 having a shape close to a cylinder. This is because if such a notch 42 is provided, a semiconductor chip 50 having a rectangular shape or the like with edge-like corners can be formed as shown in FIG.
This is because the material can be accommodated in the cavity 40 in close proximity to the inner surface of the cavity 40 without being obstructed by the curved corners of the inner surface of the cavity 40 with a small gap. This is because the electrode 52 on the top surface of the semiconductor chip can be connected to the inner end of the connection line 24 provided on the step surface 22 of the device body around the cavity 40 via a short wire 60 or the like over a short distance with less loss in high frequency characteristics. . However, in such a case, in the first semiconductor storage device, as shown in FIGS. 1 to 8, the inner surface of the recess 32 is positioned directly below the inner surface of the cavity 40 or outwardly from the inner surface of the cavity 40. , the recess 32 is widely opened on the surface of the bottom plate 30, and the recess 32 is
It is necessary to prevent the semiconductor chip 50 from approaching the inner surface of the cavity 40 from the inner surface.

【0045】[0045]

【発明の効果】以上説明したように、本発明の第1の半
導体収納装置によれば、装置本体底面に底板をろう付け
した際に、凹部内に漏れ出したろう材を、ろう材が溜ま
りやすい凹部内側面やその底面のコーナー部等に集めて
、それらのコーナー部等に設けられた窪みに的確に流入
させ、その窪み内で冷却、固化させることができる。 そして、それ以外の半導体チップをダイボンディングす
る凹部内底面にろう材が付着するのを防止できる。
[Effects of the Invention] As explained above, according to the first semiconductor storage device of the present invention, when the bottom plate is brazed to the bottom of the device main body, the brazing material leaks into the recess and easily accumulates therein. It is possible to collect it on the inner surface of the recess or the corners of the bottom surface thereof, to flow accurately into the recesses provided at those corners, and to cool and solidify within the recess. Further, it is possible to prevent the brazing material from adhering to the inner bottom surface of the recess where other semiconductor chips are die-bonded.

【0046】本発明の第2の半導体収納装置によれば、
装置本体底面に底板をろう付けした際に、キャビティ底
面に露出した底板表面に漏れ出したろう材を、キャビテ
ィ底面に露出したろう材が溜まりやすい底板表面のコー
ナー部や底板表面周囲等に集めて、それらのコーナー部
や底板表面周囲等に設けられた窪みに的確に流入させ、
その窪み内で冷却、固化させることができる。そして、
それ以外の半導体チップをダイボンディングする底板表
面にろう材が付着するのを防止できる。
According to the second semiconductor storage device of the present invention,
When the bottom plate is brazed to the bottom of the device body, the brazing material that leaked out onto the surface of the bottom plate exposed at the bottom of the cavity is collected in the corners of the bottom plate surface and around the surface of the bottom plate, where the solder metal exposed at the bottom of the cavity tends to accumulate. Precisely flow into the recesses provided in those corners and around the bottom plate surface,
It can be cooled and solidified within the depression. and,
It is possible to prevent the brazing material from adhering to the surface of the bottom plate to which other semiconductor chips are die-bonded.

【0047】その結果、本発明の第1、第2の半導体収
納装置によれば、凹部内底面やキャビティ底面に露出し
た底板表面に半導体チップをダイボンディングした際に
、半導体チップ底面全体をそれらの凹部内底面や底板表
面に隙間なく密着させた状態にダイボンディングして、
半導体チップが発する熱を底板を通して半導体収納装置
外部に効率良く放散させることができる。それと共に、
凹部内底面やキャビティ底面に露出した底板表面に半導
体チップをダイボンディングした際に、チップボンディ
ング用のボンディング材の引張力で、脆弱な半導体チッ
プにクラックが生ずるのを防止できる。
As a result, according to the first and second semiconductor storage devices of the present invention, when semiconductor chips are die-bonded to the surface of the bottom plate exposed on the inner bottom surface of the recess or the bottom surface of the cavity, the entire bottom surface of the semiconductor chips is bonded to the bottom surface of the bottom plate. Die bonding is carried out in close contact with the inner bottom surface of the recess and the surface of the bottom plate without any gaps.
Heat generated by the semiconductor chip can be efficiently dissipated to the outside of the semiconductor storage device through the bottom plate. Along with that,
When a semiconductor chip is die-bonded to the surface of the bottom plate exposed at the inner bottom surface of the recess or the bottom surface of the cavity, it is possible to prevent cracks from occurring in the fragile semiconductor chip due to the tensile force of the bonding material for chip bonding.

【図面の簡単な説明】[Brief explanation of drawings]

【図1】本発明の第1の半導体収納装置の分解組み立て
説明図である。
FIG. 1 is an explanatory diagram of an exploded assembly of a first semiconductor storage device of the present invention.

【図2】本発明の第1の半導体収納装置の分解組み立て
説明図である。
FIG. 2 is an explanatory diagram of an exploded assembly of the first semiconductor storage device of the present invention.

【図3】本発明の第1の半導体収納装置の一部拡大正面
断面図である。
FIG. 3 is a partially enlarged front sectional view of the first semiconductor storage device of the present invention.

【図4】本発明の第1の半導体収納装置の一部拡大正面
断面図である。
FIG. 4 is a partially enlarged front sectional view of the first semiconductor storage device of the present invention.

【図5】本発明の第1の半導体収納装置の分解組み立て
説明図である。
FIG. 5 is an explanatory diagram of an exploded assembly of the first semiconductor storage device of the present invention.

【図6】本発明の第1の半導体収納装置の分解組み立て
説明図である。
FIG. 6 is an explanatory diagram of an exploded assembly of the first semiconductor storage device of the present invention.

【図7】本発明の第1の半導体収納装置の一部拡大正面
断面図である。
FIG. 7 is a partially enlarged front sectional view of the first semiconductor storage device of the present invention.

【図8】本発明の第1の半導体収納装置の一部拡大正面
断面図である。
FIG. 8 is a partially enlarged front sectional view of the first semiconductor storage device of the present invention.

【図9】本発明の第2の半導体収納装置の分解組み立て
説明図である。
FIG. 9 is an explanatory view of disassembling and assembling the second semiconductor storage device of the present invention.

【図10】本発明の第2の半導体収納装置の分解組み立
て説明図である。
FIG. 10 is an explanatory diagram of an exploded assembly of a second semiconductor storage device of the present invention.

【図11】本発明の第2の半導体収納装置の一部拡大正
面断面図である。
FIG. 11 is a partially enlarged front sectional view of the second semiconductor storage device of the present invention.

【図12】本発明の第2の半導体収納装置の一部拡大正
面断面図である。
FIG. 12 is a partially enlarged front sectional view of the second semiconductor storage device of the present invention.

【図13】本発明の第1、第2の半導体収納装置のキャ
ビティのコーナー部周辺の一部拡大平面図である。
FIG. 13 is a partially enlarged plan view of the periphery of the corner portion of the cavity of the first and second semiconductor storage devices of the present invention.

【図14】従来の半導体収納装置の正面断面図である。FIG. 14 is a front sectional view of a conventional semiconductor storage device.

【符号の説明】[Explanation of symbols]

10  ろう付け層 20  装置本体 30  底板 32  凹部 40  キャビティ 50  半導体チップ 70  ろう材 300  窪み 302  窪み 304  窪み 306  窪み 308  窪み 310  窪み 10 Brazing layer 20 Device body 30 Bottom plate 32 Recess 40 Cavity 50 Semiconductor chip 70 Brazing metal 300 Hollow 302 Hollow 304 Hollow 306 Hollow 308 Hollow 310 Hollow

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】  ろう付け層を備えた装置本体底面に底
板をろう付けして、その底板で前記装置本体に設けた半
導体チップ収容用のキャビティ底面を封じてなる半導体
収納装置であって、前記キャビティ底面に露出した底板
表面に半導体チップ嵌入用の凹部を設けた半導体収納装
置において、前記底板を前記装置本体底面にろう付けし
た際に前記凹部内に漏れ出したろう材が溜まりやすい凹
部内表面部分に、ろう材を溜める窪みを設けたことを特
徴とする半導体収納装置。
1. A semiconductor storage device in which a bottom plate is brazed to the bottom surface of a device main body provided with a brazing layer, and the bottom surface of a cavity for accommodating a semiconductor chip provided in the device main body is sealed with the bottom plate, In a semiconductor storage device in which a recess for inserting a semiconductor chip is provided on a bottom plate surface exposed at the bottom of a cavity, an inner surface portion of the recess where brazing material leaking into the recess when the bottom plate is brazed to the bottom of the device main body tends to accumulate. A semiconductor storage device characterized in that a recess is provided in which a brazing material is stored.
【請求項2】  凹部内側面のコーナー部に、窪みを設
けた請求項1記載の半導体収納装置。
2. The semiconductor storage device according to claim 1, wherein a recess is provided at a corner portion of an inner surface of the recess.
【請求項3】  凹部内側面とその底面とが交差するコ
ーナー部に、窪みを設けた請求項1記載の半導体収納装
置。
3. The semiconductor storage device according to claim 1, wherein a recess is provided at a corner portion where the inner surface of the recess intersects with the bottom surface thereof.
【請求項4】  ろう付け層を備えた装置本体底面に底
板をろう付けして、その底板で前記装置本体に設けた半
導体チップ収容用のキャビティ底面を封じてなる半導体
収納装置であって、前記キャビティ底面に露出した底板
表面を前記装置本体底面にろう付けした底板表面に平面
状に連ねた半導体収納装置において、前記底板を前記装
置本体底面にろう付けした際に前記キャビティ底面に露
出した底板表面に漏れ出したろう材が溜まりやすい底板
表面部分に、ろう材を溜める窪みを設けたことを特徴と
する半導体収納装置。
4. A semiconductor storage device in which a bottom plate is brazed to the bottom surface of the device main body provided with a brazing layer, and the bottom surface of a cavity for accommodating a semiconductor chip provided in the device main body is sealed with the bottom plate, In a semiconductor storage device in which a bottom plate surface exposed at the bottom of a cavity is connected in a planar manner to a bottom plate surface brazed to the bottom of the device main body, the bottom plate surface exposed to the bottom of the cavity when the bottom plate is brazed to the bottom of the device main body. A semiconductor storage device characterized in that a recess is provided in the surface of the bottom plate where leaked brazing material tends to accumulate.
【請求項5】  キャビティ底面に露出した底板表面の
コーナー部に、窪みを設けた請求項4記載の半導体収納
装置。
5. The semiconductor storage device according to claim 4, wherein a recess is provided in a corner portion of the surface of the bottom plate exposed at the bottom surface of the cavity.
【請求項6】  キャビティ底面に露出した底板表面周
囲に、窪みを設けた請求項4記載の半導体収納装置。
6. The semiconductor storage device according to claim 4, wherein a depression is provided around the surface of the bottom plate exposed at the bottom of the cavity.
【請求項7】  装置本体のキャビティ内側面のコーナ
ー部に、切欠きを設けた請求項1、2、3、4、5また
は6記載の半導体収納装置。
7. The semiconductor storage device according to claim 1, wherein a notch is provided in a corner of an inner surface of the cavity of the device main body.
JP13041191A 1991-05-02 1991-05-02 Semiconductor container Pending JPH04332141A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13041191A JPH04332141A (en) 1991-05-02 1991-05-02 Semiconductor container

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13041191A JPH04332141A (en) 1991-05-02 1991-05-02 Semiconductor container

Publications (1)

Publication Number Publication Date
JPH04332141A true JPH04332141A (en) 1992-11-19

Family

ID=15033626

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13041191A Pending JPH04332141A (en) 1991-05-02 1991-05-02 Semiconductor container

Country Status (1)

Country Link
JP (1) JPH04332141A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010199621A (en) * 2010-05-31 2010-09-09 Murata Mfg Co Ltd Multilayer ceramic substrate
JP2012094701A (en) * 2010-10-27 2012-05-17 Kyocera Corp Package for housing semiconductor element and module including the package

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010199621A (en) * 2010-05-31 2010-09-09 Murata Mfg Co Ltd Multilayer ceramic substrate
JP2012094701A (en) * 2010-10-27 2012-05-17 Kyocera Corp Package for housing semiconductor element and module including the package

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