JPH04307438A - Optical information recording medium - Google Patents

Optical information recording medium

Info

Publication number
JPH04307438A
JPH04307438A JP3071499A JP7149991A JPH04307438A JP H04307438 A JPH04307438 A JP H04307438A JP 3071499 A JP3071499 A JP 3071499A JP 7149991 A JP7149991 A JP 7149991A JP H04307438 A JPH04307438 A JP H04307438A
Authority
JP
Japan
Prior art keywords
layer
substrate
refractive index
moisture
hard coat
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3071499A
Other languages
Japanese (ja)
Inventor
Eri Kinou
喜納 恵里
Makoto Fujigami
真 藤上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sekisui Chemical Co Ltd
Original Assignee
Sekisui Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sekisui Chemical Co Ltd filed Critical Sekisui Chemical Co Ltd
Priority to JP3071499A priority Critical patent/JPH04307438A/en
Publication of JPH04307438A publication Critical patent/JPH04307438A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To suppress the reflection loss of light and to improve signal characteristics and durability by setting the refractive index n of a moistureproof layer between the refractive index n(s) of a substrate and the refractive index n(h) of a hard coat layer. CONSTITUTION:The transparent moistureproof layer is formed on the specular surface of a transparent resin substrate. The value of the refractive index n of this transparent moistureproof layer is set at the value between the refractive index n(s) of the substrate and the refractive index n(h) of the hard coat layer. The transparent moistureproof layer has nearly 0 coefft. of absorption in the use wavelength region of light and the coefft. of moisture vapor permeation thereof is preferably specified to <=5X10<-4>(gmm/m<2> day). The hard coat layer is adequately constituted of a UV curing resin and is more particularly preferably an acrylate system. The (substrate treated) specular surface is preferably subjected to a substrate treatment in order to enhance the adhesion of the transparent moistureproof layer and the substrate. The plasma treatment by O2 is most effective as the substrate treatment.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】本発明は、光情報記録媒体に係り
、より詳細には、光の反射損失が小さく、信号特性・耐
久性共に優れた光情報記録媒体に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optical information recording medium, and more particularly to an optical information recording medium with low reflection loss of light and excellent signal characteristics and durability.

【0002】0002

【従来の技術】透明基板の鏡面側から光を入射して記録
または再生を行なう光情報記録媒体において、基板材料
が樹脂である場合、その鏡面側からの吸湿による機械的
変形を原因とする信号特性の劣化が問題となっている。 そこで鏡面側に防湿層を形成してこの吸湿を防ごうとい
う技術が試みられている(例えば、特開昭58−322
38号公報)。あるいは外界と接触する部位を誘電体膜
で被覆する技術も試みられている(特開昭63−690
46号公報)。
[Prior Art] In an optical information recording medium in which recording or reproduction is performed by entering light from the mirror side of a transparent substrate, when the substrate material is resin, a signal is generated due to mechanical deformation due to moisture absorption from the mirror side. Deterioration of characteristics has become a problem. Therefore, attempts have been made to form a moisture-proof layer on the mirror surface to prevent moisture absorption (for example, Japanese Patent Laid-Open No. 58-322
Publication No. 38). Alternatively, a technique has also been attempted in which the parts that come into contact with the outside world are covered with a dielectric film (Japanese Patent Laid-Open No. 63-690
Publication No. 46).

【0003】しかし、前者の場合、防湿層の屈折率によ
っては入射光の反射損失が膜厚によって大きく左右され
、成膜上また信号特性(記録感度)の上で不都合である
。加えて、機械的強度を高めるという観点から防湿層上
にハードコート層を設けた場合には、かかる不都合は更
に顕著になる。後者においても強度の点からハードコー
ト層は不可欠であり、その際には前者の場合と同様に反
射率が問題となる。
However, in the former case, depending on the refractive index of the moisture-proof layer, the reflection loss of incident light is greatly affected by the film thickness, which is disadvantageous in terms of film formation and signal characteristics (recording sensitivity). In addition, when a hard coat layer is provided on the moisture-proof layer from the viewpoint of increasing mechanical strength, this disadvantage becomes even more noticeable. In the latter case, a hard coat layer is also essential from the viewpoint of strength, and in this case, reflectance becomes an issue as in the former case.

【0004】また、高温高湿下での耐久性試験では基板
に対する防湿層の密着力が重要となるが、下地処理のな
い場合、防湿層の密着力は未だ充分とは言えない。
[0004] Furthermore, in durability tests under high temperature and high humidity conditions, the adhesion of the moisture-proof layer to the substrate is important, but without surface treatment, the adhesion of the moisture-proof layer is still not sufficient.

【0005】[0005]

【発明が解決しようとする課題】本発明は、防湿層の屈
折率nを基板の屈折率n(s)とハードコート層の屈折
率n(h)との間に設定することによって、光の反射損
失を小さく抑え、信号特性・耐久性共に優れた光情報記
録媒体を提供することを目的とする。
[Problems to be Solved by the Invention] The present invention provides a method for controlling light by setting the refractive index n of the moisture-proof layer between the refractive index n(s) of the substrate and the refractive index n(h) of the hard coat layer. The purpose of the present invention is to provide an optical information recording medium with low reflection loss and excellent signal characteristics and durability.

【0006】本発明は、上記目的に加え、防湿層の密着
性に優れ、耐久性がより一段と優れた光情報記録媒体を
提供することを目的とする。
[0006] In addition to the above-mentioned objects, the present invention aims to provide an optical information recording medium which has excellent adhesion of a moisture-proof layer and is even more durable.

【0007】[0007]

【課題を解決するための手段】上記目的を達成するため
の本発明の要旨は、透明樹脂基板の記録面に記録層が形
成され、該透明樹脂基板の鏡面に防湿層が形成されてい
る光情報記録媒体において、該防湿層上にハードコート
層を形成し、該透明樹脂基板、該防湿層、該ハードコー
ト層の屈折率をそれぞれ、n(s),n,n(h)とし
たとき、nの値を、n(s)とn(h)との間の値とし
たことを特徴とする光情報記録媒体に存在する。以下に
本発明の詳細な構成を説明する。
[Means for Solving the Problems] The gist of the present invention to achieve the above object is to provide an optical disc in which a recording layer is formed on the recording surface of a transparent resin substrate, and a moisture-proof layer is formed on the mirror surface of the transparent resin substrate. In the information recording medium, when a hard coat layer is formed on the moisture-proof layer, and the refractive indices of the transparent resin substrate, the moisture-proof layer, and the hard coat layer are n(s), n, and n(h), respectively. , n is between n(s) and n(h). The detailed configuration of the present invention will be explained below.

【0008】(基板)ここで前記透明樹脂基板としては
、例えば、ポリカーボネート(PC)、ポリメタクリル
酸メチル(PMMA)等のアクリル、エポキシ等、光情
報記録媒体の透明基板として使用されうる合成樹脂より
なる基板であれば特に限定されない。なお、これらの樹
脂の屈折率n(s)は樹脂の種類によって異なるが、お
およそ1.5〜1.6である。
(Substrate) Here, the transparent resin substrate is made of synthetic resins that can be used as transparent substrates of optical information recording media, such as acrylics such as polycarbonate (PC) and polymethyl methacrylate (PMMA), and epoxy. There is no particular limitation as long as the substrate is Note that the refractive index n(s) of these resins varies depending on the type of resin, but is approximately 1.5 to 1.6.

【0009】(記録層)前記透明樹脂基板の記録面には
記録層が形成される。記録層としては、光情報記録媒体
の記録作用を有するものであれば特に限定されず、光磁
気型、相変化型、追記型のいずれでもよい。例えば光磁
気型の場合、例えば、TbFeCo,TbFe,TbC
o,GaTbCo等の薄膜が用いられる。記録層の膜厚
は一般的に100〜1000Åが好適である。
(Recording layer) A recording layer is formed on the recording surface of the transparent resin substrate. The recording layer is not particularly limited as long as it has the recording function of an optical information recording medium, and may be of a magneto-optical type, a phase change type, or a write-once type. For example, in the case of magneto-optical type, for example, TbFeCo, TbFe, TbC
A thin film of GaTbCo or the like is used. The thickness of the recording layer is generally preferably 100 to 1000 Å.

【0010】なお、記録層に接する上下に、すなわち記
録層をはさんで、例えばSiN,SiAlON等の誘電
体からなる保護層を100〜1000Å設けてもよい。 更にそれらの上に例えば、Al,Cr等からなる反射層
を500Å程度の膜厚で設け、最上層として例えばアク
リレート系の紫外線硬化型樹脂で厚さ5μm前後のトッ
プコート処理をしてもよい。
[0010] A protective layer made of a dielectric material such as SiN or SiAlON may be provided with a thickness of 100 to 1000 Å above and below the recording layer, that is, on both sides of the recording layer. Furthermore, a reflective layer made of, for example, Al, Cr, etc. may be provided thereon to a thickness of about 500 Å, and the top layer may be top coated with, for example, an acrylate-based ultraviolet curing resin to a thickness of about 5 μm.

【0011】(透明防湿層)本発明では、透明樹脂基板
の鏡面に透明防湿層を形成する。本発明では、この透明
防湿層の屈折率nの値を、基板の屈折率n(s)と後述
するハードコート層の屈折率n(h)との間の値にする
(Transparent moisture-proof layer) In the present invention, a transparent moisture-proof layer is formed on the mirror surface of a transparent resin substrate. In the present invention, the value of the refractive index n of this transparent moisture-proof layer is set to a value between the refractive index n(s) of the substrate and the refractive index n(h) of the hard coat layer described later.

【0012】なお、該透明防湿層は、光の使用波長域で
の吸収係数がほぼ0であり、なおかつ透湿係数がおおよ
そ5×10−4(gmm/m2day)以下とすること
が好ましい。その構成材料としては、例えば、MgO,
Al2O3,SiTaO,SiZrO等があげられ、そ
の膜厚は1000〜2000Åが好ましく、1400〜
1600Åがより好ましい。
[0012] The transparent moisture-proof layer preferably has an absorption coefficient of approximately 0 in the usable wavelength range of light, and a moisture permeability coefficient of approximately 5 x 10-4 (gmm/m2day) or less. Its constituent materials include, for example, MgO,
Examples include Al2O3, SiTaO, SiZrO, etc., and the film thickness is preferably 1000 to 2000 Å, and 1400 to 2000 Å.
1600 Å is more preferable.

【0013】透明防湿層の屈折率nは、例えば、その構
成材料の組成比を変化させることにより変化させればよ
く、また、構成材料の組成比を変化させるには成膜条件
を制御すればよい。すなわち、例えば、スパッタリング
により透明防湿層を形成する場合、スパッタリングガス
のガス圧を変化させることにより、また、スパッタリン
グガスが例えば(Ar+O2)の場合O2の分圧を変化
させることにより、さらには、ターゲットに別材料のチ
ップをその個数を変化させて載置すること等により行え
ばよい。
The refractive index n of the transparent moisture-proof layer can be changed by, for example, changing the composition ratio of its constituent materials, and the composition ratio of the constituent materials can be changed by controlling the film-forming conditions. good. That is, for example, when forming a transparent moisture-proof layer by sputtering, by changing the gas pressure of the sputtering gas, or by changing the partial pressure of O2 when the sputtering gas is (Ar + O2), furthermore, by changing the partial pressure of O2, the target This may be done by placing chips of different materials in varying numbers on the surface of the substrate.

【0014】(ハードコート層)本発明では、透明防湿
層上に、ハードコート層を形成する。ハードコート層と
しては紫外線硬化型樹脂により構成することが好適で、
例えば、アクリレート系、エポキシ系、シリコン系等が
構成材料としてあげられるが、アクリレート系が特に好
ましい。その屈折率n(h)は1.5程度、厚さは数μ
mが好ましい。
(Hard Coat Layer) In the present invention, a hard coat layer is formed on the transparent moisture-proof layer. The hard coat layer is preferably composed of an ultraviolet curable resin,
For example, acrylate-based, epoxy-based, silicon-based, etc. may be mentioned as constituent materials, and acrylate-based is particularly preferred. Its refractive index n(h) is about 1.5, and its thickness is several microns.
m is preferred.

【0015】(下地処理)鏡面には透明防湿層と基板と
の密着性を高めるために下地処理を行うことが好ましい
(請求項2)。下地処理としては、例えば、プラズマ処
理、電子線照射処理等があるが、プラズマ処理が特に効
果的である。プラズマ処理としては、例えばO2による
プラズマ処理、Arによるプラズマ処理等があるが、中
でもO2によるプラズマ処理が最も有効である。
(Base treatment) It is preferable to perform a base treatment on the mirror surface in order to improve the adhesion between the transparent moisture-proof layer and the substrate (Claim 2). Examples of the base treatment include plasma treatment, electron beam irradiation treatment, etc., and plasma treatment is particularly effective. Examples of plasma processing include plasma processing using O2 and plasma processing using Ar, among which plasma processing using O2 is the most effective.

【0016】(各層の形成方法)前記記録層、保護層、
反射層、透明防湿層の形成手段としては、均一な厚み及
び組成が得られるものであれば特に限定されず、例えば
、真空蒸着、スパッタリング等が適用可能である。トッ
プコート、ハードコート層は、均一な厚みが得られる方
法であれば限定されないが、例えばスピンコート法が適
用できる。
(Method for forming each layer) The recording layer, the protective layer,
The means for forming the reflective layer and the transparent moisture-proof layer is not particularly limited as long as a uniform thickness and composition can be obtained, and for example, vacuum deposition, sputtering, etc. can be applied. The top coat and hard coat layer are not limited as long as they can be formed to have a uniform thickness, but for example, spin coating can be applied.

【0017】[0017]

【実施例】(実施例1)下記■〜■の各種基板を用意し
、その基板に透明防湿層を形成した。
[Example] (Example 1) Various substrates shown below (1) to (2) were prepared, and a transparent moisture-proof layer was formed on the substrates.

【0018】 ■反射率測定用:厚さ1.2mmのPC板(屈折率:n
(s)=1.59) ■組成比・吸収係数・屈折率測定用:Siウエハー■透
湿係数測定用:厚さ180μmのPCシート■光情報記
録媒体用:3.5インチPCディスク基板
■For reflectance measurement: PC board with a thickness of 1.2 mm (refractive index: n
(s) = 1.59) ■For composition ratio/absorption coefficient/refractive index measurement: Si wafer ■For moisture permeability coefficient measurement: 180 μm thick PC sheet ■For optical information recording medium: 3.5 inch PC disk substrate

【0019】
Al2O3をターゲットとして、(Ar+O2)雰囲気
下でスパッタリングを行い、上記■〜■の基板上に透明
防湿層を形成した。なお、スパッタリング時のO2分圧
を0%,10%,20%と変化させることにより、透明
防湿層の組成を変化させ、それにより表1のNo.11
〜No.13に示す屈折率nを有する透明防湿層を形成
した。なお、透明防湿層の厚さはNo.11〜No.1
3のすべてにつき1500Åとした。
[0019]
Using Al2O3 as a target, sputtering was performed in an (Ar+O2) atmosphere to form a transparent moisture-proof layer on the substrates ① to ② above. In addition, by changing the O2 partial pressure during sputtering from 0% to 10% to 20%, the composition of the transparent moisture-proof layer was changed. 11
~No. A transparent moisture-proof layer having a refractive index n shown in No. 13 was formed. In addition, the thickness of the transparent moisture-proof layer is No. 11~No. 1
It was set to 1500 Å for all of 3.

【0020】また、MgOをターゲットとしてAr雰囲
気中で、導入するスパッタリングガス圧を0.7Pa,
2.0Pa,3.0Paに変化させることにより透明防
湿層の組成を変化させ、それにより表1のNo.14〜
No.16に示す屈折率nを有する透明防湿層を形成し
た。透明防湿層の厚さはNo.14〜No.16のすべ
てにつき1500Åとした。
[0020] Furthermore, using MgO as a target in an Ar atmosphere, the sputtering gas pressure introduced was set to 0.7 Pa,
By changing the pressure to 2.0 Pa and 3.0 Pa, the composition of the transparent moisture-proof layer was changed. 14~
No. A transparent moisture-proof layer having a refractive index n shown in No. 16 was formed. The thickness of the transparent moisture-proof layer is No. 14~No. It was set to 1500 Å for all 16.

【0021】なお、■の3.5インチPCディスク基板
の記録面側には、SiN(保護層)/TbFeCo(記
録層)/SiN(保護層)/Al(反射層)を各々80
0Å/300Å/300Å/500Åの厚さでスパッタ
リング成膜し、鏡面側に前記透明防湿層を形成して光情
報記録媒体を作成した。
[0021] On the recording surface side of the 3.5-inch PC disk substrate (■), SiN (protective layer)/TbFeCo (recording layer)/SiN (protective layer)/Al (reflective layer) were coated at 80% each.
Films were formed by sputtering to a thickness of 0 Å/300 Å/300 Å/500 Å, and the transparent moisture-proof layer was formed on the mirror surface side to prepare an optical information recording medium.

【0022】また、■の基板(反射率測定用基板)及び
■の基板を用いて作成した光情報記録媒体については、
透明防湿層を形成後、その上に、UVハードコート(大
日本インキ化学工業株式会社EX/704、アクリレー
ト系、n(h)=1.52)をスピンコート法により5
μmの厚さで形成した。
[0022] Regarding the substrate ① (substrate for reflectance measurement) and the optical information recording medium made using the substrate ②,
After forming the transparent moisture-proof layer, a UV hard coat (Dainippon Ink & Chemicals Co., Ltd. EX/704, acrylate type, n(h) = 1.52) was applied on it by spin coating.
It was formed with a thickness of μm.

【0023】以上のようにして透明防湿層を形成した■
〜■の基板につき表1に示す項目のそれぞれの特性を測
定した。なお、表1に示す最大そり量は、高温高湿の環
境下(60℃,80%RH)に、透明防湿層が形成され
た■の基板(光情報記録媒体)を置くことにより測定し
た。
[0023] A transparent moisture-proof layer was formed as described above.
The characteristics of each of the items shown in Table 1 were measured for the substrates of ~■. The maximum amount of warpage shown in Table 1 was measured by placing the substrate 2 (optical information recording medium) on which a transparent moisture-proof layer was formed in a high temperature and high humidity environment (60° C., 80% RH).

【0024】測定結果を表1に示す。なお、表1におい
て、反射率およびそり量は、ハードコート層と透明防湿
層とのトータルの量を測定している。また、比較のため
に、透明防湿層を形成しない場合(No.17)及び広
く一般に保護膜として用いられているSiN膜を前記A
l2O3膜あるいはMgO膜に代えて透明防湿層とした
場合(No.18)の結果も併記する。なお、反射率の
測定に際してはλ=830nmなる波長の光を用いた。
The measurement results are shown in Table 1. In addition, in Table 1, the reflectance and the amount of warpage are measured by the total amount of the hard coat layer and the transparent moisture-proof layer. In addition, for comparison, the case where no transparent moisture-proof layer is formed (No. 17) and the SiN film that is widely used as a protective film are shown in the above A.
The results obtained when a transparent moisture-proof layer was used instead of the 12O3 film or the MgO film (No. 18) are also shown. Note that when measuring the reflectance, light with a wavelength of λ=830 nm was used.

【0025】[0025]

【表1】 *PC+ハードコート層の値 *PC基板+ハードコート層の値 **記録部4層膜/PC基板/ハードコート層の値No
.11〜13:Al2O3膜 No.14〜16:MgO膜 No.17:PC基板(透明防湿層なし)No.18:
SiN膜
[Table 1] * Value of PC + hard coat layer * Value of PC board + hard coat layer ** Value of recording section 4-layer film/PC board/hard coat layer No.
.. 11-13: Al2O3 film No. 14-16: MgO film No. 17: PC board (no transparent moisture barrier layer) No. 18:
SiN film

【0026】表1におけるNo.17については、吸収
係数、屈折率、透湿係数はPC基板そのものの値、反射
率はPC基板にハードコート層を形成した時の値、そり
量は記録面側にNo.11〜No.16の場合と同様の
4層膜を成膜し、鏡面側にハードコート層のみを形成し
たものの値である。また、No.18は、Al2O3膜
あるいはMgO膜のかわりにSiN膜を用いたときの値
である。
[0026] No. in Table 1. Regarding No. 17, the absorption coefficient, refractive index, and moisture permeability coefficient are the values of the PC board itself, the reflectance is the value when a hard coat layer is formed on the PC board, and the amount of warpage is the value of No. 1 on the recording surface side. 11~No. This value is obtained by forming a four-layer film similar to No. 16 and forming only a hard coat layer on the mirror surface side. Also, No. 18 is the value when a SiN film is used instead of the Al2O3 film or the MgO film.

【0027】表1に示すように、SiN膜の場合(No
.18)に比べAl2O3膜あるいはMgO膜の場合(
No.11からNo.16)はトータルの反射率が著し
く小さくなっていることがわかる。特に本発明の実施例
(No.12,No.15)は、透明防湿層の屈折率n
が基板の屈折率n(s)とハードコート層の屈折率n(
h)との間の値(1.59>n>1.52)であり、P
C基板と透明防湿層、また透明防湿層とハードコート層
の界面での多重反射が殆ど0になり、防湿層があること
によって生じる反射損失を抑え、透明防湿層がない場合
と同等になっている。また、本発明の実施例(No.1
2,No.15)では、透湿係数Qは4×10−4(g
mm/m2day)以下であり、それに伴い最大そり量
は2mrad以下と極めて小さくなっている。
As shown in Table 1, in the case of SiN film (No.
.. Compared to 18), in the case of Al2O3 film or MgO film (
No. 11 to no. 16), it can be seen that the total reflectance is significantly smaller. In particular, in Examples (No. 12, No. 15) of the present invention, the refractive index n of the transparent moisture-proof layer is
is the refractive index n(s) of the substrate and the refractive index n(s) of the hard coat layer
h) (1.59>n>1.52), and P
Multiple reflections at the interfaces between the C substrate and the transparent moisture-proof layer, as well as between the transparent moisture-proof layer and the hard coat layer, are almost zero, suppressing the reflection loss caused by the presence of the moisture-proof layer and making it equivalent to the case without the transparent moisture-proof layer. There is. In addition, Example (No. 1) of the present invention
2, No. 15), the moisture permeability coefficient Q is 4 x 10-4 (g
mm/m2day), and accordingly, the maximum amount of warpage is extremely small, 2 mrad or less.

【0028】次いで、■の基板を用いて作成した光情報
記録媒体につき、信号特性の一つとしてCNR(搬送波
対雑音比)を測定した。その結果を図1に示す。
Next, CNR (carrier-to-noise ratio) was measured as one of the signal characteristics for the optical information recording medium produced using the substrate (2). The results are shown in Figure 1.

【0029】図1に示すように、No.12(n=1.
56)はSiN膜のもの(No.17)に比べて感度で
2.0mW、CNRで2dB程度、またNo.13,N
o.16(ともにn=1.50)に比べても感度が1.
0mW程度向上していることから、防湿層の屈折率nを
基板の屈折率n(s)とハードコート層の屈折率n(h
)との間の値に設定することで、反射損失による信号特
性の劣化を低く抑え、よりブランクに近いものとなって
いることがわかる。
As shown in FIG. 12 (n=1.
No. 56) has a sensitivity of 2.0 mW and a CNR of about 2 dB compared to the SiN film one (No. 17). 13,N
o. Even when compared to 16 (both n=1.50), the sensitivity is 1.
Since the improvement is about 0 mW, the refractive index n of the moisture-proof layer is calculated by changing the refractive index n of the substrate to the refractive index n(h) of the hard coat layer.
), the deterioration of the signal characteristics due to reflection loss is suppressed to a low level, resulting in a signal closer to a blank.

【0030】(実施例2)本例では、実施例1における
Al2O3膜あるいはMgO膜に代えSixTayO1
−x−y膜により透明防湿層を形成した。その成膜は以
下のようにして行った。
(Example 2) In this example, SixTayO1 was used instead of the Al2O3 film or MgO film in Example 1.
A transparent moisture-proof layer was formed by the -xy film. The film was formed as follows.

【0031】SiO2ターゲット上に適宜の数のTaチ
ップを載置し、(Ar+O2)雰囲気下でスパッタリン
グを行い、実施例で述べた■〜■の基板上に透明防湿層
を形成した。なお、スパッタリング時のO2分圧は20
%とし、Taチップの数を変えることにより透明防湿層
の組成(SixTayO1−x−y)を表2のNo.2
1〜No.23に示すように変化させ、屈折率nを変化
させた。膜厚はすべて1500Åとした。
An appropriate number of Ta chips were placed on a SiO2 target, and sputtering was performed in an (Ar+O2) atmosphere to form a transparent moisture-proof layer on the substrates (1) to (4) described in Examples. Note that the O2 partial pressure during sputtering was 20
%, and by changing the number of Ta chips, the composition of the transparent moisture-proof layer (SixTayO1-x-y) was changed to No. 2 in Table 2. 2
1~No. The refractive index n was changed as shown in 23. All film thicknesses were 1500 Å.

【0032】なお、■の3.5インチPCディスク基板
の記録面側には実施例1と同様に、保護層だ記録層をは
さみ、更にその上に反射層を形成して光情報記録媒体を
作成した。なお、各層の厚さ、成膜方法も実施例1と同
様にした。
As in Example 1, a protective layer and a recording layer are sandwiched on the recording surface side of the 3.5-inch PC disk substrate (2), and a reflective layer is further formed on top of the protective layer to form an optical information recording medium. Created. Note that the thickness of each layer and the film forming method were also the same as in Example 1.

【0033】また、■の基板(反射率測定用基板)及び
■の基板(光情報記録媒体)のについては、透明防湿層
形成後、実施例1と同様のハードコート層を形成した。
For the substrate (1) (reflectance measurement substrate) and the substrate (2) (optical information recording medium), a hard coat layer similar to that in Example 1 was formed after forming the transparent moisture-proof layer.

【0034】以上のようにして透明防湿層を形成した■
〜■の基板につき実施例1と同様に、表2に示す項目の
それぞれの特性を測定した。なお、表2に示す最大そり
量は、高温高湿の環境下(80℃,80%RH)に、透
明防湿層が形成された■の基板(光情報記録媒体)を置
くことにより測定した。
[0034] A transparent moisture-proof layer was formed as described above.
In the same manner as in Example 1, the characteristics of each of the items shown in Table 2 were measured for the substrates of ~■. The maximum amount of warpage shown in Table 2 was measured by placing the substrate 2 (optical information recording medium) on which a transparent moisture-proof layer was formed in a high temperature and high humidity environment (80° C., 80% RH).

【0035】測定結果も表2に示す。なお、表2におい
て、反射率およびそり量は、ハードコート層と透明防湿
層とのトータルの量を測定している。また、反射率の測
定に際してはλ=830nmなる波長の光を用いた。
The measurement results are also shown in Table 2. In addition, in Table 2, the reflectance and the amount of warpage are measured by the total amount of the hard coat layer and the transparent moisture-proof layer. Further, when measuring the reflectance, light having a wavelength of λ=830 nm was used.

【0036】[0036]

【表2】 *PC+ハードコート層の値 **記録部4層膜/PC基板/ハードコート層の値No
.21〜23:SiTaO膜 No.17:PC基板(透明防湿層なし)No.18:
SiN膜
[Table 2] *Value of PC + hard coat layer** Value of recording section 4-layer film/PC board/hard coat layer No.
.. 21-23: SiTaO film No. 17: PC board (no transparent moisture barrier layer) No. 18:
SiN film

【0037】なお、表2におけるNo.17、No.1
8は、表1におけるNo.17、No.18を再掲した
ものである。表2に示すように、SiN膜の場合(No
.18)に比べSiTaO膜の場合(No.21〜No
.23)はトータルの反射率が著しく小さくなっている
ことがわかる。特に本発明の実施例(No.22)は透
明防湿層の屈折率が基板とハードコート層の間の値(1
.59>n>1.52)であり、PC基板と透明防湿層
、また透明防湿層とハードコート層の界面での多重反射
が殆ど0になり、透明防湿層があることによって生じる
反射損失を抑え、透明防湿層がない場合と同等になって
いる。
[0037] Note that No. 2 in Table 2. 17, No. 1
8 is No. 8 in Table 1. 17, No. This is a reprint of 18. As shown in Table 2, in the case of SiN film (No.
.. 18), in the case of SiTaO film (No. 21 to No.
.. 23), it can be seen that the total reflectance is significantly smaller. In particular, in Example (No. 22) of the present invention, the refractive index of the transparent moisture-proof layer is the value (1) between the substrate and the hard coat layer.
.. 59>n>1.52), and multiple reflections at the interfaces between the PC board and the transparent moisture-proof layer, as well as between the transparent moisture-proof layer and the hard coat layer, are almost 0, suppressing reflection loss caused by the presence of the transparent moisture-proof layer. , it is equivalent to the case without a transparent moisture barrier layer.

【0038】また、本発明の実施例(No.22)では
、透湿係数が、5×10−4(gmm/m2day)以
下であり、それにともない最大そり量が3mrad以下
と極めて小さくなっている。
[0038] Furthermore, in the example (No. 22) of the present invention, the moisture permeability coefficient is 5 x 10-4 (gmm/m2day) or less, and accordingly, the maximum amount of warpage is extremely small at 3 mrad or less. .

【0039】(実施例3)本例では、前記■のPC基板
を用い、その鏡面側に下地処理(O2プラズマ処理:O
2ガス圧2,0Pa,300W,1min)を施した。 次いで、基板鏡面側に表2のNo.21〜23の膜組成
になるようにスッパタリング成膜を行なった(それらを
No.31、32、33とする)。膜厚は実施例1と同
様、総て1500Åとした。
(Example 3) In this example, the above-mentioned PC board (1) is used, and the mirror surface side thereof is subjected to base treatment (O2 plasma treatment: O2 plasma treatment).
2 gas pressure 2.0 Pa, 300 W, 1 min) was applied. Next, No. 2 in Table 2 was applied to the mirror surface side of the substrate. Sputtering film formation was performed to obtain film compositions of Nos. 21 to 23 (these will be referred to as Nos. 31, 32, and 33). As in Example 1, the film thickness was 1500 Å in all.

【0040】このようにして作成したNo.31〜No
.33(下地処理のあるもの)のサンプルと、実施例2
で作成したNo.21〜No.23(下地処理のないも
の)のサンプルの合計6種類のサンプルについて、密着
力を評価するためにテープ剥離テストを「塗料−K54
00、試験方法その6:塗料及び塗膜の長期性能に関す
る試験」に従い行った。
[0040]No. created in this way. 31~No
.. Sample 33 (with surface treatment) and Example 2
No. created in 21~No. A total of 6 types of samples, 23 samples (without surface treatment), were subjected to a tape peel test to evaluate the adhesion.
00, Test method No. 6: Test on long-term performance of paints and coating films.

【0041】初期及び耐久性試験(80℃,90%RH
,200hr)後の結果を表3に示す。なお、表3にお
いて、(0/100)とは、膜にナイフで切れ目を入れ
た升目100個のうち、テープ剥離テストで膜が完全に
残った升目の数が0であるという意味である。また比較
のため、耐久性に優れる薄膜の例として下地処理を施し
ていないAl2O3,MgO膜についての測定データも
あわせてのせる。なお、膜そのものの密着力を評価する
ために、サンプルにはすべてハードコートを施していな
い。
[0041] Initial and durability test (80°C, 90%RH
, 200 hours) are shown in Table 3. In Table 3, (0/100) means that out of 100 squares in which the film was cut with a knife, the number of squares in which the film remained completely in the tape peel test was 0. For comparison, measurement data on Al2O3 and MgO films without surface treatment are also shown as examples of thin films with excellent durability. Note that in order to evaluate the adhesion of the film itself, no hard coating was applied to any of the samples.

【0042】[0042]

【表3】 下地処理を施したことで、特に耐久性試験後の密着力が
大幅に向上し、SiTaO膜であっても、耐久性に優れ
るAl2O3、MgO膜と同等の密着性を示すことがわ
かる。
[Table 3] By applying the base treatment, the adhesion strength especially after the durability test was significantly improved, and even the SiTaO film showed the same adhesion as the highly durable Al2O3 and MgO films. Recognize.

【0043】(実施例4)SiTaO膜を防湿層とする
光情報記録媒体を作製した。3.5インチPCを基板と
し、記録面側には、SiN/TbFeCo/SiN/A
lを各々800Å/300Å/300Å/500Åの厚
さにスパッタリング成膜した。鏡面側は下地処理(O2
プラズマ処理:O2ガス圧2,0Pa,300W,1m
in)をした後、SiTaOを、表2のNo.21〜N
o.23の条件でスパッタリング成膜し、更にスピンコ
ート法により5μmのハードコート(前述EX−704
)を施した(これらをそれぞれNo.41,42,43
とする)。また、鏡面側を下地処理した後、SiTaO
膜のかわりにSiN膜を用いて同様の光情報記録媒体を
作成し(このサンプルをNo.48とする)、CNRを
測定した。その結果を図2に示す。なお、図2には、N
o.17(下地処理・防湿層のない鏡面側ハードコート
層のみの同様の光情報記録媒体)のデータも再掲してあ
る。
(Example 4) An optical information recording medium using a SiTaO film as a moisture-proof layer was produced. The substrate is a 3.5-inch PC, and the recording surface side is SiN/TbFeCo/SiN/A.
1 was formed by sputtering to a thickness of 800 Å/300 Å/300 Å/500 Å, respectively. The mirror side is undercoated (O2
Plasma treatment: O2 gas pressure 2.0 Pa, 300 W, 1 m
In), SiTaO was added to No. 2 in Table 2. 21~N
o. A film was formed by sputtering under the conditions of 23, and then a 5 μm hard coat (ex-704 described above) was applied by spin coating.
) were applied (these were No. 41, 42, 43, respectively).
). In addition, after surface treatment on the mirror side, SiTaO
A similar optical information recording medium was prepared using a SiN film instead of the film (this sample was designated as No. 48), and the CNR was measured. The results are shown in FIG. In addition, in FIG. 2, N
o. The data for No. 17 (a similar optical information recording medium with only a hard coat layer on the specular side without any base treatment or moisture barrier layer) is also shown again.

【0044】図2に示すように、本発明の実施例である
No.42(n=1.53)はSiN膜のものに比べて
感度で2.0mW、CNRで2dB程度、また、No.
41(n=1.4),No.43(n=1.66)に比
べても感度が1.0mW程度向上していることから、防
湿層の屈折率を基板とハードコート層の間の値に設定す
ることで、反射損失による信号特性の劣化を低く抑え、
よりブランクに近いものとなっていることがわかる。
As shown in FIG. 2, No. 2 is an embodiment of the present invention. No. 42 (n=1.53) has a sensitivity of 2.0 mW and a CNR of about 2 dB compared to the SiN film one.
41 (n=1.4), No. 43 (n = 1.66), the sensitivity has improved by about 1.0 mW, so by setting the refractive index of the moisture barrier layer to a value between the substrate and the hard coat layer, the signal due to reflection loss can be reduced. Keeping deterioration of characteristics to a low level,
It can be seen that the image is closer to a blank.

【0045】[0045]

【発明の効果】本発明によれば、基板鏡面側に透明防湿
層及びハードコート層を形成することによって基板の吸
湿による変形を防ぎ、耐擦傷性も付与することができる
。また基板に下地処理を施すことによって防湿層の密着
性が向上し、高温高湿下における耐久性が向上する。 さらに防湿層の屈折率を基板とハードコート層の間の値
に制御することによって鏡面側から入射する光の反射損
失を低く抑え、その結果信号特性の向上がみられる。
According to the present invention, by forming a transparent moisture-proof layer and a hard coat layer on the mirror surface side of the substrate, deformation of the substrate due to moisture absorption can be prevented and scratch resistance can also be imparted. Further, by subjecting the substrate to a base treatment, the adhesion of the moisture-proof layer is improved, and the durability under high temperature and high humidity conditions is improved. Furthermore, by controlling the refractive index of the moisture-proof layer to a value between that of the substrate and the hard coat layer, the reflection loss of light incident from the mirror side is kept low, resulting in improved signal characteristics.

【図面の簡単な説明】[Brief explanation of drawings]

【図1】  実施例1における光情報記録媒体のCNR
特性を示すグラフ。
[Figure 1] CNR of the optical information recording medium in Example 1
Graph showing characteristics.

【図2】  実施例4における光情報記録媒体のCNR
特性を示すグラフ。
[Figure 2] CNR of the optical information recording medium in Example 4
Graph showing characteristics.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】  透明樹脂基板の片側の面(以下この面
を「記録面」という)に記録層が形成され、該透明樹脂
基板の該記録面と反対側の面(以下この反対側の面を「
鏡面」という)に防湿層が形成されている光情報記録媒
体において、該防湿層上にハードコート層を形成し、該
透明樹脂基板、該防湿層、該ハードコート層の屈折率を
それぞれ、n(s),n,n(h)としたとき、nの値
を、n(s)とn(h)との間の値としたことを特徴と
する光情報記録媒体。
Claim 1: A recording layer is formed on one surface of a transparent resin substrate (hereinafter referred to as the "recording surface"), and a recording layer is formed on the surface of the transparent resin substrate opposite to the recording surface (hereinafter this opposite surface). of"
In an optical information recording medium in which a moisture-proof layer is formed on a mirror surface, a hard coat layer is formed on the moisture-proof layer, and the refractive index of the transparent resin substrate, the moisture-proof layer, and the hard coat layer are set to n. An optical information recording medium characterized in that, where (s), n, and n(h), the value of n is between n(s) and n(h).
【請求項2】  前記鏡面は、下地処理がなされた面で
あることを特徴とする請求項1記載の光情報記録媒体。
2. The optical information recording medium according to claim 1, wherein the mirror surface is a surface that has been subjected to a base treatment.
JP3071499A 1991-04-04 1991-04-04 Optical information recording medium Pending JPH04307438A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3071499A JPH04307438A (en) 1991-04-04 1991-04-04 Optical information recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3071499A JPH04307438A (en) 1991-04-04 1991-04-04 Optical information recording medium

Publications (1)

Publication Number Publication Date
JPH04307438A true JPH04307438A (en) 1992-10-29

Family

ID=13462427

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3071499A Pending JPH04307438A (en) 1991-04-04 1991-04-04 Optical information recording medium

Country Status (1)

Country Link
JP (1) JPH04307438A (en)

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