JPH0316048A - Magneto-optical recording medium and production thereof - Google Patents

Magneto-optical recording medium and production thereof

Info

Publication number
JPH0316048A
JPH0316048A JP6687290A JP6687290A JPH0316048A JP H0316048 A JPH0316048 A JP H0316048A JP 6687290 A JP6687290 A JP 6687290A JP 6687290 A JP6687290 A JP 6687290A JP H0316048 A JPH0316048 A JP H0316048A
Authority
JP
Japan
Prior art keywords
magneto
optical recording
coating film
recording medium
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6687290A
Other languages
Japanese (ja)
Other versions
JP3030713B2 (en
Inventor
Mutsumi Asano
睦己 浅野
Kiyoshi Kasai
笠井 清
Hidehiko Misaki
日出彦 三崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tosoh Corp
Original Assignee
Tosoh Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tosoh Corp filed Critical Tosoh Corp
Priority to JP2066872A priority Critical patent/JP3030713B2/en
Publication of JPH0316048A publication Critical patent/JPH0316048A/en
Application granted granted Critical
Publication of JP3030713B2 publication Critical patent/JP3030713B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PURPOSE:To obtain the large magneto-optical effect without generating the corrosion of a magneto-optical recording film by using Si, N and H as constituting elements to form the coating films laminated and constituted together with the magneto-optical recording film. CONSTITUTION:The coating films 2, 4 are laminated together with the magneto- optical recording film 3 on the front and rear surfaces on a substrate 1. At least either of the constituting films is formed of the Si, N and H as its constituting elements. The coating films 2, 4 made of the Si, N and H as the constituting elements have the function to increase a Kerr effect and the function to protect the magnetic film 3 against corrosion. The magneto-optical recording medium formed in such a manner obviates the corrosion of the magnetic film 3, has the large magneto-optical effect and has the excellent reading performance, recording sensitivity and reliability as well.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は光磁気記録媒体に関し、詳しくは基板上に光磁
気記録磁性膜と共に積層する被覆膜に特徴のある光磁気
記録媒体に関するものである。
Detailed Description of the Invention (Industrial Application Field) The present invention relates to a magneto-optical recording medium, and more particularly to a magneto-optical recording medium characterized by a coating film laminated on a substrate together with a magneto-optical recording magnetic film. be.

(従来の技術) 光記録媒体の中でも書き込み消去のできる書き換え可能
型として従来知られるものとして、相変化型、フォトク
ロミック型、光磁気型等の媒体がある。これらの書き換
え可能型の中でも光磁気型が書き込み速度や繰返し耐性
に優れており、注目されている。
(Prior Art) Among optical recording media, there are phase change type, photochromic type, magneto-optical type media, etc. as conventionally known rewritable type media that can be written and erased. Among these rewritable types, the magneto-optical type is attracting attention because it has excellent writing speed and repeat durability.

ところで、この光磁気型の光記録媒体の光磁気記録磁性
膜(以下この膜を単に磁性膜という)には、例えば希土
類一遷移金属薄!I(以下、RE−TM膜という)ある
いはM n B i系薄膜を用いたものが従来提案され
ており、このうちRE−TM膜を用いたものが総合特性
に優れている。しかしながら、これら磁性膜は耐食性に
劣るという欠点を有し、磁性膜の腐食に伴い保磁力の変
化、力一回転角の減少、孔食の発生等の劣化を生じるた
めに、記録媒体としてC/N値(carrier to
 noiserat 1o)の低下や誤り率の増加につ
ながる。この対策としては磁性膜の両面あるいは片面に
被覆膜を形威し、磁性膜の耐食性を向上させることが知
られている。
By the way, the magneto-optical recording magnetic film (hereinafter simply referred to as a magnetic film) of this magneto-optical optical recording medium is made of, for example, a rare earth-transition metal thin! Films using I (hereinafter referred to as RE-TM film) or MnB i-based thin films have been proposed in the past, and among these, films using RE-TM films have excellent overall characteristics. However, these magnetic films have the disadvantage of poor corrosion resistance, and corrosion of the magnetic film causes deterioration such as a change in coercive force, a decrease in the rotation angle per force, and the occurrence of pitting corrosion. N value (carrier to
This leads to a decrease in noise rate (1o) and an increase in error rate. As a countermeasure against this problem, it is known to form a coating film on both or one side of the magnetic film to improve the corrosion resistance of the magnetic film.

また、上記被覆膜を磁性膜の光入射面(以下適宜、磁性
膜の表面という)に積層する場合は,、磁性膜のカー回
転角を大きくするカー効果増大の機能を持たせることが
できるが、そのためには被覆膜の屈折率を大きくするこ
とが必要である。
In addition, when the above coating film is laminated on the light incident surface of the magnetic film (hereinafter referred to as the surface of the magnetic film as appropriate), it can have the function of increasing the Kerr effect by increasing the Kerr rotation angle of the magnetic film. However, for this purpose, it is necessary to increase the refractive index of the coating film.

更に光磁気記録媒体は合或樹脂やガラス等を基板として
用い、これに磁性膜と被覆膜を設けた構造を有しており
、被覆膜には化学的に安定で、酸素や水分を遮蔽し、基
板や磁性膜との親和性が良いことが望まれる。特に基板
としてポリカーボネイトやアクリル樹脂等の合成樹脂を
用いた場合、基板や磁性膜との親和性がよく、基板に含
有されたあるいは基板を透過してくる酸素や水分等を透
過しないことが強く要求される。更に、被覆膜を磁性膜
の表面に設ける場合は入射光が磁性膜に充分に達するだ
けの透明性が必要である。
Furthermore, magneto-optical recording media have a structure in which a substrate such as alloy resin or glass is provided with a magnetic film and a coating film, and the coating film is chemically stable and free from oxygen and moisture. It is desired that the material be shielded and have good compatibility with the substrate and magnetic film. In particular, when synthetic resin such as polycarbonate or acrylic resin is used as a substrate, it is strongly required that it has good affinity with the substrate and magnetic film and that oxygen, moisture, etc. contained in or passing through the substrate do not permeate. be done. Furthermore, when a coating film is provided on the surface of a magnetic film, it must be sufficiently transparent to allow incident light to reach the magnetic film.

またその他に光磁気記録媒体には情報の転送速度を上げ
るため、より高速で動作させたいという要望がある。そ
のため、光磁気記録媒体としてはより低い光強度で記録
し得るもの、すなわち記録感度が良好なものが要求され
る。
In addition, there is a demand for magneto-optical recording media to operate at higher speeds in order to increase the information transfer rate. Therefore, a magneto-optical recording medium is required that can record with lower light intensity, that is, has good recording sensitivity.

磁性膜保護とカー効果増大の機能の少なくとも一つの機
能を有する被覆膜として従来、S iO 2 ,1  
0  などの酸化物、p..n N,  S is N
4等23 の窒化物などが報告されている。しかし上記のような被
覆膜を磁性膜とともに積層した光磁気記録媒体には次の
ような欠点が指摘される。すなわち、SiO  SAn
)203等の酸化物を被覆膜として2 用いた光磁気記録媒体は、酸化物が酸素を放出するため
、磁性膜を酸化し易くし、特性劣化を生じさせるという
欠点がある。一方、AINは水分に対し安定性に欠ける
ことから、これを被覆膜として用いた光磁気記録媒体は
水分に弱いという問題を有し、Sl8N4は基板との密
着性が悪く剥離するという欠点がある。
Conventionally, SiO 2 ,1 has been used as a coating film having at least one of the functions of protecting the magnetic film and increasing the Kerr effect.
0 and other oxides, p. .. n N, S is N
23 nitrides such as 4 etc. have been reported. However, the following drawbacks have been pointed out to magneto-optical recording media in which the above-mentioned coating film is laminated together with a magnetic film. That is, SiO SAn
Magneto-optical recording media using oxides such as ) 203 as coating films have the disadvantage that the oxides release oxygen, which makes the magnetic film easy to oxidize, resulting in characteristic deterioration. On the other hand, since AIN lacks stability against moisture, magneto-optical recording media using it as a coating film are susceptible to moisture, and Sl8N4 has the disadvantage of poor adhesion to the substrate and peeling. be.

以上述べたとおり、従来の光磁気記録媒体は上述した要
求点を満たすものではなく、更にこれらは高速での動作
に対し感度が不十分であるという問題があった。
As described above, conventional magneto-optical recording media do not meet the above-mentioned requirements, and furthermore, they have the problem of insufficient sensitivity for high-speed operation.

(発明が解決しようとする課題) 本発明の目的は上記の従来技術に鑑みなされたものであ
り、磁性膜の腐蝕が生じることがなく、大きいカー効果
を有し、更に書込み感度に優れた光磁気記録媒体の提供
することにある。
(Problems to be Solved by the Invention) The object of the present invention was to provide a light beam that does not cause corrosion of the magnetic film, has a large Kerr effect, and has excellent writing sensitivity. Our goal is to provide magnetic recording media.

(課題を解決するための手段) 本発明者らは上記課題を解決するために鋭意検討を行な
った結果、光磁気記録媒体における磁性膜の腐食からの
保護あるいはカー効果増大の機能を備えた被覆膜を見出
だし本発明を完成するに至った。すなわち本発明は、基
板上で、光磁気記録磁性膜と共にその表面及び/又は背
面に被覆膜を積層して構威される光磁気記録媒体であっ
て、上記被1!膜の少なくとも一つがSt,N及びHを
構或元素とする被覆膜からなることを特徴とする光磁気
記録媒体及びその製造方法である。以下、本発明を詳細
に説明する。
(Means for Solving the Problems) As a result of intensive studies to solve the above problems, the present inventors have found that a coating with a function of protecting a magnetic film from corrosion or increasing the Kerr effect in a magneto-optical recording medium is provided. They discovered a coating film and completed the present invention. That is, the present invention is a magneto-optical recording medium which is constructed by laminating a magneto-optical recording magnetic film and a coating film on the surface and/or back surface of the substrate on a substrate, the above-mentioned film 1! A magneto-optical recording medium and a method for manufacturing the same, characterized in that at least one of the films is a coating film containing St, N, and H as constituent elements. The present invention will be explained in detail below.

本発明の光磁気記録媒体における磁性膜としては、上記
したMnBi系材料あるいはRE−TM膜を挙げること
ができる。このうち、RE−TM膜としてはTbFeC
o系の膜やGdFeCo,GdTbFe,TbCo,T
bDyFeCo,NdDyFeCo,DyFeCoなど
の膜を例示することができる。更に、プラスチック中の
モノマーや水分、あるいは外部からの水分等により劣化
をうける記録材を用いた他の記録材料、例えばW O 
R M (write once read many
)用のカルコゲン等の全てにも適用可能であることは明
らかである。また、基板としてはガラスあるいはボリカ
ーボネイト、エポキシ等の樹脂基板を用いることができ
、記録媒体の形状は一般的なディスク状のものの他、カ
ード、テープ、シート、ドラムその他任意の形状のもの
が採用され得る。
Examples of the magnetic film in the magneto-optical recording medium of the present invention include the above-mentioned MnBi-based material or RE-TM film. Among these, TbFeC is used as the RE-TM film.
o-based films, GdFeCo, GdTbFe, TbCo, T
Examples include films such as bDyFeCo, NdDyFeCo, and DyFeCo. Furthermore, other recording materials using recording materials that are subject to deterioration due to monomers and moisture in plastics, or moisture from the outside, such as WO
R M (write once read many
), it is obvious that it is applicable to all chalcogens, etc. In addition, glass, polycarbonate, epoxy, or other resin substrates can be used as the substrate, and the recording medium can be of any shape, such as a general disk shape, a card, tape, sheet, drum, etc. can be done.

本発明の光磁気記録媒体において用いられるSi,N及
びHを構成元素とする被覆膜は、力一効果を増大させる
機能を有するため、この被覆膜を磁性膜の表面に積層し
て得られた光磁気記録媒体のC/N値は向上し、読み出
し性能が向上する。
The coating film containing Si, N, and H as constituent elements used in the magneto-optical recording medium of the present invention has the function of increasing the force-strength effect. The C/N value of the magneto-optical recording medium thus obtained is improved, and the read performance is improved.

また、上記被!!膜は磁性膜を腐食から保護する機能を
有するため、これを磁性膜の表面及び/又は光入射側と
反対の面(以下適宜、磁性膜の背面という)に積層して
得られた光磁気記録媒体の磁性膜は腐食から保護され、
このことにより光磁気記録媒体の信頼性が向上する。更
に、上記被1!!膜を磁性膜の表面及び/又は背面に積
層した場合、得られる光磁気記録媒体の記録感度は良好
となる。
Also covered above! ! Since the film has the function of protecting the magnetic film from corrosion, magneto-optical recording is obtained by laminating it on the surface of the magnetic film and/or the surface opposite to the light incident side (hereinafter referred to as the back surface of the magnetic film). The magnetic film of the medium is protected from corrosion,
This improves the reliability of the magneto-optical recording medium. Furthermore, the above 1! ! When the film is laminated on the surface and/or back surface of the magnetic film, the resulting magneto-optical recording medium has good recording sensitivity.

本発明の光磁気記録媒体において用いられるSi,N及
びHを構成元素とする被覆膜が上述した機能を有する理
由は明らかではないが、被覆膜中の構或元素あるいはそ
の結合に基づくものであることが考えられる。すなわち
、披覆膜中にSi原子とH原子及びN原子とH原子の結
合が生じ、このことによりSt原子とN原子の未結合手
の結合が生じるため透明性が向上し、また被覆膜中にH
原子が含まれることにより被覆膜と基板との親和性が向
上するものと考えられる。更に上述した被覆膜を用いた
光磁気記録媒体の記録感度が良好となることについては
、被覆膜中のSi原子とN原子が部分的に中原子と結合
し、被覆膜の分子構造が網目構造が部分的に切れた構造
となり、このことにより被覆膜の熱伝導率が低下するた
めであると考えられる。このことは上記被覆膜のうち、
特に赤外域3350±50cm  ,2200±50c
m−’及−1 び850±50cm−’に吸収を有するものが透明性、
基板との密着性、熱伝導率などに優れ、好ましいものと
なることから推察される。なお、上記吸収は各々、N−
H結合、St−H結合及びSi−N結合が被覆膜中に含
まれることを示す。
The reason why the coating film containing Si, N, and H as constituent elements used in the magneto-optical recording medium of the present invention has the above-mentioned function is not clear, but it may be due to the constituent elements in the coating film or their combinations. It is possible that In other words, bonds between Si atoms and H atoms and between N atoms and H atoms occur in the coating film, and as a result, bonds between dangling bonds between St atoms and N atoms occur, improving transparency and improving the coating film. H inside
It is thought that the inclusion of atoms improves the affinity between the coating film and the substrate. Furthermore, the reason why the recording sensitivity of the magneto-optical recording medium using the above-mentioned coating film is good is that the Si atoms and N atoms in the coating film partially combine with the middle atoms, and the molecular structure of the coating film is improved. It is thought that this is because the network structure becomes a partially cut structure, which lowers the thermal conductivity of the coating film. This means that among the above coating films,
Especially in the infrared region 3350±50cm, 2200±50c
Those that have absorption at m-' and -1 and 850±50 cm-' are transparent;
This is inferred from the fact that it has excellent adhesion to the substrate, thermal conductivity, etc., making it preferable. Note that each of the above absorptions is N-
This shows that H bonds, St-H bonds, and Si-N bonds are contained in the coating film.

ところで、本発明において用いられるSi,N及びHを
構成元素とする被覆膜中のH原子の含有量は10 あた
り、1.0X102lから1.0×3 1023個であることが好ましい。これより多い場合、
被覆膜がボーラスとなり、被覆膜が破壊されやすくなっ
たり、光磁気記録媒体にあっては読み出しエラーが生じ
やすくなったり、C/N値が低下するおそれがある。一
方、H原子の含有量が上記範囲より少ない場合、被覆膜
の基板に対する密着性が悪くくなったり、光磁気記録媒
体にあっては記録感度が悪化する傾向がある。なお、よ
り好ましいH原子の含有量は、被覆膜IC:tn3あた
り、5.OX1021から5.OX1022個である。
Incidentally, the content of H atoms in the coating film containing Si, N and H as constituent elements used in the present invention is preferably from 1.0×10 2 to 1.0×3 10 23 per 10 2 . If more than this,
There is a risk that the coating film becomes a bolus and is easily destroyed, that read errors are more likely to occur in magneto-optical recording media, and that the C/N value decreases. On the other hand, if the content of H atoms is less than the above range, the adhesion of the coating film to the substrate tends to deteriorate, and the recording sensitivity of the magneto-optical recording medium tends to deteriorate. In addition, the more preferable H atom content is 5.5% per coating film IC:tn3. 5 from OX1021. There are 1022 OX.

また、被覆膜のN原子含有量は10原子%以上であるこ
とか好ましく、これより少ない場合、被’81Hの光の
吸収が増加し、得られるカー効果が減少するおそれがあ
る。なお、被覆膜のN原子含有量は、被覆膜の形或のし
易さから、上限を60原子%程度とすることが好ましい
Further, it is preferable that the N atom content of the coating film is 10 atomic % or more; if it is less than this, the absorption of light by '81H may increase and the obtained Kerr effect may be reduced. Note that the upper limit of the N atom content of the coating film is preferably about 60 atomic % from the viewpoint of ease of shaping the coating film.

また、本発明の光磁気記録媒体において、上記被覆膜の
厚みは特に限定されないが、例えばカー効果を増大させ
る目的で利用するためには50〜150nmの範囲の厚
みに設定することが好ましく、磁性膜の腐食保護の目的
としてのみ用いる場合には30〜200問の厚みに設定
することが好ましい。いずれも厚すぎる場合には被覆膜
の或膜時間が長くなり、薄すぎる場合には被m膜による
効果が十分に得られないことがある。
Further, in the magneto-optical recording medium of the present invention, the thickness of the coating film is not particularly limited, but for example, in order to use it for the purpose of increasing the Kerr effect, it is preferably set to a thickness in the range of 50 to 150 nm. When used only for the purpose of corrosion protection of the magnetic film, it is preferable to set the thickness to 30 to 200 layers. In either case, if the coating is too thick, the coating time will be long, and if the coating is too thin, the effect of the coating may not be sufficiently obtained.

本発明の光磁気記録媒体は例えばスパッタリング法など
により各膜を形成することにより製造することができる
。このうちSi,N及びHを構戒元索とする被覆膜は、
金属シリコンをターゲットとして用い、スパッタガスと
してアルゴンガスに窒素ガス,水素ガス.アンモニアガ
スを混合したガスを用いてスパッタリングを行うことに
より形或することができる。また、その他にも上記被覆
膜はシラン系ガス、窒素ガス、水素ガス雰囲気下でのC
 V D (chemica!vapor depos
lHon)法によっても形成することができるが、磁性
膜は通常スパッタリング法により形威されるため装置の
整合性の点から、あるいは基板温度の上昇が少ない点な
どからスパッタリング法を採用することが好ましい。ま
た、本発明の光磁気記録媒体を製造するときに用い得る
スパッタリング装置は特に制限されないが、基板温度の
制御がし易すく、膜の形威速度が大きいなどの点からマ
グネトロン装置が特に好ましく使用される。更に、si
,N及びHを構成元素とする被覆膜を形威する場合には
、スパッタリング前の予備排気は残留ガスの影響を除く
ためできるだけ高真空まで行うのがよく、スパッタリン
グ時の全スパッタガスは0.15〜1.OPaとするこ
とが好ましい。また、アンモニアガスを用いる場合には
スパッタガス中のアンモニアガスの割合は5〜40容量
%とすることが好ましい。
The magneto-optical recording medium of the present invention can be manufactured by forming each film by, for example, a sputtering method. Among these, the coating film with Si, N, and H as its constituent elements is
Using metallic silicon as a target, argon gas, nitrogen gas, and hydrogen gas are used as sputtering gases. The shape can be formed by sputtering using a gas mixed with ammonia gas. In addition, the above-mentioned coating film can also be coated with C under an atmosphere of silane gas, nitrogen gas, or hydrogen gas.
V D (chemica!vapor depos
Although magnetic films can also be formed by the sputtering method, it is preferable to use the sputtering method from the viewpoint of device compatibility and the fact that the rise in substrate temperature is small. . Although there are no particular restrictions on the sputtering equipment that can be used to manufacture the magneto-optical recording medium of the present invention, a magnetron equipment is particularly preferably used because it is easy to control the substrate temperature and has a high film forming speed. be done. Furthermore, si
, N, and H as constituent elements, it is best to perform preliminary evacuation before sputtering to as high a vacuum as possible to eliminate the influence of residual gas, and ensure that the total sputter gas during sputtering is 0. .15~1. It is preferable to use OPa. Further, when ammonia gas is used, the proportion of ammonia gas in the sputtering gas is preferably 5 to 40% by volume.

なお、被覆膜中におけるH原子あるいはN原子の含有量
の調整は、用いるスパッタガス中の窒素ガス,水素ガス
あるいはアンモニアガスの混合量を適宜調整することに
より行なうことができる。更に、ターゲットとして用い
られる金属シリコンに数%の不純物が含まれていても得
られる被覆膜には何ら影響はない。
The content of H atoms or N atoms in the coating film can be adjusted by appropriately adjusting the amount of nitrogen gas, hydrogen gas, or ammonia gas mixed in the sputtering gas used. Furthermore, even if the metal silicon used as the target contains several percent of impurities, the resulting coating film will not be affected in any way.

以上の光磁気記録媒体の製造方法によれば、量産性が向
上し、また披m膜については基板あるいは磁性膜との密
着性が良好なものが得られる。
According to the method for manufacturing a magneto-optical recording medium described above, mass productivity is improved, and a film having good adhesion to a substrate or a magnetic film can be obtained.

(実施例) 以下、本発明を図面を参照しつつ実施態様に基づいて説
明するが、本発明はこれらに限定されるものではない。
(Example) The present invention will be described below based on embodiments with reference to the drawings, but the present invention is not limited thereto.

第1図は、本発明の光磁気記録媒体の一実施態様の概要
をその厚み断面で示した図である。本例において、1は
ガラス、ポリメチルメタアクリレート、ポリカーボネイ
ト等で形威された透明な基板を示し、この基板にはトラ
ッキング案内用の図示しない満が形成される。また、光
は基板1を通して照射され、記録あるいは読み出しが行
なわれる。2は基板1と磁性膜の間に介挿された磁性膜
の表面に積層された被覆膜(以下、表面被覆膜という)
であり、3は例えばTbFeCo系のRE−TM膜など
からなる磁性膜を示す。更に4は磁性膜の背面に積層さ
れた被覆膜(以下、背面被覆膜という〉を示し、本例に
おいては表面被覆膜2及び背面被ffllllJともS
L,N及びHを構或元素とする被1!!膜からなる。ま
た各々の膜厚は、磁性膜3は30〜120nm、表面被
覆膜2は50〜1 2 0 rlffiN背面被覆膜4
は70〜110rv程度で形成される。なお、本発明の
光磁気記録媒体は、表面被覆膜2及び背面被8!膜4の
いずれか一方がSt,N及びHを構成元素とする被覆膜
以外の被msにより構威されるものであってもよい。
FIG. 1 is a diagram showing an outline of an embodiment of the magneto-optical recording medium of the present invention in its thickness section. In this example, reference numeral 1 denotes a transparent substrate made of glass, polymethyl methacrylate, polycarbonate, etc., and a hole (not shown) for tracking guidance is formed on this substrate. Further, light is irradiated through the substrate 1 to perform recording or reading. 2 is a coating film laminated on the surface of the magnetic film interposed between the substrate 1 and the magnetic film (hereinafter referred to as a surface coating film)
3 indicates a magnetic film made of, for example, a TbFeCo-based RE-TM film. Furthermore, 4 indicates a coating film laminated on the back side of the magnetic film (hereinafter referred to as the back coating film), and in this example, both the surface coating film 2 and the back coating fflllllJ are S.
Cover 1 whose constituent elements are L, N and H! ! Consists of a membrane. The thickness of each film is 30 to 120 nm for the magnetic film 3, 50 to 120 nm for the surface coating film 2, and 50 to 120 nm for the magnetic film 3.
is formed at about 70 to 110 rv. Note that the magneto-optical recording medium of the present invention has a surface coating film 2 and a back coating film 8! Either one of the films 4 may be composed of a coating other than a coating film containing St, N, and H as constituent elements.

第2図は光磁気記録媒体の他の実施態様の概要をその厚
み断面で示した図である。本例では基板5と磁性膜8間
の被覆膜を2層に形成したものである。これらの2層は
S iO 2膜6及びZnS膜7から構成することがで
き、SiO2H6は磁性膜8の腐食からの保護を目的と
して、厚み10〜100nm程度の形成され、ZnS膜
7はカー効果増大を目的として、厚み50〜1 2 O
 n!8程度に形成される。また、背面被覆膜9はSi
,N及びHを構成元索とする被覆膜からなる。
FIG. 2 is a diagram showing an outline of another embodiment of the magneto-optical recording medium in its thickness section. In this example, the coating film between the substrate 5 and the magnetic film 8 is formed in two layers. These two layers can be composed of a SiO 2 film 6 and a ZnS film 7. The SiO 2 H 6 is formed to a thickness of about 10 to 100 nm for the purpose of protecting the magnetic film 8 from corrosion, and the ZnS film 7 is formed by the Kerr effect. For the purpose of increasing the thickness, 50 to 1 2 O
n! It is formed to about 8. In addition, the back coating film 9 is made of Si
, N and H as constituent members.

本発明の光磁気記録媒体は、上述の実施態様のほかにも
、反射膜を磁性膜の背面側に設けてなる反射型のもので
あってもよい。このような光磁気記録媒体は例えばアル
ミニウム、チタン、クロムあるいは反射性金属、合金な
どからなる厚み20〜1 0 0 nm程度の反射膜を
磁性膜の背面側に有し、この反射膜により磁性膜に入射
した光が反射し、この反射した光によって記録再生が行
なわれるものである。このような反射型の本発明の光磁
気記録媒体は、上述した被m膜が磁性膜の表面及び/又
は背面に積層されるが、この被覆膜の厚みは、磁性膜の
表面に積層する場合は70〜150nゆに設定すること
が好ましく、磁性膜の厚みは10〜50nm程度に設定
される。更に、磁性膜の背面にSt,N及びHを構成元
素とする被覆膜を積層する場合、この被覆膜はファラデ
ー効果を増大せしめる機能を有することが好ましく、そ
のためには被fflll!lの厚みを10〜8 0 n
mに設定することが好ましい。
In addition to the embodiments described above, the magneto-optical recording medium of the present invention may be of a reflective type in which a reflective film is provided on the back side of a magnetic film. Such magneto-optical recording media have a reflective film made of, for example, aluminum, titanium, chromium, or a reflective metal or alloy, with a thickness of about 20 to 100 nm, on the back side of the magnetic film. The light incident on the disk is reflected, and recording and reproduction are performed using this reflected light. In such a reflective magneto-optical recording medium of the present invention, the above-mentioned coating film is laminated on the surface and/or back surface of the magnetic film, and the thickness of this coating film is determined by the thickness of the coating film laminated on the surface of the magnetic film. In this case, it is preferable to set the thickness to 70 to 150 nm, and the thickness of the magnetic film is set to about 10 to 50 nm. Furthermore, when a coating film containing St, N, and H as constituent elements is laminated on the back surface of the magnetic film, it is preferable that this coating film has a function of increasing the Faraday effect, and for this purpose, it is necessary to ffllll! The thickness of l is 10~80n
It is preferable to set it to m.

実施例1〜9 本発明の光磁気記録媒体の特徴的な被覆膜の特性を測定
するため石英ガラス、n型シリコンウェハー基板の上に
Si,N及びHを構或元素とする被覆膜を約110〜1
 4 0 nmの厚さに形威した。
Examples 1 to 9 In order to measure the characteristics of the characteristic coating film of the magneto-optical recording medium of the present invention, a coating film containing Si, N, and H as constituent elements was formed on a quartz glass, n-type silicon wafer substrate. about 110 to 1
The thickness was 40 nm.

被覆膜は高周波電源(周波数13.56MHz)と直流
電源を有した2極マグネトロンスバッタ装置(CFS−
4ES  徳田製作所製)を用いて金属シリコンをター
ゲットとして設置し、予備排気2− O X 1 0−
’P−a以下とし、基板を加熱なしで2 0 rpmで
回転しながら、高周波スパッタリングにより電力300
Wで、スパッタガスとして表1に示すガスを導入して形
成した。
The coating film was made using a two-pole magnetron scattering device (CFS-
4ES (manufactured by Tokuda Seisakusho) was used to set up metal silicon as a target, and pre-exhaust 2-O
'P-a or less, and while rotating the substrate at 20 rpm without heating, a power of 300 was applied by high-frequency sputtering.
It was formed using W and the gases shown in Table 1 were introduced as sputtering gases.

シリコンウエハー上に形成した被覆膜の屈折率をエリプ
ソメーターで測定した結果と石英ガラス基板上に形成し
た被覆膜の透過率(波長8 3 0 nm)を分光光度
計で測定した結果を併せて表1に示す。
Combined the results of measuring the refractive index of the coating film formed on the silicon wafer with an ellipsometer and the results of measuring the transmittance (wavelength 830 nm) of the coating film formed on the quartz glass substrate with a spectrophotometer. are shown in Table 1.

本発明の光磁気記録媒体に用いられる被覆膜の透明性は
充分あり、また屈折率も1.9以上と大きく、良好なカ
ー効果増大が期待できるものであることがわかる。
It can be seen that the coating film used in the magneto-optical recording medium of the present invention has sufficient transparency and has a large refractive index of 1.9 or more, so that a good increase in the Kerr effect can be expected.

表1 また、シリコンウエハー上に形成した被覆膜の赤外吸収
スペクトルをフーリエ変換赤外光度計(J’lR−10
0日本電子(株)社製)で測定した。その結果、850
(7)−1近辺にSi−N結合による吸収が認められた
他、3320CITl−’近辺にN一H結合による吸収
、2170CI!l−’近辺にSi一H結合による吸収
が認められ、本実施例において形威された被覆膜はHを
含有していることが確認された。更に、この披m膜中の
Hの含有量をジャーナル オプ アプライド フィジッ
クス 49巻2473頁 1978年(Journal
 of AppliedPhysics 49.247
3−(197g) )に報告されている方法、すなわち
赤外吸収スペクトルを用いる方法により定量した。その
結果を表2に示す。また、被m膜の組成をE P M 
A (Electron Probe M1cro^n
alysis  )により測定した。その結果も表2に
併せて示す。なお、EPMA組或分析の結果にはHを除
いた組或が示されている。
Table 1 In addition, the infrared absorption spectrum of the coating film formed on the silicon wafer was measured using a Fourier transform infrared photometer (J'lR-10
0 (manufactured by JEOL Ltd.). As a result, 850
(7) Absorption due to Si-N bond was observed near -1, absorption due to N-H bond near 3320CITl-', and absorption due to N-H bond near 2170CI! Absorption due to Si-H bond was observed in the vicinity of 1-', and it was confirmed that the coating film formed in this example contained H. Furthermore, the content of H in the arytenoid membrane was calculated in Journal Op Applied Physics, Vol. 49, p. 2473, 1978 (Journal Op Applied Physics, Vol. 49, p.
of Applied Physics 49.247
3-(197g)), that is, a method using an infrared absorption spectrum. The results are shown in Table 2. In addition, the composition of the film is E P M
A (Electron Probe M1cro^n
lysis). The results are also shown in Table 2. Note that the results of the EPMA group analysis show the group excluding H.

表2 本発明の光磁気記録媒体の特徴的構成である被覆膜の特
性と比較するため石英ガラス、n型シリコンウエハー基
板の上に、スパッタガスとして表3に示したガスを導入
した以外は実施例1と同様の方法で被8!膜を形成した
。なお、被覆膜の厚みは110〜140rvとした。得
られた被m漢の屈折率、透過率及び被覆膜の組成を実施
例1と同様の方法で測定した。その結果を表3に示す。
Table 2 In order to compare the characteristics of the coating film, which is a characteristic structure of the magneto-optical recording medium of the present invention, the gases shown in Table 3 were introduced as sputtering gases onto a quartz glass, n-type silicon wafer substrate. 8! in the same manner as in Example 1! A film was formed. In addition, the thickness of the coating film was set to 110 to 140 rv. The refractive index, transmittance, and composition of the coating film obtained were measured in the same manner as in Example 1. The results are shown in Table 3.

表3 また、シリコンウェハー上に形成した被覆膜の赤外吸収
スペクトルをフーリエ変換赤外光度計で測定した。その
結果、これらの膜にはHが含まれていることを示す吸収
がなく、Hが含まれていないことがわかった。
Table 3 In addition, the infrared absorption spectrum of the coating film formed on the silicon wafer was measured using a Fourier transform infrared photometer. As a result, it was found that these films did not contain any absorption indicating that they contained H.

実施例10〜13 第1図に示した構成の光磁気記録媒体を、ボリカーボネ
イト基板(直径13叩、膜厚1.2mmの円板、1.6
Jmピッチの案内溝付(溝幅0.6am)の上に、75
nm厚のTb  Fe   Co   磁性24B4。
Examples 10 to 13 A magneto-optical recording medium having the configuration shown in FIG.
75 on the Jm pitch guide groove (groove width 0.6am)
nm thick Tb Fe Co magnetic 24B4.

5   11.5 膜3と、この磁性膜の表面及び背面にSi,N及びHを
構成元素とする被覆膜(表面被覆膜2及び背面被覆膜4
)を積層して製造した。
5 11.5 Film 3 and a coating film containing Si, N, and H as constituent elements on the surface and back surface of this magnetic film (surface coating film 2 and back coating film 4).
) were manufactured by laminating them.

光磁気記録媒体の製造は、前記のスパッタリング装置を
用いて、被覆膜は高周波スパッタリングにより、磁性膜
は直流スパッタリングにより行なった。被′I!i膜の
形成は実施例3(実施例10),実施例4(実施例11
),実施例7(実施例12)実施例8(実施例13)で
採用した条件と同じ条件下で行なった。また表面被覆膜
2の厚みは85nffi、背面被覆膜4の厚みは1 0
 0 nmとした。更に磁性1f!I 3はターゲット
としてTbFeCo合金を用いて形或した。
The magneto-optical recording medium was manufactured using the sputtering apparatus described above, with the coating film being formed by high frequency sputtering and the magnetic film being formed by direct current sputtering. Covered'I! The formation of the i film was performed in Example 3 (Example 10) and Example 4 (Example 11).
), Example 7 (Example 12) The experiments were carried out under the same conditions as those employed in Example 8 (Example 13). The thickness of the surface coating film 2 is 85nffi, and the thickness of the back coating film 4 is 10.
It was set to 0 nm. Furthermore, magnetic 1f! I3 was formed using a TbFeCo alloy as a target.

比較例3〜5 表面被覆H2及び背面被覆膜4の形或条件を変えた以外
は実施例10と同様の方法で光磁気記録媒体を製造した
。なお、表面被覆膜2及び背面被覆膜4の形威は比較例
1(比較例3)で採用した条件、比較例2(比較例4)
で採用した条件と同じ条件下で行なった。また、比較例
5として表面被覆膜2を設けず、膜厚が10On−の背
面被覆膜4のみを被覆膜として有する光磁気記録媒体を
製造した。このときの背面被覆@4の形成は比較例2で
採用した条件下で行なった。
Comparative Examples 3 to 5 Magneto-optical recording media were manufactured in the same manner as in Example 10, except that the shapes and conditions of the surface coating H2 and the back coating film 4 were changed. The shape and strength of the surface coating film 2 and the back coating film 4 are based on the conditions adopted in Comparative Example 1 (Comparative Example 3) and Comparative Example 2 (Comparative Example 4).
The test was carried out under the same conditions as those employed in . Further, as Comparative Example 5, a magneto-optical recording medium was manufactured which did not include the surface coating film 2 and had only the back coating film 4 with a film thickness of 10 On- as a coating film. At this time, the formation of the backside coating @4 was carried out under the conditions adopted in Comparative Example 2.

評価試験 上記実施例10〜13および比較例3〜5で製造した光
磁気記録媒体について、ドライブ装置を用いてその記録
パワーの線速依存性を測定した。
Evaluation Test For the magneto-optical recording media manufactured in Examples 10 to 13 and Comparative Examples 3 to 5, the linear velocity dependence of recording power was measured using a drive device.

使用したドライブ装置の諸元は、波長;830I1レン
ズのNA;0.5である。また、測定条件は記録ビット
長1.4jmとなるように線速と記録周波数を変えて、
記録パワーを3Ilwから10mWの範囲で0.2mW
間隔で変えて記録を行ない第2高調波が最低となる時の
最適記録パワーを求めた。
The specifications of the drive device used were: wavelength; NA of 830I1 lens; 0.5. In addition, the measurement conditions were to change the linear velocity and recording frequency so that the recording bit length was 1.4jm.
Recording power is 0.2mW in the range of 3Ilw to 10mW.
Recording was performed at different intervals, and the optimum recording power when the second harmonic was the lowest was determined.

また、その他の測定条件は、外部磁界;5000e.デ
ューティー比;50%,リードパワー;0.8■Vであ
る。実施例10.11の結果を第3図に、実施例12.
13の結果を第4図に、比較例3,4の結果を第5図に
示す。第3〜5図より、本発明の光磁気記録媒体の記録
感度は優れていることがわかる。
Other measurement conditions were: external magnetic field; 5000e. Duty ratio: 50%, read power: 0.8 ■V. The results of Example 10.11 are shown in FIG. 3, and the results of Example 12.
The results of No. 13 are shown in FIG. 4, and the results of Comparative Examples 3 and 4 are shown in FIG. From FIGS. 3 to 5, it can be seen that the magneto-optical recording medium of the present invention has excellent recording sensitivity.

次に上記実施例10〜13および比較例3.4で示した
光磁気記録媒体を65℃、90%相対湿度雰囲気に保持
してその状態を観察するとともに反射率の変化を測定し
た。
Next, the magneto-optical recording media shown in Examples 10 to 13 and Comparative Example 3.4 were maintained in an atmosphere of 65° C. and 90% relative humidity, and their conditions were observed and changes in reflectance were measured.

実施例10.11の光磁気記録媒体の反射率変化を第6
図に、実施例12.13の光磁気記録媒体の反射率の変
化を第7図に、比較例3.4の光磁気記録媒体の反射率
の変化を第8図に示す。比較例3.4の光磁気記録媒体
は400〜500時間程度の保持でクラックが発生し、
反射率が低下した。一方、SL,N及びHを構成元素と
する被1!膜を用いた本発明の光磁気記録媒体は150
0時間の保持でもクラックや孔食が発生せず、反射率の
変化もほとんどみられず、信頼性に優れたものであるこ
とがわかった。また、このことから本発明の光磁気記録
媒体において被覆膜として用いられるSi,N及びHを
構成元素とする被8!膜は水分や酸素の遮断に優れてい
ることがわかった。
The change in reflectance of the magneto-optical recording medium of Example 10.11 is shown in the sixth example.
FIG. 7 shows the change in reflectance of the magneto-optical recording medium of Example 12.13, and FIG. 8 shows the change in reflectance of the magneto-optical recording medium of Comparative Example 3.4. The magneto-optical recording medium of Comparative Example 3.4 cracked after being held for about 400 to 500 hours.
Reflectance decreased. On the other hand, 1! whose constituent elements are SL, N, and H! The magneto-optical recording medium of the present invention using a film is 150
Even after holding for 0 hours, no cracks or pitting corrosion occurred, and almost no change in reflectance was observed, indicating that the product had excellent reliability. Further, from this fact, the coating film containing Si, N, and H as the constituent elements used as the coating film in the magneto-optical recording medium of the present invention! The membrane was found to be excellent at blocking moisture and oxygen.

なお、本発明の光磁気記録媒体と比較例における光磁気
記録媒体との耐久性の相違は、用いた被覆膜に起因する
ものと考えられる。すなわち本発明において用いた被覆
膜はH原子を含んでいることから基板との親和性が向上
し、密着性が増していることに光磁気記録媒体の耐久性
の相違が起因しているものと考えられる。更には、上記
実施例において用いた被覆膜はSi−H結合、Si−N
結合が存在から、より柔軟で応力の少ない膜となってお
り、上述した密着性の向上と相俟ってクラックやt!I
離の発生が生じにくいものとなっていることが考えられ
る。
The difference in durability between the magneto-optical recording medium of the present invention and the magneto-optical recording medium of the comparative example is considered to be due to the coating film used. In other words, since the coating film used in the present invention contains H atoms, it has improved affinity with the substrate, and the difference in durability of the magneto-optical recording medium is due to the increased adhesion. it is conceivable that. Furthermore, the coating film used in the above examples has Si-H bonds, Si-N
Due to the presence of bonds, the film is more flexible and has less stress, which, together with the above-mentioned improved adhesion, prevents cracks and t! I
This is thought to be due to the fact that separation is less likely to occur.

次に実施例12.13及び比較例3〜5で得られた光磁
気記録媒体について、ドライブ装置を用いてその記録再
生特性を測定した。使用したドライブ装置の諸元は、波
長830■、レンズのNA;0.5であり、測定条件は
線速4m/s,外部磁場;5 0 0 0 0e.記録
周波数; I MHz sデューティー比;50%、リ
ードパ’7−;0.cmWとし、測定は記録パワーを3
+aWからcmWの範囲で0.21間隔で変えて記録を
行ない第2高調波が最低となるときのC/N値を求めた
。その結果を表4に示す。
Next, the recording and reproducing characteristics of the magneto-optical recording media obtained in Examples 12 and 13 and Comparative Examples 3 to 5 were measured using a drive device. The specifications of the drive device used were: wavelength 830cm, lens NA: 0.5, and measurement conditions: linear velocity 4m/s, external magnetic field: 50000e. Recording frequency: I MHz duty ratio: 50%, read par'7-; 0. cmW, and the measurement was performed using a recording power of 3
Recording was performed at intervals of 0.21 in the range from +aW to cmW, and the C/N value when the second harmonic was the lowest was determined. The results are shown in Table 4.

表4 上記記録再生測定の結果から、本発明の光磁気記録媒体
において用いられている被覆膜は、力一効果を増大させ
る機能を充分に有していることがわかった。
Table 4 From the results of the above-mentioned recording and reproducing measurements, it was found that the coating film used in the magneto-optical recording medium of the present invention has a sufficient function of increasing the force-strength effect.

(発明の効果) 以上述べたように、本発明の光磁気記録媒体は、Si,
N及びHを構成元素としてなる被覆膜を光磁気記録膜の
保護及び/又はカー効果増大のために備えたものであり
、この光磁気記録媒体は磁性膜の腐食が生じることがな
く、また大きい磁気光学効果を有し、読みだし性能,記
録感度及び信頼性に優れたものでなる。
(Effects of the Invention) As described above, the magneto-optical recording medium of the present invention has Si,
A coating film containing N and H as constituent elements is provided to protect the magneto-optical recording film and/or increase the Kerr effect, and this magneto-optical recording medium is free from corrosion of the magnetic film and is It has a large magneto-optical effect and has excellent read performance, recording sensitivity, and reliability.

1,5・・・基板 3,8・・・磁性膜 6・・・SlO2III1,5...Substrate 3, 8...Magnetic film 6...SlO2III

Claims (8)

【特許請求の範囲】[Claims] (1)基板上で、光磁気記録磁性膜と共にその表面及び
/又は背面に被覆膜を積層して構成される光磁気記録媒
体であって、上記被覆膜の少なくとも一つがSi、N及
びHを構成元素とする被覆膜からなることを特徴とする
光磁気記録媒体。
(1) A magneto-optical recording medium formed by laminating a coating film on the surface and/or back surface of a magneto-optical recording magnetic film on a substrate, wherein at least one of the coating films includes Si, N, and A magneto-optical recording medium comprising a coating film containing H as a constituent element.
(2)Si、N及びHを構成元素とする被覆膜のH原子
の含有量が被覆膜の1cm^3あたり1.0×10^2
^1〜1.0×10^2^3個であることを特徴とする
請求項第(1)項に記載の光磁気記録媒体。
(2) The H atom content of the coating film whose constituent elements are Si, N, and H is 1.0 x 10^2 per 1 cm^3 of the coating film.
2. The magneto-optical recording medium according to claim 1, wherein the number of the magneto-optical recording medium is ^1 to 1.0 x 10^2^3.
(3)Si、N及びHを構成元素とする被覆膜のN原子
の含有量が10原子%以上(ただし、H原子を除く組成
)であることを特徴とする請求項第(1)項または第(
2)項に記載の光磁気記録媒体。
(3) Claim (1) characterized in that the N atom content of the coating film whose constituent elements are Si, N, and H is 10 at % or more (however, the composition excludes H atoms). or the first (
2) The magneto-optical recording medium according to item 2).
(4)Si、N及びHを構成元素とする被覆膜が赤外域
3350±50cm^−^1、2200±50cm^−
^1及び850±50cm^−^1に吸収を有すること
を特徴とする請求項第(1)〜(3)項のいずれか記載
の光磁気記録媒体。
(4) The coating film whose constituent elements are Si, N and H has an infrared range of 3350±50cm^-^1, 2200±50cm^-
The magneto-optical recording medium according to any one of claims (1) to (3), characterized in that it has absorption at ^1 and 850±50 cm^-^1.
(5)ターゲットとして金属シリコンを用い、スパッタ
ガスとしてアルゴンガス、窒素ガス及び水素ガスの混合
ガスを用いてスパッタリングを行ない、Si、N及びH
を構成元素とする被覆膜を形成することを特徴とする請
求項第(1)項に記載の光磁気記録媒体の製造方法。
(5) Sputtering is performed using metallic silicon as a target and a mixed gas of argon gas, nitrogen gas, and hydrogen gas as sputtering gas, and Si, N, and H
2. The method of manufacturing a magneto-optical recording medium according to claim 1, further comprising forming a coating film containing as a constituent element.
(6)ターゲットとして金属シリコンを用い、スパッタ
ガスとしてアルゴンガス及びアンモニアガスの混合ガス
を用いてスパッタリングを行ない、Si、N及びHを構
成元素とする被覆膜を形成することを特徴とする請求項
第(1)項に記載の光磁気記録媒体の製造方法。
(6) A claim characterized in that sputtering is performed using metallic silicon as a target and a mixed gas of argon gas and ammonia gas as a sputtering gas to form a coating film containing Si, N, and H as constituent elements. A method for manufacturing a magneto-optical recording medium according to item (1).
(7)ターゲットとして金属シリコンを用い、スパッタ
ガスとしてアルゴンガス、アンモニアガス及び水素ガス
の混合ガスを用いてスパッタリングを行ない、Si、N
及びHを構成元素とする被覆膜を形成することを特徴と
する請求項第(1)項に記載の光磁気記録媒体の製造方
法。
(7) Sputtering is performed using metallic silicon as a target and a mixed gas of argon gas, ammonia gas, and hydrogen gas as sputtering gas, and Si, N
2. The method of manufacturing a magneto-optical recording medium according to claim 1, further comprising forming a coating film containing H and H as constituent elements.
(8)ターゲットとして金属シリコンを用い、スパッタ
ガスとしてアルゴンガス、アンモニアガス及び窒素ガス
の混合ガスを用いてスパッタリングを行ない、Si、N
及びHを構成元素とする被覆膜を形成することを特徴と
する請求項第(1)項に記載の光磁気記録媒体の製造方
法。
(8) Sputtering is performed using metallic silicon as a target and a mixed gas of argon gas, ammonia gas, and nitrogen gas as sputtering gas, and Si, N
2. The method of manufacturing a magneto-optical recording medium according to claim 1, further comprising forming a coating film containing H and H as constituent elements.
JP2066872A 1989-03-20 1990-03-19 Magneto-optical recording medium and method of manufacturing the same Expired - Fee Related JP3030713B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2066872A JP3030713B2 (en) 1989-03-20 1990-03-19 Magneto-optical recording medium and method of manufacturing the same

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP1-66382 1989-03-20
JP6638289 1989-03-20
JP2066872A JP3030713B2 (en) 1989-03-20 1990-03-19 Magneto-optical recording medium and method of manufacturing the same

Publications (2)

Publication Number Publication Date
JPH0316048A true JPH0316048A (en) 1991-01-24
JP3030713B2 JP3030713B2 (en) 2000-04-10

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Country Link
JP (1) JP3030713B2 (en)

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* Cited by examiner, † Cited by third party
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