JPH0429526B2 - - Google Patents
Info
- Publication number
- JPH0429526B2 JPH0429526B2 JP57210689A JP21068982A JPH0429526B2 JP H0429526 B2 JPH0429526 B2 JP H0429526B2 JP 57210689 A JP57210689 A JP 57210689A JP 21068982 A JP21068982 A JP 21068982A JP H0429526 B2 JPH0429526 B2 JP H0429526B2
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- support surface
- film body
- solvent
- optical thin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/41—Refractivity; Phase-affecting properties, e.g. optical path length
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
Landscapes
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Optical Elements Other Than Lenses (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Moulding By Coating Moulds (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US326488 | 1981-12-02 | ||
| US06/326,488 US4453828A (en) | 1981-12-02 | 1981-12-02 | Apparatus and methods for measuring the optical thickness and index of refraction of thin, optical membranes |
| US326489 | 1981-12-02 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP31085089A Division JPH02196905A (ja) | 1981-12-02 | 1989-12-01 | 光学的薄膜体の膜厚測定方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58196501A JPS58196501A (ja) | 1983-11-16 |
| JPH0429526B2 true JPH0429526B2 (enExample) | 1992-05-19 |
Family
ID=23272419
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57210689A Granted JPS58196501A (ja) | 1981-12-02 | 1982-12-02 | 光学的薄膜体の製造方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US4453828A (enExample) |
| JP (1) | JPS58196501A (enExample) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6153601A (ja) * | 1984-08-24 | 1986-03-17 | Asahi Chem Ind Co Ltd | 高性能なフオトマスク・レチクル用防塵カバ−体 |
| GB2165545B (en) * | 1984-10-16 | 1988-03-30 | Du Pont | Pellicle structure for transmission of mid ultraviolet light |
| JPS61209449A (ja) * | 1985-03-14 | 1986-09-17 | Asahi Chem Ind Co Ltd | 非反射性ペリクル体 |
| US4747683A (en) * | 1986-01-17 | 1988-05-31 | Eye Research Institute Of Retina Foundation | Method and device for in vivo wetting determinations |
| US4815856A (en) * | 1986-06-05 | 1989-03-28 | Storage Technology Partners Ii | Method and apparatus for measuring the absolute thickness of dust defocus layers |
| JPH0772793B2 (ja) * | 1986-09-05 | 1995-08-02 | 三井石油化学工業株式会社 | ペリクル |
| US4707611A (en) * | 1986-12-08 | 1987-11-17 | Rockwell International Corporation | Incremental monitoring of thin films |
| JPS6453101A (en) * | 1987-05-25 | 1989-03-01 | Kurashiki Boseki Kk | Equal tilt angle interference type film thickness gauge |
| JP2673987B2 (ja) * | 1987-05-28 | 1997-11-05 | 三井石油化学工業 株式会社 | 膜の引剥し方法 |
| JPH0263A (ja) * | 1989-04-07 | 1990-01-05 | Daicel Chem Ind Ltd | フォトマスクカバー |
| US4999014A (en) * | 1989-05-04 | 1991-03-12 | Therma-Wave, Inc. | Method and apparatus for measuring thickness of thin films |
| US5054927A (en) * | 1990-07-17 | 1991-10-08 | Garves John C | Apparatus and method for determining the thickness of insulated glass |
| US5241366A (en) * | 1992-03-04 | 1993-08-31 | Tencor Instruments | Thin film thickness monitor |
| JPH10501072A (ja) * | 1995-03-20 | 1998-01-27 | カンサス ステイト ユニバーシティ リサーチ フアウンデーション | エリプソメトリー顕微鏡 |
| US5646734A (en) * | 1995-08-28 | 1997-07-08 | Hewlett-Packard Company | Method and apparatus for independently measuring the thickness and index of refraction of films using low coherence reflectometry |
| WO1998048252A1 (en) | 1997-04-22 | 1998-10-29 | The Regents Of The University Of California | Laser detection of material thickness |
| US7815862B2 (en) * | 2003-03-14 | 2010-10-19 | Alliance For Sustainable Energy, Llc | Wafer characteristics via reflectometry |
| US7821655B2 (en) | 2004-02-09 | 2010-10-26 | Axcelis Technologies, Inc. | In-situ absolute measurement process and apparatus for film thickness, film removal rate, and removal endpoint prediction |
| DE102015007054A1 (de) | 2015-06-02 | 2016-12-08 | Thomas Huth-Fehre | Verfahren und Vorrichtung zur Bestimmung der Dicke von dünnen organischen Schichten |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3612692A (en) * | 1968-11-21 | 1971-10-12 | Ibm | Dielectric film thickness monitoring and control system and method |
| JPS5228644B2 (enExample) * | 1973-02-26 | 1977-07-28 | ||
| JPS50127959A (enExample) * | 1974-03-29 | 1975-10-08 | ||
| GB1485009A (en) * | 1974-06-17 | 1977-09-08 | Decca Ltd | Apparatus for depositing uniform films |
| US4175145A (en) * | 1975-04-28 | 1979-11-20 | Teletype Corporation | Making memory structure for laser recording system |
| US4246054A (en) * | 1979-11-13 | 1981-01-20 | The Perkin-Elmer Corporation | Polymer membranes for X-ray masks |
-
1981
- 1981-12-02 US US06/326,488 patent/US4453828A/en not_active Expired - Fee Related
-
1982
- 1982-12-02 JP JP57210689A patent/JPS58196501A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58196501A (ja) | 1983-11-16 |
| US4453828A (en) | 1984-06-12 |
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