JPH0429526B2 - - Google Patents

Info

Publication number
JPH0429526B2
JPH0429526B2 JP57210689A JP21068982A JPH0429526B2 JP H0429526 B2 JPH0429526 B2 JP H0429526B2 JP 57210689 A JP57210689 A JP 57210689A JP 21068982 A JP21068982 A JP 21068982A JP H0429526 B2 JPH0429526 B2 JP H0429526B2
Authority
JP
Japan
Prior art keywords
thin film
support surface
film body
solvent
optical thin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57210689A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58196501A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS58196501A publication Critical patent/JPS58196501A/ja
Publication of JPH0429526B2 publication Critical patent/JPH0429526B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/41Refractivity; Phase-affecting properties, e.g. optical path length
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/02Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Moulding By Coating Moulds (AREA)
JP57210689A 1981-12-02 1982-12-02 光学的薄膜体の製造方法 Granted JPS58196501A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US326488 1981-12-02
US06/326,488 US4453828A (en) 1981-12-02 1981-12-02 Apparatus and methods for measuring the optical thickness and index of refraction of thin, optical membranes
US326489 1981-12-02

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP31085089A Division JPH02196905A (ja) 1981-12-02 1989-12-01 光学的薄膜体の膜厚測定方法

Publications (2)

Publication Number Publication Date
JPS58196501A JPS58196501A (ja) 1983-11-16
JPH0429526B2 true JPH0429526B2 (enExample) 1992-05-19

Family

ID=23272419

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57210689A Granted JPS58196501A (ja) 1981-12-02 1982-12-02 光学的薄膜体の製造方法

Country Status (2)

Country Link
US (1) US4453828A (enExample)
JP (1) JPS58196501A (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6153601A (ja) * 1984-08-24 1986-03-17 Asahi Chem Ind Co Ltd 高性能なフオトマスク・レチクル用防塵カバ−体
GB2165545B (en) * 1984-10-16 1988-03-30 Du Pont Pellicle structure for transmission of mid ultraviolet light
JPS61209449A (ja) * 1985-03-14 1986-09-17 Asahi Chem Ind Co Ltd 非反射性ペリクル体
US4747683A (en) * 1986-01-17 1988-05-31 Eye Research Institute Of Retina Foundation Method and device for in vivo wetting determinations
US4815856A (en) * 1986-06-05 1989-03-28 Storage Technology Partners Ii Method and apparatus for measuring the absolute thickness of dust defocus layers
JPH0772793B2 (ja) * 1986-09-05 1995-08-02 三井石油化学工業株式会社 ペリクル
US4707611A (en) * 1986-12-08 1987-11-17 Rockwell International Corporation Incremental monitoring of thin films
JPS6453101A (en) * 1987-05-25 1989-03-01 Kurashiki Boseki Kk Equal tilt angle interference type film thickness gauge
JP2673987B2 (ja) * 1987-05-28 1997-11-05 三井石油化学工業 株式会社 膜の引剥し方法
JPH0263A (ja) * 1989-04-07 1990-01-05 Daicel Chem Ind Ltd フォトマスクカバー
US4999014A (en) * 1989-05-04 1991-03-12 Therma-Wave, Inc. Method and apparatus for measuring thickness of thin films
US5054927A (en) * 1990-07-17 1991-10-08 Garves John C Apparatus and method for determining the thickness of insulated glass
US5241366A (en) * 1992-03-04 1993-08-31 Tencor Instruments Thin film thickness monitor
JPH10501072A (ja) * 1995-03-20 1998-01-27 カンサス ステイト ユニバーシティ リサーチ フアウンデーション エリプソメトリー顕微鏡
US5646734A (en) * 1995-08-28 1997-07-08 Hewlett-Packard Company Method and apparatus for independently measuring the thickness and index of refraction of films using low coherence reflectometry
WO1998048252A1 (en) 1997-04-22 1998-10-29 The Regents Of The University Of California Laser detection of material thickness
US7815862B2 (en) * 2003-03-14 2010-10-19 Alliance For Sustainable Energy, Llc Wafer characteristics via reflectometry
US7821655B2 (en) 2004-02-09 2010-10-26 Axcelis Technologies, Inc. In-situ absolute measurement process and apparatus for film thickness, film removal rate, and removal endpoint prediction
DE102015007054A1 (de) 2015-06-02 2016-12-08 Thomas Huth-Fehre Verfahren und Vorrichtung zur Bestimmung der Dicke von dünnen organischen Schichten

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3612692A (en) * 1968-11-21 1971-10-12 Ibm Dielectric film thickness monitoring and control system and method
JPS5228644B2 (enExample) * 1973-02-26 1977-07-28
JPS50127959A (enExample) * 1974-03-29 1975-10-08
GB1485009A (en) * 1974-06-17 1977-09-08 Decca Ltd Apparatus for depositing uniform films
US4175145A (en) * 1975-04-28 1979-11-20 Teletype Corporation Making memory structure for laser recording system
US4246054A (en) * 1979-11-13 1981-01-20 The Perkin-Elmer Corporation Polymer membranes for X-ray masks

Also Published As

Publication number Publication date
JPS58196501A (ja) 1983-11-16
US4453828A (en) 1984-06-12

Similar Documents

Publication Publication Date Title
US4378953A (en) Thin, optical membranes and methods and apparatus for making them
US4536240A (en) Method of forming thin optical membranes
JPS58196501A (ja) 光学的薄膜体の製造方法
US20020086163A1 (en) Protective film of a polarizing plate
US5378514A (en) Frame-supported pellicle for photolithography
JPH1152205A (ja) Uv接着剤及び保護層を有する光学系
US20050259247A1 (en) Apparatus and process for detecting inclusions
TWI329781B (enExample)
JPH0579922B2 (enExample)
JPH0371134A (ja) 防塵膜
KR20220059170A (ko) 접착제용 조성물, 그의 제조 방법, 그를 포함하는 레티클 어셈블리, 및 그를 포함하는 레티클 어셈블리의 제조 방법
US20020160172A1 (en) Protective film of a polarizing plate
US4531838A (en) Method and device for controlling the film thickness of evaporated film
US5216487A (en) Transmissive system for characterizing materials containing photoreactive constituents
US6594008B1 (en) Method and apparatus for the production of thin films
Smartt Scattered-light measurements of optical surfaces
KR20200054235A (ko) 편광 필름 보호용 적층체 및 그 제조 방법
JP3429897B2 (ja) ペリクルの製造方法
CN112030128A (zh) 一种用于Sagnac型干涉仪组件的镀膜夹具
JP4049458B2 (ja) 薄膜の膜厚計測装置及び薄膜の膜厚計測方法
EP0314418B1 (en) Dust-proof film
SU1746213A1 (ru) Способ контрол толщины пленки в процессе ее нанесени
JP2003302527A (ja) 偏光分離素子およびその作製方法、接着装置及び光ピックアップ装置
Calì et al. Use of a Scanning Laser Beam for Thin Film Control and Characterization
JP2011100065A (ja) ペリクル膜の製造方法および装置