JPS58196501A - 光学的薄膜体の製造方法 - Google Patents

光学的薄膜体の製造方法

Info

Publication number
JPS58196501A
JPS58196501A JP57210689A JP21068982A JPS58196501A JP S58196501 A JPS58196501 A JP S58196501A JP 57210689 A JP57210689 A JP 57210689A JP 21068982 A JP21068982 A JP 21068982A JP S58196501 A JPS58196501 A JP S58196501A
Authority
JP
Japan
Prior art keywords
thin film
film body
optical thin
optical
thickness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57210689A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0429526B2 (enExample
Inventor
レイ・ウイン
ロナルド・エス・ハ−シエル
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Advanced Semiconductor Products Inc
Original Assignee
Advanced Semiconductor Products Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advanced Semiconductor Products Inc filed Critical Advanced Semiconductor Products Inc
Publication of JPS58196501A publication Critical patent/JPS58196501A/ja
Publication of JPH0429526B2 publication Critical patent/JPH0429526B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/41—Refractivity; Phase-affecting properties, e.g. optical path length
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Moulding By Coating Moulds (AREA)
JP57210689A 1981-12-02 1982-12-02 光学的薄膜体の製造方法 Granted JPS58196501A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US326488 1981-12-02
US06/326,488 US4453828A (en) 1981-12-02 1981-12-02 Apparatus and methods for measuring the optical thickness and index of refraction of thin, optical membranes
US326489 1981-12-02

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP31085089A Division JPH02196905A (ja) 1981-12-02 1989-12-01 光学的薄膜体の膜厚測定方法

Publications (2)

Publication Number Publication Date
JPS58196501A true JPS58196501A (ja) 1983-11-16
JPH0429526B2 JPH0429526B2 (enExample) 1992-05-19

Family

ID=23272419

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57210689A Granted JPS58196501A (ja) 1981-12-02 1982-12-02 光学的薄膜体の製造方法

Country Status (2)

Country Link
US (1) US4453828A (enExample)
JP (1) JPS58196501A (enExample)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6153601A (ja) * 1984-08-24 1986-03-17 Asahi Chem Ind Co Ltd 高性能なフオトマスク・レチクル用防塵カバ−体
JPS61106243A (ja) * 1984-10-16 1986-05-24 デュ・ポン・タウ・ラボラトリーズ・インコーポレーテッド 紫外線を透過するペリクルとその製法
JPS61209449A (ja) * 1985-03-14 1986-09-17 Asahi Chem Ind Co Ltd 非反射性ペリクル体
JPS6364048A (ja) * 1986-09-05 1988-03-22 Mitsui Petrochem Ind Ltd ペリクル
JPH0263A (ja) * 1989-04-07 1990-01-05 Daicel Chem Ind Ltd フォトマスクカバー
JPH0284646A (ja) * 1987-05-28 1990-03-26 Mitsui Petrochem Ind Ltd 膜の引剥し方法及びその治具

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4747683A (en) * 1986-01-17 1988-05-31 Eye Research Institute Of Retina Foundation Method and device for in vivo wetting determinations
US4815856A (en) * 1986-06-05 1989-03-28 Storage Technology Partners Ii Method and apparatus for measuring the absolute thickness of dust defocus layers
US4707611A (en) * 1986-12-08 1987-11-17 Rockwell International Corporation Incremental monitoring of thin films
JPS6453101A (en) * 1987-05-25 1989-03-01 Kurashiki Boseki Kk Equal tilt angle interference type film thickness gauge
US4999014A (en) * 1989-05-04 1991-03-12 Therma-Wave, Inc. Method and apparatus for measuring thickness of thin films
US5054927A (en) * 1990-07-17 1991-10-08 Garves John C Apparatus and method for determining the thickness of insulated glass
US5241366A (en) * 1992-03-04 1993-08-31 Tencor Instruments Thin film thickness monitor
JPH10501072A (ja) * 1995-03-20 1998-01-27 カンサス ステイト ユニバーシティ リサーチ フアウンデーション エリプソメトリー顕微鏡
US5646734A (en) * 1995-08-28 1997-07-08 Hewlett-Packard Company Method and apparatus for independently measuring the thickness and index of refraction of films using low coherence reflectometry
WO1998048252A1 (en) 1997-04-22 1998-10-29 The Regents Of The University Of California Laser detection of material thickness
US7815862B2 (en) * 2003-03-14 2010-10-19 Alliance For Sustainable Energy, Llc Wafer characteristics via reflectometry
US7821655B2 (en) 2004-02-09 2010-10-26 Axcelis Technologies, Inc. In-situ absolute measurement process and apparatus for film thickness, film removal rate, and removal endpoint prediction
DE102015007054A1 (de) 2015-06-02 2016-12-08 Thomas Huth-Fehre Verfahren und Vorrichtung zur Bestimmung der Dicke von dünnen organischen Schichten

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49113608A (enExample) * 1973-02-26 1974-10-30
JPS50127959A (enExample) * 1974-03-29 1975-10-08
JPS5112874A (enExample) * 1974-06-17 1976-01-31 Decca Ltd
US4175145A (en) * 1975-04-28 1979-11-20 Teletype Corporation Making memory structure for laser recording system
JPS5683941A (en) * 1979-11-13 1981-07-08 Perkin Elmer Corp Method of forming arbitrary stationary thin film for manufacturing lithographic mask

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3612692A (en) * 1968-11-21 1971-10-12 Ibm Dielectric film thickness monitoring and control system and method

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49113608A (enExample) * 1973-02-26 1974-10-30
JPS50127959A (enExample) * 1974-03-29 1975-10-08
JPS5112874A (enExample) * 1974-06-17 1976-01-31 Decca Ltd
US4175145A (en) * 1975-04-28 1979-11-20 Teletype Corporation Making memory structure for laser recording system
JPS5683941A (en) * 1979-11-13 1981-07-08 Perkin Elmer Corp Method of forming arbitrary stationary thin film for manufacturing lithographic mask

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6153601A (ja) * 1984-08-24 1986-03-17 Asahi Chem Ind Co Ltd 高性能なフオトマスク・レチクル用防塵カバ−体
JPS61106243A (ja) * 1984-10-16 1986-05-24 デュ・ポン・タウ・ラボラトリーズ・インコーポレーテッド 紫外線を透過するペリクルとその製法
JPS61209449A (ja) * 1985-03-14 1986-09-17 Asahi Chem Ind Co Ltd 非反射性ペリクル体
JPS6364048A (ja) * 1986-09-05 1988-03-22 Mitsui Petrochem Ind Ltd ペリクル
JPH0284646A (ja) * 1987-05-28 1990-03-26 Mitsui Petrochem Ind Ltd 膜の引剥し方法及びその治具
JPH0263A (ja) * 1989-04-07 1990-01-05 Daicel Chem Ind Ltd フォトマスクカバー

Also Published As

Publication number Publication date
JPH0429526B2 (enExample) 1992-05-19
US4453828A (en) 1984-06-12

Similar Documents

Publication Publication Date Title
US4378953A (en) Thin, optical membranes and methods and apparatus for making them
JPH0429526B2 (enExample)
Yamamoto et al. In situ ellipsometric study of optical properties of ultrathin films
JP2559053B2 (ja) 層の厚さを測定する方法及びその方法を用いてある一定の相互作用を測定する方法及びその方法を実施するための手段
JP2927934B2 (ja) 薄膜測定方法および装置
EP0397388A3 (en) Method and apparatus for measuring thickness of thin films
US3062087A (en) Apparatus for investigating polarized light phenomena
Daillant et al. Final stages of spreading of polymer droplets on smooth solid surfaces
WO2005116617A1 (en) Apparatus and process for detecting inclusions
Brunner et al. Formation of Ultrathin Films at the Solid–Liquid Interface Studied byIn SituEllipsometry
EP0084221A1 (en) Method for the manufacture of a thin optical membrane
KR960029830A (ko) 광학 이방성을 측정하기 위한 장치 및 방법
Azzam NIRSE: Normal-incidence rotating-sample ellipsometer
Yamamoto et al. A vacuum automatic ellipsometer for principal angle of incidence measurement
CN117213801A (zh) 一种光学膜光轴角度的检测方法以及检测系统
US5216487A (en) Transmissive system for characterizing materials containing photoreactive constituents
US5105655A (en) Rheological device for in situ measurements of photo polymerization kinetics
Calì et al. Use of a Scanning Laser Beam for Thin Film Control and Characterization
Smartt Scattered-light measurements of optical surfaces
Abe et al. Production of 400 mirrors with high VUV reflectivity for use in the SLD Cherenkov ring imaging detector
Konova et al. Determination of film thickness and refractive index of films and substrates by means of angular modulation in reflection
JPS57179648A (en) Reflectivity measuring apparatus
SU1107033A1 (ru) Способ определени комплексного показател преломлени пленочных структур на подложке
Thomas Low-scatter, low-loss mirrors for laser gyros
JPS606807A (ja) 光軸調整方法