JPH04290432A - Semiconductor manufacturing device - Google Patents
Semiconductor manufacturing deviceInfo
- Publication number
- JPH04290432A JPH04290432A JP5453591A JP5453591A JPH04290432A JP H04290432 A JPH04290432 A JP H04290432A JP 5453591 A JP5453591 A JP 5453591A JP 5453591 A JP5453591 A JP 5453591A JP H04290432 A JPH04290432 A JP H04290432A
- Authority
- JP
- Japan
- Prior art keywords
- tank
- storage tank
- liquid
- chemical solution
- liquid storage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 23
- 238000004519 manufacturing process Methods 0.000 title abstract description 13
- 239000007788 liquid Substances 0.000 claims abstract description 45
- 239000000126 substance Substances 0.000 claims abstract description 45
- 238000003860 storage Methods 0.000 claims abstract description 32
- 238000011084 recovery Methods 0.000 claims abstract description 17
- 239000000758 substrate Substances 0.000 claims abstract description 10
- 238000000746 purification Methods 0.000 claims description 8
- 238000000034 method Methods 0.000 abstract description 4
- 238000004140 cleaning Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 238000001039 wet etching Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 1
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
- Coating Apparatus (AREA)
Abstract
Description
【０００１】0001
【産業上の利用分野】本発明は半導体基板を処理槽に浸
漬してウエットエッチングまたは洗浄を行う工程におい
て、使用した薬液を回収して清浄化し、再度処理槽に供
給する系を備えた半導体製造装置に関する。[Industrial Application Field] The present invention is a semiconductor manufacturing system equipped with a system for recovering and cleaning the chemical solution used in the process of wet etching or cleaning by immersing a semiconductor substrate in a processing tank, and supplying it to the processing tank again. Regarding equipment.
【０００２】0002
【従来の技術】以下に従来の半導体製造装置について説
明する。図２は従来の半導体製造装置の構成図である。
図２において、２１は薬液運搬容器、２２はポンプ、２
３は貯液槽、２４はポンプ、２５はフィルタ、２６は内
槽、２７は外槽、２８は貯液槽２３と処理槽の外槽２７
を連結するパイプ、２９はポンプ、３０はフィルタ、３
１は三方弁である。2. Description of the Related Art A conventional semiconductor manufacturing apparatus will be explained below. FIG. 2 is a configuration diagram of a conventional semiconductor manufacturing apparatus. In FIG. 2, 21 is a chemical liquid transport container, 22 is a pump, and 2
3 is a liquid storage tank, 24 is a pump, 25 is a filter, 26 is an inner tank, 27 is an outer tank, 28 is a liquid storage tank 23 and an outer tank 27 of the processing tank.
29 is a pump, 30 is a filter, 3
1 is a three-way valve.
【０００３】以上のように構成された従来の半導体製造
装置について、以下その動作について説明する。薬液は
薬液運搬容器２１からポンプ２２によって貯液槽２３に
供給される。貯液槽２３には循環用のポンプ２４とフィ
ルタ２５が接続されており、貯液槽２３内の薬液はポン
プ２４によって循環し浄化される。一方半導体基板のウ
エット処理を行うための処理槽は内槽２６と外槽２７か
ら構成され、貯液槽２３からパイプ２８を通って供給さ
れる薬液はポンプ２９によってフィルタ３０を通過して
内槽２６に入る。この時、三方弁３１は薬液が貯液槽２
３から内槽２６へ流れ込む方向に切り換えられており、
所定量の薬液が内槽２６および外槽２７に供給されると
今度は三方弁３１は薬液が外槽２７から出てフィルタ３
０を通って内槽２６に流れ込む方向に切り換えられる。The operation of the conventional semiconductor manufacturing apparatus configured as described above will be explained below. The chemical liquid is supplied from the chemical liquid transport container 21 to the liquid storage tank 23 by the pump 22 . A circulation pump 24 and a filter 25 are connected to the liquid storage tank 23, and the chemical solution in the liquid storage tank 23 is circulated and purified by the pump 24. On the other hand, a processing tank for performing wet processing of semiconductor substrates is composed of an inner tank 26 and an outer tank 27, and the chemical solution supplied from the liquid storage tank 23 through a pipe 28 is passed through a filter 30 by a pump 29, and then passed through a filter 30 to the inner tank. Enter 26. At this time, the three-way valve 31 allows the chemical solution to flow into the liquid storage tank 2.
3 to flow into the inner tank 26,
When a predetermined amount of the chemical liquid is supplied to the inner tank 26 and the outer tank 27, the three-way valve 31 causes the chemical liquid to come out of the outer tank 27 and pass through the filter 3.
0 and flows into the inner tank 26.
【０００４】以上のように貯液槽２３と内槽２６にそれ
ぞれフィルタ２５、３０を介した循環系を設けることに
より、半導体基板を浸漬する前には貯液槽２３内の薬液
をポンプ２４で循環させ、フィルタ２５を通過させて浄
化し、ウエット処理中には内槽２６中の薬液をポンプ２
９で循環させフィルタ３０によって浄化する。As described above, by providing a circulation system in the liquid storage tank 23 and the inner tank 26 via the filters 25 and 30, respectively, the chemical solution in the liquid storage tank 23 is pumped with the pump 24 before immersing the semiconductor substrate. The chemical solution in the inner tank 26 is circulated and purified by passing through the filter 25, and the pump 2
9 and purified by a filter 30.
【０００５】[0005]
【発明が解決しようとする課題】しかしながら上記の従
来の構成では、処理槽の内槽２６で半導体基板をウエッ
ト処理しているときは貯液槽２３には薬液が入っていな
いため、ウエット処理時間を利用して次のロット処理の
ための薬液の浄化ができず、また薬液を内槽２６から貯
液槽２３に移して浄化しているときにはウエット処理が
できないという課題を有していた。[Problems to be Solved by the Invention] However, in the above-mentioned conventional configuration, when a semiconductor substrate is being wet-processed in the inner tank 26 of the processing tank, there is no chemical in the liquid storage tank 23, so the wet processing time is shortened. However, there have been problems in that it is not possible to purify the chemical solution for the next lot processing using the method, and wet processing cannot be performed when the chemical solution is transferred from the inner tank 26 to the storage tank 23 for purification.
【０００６】本発明は上記従来の課題を解決するもので
、ウエット処理中にも貯液槽で次のロットのための薬液
の浄化が可能である半導体製造装置を提供することを目
的とする。SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned conventional problems, and an object of the present invention is to provide a semiconductor manufacturing apparatus in which a chemical solution for the next lot can be purified in a liquid storage tank even during wet processing.
【０００７】[0007]
【課題を解決するための手段】この目的を達成するため
に本発明の半導体製造装置は、半導体基板を処理する処
理槽と、処理槽から薬液を回収する回収槽と、処理槽に
薬液を供給する貯液槽と、処理槽に接続された循環式浄
化手段と、回収槽の回収液を浄化して貯液槽に供給する
手段とを有するものである。[Means for Solving the Problems] In order to achieve this object, the semiconductor manufacturing apparatus of the present invention includes a processing tank for processing semiconductor substrates, a recovery tank for recovering a chemical solution from the processing tank, and a supply tank for supplying the chemical solution to the processing tank. The system has a liquid storage tank, a circulating purification means connected to the processing tank, and a means for purifying the recovered liquid in the recovery tank and supplying the purified liquid to the liquid storage tank.
【０００８】[0008]
【作用】この構成によって、薬液は３ヶ所の槽の内の２
ヶ所に貯蔵されることになり、ウエット処理に使用中の
薬液は処理槽に連結した薬液浄化手段で浄化される一方
、貯液槽の薬液は次のウエット処理のために貯液槽に連
結した浄化手段によって浄化される。[Operation] With this configuration, the chemical solution can be placed in two of the three tanks.
The chemical solution being used for wet processing is purified by a chemical purification means connected to the processing tank, while the chemical solution in the storage tank is connected to the storage tank for the next wet processing. It is purified by a purifying means.
【０００９】[0009]
【実施例】以下本発明の一実施例について図１を参照し
ながら説明する。図１において、１は半導体基板をウエ
ット処理するための薬液、２は処理槽、３はポンプ、４
はフィルタ、５はバルブ、６は回収液、７は回収槽、８
はポンプ、９はフィルタ、１０は薬液、１１は貯液槽、
１２はバルブである。[Embodiment] An embodiment of the present invention will be described below with reference to FIG. In FIG. 1, 1 is a chemical solution for wet processing a semiconductor substrate, 2 is a processing tank, 3 is a pump, and 4 is a chemical solution for wet processing a semiconductor substrate.
is a filter, 5 is a valve, 6 is a recovery liquid, 7 is a recovery tank, 8
is a pump, 9 is a filter, 10 is a chemical solution, 11 is a storage tank,
12 is a valve.
【００１０】以上のように構成された半導体製造装置に
ついて、以下その動作について説明する。薬液１が処理
槽２に供給され、オ−バ−フロ−した薬液１はポンプ３
に吸引されてフィルタ４を通過し、再び処理槽２に供給
され、この循環を繰り返す。ウェットエッチング、洗浄
等のウエット処理を連続的に行う場合は、一回の処理毎
に使用した薬液１をバルブ５を開けて回収槽７に回収し
た後、すでに浄化されて貯液槽１１に貯液されている清
浄な薬液１０をバルブ１２を開けて処理槽２へ供給する
。その後、回収液６を回収槽７からポンプ８で吸引して
フィルタ９を通過させて清浄化し、貯液槽１１へ送り込
む。また本実施例の構成では、薬液１を回収した後、処
理槽２の内部を洗浄し、乾燥させるための洗浄系統を処
理槽２に連結させることもできる。また使用済みの薬液
１を交換する場合、回収槽７へ回収が済んだ時点で貯液
槽１１の薬液１０を処理槽２へ供給することになり、循
環が一時的に停止するため、フィルタ４およびフィルタ
９は親水性のものを使用するか、またはフィルタ４と９
の前後にバルブを設けることが望ましい。また、本実施
例ではフィルタ９を回収槽７から貯液槽１１への経路に
設けたが、より効果あらしめるためには貯液槽１１にポ
ンプとフィルタからなる薬液浄化手段を連結し、薬液１
０を連続して複数回その薬液浄化手段を通過させるか、
または回収槽７と貯液槽１１との間で循環回路を構成し
てその間にフィルタを含む薬液浄化手段を設け、薬液を
循環させても良い。The operation of the semiconductor manufacturing apparatus constructed as described above will be explained below. The chemical solution 1 is supplied to the processing tank 2, and the overflowing chemical solution 1 is sent to the pump 3.
The water is sucked into the water, passes through the filter 4, and is again supplied to the processing tank 2, where this circulation is repeated. When wet processing such as wet etching or cleaning is performed continuously, the chemical solution 1 used for each process is collected into the collection tank 7 by opening the valve 5, and then the chemical solution 1 is already purified and stored in the storage tank 11. A valve 12 is opened to supply the clean chemical solution 10 to the processing tank 2. Thereafter, the recovered liquid 6 is sucked from the recovery tank 7 by a pump 8, passed through a filter 9 to be cleaned, and sent to the liquid storage tank 11. Further, in the configuration of this embodiment, a cleaning system for cleaning and drying the inside of the processing tank 2 after collecting the chemical solution 1 can also be connected to the processing tank 2. In addition, when replacing the used chemical solution 1, the chemical solution 10 in the liquid storage tank 11 will be supplied to the processing tank 2 once it has been collected into the collection tank 7, and the circulation will be temporarily stopped. and filter 9 should be hydrophilic, or filters 4 and 9 should be
It is desirable to provide valves before and after the Further, in this embodiment, the filter 9 is provided in the path from the collection tank 7 to the liquid storage tank 11, but in order to make it more effective, a chemical purification means consisting of a pump and a filter is connected to the liquid storage tank 11. 1
0 through the chemical purification means several times in succession, or
Alternatively, a circulation circuit may be configured between the recovery tank 7 and the liquid storage tank 11, and a chemical purification means including a filter may be provided between the recovery tank 7 and the liquid storage tank 11 to circulate the chemical liquid.
【００１１】[0011]
【発明の効果】以上のように本発明は、一度使用した薬
液を回収槽に完全に回収した後、すでに清浄化されて貯
液槽に貯液されている薬液を処理槽に供給して使用する
ため、ロット間のばらつきのないウエット処理ができる
優れた半導体製造装置を実現できるものである。[Effects of the Invention] As described above, in the present invention, after the once-used chemical solution is completely recovered in the recovery tank, the chemical solution that has already been cleaned and stored in the storage tank is supplied to the processing tank for use. Therefore, it is possible to realize an excellent semiconductor manufacturing apparatus that can perform wet processing without lot-to-lot variation.
【図１】本発明の一実施例における半導体製造装置の構
成図FIG. 1 is a configuration diagram of a semiconductor manufacturing apparatus according to an embodiment of the present invention.
【図２】従来の半導体製造装置の構成図[Figure 2] Configuration diagram of conventional semiconductor manufacturing equipment
１ 薬液
２ 処理槽
４ フィルタ（循環式浄化手段）
６ 回収液
７ 回収槽
９ フィルタ（回収液を浄化して貯液槽に供給する手
段）
１１ 貯液槽1 Chemical solution 2 Processing tank 4 Filter (circulating purification means) 6 Recovery liquid 7 Recovery tank 9 Filter (means for purifying the recovery liquid and supplying it to the liquid storage tank) 11 Liquid storage tank
Claims (1)
槽から薬液を回収する回収槽と、前記処理槽に薬液を供
給する貯液槽と、前記処理槽に接続された循環式浄化手
段と、前記回収槽の回収液を浄化して前記貯液槽に供給
する手段とを有する半導体製造装置。1. A processing tank for processing semiconductor substrates, a recovery tank for recovering a chemical solution from the processing tank, a liquid storage tank for supplying the chemical solution to the processing tank, and a circulating purification means connected to the processing tank. and means for purifying the recovery liquid in the recovery tank and supplying the recovered liquid to the liquid storage tank.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5453591A JPH04290432A (en) | 1991-03-19 | 1991-03-19 | Semiconductor manufacturing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5453591A JPH04290432A (en) | 1991-03-19 | 1991-03-19 | Semiconductor manufacturing device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04290432A true JPH04290432A (en) | 1992-10-15 |
Family
ID=12973360
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5453591A Pending JPH04290432A (en) | 1991-03-19 | 1991-03-19 | Semiconductor manufacturing device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04290432A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5339842A (en) * | 1992-12-18 | 1994-08-23 | Specialty Coating Systems, Inc. | Methods and apparatus for cleaning objects |
| US5881748A (en) * | 1994-03-28 | 1999-03-16 | Shin-Etsu Handotai Co. Ltd. | Apparatus for rinsing wafers adhered with chemical liquid by use of purified water |
| WO2011138881A1 (en) * | 2010-05-06 | 2011-11-10 | 東京エレクトロン株式会社 | Chemical supply system, substrate processing apparatus provided with same, and application/development system provided with the substrate processing apparatus |
-
1991
- 1991-03-19 JP JP5453591A patent/JPH04290432A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5339842A (en) * | 1992-12-18 | 1994-08-23 | Specialty Coating Systems, Inc. | Methods and apparatus for cleaning objects |
| US5881748A (en) * | 1994-03-28 | 1999-03-16 | Shin-Etsu Handotai Co. Ltd. | Apparatus for rinsing wafers adhered with chemical liquid by use of purified water |
| WO2011138881A1 (en) * | 2010-05-06 | 2011-11-10 | 東京エレクトロン株式会社 | Chemical supply system, substrate processing apparatus provided with same, and application/development system provided with the substrate processing apparatus |
| US9086190B2 (en) | 2010-05-06 | 2015-07-21 | Tokyo Electron Limited | Chemical supply system, substrate treatment apparatus incorporating the same, and coating and developing system incorporating the same apparatus |
| US10035173B2 (en) | 2010-05-06 | 2018-07-31 | Tokyo Electron Limited | Chemical supply system, substrate treatment apparatus incorporating the same, and coating and developing system incorporating the same apparatus |
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