JPH0428785B2 - - Google Patents

Info

Publication number
JPH0428785B2
JPH0428785B2 JP62229386A JP22938687A JPH0428785B2 JP H0428785 B2 JPH0428785 B2 JP H0428785B2 JP 62229386 A JP62229386 A JP 62229386A JP 22938687 A JP22938687 A JP 22938687A JP H0428785 B2 JPH0428785 B2 JP H0428785B2
Authority
JP
Japan
Prior art keywords
carbon
hydrogen
film
carbon film
diamond
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP62229386A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6379972A (ja
Inventor
Shunpei Yamazaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Semiconductor Energy Laboratory Co Ltd
Original Assignee
Semiconductor Energy Laboratory Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semiconductor Energy Laboratory Co Ltd filed Critical Semiconductor Energy Laboratory Co Ltd
Priority to JP22938687A priority Critical patent/JPS6379972A/ja
Publication of JPS6379972A publication Critical patent/JPS6379972A/ja
Publication of JPH0428785B2 publication Critical patent/JPH0428785B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/24—Deposition of silicon only

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Formation Of Insulating Films (AREA)
  • Electronic Switches (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
JP22938687A 1987-09-12 1987-09-12 炭素被膜 Granted JPS6379972A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22938687A JPS6379972A (ja) 1987-09-12 1987-09-12 炭素被膜

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22938687A JPS6379972A (ja) 1987-09-12 1987-09-12 炭素被膜

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP56140653A Division JPS5842472A (ja) 1981-09-07 1981-09-07 サ−マルヘツド

Related Child Applications (3)

Application Number Title Priority Date Filing Date
JP1699390A Division JPH02238957A (ja) 1990-01-26 1990-01-26 サーマルヘッド
JP2200074A Division JPH03205161A (ja) 1990-07-27 1990-07-27 サーマルヘッド
JP5093787A Division JP2592392B2 (ja) 1993-03-30 1993-03-30 珪素を含む炭素被膜の作製方法

Publications (2)

Publication Number Publication Date
JPS6379972A JPS6379972A (ja) 1988-04-09
JPH0428785B2 true JPH0428785B2 (enrdf_load_stackoverflow) 1992-05-15

Family

ID=16891376

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22938687A Granted JPS6379972A (ja) 1987-09-12 1987-09-12 炭素被膜

Country Status (1)

Country Link
JP (1) JPS6379972A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01283838A (ja) * 1988-05-10 1989-11-15 Toshiba Corp 半導体装置
CN100404270C (zh) * 2005-05-31 2008-07-23 哈尔滨工业大学 热敏打印头的非晶金刚石耐磨保护层及其制备方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1582231A (en) * 1976-08-13 1981-01-07 Nat Res Dev Application of a layer of carbonaceous material to a surface
JPS5535301U (enrdf_load_stackoverflow) * 1978-04-19 1980-03-06
DE2926080A1 (de) * 1979-06-28 1981-01-08 Philips Patentverwaltung Mittel zur trockenschmierung
EP0048542B2 (en) * 1980-08-21 1993-03-31 National Research Development Corporation Coating infra red transparent semiconductor material
JPS6153955A (ja) * 1984-08-24 1986-03-18 松下電工株式会社 エア−コレクタの取付構造

Also Published As

Publication number Publication date
JPS6379972A (ja) 1988-04-09

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