JPH04284663A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPH04284663A
JPH04284663A JP3048416A JP4841691A JPH04284663A JP H04284663 A JPH04284663 A JP H04284663A JP 3048416 A JP3048416 A JP 3048416A JP 4841691 A JP4841691 A JP 4841691A JP H04284663 A JPH04284663 A JP H04284663A
Authority
JP
Japan
Prior art keywords
semiconductor chip
semiconductor
arrayed
wiring
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3048416A
Other languages
Japanese (ja)
Inventor
Kengo Sato
健吾 佐藤
Hirohiko Izumi
和泉 裕彦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP3048416A priority Critical patent/JPH04284663A/en
Publication of JPH04284663A publication Critical patent/JPH04284663A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/4911Disposition the connectors being bonded to at least one common bonding area, e.g. daisy chain
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/19Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
    • H01L2924/191Disposition
    • H01L2924/19101Disposition of discrete passive components
    • H01L2924/19107Disposition of discrete passive components off-chip wires

Landscapes

  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)

Abstract

PURPOSE:To manufacture the title compact and highly reliable semiconductor device by a method wherein the first semiconductor chip coated with an insulating film whereon an electrode is re-arrayed and the second semiconductor chip are laminated so as to connect the re-arrayed electrode with the second semiconductor chip. CONSTITUTION:The first semiconductor chip 1 coated with an insulating film 8 whereon an electrode 7 is re-arrayed and the second semiconductor chip 2 are successively laminated in a vessel 3 containing the semiconductor chips and then the re-arrayed electrode 7 is connected to the electrode 9 of the second semiconductor chip before starting the mounting step. For example, the first semiconductor chip 1 whereon the re-arrayed wiring 10 and the re-arrayed pad 7 are formed through the intermediary of a polyimide film 8 is mounted in a cavity 16 formed in a package 13 and then the second semiconductor chip 2 is laminated on the first semiconductor chip 1 to be mounted so that the re-arrayed pad 7 and the bonding pad 9 of the second semiconductor chip 2 may be connected to each other.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】〔発明の目的〕[Object of the invention]

【0002】0002

【産業上の利用分野】本発明は、半導体装置に係り、特
に複数の異なる種類の半導体チップを複数個積層して搭
載するようにした半導体装置の実装構造に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor device, and more particularly to a mounting structure for a semiconductor device in which a plurality of semiconductor chips of different types are stacked and mounted.

【0003】0003

【従来の技術】近年、COB(Chip  on  b
ord)やメモリカード用モジュールなどの高密度実装
における軽薄短小高機能化の傾向は高まる一方である。
[Prior Art] In recent years, COB (Chip on b)
There is an ever-increasing trend towards lighter, thinner, smaller, and more highly functional products in high-density packaging such as memory card modules (ord) and memory card modules.

【0004】高機能化という点に着目すると、限られた
寸法のパッケージ内により多くの品種を複数個並べて搭
載し接続するには困難な状況にある。
[0004] When focusing on high functionality, it is difficult to mount and connect a plurality of products of various types in a package with limited dimensions.

【0005】図3は従来の一般的な高密度実装型の半導
体装置である。この半導体装置では、定められた長さの
パッケージ3内に形成された2つのキャビティ6内に他
品種の半導体チップ1,2を搭載し、キャビテイ6内に
形成された配線4を介して相互に接続配線を行うように
している。5はチップのボンディングパッド9と配線4
との間を接続するワイヤである。
FIG. 3 shows a conventional, general high-density packaging type semiconductor device. In this semiconductor device, semiconductor chips 1 and 2 of different types are mounted in two cavities 6 formed in a package 3 having a predetermined length, and are interconnected via wiring 4 formed in the cavity 6. I am trying to do the connection wiring. 5 is the bonding pad 9 of the chip and the wiring 4
This is the wire that connects the

【0006】このように長さの決められたパッケージ内
に多品種の半導体チップを複数個並べて実装した場合、
その種類および数が限られるばかりでなく、パッケージ
内における半導体チップの占有面積が大きくなり、必然
的にパッケージを大型化せざるを得なくなる。また異な
る種類のチップを接続する場合、パッケージ内の配線の
引き回しによる電気抵抗の悪化を招くのみならず、さら
にはこれらの実装の複雑化による接続不良の原因となり
、信頼性に大きな影響を及ぼす。
[0006] When a plurality of semiconductor chips of various types are mounted side by side in a package with a predetermined length as described above,
Not only are the types and number of semiconductor chips limited, but the area occupied by the semiconductor chip within the package becomes large, which inevitably forces the package to be larger. Furthermore, when connecting different types of chips, not only does the wiring inside the package deteriorate in electrical resistance, but also the complexity of mounting these chips causes connection failures, which has a significant impact on reliability.

【0007】[0007]

【発明が解決しようとする課題】このように従来の半導
体装置では、定められた長さのパッケージ内に多品種の
半導体チップを複数個実装しようとすると、半導体チッ
プの占有面積が大きくなり、必然的にパッケージを大型
化せざるを得なくなる上、チップ間の接続のための、パ
ッケージ内配線の引き回しによる電気抵抗の悪化、さら
にはこれらの実装の複雑化による接続不良の原因となり
、信頼性が低いという問題があった。
[Problems to be Solved by the Invention] As described above, in conventional semiconductor devices, when a plurality of semiconductor chips of various types are mounted in a package of a predetermined length, the area occupied by the semiconductor chips becomes large. In addition to forcing the package to be larger, the electrical resistance deteriorates due to the routing of wiring inside the package to connect chips, and the complexity of mounting these components causes connection failures, reducing reliability. The problem was that it was low.

【0008】本発明は前記実情に鑑みてなされたもので
、小型で信頼性の高い半導体装置を提供することを目的
とする。
The present invention has been made in view of the above-mentioned circumstances, and an object of the present invention is to provide a compact and highly reliable semiconductor device.

【0009】[発明の構成][Configuration of the invention]

【0010】0010

【課題を解決するための手段】本発明では、下側の半導
体チップ表面を絶縁膜で被覆しこの絶縁膜の上層に電極
(ボンディングパッド)を再配列し、上側の半導体チッ
プのボンディングパッドとの距離を小さくし、接続配線
距離を短縮化して、複数の半導体チップを積層して、同
一容器内に収容するようにしている。
[Means for Solving the Problems] In the present invention, the surface of the lower semiconductor chip is covered with an insulating film, and the electrodes (bonding pads) are rearranged on the upper layer of this insulating film so that they are connected to the bonding pads of the upper semiconductor chip. By reducing the distance and connection wiring distance, a plurality of semiconductor chips are stacked and housed in the same container.

【0011】[0011]

【作用】上記構成によれば、互いに電気的に接続するよ
うな端子電極は半導体チップを積層して、容器内で相互
接続するため、容器内での配線の引き回しを低減し、信
頼性の高い半導体装置を得ることができる。
[Function] According to the above configuration, the terminal electrodes that are electrically connected to each other are made by stacking semiconductor chips and are interconnected inside the container, which reduces the amount of wiring inside the container and provides high reliability. A semiconductor device can be obtained.

【0012】望ましくは、上側の半導体チップのボンデ
ィングパッドも再配列し、さらなる配線距離の短縮化を
はかることができる。
Desirably, the bonding pads of the upper semiconductor chip can also be rearranged to further shorten the wiring distance.

【0013】[0013]

【実施例】以下本発明の実施例について、図面を参照し
つつ詳細に説明する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Examples of the present invention will be described in detail below with reference to the drawings.

【0014】実施例1 図1は、本発明の第1の実施例の半導体装置の斜視図、
図2は同装置の断面図である。
Embodiment 1 FIG. 1 is a perspective view of a semiconductor device according to a first embodiment of the present invention.
FIG. 2 is a sectional view of the device.

【0015】この半導体装置は、パッケージ13内に形
成されたキャビテイ16内に、表面にポリイミド膜を介
して再配列配線10および再配列パッド7を形成した第
1の半導体チップ1を搭載し, さらにこの上に第2の
半導体チップ2を積層し、前記再配列パッド7と第2の
半導体チップ2のボンディングパッド9とをワイヤ5を
介して相互接続するように実装したことを特徴とするも
のである。再配列パッド7は第1の半導体チップの周縁
部に位置するボンディングパッド19から再配列配線1
0によって引き回され、それぞれ第2の半導体チップ2
の所望のボンディングパッド9に近接するように形成さ
れている。
This semiconductor device includes a first semiconductor chip 1 having rearrangement wiring 10 and rearrangement pads 7 formed on its surface through a polyimide film, in a cavity 16 formed in a package 13, and further includes: A second semiconductor chip 2 is laminated thereon and mounted so that the rearrangement pads 7 and bonding pads 9 of the second semiconductor chip 2 are interconnected via wires 5. be. The re-arrangement pad 7 connects the re-arrangement wiring 1 from the bonding pad 19 located at the periphery of the first semiconductor chip.
0, and each second semiconductor chip 2
The bonding pad 9 is formed close to the desired bonding pad 9.

【0016】そしてキャビティ16には、第1の配線1
4が形成され、この第1の配線は、ワイヤ5を介して第
1の半導体チップ1の周縁部に位置するボンディングパ
ッド19と接続される。20は第2の半導体チップ表面
のボンディングパッドを相互接続するための再配列配線
である。
[0016] In the cavity 16, the first wiring 1
4 is formed, and this first wiring is connected to a bonding pad 19 located at the peripheral edge of the first semiconductor chip 1 via a wire 5 . Reference numeral 20 denotes rearrangement wiring for interconnecting bonding pads on the surface of the second semiconductor chip.

【0017】この装置によれば、チップ間の相互接続は
再配列されたボンディングパッドを介してなされるため
、容器内での配線の引き回しを低減し、信頼性の高い半
導体装置を得ることができる。
According to this device, interconnections between chips are made via rearranged bonding pads, which reduces the amount of wiring inside the container and provides a highly reliable semiconductor device. .

【0018】なお、前記実施例では、下側の半導体チッ
プのボンディングパッド19の一部が露呈するようにポ
リイミド膜8を形成し、該ボンディングパッド19上に
かかるようにポリイミド膜8上層に再配列配線を形成し
ているが、半導体チップのボンディングパッド19がす
べて覆われるようにポリイミド膜を形成し、スルーホー
ルを介して再配列配線と接続するようにしてもよい。
In the above embodiment, the polyimide film 8 is formed so that a part of the bonding pad 19 of the lower semiconductor chip is exposed, and the polyimide film 8 is rearranged in the upper layer so as to cover the bonding pad 19. Although wiring is formed, a polyimide film may be formed so as to cover all the bonding pads 19 of the semiconductor chip, and may be connected to the rearranged wiring via through holes.

【0019】また、前記実施例では、両方の半導体チッ
プのボンディングパッドを再配列するようにしたが、下
側の第1の半導体チップのボンディングパッドのみを再
配列するようにしてもよい。また、上側の第2の半導体
チップにも第1の半導体チップの対応するパッド位置に
近くなるように再配列配線を形成しボンディングパッド
を再配列するようにすればパッケージ内でのボンディン
グワイヤの引き回しおよび配線の引き回しをさらに小さ
くすることができる。
Further, in the above embodiment, the bonding pads of both semiconductor chips are rearranged, but only the bonding pads of the first semiconductor chip on the lower side may be rearranged. In addition, if the rearrangement wiring is formed on the upper second semiconductor chip so that it is closer to the corresponding pad position of the first semiconductor chip and the bonding pads are rearranged, the bonding wires can be routed within the package. Also, the amount of wiring can be further reduced.

【0020】また、前記実施例では2個の半導体チップ
を積層するようにしたが、3個以上を積層するようにし
てもよいことはいうまでもない。
Further, in the above embodiment, two semiconductor chips are stacked, but it goes without saying that three or more semiconductor chips may be stacked.

【0021】実施例2 加えて、第1および第2の半導体チップ間での相互接続
端子を他数個もつような場合には、一方または両方のボ
ンディングパッドを再配列し、ワイヤを介することなく
直接接合(ダイレクトボンディング)で両者を接続する
ようにしてもよい。
Embodiment 2 In addition, if the first and second semiconductor chips have several other interconnect terminals, one or both of the bonding pads may be rearranged to eliminate the need for wires. The two may be connected by direct bonding.

【0022】本発明の第2の実施例としてこの例につい
て図3を参照しつつ説明する。
A second embodiment of the present invention will be described with reference to FIG.

【0023】この半導体装置は、図3に示すように、第
1の半導体チップ21a表面を覆うポリイミド樹脂膜2
7上に形成された再配列電極(ボンディングパッド)3
0aと、この再配列電極30aに対応するように第2の
半導体チップ21bにもポリイミド樹脂膜27を介して
再配列電極30bを形成し、両者を再配列電極が向かい
合うように、リードフレームのインナーリード22を介
して積層し、インナーリード22の先端がバンプ26に
よってそれぞれ第1および第2の半導体チップの再配列
電極に直接接合されていることを特徴とするものである
As shown in FIG. 3, this semiconductor device has a polyimide resin film 2 covering the surface of a first semiconductor chip 21a.
Rearranged electrode (bonding pad) 3 formed on 7
A rearrangement electrode 30b is also formed on the second semiconductor chip 21b via a polyimide resin film 27 so as to correspond to the rearrangement electrode 30a. The inner leads 22 are stacked with leads 22 interposed therebetween, and the tips of the inner leads 22 are directly connected to rearrangement electrodes of the first and second semiconductor chips by bumps 26, respectively.

【0024】すなわち、図4に上側の第1の半導体チッ
プ21aを除いた状態を示すように、半導体チップ21
bの能動素子領域を含む表面全体がポリイミド樹脂膜2
7で被覆されており、このポリイミド樹脂膜に形成され
たスルーホールhを介してボンディングパッド22に接
続するように、再配列電極30bを含む再配列配線31
が能動素子領域上に再配列されている。そしてこの再配
列電極30bにインナーリード22の先端がバンプ26
によって直接接合されている。
That is, as shown in FIG. 4 with the upper first semiconductor chip 21a removed, the semiconductor chip 21
The entire surface including the active element region b is made of polyimide resin film 2.
7 and is connected to the bonding pad 22 through a through hole h formed in this polyimide resin film.
are rearranged on the active device area. Then, the tip of the inner lead 22 bumps 26 onto this rearranged electrode 30b.
are directly joined by.

【0025】そしてこの上に、向かい合うように第1の
半導体チップ21aの再配列電極がこのインナーリード
22にバンプ26によって直接接合され、第1および第
2の半導体チップの相互接続とリードフレームへの接続
とを行っている。
On top of this, the rearranged electrodes of the first semiconductor chip 21a are directly bonded to the inner leads 22 by bumps 26 so as to face each other, thereby interconnecting the first and second semiconductor chips and connecting them to the lead frame. Connections are made.

【0026】そして、この外側は封止樹脂29で被覆さ
れている。23は前記インナーリード22と一体的に形
成され、樹脂パッケージ29から導出されるアウターリ
ードである。28はインナーリード表面を被覆する絶縁
膜としてのポリイミド膜である。
[0026]The outside of this is covered with a sealing resin 29. 23 is an outer lead formed integrally with the inner lead 22 and led out from the resin package 29. As shown in FIG. 28 is a polyimide film as an insulating film covering the inner lead surface.

【0027】この構造では、例えば同一チップを相互接
続して用いる場合に、向かい合わせにするとボンディン
グパッドの位置は互いに反転した位置になってしまい、
ボンディングワイヤが長くなってしまうが、このように
ボンディングパッドを互いに相対向するように再配列し
、さらにこれらボンディングパッドの間にインナーリー
ド22を挟んで直接接合することができ、極めて小型で
信頼性の高いものとなる。
[0027] In this structure, for example, when the same chips are interconnected and used, the positions of the bonding pads are reversed when they are placed facing each other.
Although the bonding wire becomes long, in this way the bonding pads can be rearranged to face each other and the inner leads 22 can be sandwiched between these bonding pads for direct bonding, making it extremely compact and reliable. will be of high value.

【0028】なお、リードフレームに代えて、フィルム
キャリアを用いるようにしてもよい
Note that a film carrier may be used instead of the lead frame.

【0029】。[0029].

【発明の効果】以上説明してきたように、本発明によれ
ば、複数の半導体チップを積層して、同一容器内に収容
するとともに下層側の半導体チップ表面を絶縁膜で被覆
しこの絶縁膜の上層に電極を再配列し、上層側の半導体
チップのボンディングパッドとの距離を小さくし、接続
配線距離を短縮化するようにしているため、容器内での
配線の引き回しを低減し、信頼性の高い半導体装置を得
ることができる。
As explained above, according to the present invention, a plurality of semiconductor chips are stacked and housed in the same container, and the surface of the lower semiconductor chip is covered with an insulating film. The electrodes are rearranged on the upper layer to reduce the distance from the bonding pads of the semiconductor chip on the upper layer, reducing the connection wiring distance, reducing the amount of wiring inside the container and improving reliability. A high quality semiconductor device can be obtained.

【図面の簡単な説明】[Brief explanation of the drawing]

【図1】本発明の第1の実施例の半導体装置を示す斜視
図。
FIG. 1 is a perspective view showing a semiconductor device according to a first embodiment of the present invention.

【図2】本発明の実施例の半導体装置の断面図。FIG. 2 is a cross-sectional view of a semiconductor device according to an embodiment of the present invention.

【図3】本発明の第2の実施例の半導体装置を示す断面
図。
FIG. 3 is a cross-sectional view showing a semiconductor device according to a second embodiment of the present invention.

【図4】本発明の第2の実施例の半導体装置の一部破断
図。
FIG. 4 is a partially cutaway view of a semiconductor device according to a second embodiment of the present invention.

【図5】従来例の半導体装置を示す斜視図。FIG. 5 is a perspective view showing a conventional semiconductor device.

【符号の説明】[Explanation of symbols]

1  第1の半導体チップ 2  第2の半導体チップ 3  パッケージ 4  配線層 5  ワイヤ 6  キャビテイ 7  パッド 8  ポリイミド膜 9  パッド 10  第2の配線 13  パッケージ 14  配線 16  キャビテイ 21a  第1の半導体チップ 21b  第2の半導体チップ 22  インナーリード 27  ポリイミド樹脂膜 30a  再配列電極(ボンディングパッド)30b 
 再配列電極 26  バンプ h  スルーホール 31  再配列配線
1 First semiconductor chip 2 Second semiconductor chip 3 Package 4 Wiring layer 5 Wire 6 Cavity 7 Pad 8 Polyimide film 9 Pad 10 Second wiring 13 Package 14 Wiring 16 Cavity 21a First semiconductor chip 21b Second semiconductor Chip 22 Inner lead 27 Polyimide resin film 30a Rearranged electrode (bonding pad) 30b
Rearranged electrode 26 Bump h Through hole 31 Rearranged wiring

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】  半導体チップを収容する容器内に、表
面を絶縁膜で被覆しこの絶縁膜の上層に電極を再配列し
てなる第1の半導体チップと、第2の半導体チップとを
順次積層するとともに、前記再配列された電極と前記第
2の半導体チップの電極とを接続して、実装するように
したことを特徴とする半導体装置。
1. A first semiconductor chip whose surface is covered with an insulating film and electrodes are rearranged on the upper layer of the insulating film and a second semiconductor chip are sequentially laminated in a container for accommodating the semiconductor chips. At the same time, the semiconductor device is characterized in that the rearranged electrodes and the electrodes of the second semiconductor chip are connected and mounted.
JP3048416A 1991-03-13 1991-03-13 Semiconductor device Pending JPH04284663A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3048416A JPH04284663A (en) 1991-03-13 1991-03-13 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3048416A JPH04284663A (en) 1991-03-13 1991-03-13 Semiconductor device

Publications (1)

Publication Number Publication Date
JPH04284663A true JPH04284663A (en) 1992-10-09

Family

ID=12802707

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3048416A Pending JPH04284663A (en) 1991-03-13 1991-03-13 Semiconductor device

Country Status (1)

Country Link
JP (1) JPH04284663A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5854740A (en) * 1995-04-27 1998-12-29 Lg Semicon Co., Ltd. Electronic circuit board with semiconductor chip mounted thereon, and manufacturing method therefor
JP2002261234A (en) * 2001-03-05 2002-09-13 Oki Electric Ind Co Ltd Sheet for rearrangement, semiconductor device and its manufacturing method
KR100390466B1 (en) * 1999-12-30 2003-07-04 앰코 테크놀로지 코리아 주식회사 multi chip module semiconductor package
US6812575B2 (en) 2000-08-29 2004-11-02 Nec Corporation Semiconductor device
US6836002B2 (en) 2000-03-09 2004-12-28 Sharp Kabushiki Kaisha Semiconductor device
KR100480515B1 (en) * 2001-05-25 2005-04-06 엔이씨 일렉트로닉스 가부시키가이샤 Semiconductor device

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5854740A (en) * 1995-04-27 1998-12-29 Lg Semicon Co., Ltd. Electronic circuit board with semiconductor chip mounted thereon, and manufacturing method therefor
KR100390466B1 (en) * 1999-12-30 2003-07-04 앰코 테크놀로지 코리아 주식회사 multi chip module semiconductor package
US6836002B2 (en) 2000-03-09 2004-12-28 Sharp Kabushiki Kaisha Semiconductor device
US6812575B2 (en) 2000-08-29 2004-11-02 Nec Corporation Semiconductor device
JP2002261234A (en) * 2001-03-05 2002-09-13 Oki Electric Ind Co Ltd Sheet for rearrangement, semiconductor device and its manufacturing method
KR100480515B1 (en) * 2001-05-25 2005-04-06 엔이씨 일렉트로닉스 가부시키가이샤 Semiconductor device

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