JPH04275505A - Color filter and production thereof and color liquid crystal display formed by using this color filter - Google Patents

Abstract

PURPOSE:To improve the durability of the color liquid crystal display and to improve production efficiency (yield). CONSTITUTION:Transparent electrodes 2 for forming dye layers are formed on a glass substrate 1. An insulating protective film 3 is formed in parts, exclusive of the effective display part S on this substrate. This substrate is immersed into a micelle electrolysis cell and the transparent electrodes 2 are energized to form the dye layer (film) 4 on the transparent electrodes existing within the effective display part S. Since the electrodes 2a for energization drawn out to the parts exclusive of the effective display part S are coated and protected with the insulating protective film 3, the formation of the dye layers on the electrodes 2a for energization is obviated at the time of the electrolysis and, therefore, level differences are not produced in these parts. The circumference of the effective display part S is an adhesive sealing part H of the liquid crystal cell and the color filter substrate and the electrode substrate for driving are adhered in this part, by which the color liquid crystal display is assembled.

Description

[Detailed description of the invention]

0001

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a color filter, a method for manufacturing the same, and a color liquid crystal display using the color filter.

0002

[Prior Art] Color filters are used in color liquid crystal displays used for displays on liquid crystal televisions, laptop computers, notebook computers, etc., which are formed by separating and arranging pigment layers on an insulating substrate. Conventionally, this color liquid crystal display is shown in Fig. 15.
The configuration shown in is known. The color liquid crystal display shown in FIG. 15 includes a liquid crystal 30 sealed between a color filter substrate 10 and a driving substrate 20, and an adhesive (sealing material) 4.
The configuration is sealed with 0. Color filter substrate 10
is a dye layer 4 of three primary colors (R, G, B) on a glass substrate 1.
A black matrix 7 is provided between each pigment layer to prevent deterioration of contrast and color purity due to light leakage.
The transparent electrode 9 is provided on the top surface of the smoothed surface.

The driving substrate 20 has a driving transparent electrode 22 formed on a glass substrate 21. The dye layer of a color filter is usually printed on a glass substrate using a printing machine.
A printing method that prints inks of the three primary colors of GB, an ultraviolet curable resist with pigments dispersed is applied onto a glass substrate, and mask exposure and heat curing using a photolithography method is performed using RGB.
A dispersion method in which a dye layer is repeatedly formed three times, a dyeing method in which a resist is formed as a dye-preventing film on gelatin using a photolithography method, and each color of RGB is dyed with dye; The electrodeposition method uses an electrode formed on a substrate to carry out electrodeposition coating, and the micellar electrolysis method uses an electrode formed on a substrate to perform electrolysis after dispersing a surfactant and pigment.

[0004] Color filters produced by printing, dispersion, and dyeing methods are capable of forming dye layers only at desired positions (for example, effective display areas) on a glass substrate due to the nature of their manufacturing methods. However, when forming a color filter by micellar electrolysis or electrodeposition, which uses energization to form a dye layer, the electrodes are drawn out to areas other than the effective display area in order to connect the electrodes to external electrodes. , it is necessary to form a current-carrying electrode.

[0005]

[Problems to be Solved by the Invention] When forming a color filter by the above-mentioned micellar electrolysis method, electrodeposition method, etc., as shown in FIG. Since the current-carrying electrode 2a is also provided, a dye layer (film) is formed also in the area other than the effective display area. Normally, a liquid crystal display is assembled by bonding two pieces of glass together using an adhesive, but it is necessary to limit the cell gap of the liquid crystal display to a distance of about several μm. Therefore, if there is a step difference in the adhesive seal portion, it becomes a major obstacle in filling the liquid crystal and controlling the cell gap. In the micelle electrolysis method and the electrodeposition method, the current-carrying electrode 2a is colored, so as shown in FIG.
Since the non-electrode portion) 1a is generated and a step (difference in film thickness) is generated in the adhesive seal portion around the effective display portion S, there is a problem that the seal cannot be properly sealed. Conventionally, a method of scraping off the pigment film after it has been formed is known, but this method not only makes it impossible to obtain accurate dimensions, but also generates dust during scraping, resulting in a decrease in yield. There's a problem.

The present invention has been made in view of the above-mentioned problems, and aims to improve durability and production efficiency (including yield).
An object of the present invention is to provide a color filter and a method for manufacturing the same, which can improve the quality of the color filter, and a color liquid crystal display using the color filter.

[0007] In order to achieve the above object, the color filter of the present invention is a color filter comprising a transparent electrode for forming a dye layer and a dye layer formed on at least an insulating substrate. The configuration is such that an insulating protective film is formed on a portion of the substrate other than the effective display area. Also,
The method for producing a color filter of the present invention includes forming a dye layer on the transparent electrode by applying electricity to a transparent electrode for forming a dye layer formed on an insulating substrate. After forming an insulating protective film on a portion other than the effective display area on the previous substrate, a dye layer is formed by applying electricity.Preferably, an insulating protective film is formed on a portion of the substrate other than the effective display area. When forming the film, an electrode extraction window is formed at the same time. Further, the color liquid crystal display of the present invention has a structure including the color filter (substrate) of the present invention, a liquid crystal driving electrode substrate, and a liquid crystal sealed between these.

[0008]

[Means for Solving the Problems] The present invention will be explained in detail below. First, the color filter of the present invention will be explained. In the color filter of the present invention, FIGS.
As shown in (c), a transparent electrode 2 for forming a dye layer is formed on an insulating substrate 1. An insulating protective film 3 is formed on a portion of the insulating substrate 1 other than the effective display area S. This insulating protective film 3 is formed on the substrate before the dye layer is formed. As shown in FIG. 1C, a dye layer 4 is formed on the transparent electrode 2 for forming a dye layer in the effective display area S on the insulating substrate 1. As shown in FIG. In the color filter of the present invention, the transparent electrode for forming a dye layer (current-carrying electrode 2a) in a portion other than the effective display area S on the insulating substrate 1 is connected to the insulating protective film 3 as shown in FIG. 1(b). Since the dye layer is protected by coating, when the dye layer forming electrode is energized to form a dye layer, the dye layer is not formed on the current-carrying electrode 2a in a portion other than the effective display area, and no step difference occurs. . In addition, since the adhesive seal portions H of the color filter substrate 1 and the transparent substrate bonded onto the color filter substrate 1 are at the same height, bonding can be easily and completely performed, and durability is improved. do. Other configurations of the color filter of the present invention are not particularly limited. For example, the configuration of the color filter of the present invention includes a black matrix, an insulating film, a transparent electrode for forming a dye layer, an insulating protective film, a dye layer, a smoothing film, and a liquid crystal driving electrode on an insulating substrate. Laminated or
Examples include those in which a transparent electrode for forming a dye layer, a black matrix, an insulating protective film, a dye layer, a smoothing film, and a liquid crystal driving electrode are sequentially laminated on an insulating substrate. Further, it is preferable to simultaneously form an electrode extraction window frame (electrode extraction window band) 5 on a part of the insulating protective film. The materials and methods for forming each component of the color filter of the present invention will be described later. Note that the color filter of the present invention also includes a substrate for manufacturing a color filter in which at least a transparent electrode for forming a dye layer, an insulating protective film, and a dye layer are formed on an insulating substrate.

Next, a method for manufacturing a color filter according to the present invention will be explained. The color filter manufacturing method of the present invention is characterized in that an insulating protective film is formed on a portion of the substrate other than the effective display area before the dye layer is formed, and then a dye layer is formed by applying electricity. Since the method for manufacturing a color filter of the present invention differs depending on the material for forming the black matrix, the process will be explained sequentially depending on the material for forming the black matrix. FIG. 2 is a flow diagram showing a first specific example of the method for manufacturing a color filter of the present invention, and FIG.
FIG. 2 is a cross-sectional view showing a color filter obtained by the same manufacturing method. (1) A color filter is formed on a glass substrate 1. As the glass substrate, soda lime glass (blue plate), low expansion glass, non-alkali glass (NA), quartz glass, etc. are used. The glass is preferably a polished product, but may be an unpolished product. (2) Forming a metal thin film on the glass substrate 1. The metal thin film is formed by depositing a metal such as Cr (chromium) or Ni (nickel) on a glass substrate by sputtering, vapor deposition, CVD, or the like. Note that it is preferable to coat a glass substrate with silica (SiO2) and then form a metal thin film thereon, since this improves the adhesion between the metal thin film and the glass substrate. (3) The metal thin film formed on the glass substrate is patterned by photolithography to form the black matrix 7. Patterning of metal thin films by photolithography includes (a) resist coating, (b) exposure, (c) development, (d) post-bake, and (
E) Etching of the metal thin film and (F) Stripping of resist are performed in this order. Note that during exposure, a mask for forming a black matrix is used. (4) An insulating film is formed on the glass substrate on which the black matrix is formed. The insulating film is made of, for example, silica (S
iO2), titania (TiO2), alumina (Al2O
It is formed by sputtering such as 3), coating with silica or polymer, or dipping. (5) Form an ITO thin film on the insulating film. The ITO film is formed by a sputtering method, a vapor deposition method, a biosol method, or the like. (6) The ITO thin film is patterned by photolithography to form the ITO electrode 2. The patterning process by photolithography is the same as (3) above. Note that this ITO electrode 2 is used as an electrode for forming a dye layer, and the pattern is usually a vertical stripe pattern. Note that the processes (1) to (6) above are not particularly different from conventional methods of manufacturing color filters. (7) An insulating protective film 3 is formed on the black matrix-attached ITO patterned glass substrate at a portion other than the effective display area. Here, the effective display section refers to a section that constitutes the display section of a liquid crystal display, and liquid crystal is sealed in this section. The method of forming the insulating protective film 3 on parts other than the effective display area is not particularly limited. For example, when forming by photolithography, after applying a resist (positive) on the ITO patterning glass substrate (full surface) using a spin coater or roll coater,
If the effective display area S is exposed to light using a mask 1 having a light-shielding part as shown in FIG. A film can be formed. Furthermore, Figure 4
If a pattern for forming the electrode extraction window frame 5 is formed on the mask 1 as shown in FIG. 1, the electrode extraction window 6 can be formed at the same time as forming the insulating protective film. Therefore, the present invention can be implemented with the same number of steps as the conventional color filter manufacturing method. Furthermore, when using a negative resist, a mask with an inverted pattern is used. In the case of offset printing, a resin oligomer is printed on a portion other than the effective display area and thermally polymerized to form an insulating protective film. When forming the insulating protective film by photolithography, the material for forming the insulating protective film may include a resist agent containing at least one of UV-sensitive acrylic resin, epoxy resin, and siloxane resin. . When forming an insulating protective film by offset printing, a thermosetting resin (resin oligomer) or the like whose main ingredient is at least one of heat-resistant acrylic resin, epoxy resin, and siloxane resin is used. (8) After forming the above insulating protective film, R (red), G (green),
Dye layers (films) 4 of each color B (blue) are formed. The dye layer 4 is formed by micelle electrolysis, electrodeposition, or the like. In the micelle electrolysis method, a substrate is immersed in a micelle solution containing a dye, a potentiostat is connected to an ITO electrode (transparent electrode for forming a dye layer) 2 through an electrode extraction window 6, and constant potential electrolysis is performed. In this method, a dye layer (film) 4 is formed on the upper layer 2. In this case, the dye layer is formed for each color using a micelle solution for each color. The electrodeposition method is
An I formed on a substrate by dispersing an electrodeposited polymer and a pigment.
This is a method of forming a pigment layer by electrodeposition using a TO electrode. (9) After forming the dye layer, a smooth film (top coat film) is formed thereon. The top coat film is formed by spin-coating a polymer and then post-baking it. (10) Form a post-ITO electrode on the top coat film. The ITO electrode is formed in the same manner as in (5) and (6) above. Note that the pattern is usually formed using the previously formed IT.
The horizontal stripe pattern is orthogonal to the O electrode (vertical stripe pattern). A color filter is produced through the process described above.

Next, a method of manufacturing a color filter using a resist as the material for forming the black matrix will be described. FIG. 5 is a flowchart showing a second specific example of the color filter manufacturing method of the present invention, and FIG. 6 is a sectional view showing a color filter manufactured by the same manufacturing method. In the second specific example, compared to the first specific example, the black matrix forming material and the black matrix and I
The formation order with the TO electrode is different. That is, after forming an insulating film on the glass substrate 1 (FIGS. 5(1) and (2)),
First, ITO electrode 2 is formed ((3) and (4) in the same figure)
. The formation of the ITO electrode is the same as in the first specific example. Next, a black matrix is formed using a resist on the ITO electrode 2 ((5) in the same figure). This resist black matrix is formed by applying a resist onto a substrate, followed by exposure, development, and post-baking. As a resist for forming a black matrix, a resist for forming a light-shielding film containing an organic pigment or the like is used (Japanese Patent Application No. 2-117130, Japanese Patent Application No. 2-3
21498). Subsequent formation of an insulating protective film 3,
Formation of dye layer 4, formation of smooth film, formation of rear ITO electrode (
Regarding (6) to (10)) in the same figure, it is the same as in the case of the first specific example described above. A color filter is produced in the above manner.

Next, the color liquid crystal display of the present invention using the color filter produced above and its assembly process will be explained. As shown in FIG. 15 described above, the liquid crystal panel is formed by bonding a color filter (substrate) 10 and a liquid crystal driving electrode substrate 20 with spacers 40, and sealing liquid crystal 30 between them. FIG. 7 is a diagram showing the assembly process of the color liquid crystal display of the present invention. (1) The liquid crystal driving electrode substrate has a liquid crystal driving transparent electrode formed on a glass substrate, and in the case of a simple matrix method, a band-shaped transparent electrode is formed and the liquid crystal of each pixel is time-divisionally driven from the outside. In the case of the active matrix method, a pixel electrode and a driving element (matrix array) are formed for each pixel, and the liquid crystal of each pixel is driven by each driving element. A three-terminal TFT (Thin Film Tr) is a nonlinear element used in a matrix array.
Ansistor) and two-terminal MIM (Metal-
Insulator-Metal) and the like. (2) As the color filter, the above-mentioned color filter of the present invention is used. (3) The spacer is for keeping the thickness of the liquid crystal layer constant, and is made of Teflon film, Mylar film, or the like. Note that when manufacturing a display panel with a large display area, glass beads, plastic beads, etc. may be dispersed inside the panel. (4) Adhesives (sealants) include organic adhesives (for example, epoxy adhesives) and inorganic adhesives (for example, glass solder). As this adhesive, it is preferable to use an adhesive that has excellent adhesion to the insulating protective film formed outside the effective display area. (5) Rubbing is a surface treatment of a substrate performed to make the molecular arrangement uniform, and examples include parallel alignment treatment, vertical alignment treatment, etc. depending on the display method. Specific examples include friction rubbing and oriented vapor deposition. (6) There are two methods for sealing liquid crystal in a panel: one using surface tension and the other using pressure difference. A vacuum injection method using a pressure difference is preferable in order to prevent inclusion of air bubbles and deterioration. The liquid crystal to be sealed is selected depending on the display mode. For example, display modes include TN, STN, FLC.
, AFLC, VAN, etc. (7) Examples of the connection method between the electrode and the driver IC include chip-on flexible printed circuit (COF) and chip-on-glass (COG). (8) The color liquid crystal display (panel) of the present invention is produced through the above steps. The liquid crystal panel is driven by alternating current.

The color filter or color liquid crystal display of the present invention described above can be used in color liquid crystal displays such as personal computers, word processors, wall-mounted televisions, pocket liquid crystal televisions, aurora vision, solid-state image pickup devices (CCD), etc.
), etc., and color displays for audio devices, vehicle instrument panels, watches, calculators, VCRs, fax machines, communication devices, games, measuring instruments, etc.

[0013]

EXAMPLES The present invention will be explained in more detail below based on examples. Example 1 A color filter and a color liquid crystal panel were manufactured by the following procedure. Formation of Chromium Black Matrix Silica (SiO2) (manufactured by Tokyo Ohka Co., Ltd.: OCDTYPE-7) is spin-coated on a mirror-polished 300 mm square blue plate glass substrate at a rotation speed of 1,000 rpm. 35
After baking at 0°C for 60 minutes, it was cooled to room temperature and placed on the silica-coated glass substrate using a sputtering device (
A chromium (Cr) thin film having a thickness of about 2000 angstroms is sputtered using a SDP-550VT (manufactured by ULVAC). On top of this, an ultraviolet curing resist agent (manufactured by Fuji Hunt Electronics Technology Co., Ltd.: IC-28/T3)
is spin coated at a rotation speed of 1,000 rpm. After spin coating, prebaking is performed at 80° C. for 15 minutes. Thereafter, this resist/Cr/glass substrate was set in a stepper exposure machine (exposure capacity 10 mW/cm2). The mask has a pixel size of 90 μm x 310 μm and a gap of 2.
A grating pattern of 0 μm and an effective area of 160 mm×155 mm is divided into four parts and subjected to step exposure. After exposure at a scan speed of 5 mm/sec, development is performed using an alkaline developer. After development, the film is rinsed with pure water and then post-baked at 150°C. Next, as an etching solution (etchant) 6N HCl/0.1N HNO3/0.1N
A Ce(NO3)4 aqueous solution is prepared and Cr on the substrate is etched to form a pattern. The end point of etching was measured by electrical resistance. The etching required approximately 20 minutes. After etching, rinse with pure water and remove the resist with 1N NaOH. The chromium black matrix was completed by thoroughly washing with pure water.

Formation of insulating film and ITO electrode Next, silica (SiO2) (manufactured by Tokyo Ohka Co., Ltd.: OCDTYPE) is used as an insulating film on the chromium black matrix (CrBM).
-7) is spin-coated at a rotation speed of 1,000 rpm. After baking at 250° C. for 60 minutes, it is cooled to room temperature, and then an ITO thin film of about 1300 angstroms is sputtered thereon using a sputtering device (SDP-550VT manufactured by ULVAC). At this time, the workpiece was heated to 250° C. and the surface resistance of the ITO film was adjusted to 20Ω/□. This ITO thin film/CrBM/
Ultraviolet curing resist agent (manufactured by Fuji Hunt Electronics Technology Co., Ltd.: IC-28/T3) on a glass substrate
is spin coated at a rotation speed of 1,000 rpm. After spin coating, prebaking is performed at 80° C. for 15 minutes. After that, this resist/ITO thin film/CrBM/glass substrate was applied to a contact exposure machine (exposure capacity: 10 mW/cm2).
). The mask has a vertical stripe pattern with a line width of 92 μm, a gap of 18 μm, and a line length of 155 mm. A 2kw high-pressure mercury lamp is used as the light source. After taking a proximity gap of 50 μm and aligning, 15
After being exposed for a second, it is developed with an alkaline developer. After development, the film is rinsed with pure water and then post-baked at 150°C. Next, 1M FeCl3.1 was used as an etchant.
NHCl・0.1N HNO3・0.1N Ce(
An aqueous solution of NO3)4 is prepared and the ITO thin film is etched to form an ITO electrode. The end point of etching was measured by electrical resistance. The etching required approximately 40 minutes. After etching, rinse with pure water and remove the resist with 1N NaOH. Furthermore, it was washed with pure water to confirm that there was no electrical leakage between adjacent ITO electrodes, and a substrate with ITO electrodes (dye layer forming electrodes) was completed.

Simultaneous formation of an insulating protective film outside the effective display area and an electrode window frame. Acrylic resist agent (manufactured by Fuji Hunt Electronics Technology Co., Ltd.: CT) was used to form an insulating protective film outside the electrode window frame and the effective display area. Used as a resist agent. The ITO patterned glass substrate with CrBM prepared above was rotated at 10 rpm, and the resist agent 3 was placed on top of it.
Spray 0cc. Next, the number of rotations of the spin coat was set to 1,
The speed is set to 500 rpm, and the substrate is uniformly coated (film formed). This substrate is prebaked at 80° C. for 15 minutes. Then, while aligning with a contact exposure machine with an alignment function using a 2 kW high-pressure mercury lamp as a light source, exposure is performed using a design mask for forming an insulating protective film outside the electrode extraction window frame and the effective display area. Thereafter, development is performed for 90 seconds with a developer to dissolve and remove the resist on the electrode extraction window 6 and the effective display area 3. Further, rinse with pure water and post-bake at 180° C. for 100 minutes. Next, silver paste (manufactured by Tokuriki Kagaku Co., Ltd.: P-280) was applied to the electrode extraction window frame using a dispenser, and each R (red) row, B (blue) row of electrodes,
After connecting the G (green) column, bake at 150°C for 100 minutes. Through the above process, an insulating protective film is formed on the substrate other than the effective display area, and at the same time, an electrode extraction window frame is formed.

Formation of three primary color pigment layers Add ferrocene derivative micelle agent FPE to 4 liters of pure water.
G (manufactured by Dojindo Chemical Co., Ltd.), LiBr (manufactured by Wako Pure Chemical Industries, Ltd.) and Cromophthal A2B (manufactured by Ciba Geigy) were added to make solutions of 2 mM, 0.1 M, and 10 g/liter, respectively.
After dispersing with an ultrasonic homogenizer for 30 minutes to obtain a micelle solution, the substrate with ITO electrodes for producing a color filter is inserted into the micelle solution, and a potentiostat is connected to the R row of the stripes. Constant potential electrolysis at 0.5 V is performed to obtain a dye thin film (dye layer) of color filter R. After washing with pure water, pre-bake in an oven (180°C). G uses Heliogen Green L9361 (manufactured by BASF) at 15g/liter, B uses Heliogen Blue K7.
080 (manufactured by BASF) was changed to a concentration of 9 g/liter, but the film was formed under the same conditions as the R dye layer to obtain an RGB dye layer. Finally, the silver paste applied to the electrode extraction window frame is peeled off using an acetone solution. Furthermore, it is completely peeled off by applying ultrasonic waves in an acetone solution.

Formation of top coat layer Next, the color separation filter substrate prepared above was heated at 10 rpm.
, and then apply a top coat agent (manufactured by Nagase Sangyo Co., Ltd.:
Spray 30cc of OS-808). Next, the rotation speed of spin coating is set to 1,500 rpm, and a film is uniformly formed on the substrate. This substrate is post-baked at 260° C. for 100 minutes. In this way, a top coat film (smooth film) is formed on the RGB three primary color dye layer.

Formation of liquid crystal driving electrode (later ITO electrode) Using a sputtering device (manufactured by ULVAC: SDP-550VT), an ITO film was deposited on the top coat film for about 10 minutes.
Sputter 300 angstroms. At this time, the color filter substrate was heated to 120° C., and the surface resistance of the ITO film was adjusted to 20Ω/□ by introducing water vapor and oxygen. Thereafter, an ultraviolet curable resist agent (IC-28/T3 manufactured by Fuji Hunt Electronics Technology Co., Ltd.) is spin-coated on the ITO film-formed substrate at a rotation speed of 1,000 rpm. After spin coating, prebaking is performed at 80° C. for 15 minutes. Thereafter, this substrate was set in a contact exposure machine (exposure capacity: 10 mw/cm2). The mask has a line width of 312 μm, a gap of 18 μm, and a line length of 1
A horizontal stripe pattern of 75 mm is used. The light source is 2kw
A high-pressure mercury lamp is used. After alignment, a proximity gap of 50 μm was taken, and after exposure for 15 seconds,
Develop with alkaline developer. After development, the film is rinsed with pure water and then post-baked at 180°C. Next, 1M FeCl3.1N HCl.0.
An aqueous solution of 1N HNO3 and 0.1N Ce(NO3)4 is prepared and the ITO film on the substrate is etched. The end point of etching was measured by electrical resistance. This etching required approximately 23 minutes. After etching, rinse with pure water and remove the resist with 1N NaOH. In this way, a liquid crystal driving electrode (later ITO electrode) was patterned and formed, and a color filter for STN or MIM was obtained.

Preparation of a color liquid crystal display (panel) A polyamic acid resin monomer is spin-coated on the surface of the color filter substrate prepared above. This at 250℃
After curing for 1 hour to form a polyimide resin, rubbing is performed to orient it. The opposite electrode has an MIM drive circuit.
A polyamic acid resin monomer was spin-coated on a TO glass substrate, cured at 250° C. for 1 hour to form a polyimide resin, and then rubbed. Glass beads and TN liquid crystal were placed in this order between the color filter substrate and the glass substrate with MIM drive circuit (liquid crystal cell) and sealed with adhesive to complete a color liquid crystal display (panel). After connecting the extraction electrode with the driver IC mounted on the FPC to the color liquid crystal panel and pasting the polarizing plates on both sides,
The MIM drive circuit was activated and the driving of the liquid crystal was confirmed.

Evaluation of the insulating protective film of the seal portion The gap in the fabricated color liquid crystal display cell was measured using an interference film thickness meter, and the in-plane distribution of the cell gap was expressed by contour lines of 0.1 μm. The results are shown in FIG. Furthermore, as part of the cell reliability test, we tested the humidity at 90% and the temperature at 80°C to 20°C.
%, and a cycle durability test (2 hour cycle) at a temperature of -10°C was conducted. The results are shown in Table 1.

Comparative Example 1 A color liquid crystal display was produced in the same manner as in Example 1, except that no insulating protective film was formed on the substrate before forming the dye layer except for the effective display area. Note that the mask shown in FIG. 9 was used for forming the electrode extraction window frame. The gap in the fabricated color liquid crystal display cell was measured using an interference film thickness meter, and the in-plane distribution of the cell gap was determined to be 0.1.
Expressed by contour lines in μm. The results are shown in FIG. Furthermore, as a cell reliability test, humidity was 90% and temperature was 80%.
Cycle durability test from ℃ to 20% humidity, temperature -10℃ (
A 2-hour cycle) was performed. The results are shown in Table 1.

As is clear from FIGS. 11 and 12, the color liquid crystal display of the present invention (Example 1) is different from that of Comparative Example 1.
It can be seen that the gap strain in the seal part is extremely low compared to the above, and it can be seen that the insulating protective film in the seal part is effective. Furthermore, as is clear from Table 1, the color liquid crystal display of the present invention (Example 1) has durability that is 15 times or more compared to the case where the seal part does not have an insulating protective film (Comparative Example 1). It turns out.

[0023]

[Table 1]

Example 2 Formation of ITO electrode (dye layer forming electrode) A glass substrate having a sheet resistance of 20Ω/□ as an ITO film (manufactured by HOYA:
NA45; 300 mm square), UV curable resist agent (manufactured by Fuji Hunt Electronics Technology Co., Ltd.: IC
-28/T3) diluted twice with xylene to 100%
Spin coat at a rotation speed of 0 rpm. After spin coating, prebaking is performed at 80° C. for 15 minutes. Thereafter, the resist/ITO film/glass substrate was set in a one-shot proximity exposure machine (exposure capacity: 10 mw/cm2). The mask has a line width of 100μm and a gap of 20μm.
The stripe pattern has a line length of 155 mm. A 2kw high-pressure mercury lamp is used as the light source. A proximity gap of 70 μm was taken, and after exposure for 15 seconds, development was performed using an alkaline developer. After development, after rinsing with pure water, 18
Post-bake at 0°C. Next, as an etchant,
1N FeCl3・1N HCl・0.1N H
An aqueous solution of NO3.0.1N Ce(NO3)4 is prepared and the ITO film is etched. The end point of etching was measured by electrical resistance. This etching includes approximately 40
It took minutes. After etching, it was rinsed with pure water and the resist was peeled off with 1N NaOH to form an ITO electrode (stripe pattern) on the glass substrate.

Formation of resist black matrix A resist agent for forming a black matrix is a mixture of CK manufactured by Fuji Hunt Electronics Technology Co., Ltd. and acrylic resist cell solve acetate 10% solution (manufactured by Toagosei Co., Ltd.) at a weight ratio of 3:1. used as The ITO patterned glass substrate prepared earlier is rotated at 10 rpm, and 30 cc of the above resist agent is sprayed onto it. Next, the rotation speed of the spin coating is set to 2,500 rpm, and the substrate is uniformly coated (film formed). This board is 80
Pre-bake for 15 minutes at °C. And high pressure mercury lamp (2
The black matrix 7 shown in FIG.
Then, exposure is performed using a mask 100 designed for forming the electrode extraction window 6. After that, a developer (manufactured by Fuji Hunt Co., Ltd.: C)
D) was diluted 4 times with pure water and developed for 30 seconds. Furthermore, it is rinsed with pure water and post-baked at 200° C. for 100 minutes.

Simultaneous formation of insulating protective film outside the effective display area and electrode window frame Acrylic resist agent (manufactured by Tokyo Ohka Co., Ltd.: CFGR) was used to form an insulating protective film outside the electrode window frame and effective display area. Used as a resist agent. The ITO patterned glass substrate with resist BM prepared above is rotated at 10 rpm, and 30 cc of the resist agent is sprayed thereon. Next, the rotation speed of spin coating is set to 1,500 rpm, and the substrate is uniformly coated (film formed). This substrate is prebaked at 110° C. for 15 minutes. Then, while aligning with a contact exposure machine with an alignment function that uses a 2 kW high-pressure mercury lamp as a light source, exposure is performed using a design mask for forming an insulating protective film outside the electrode extraction window frame and effective display area shown in Figure 4. do. Thereafter, development is performed for 90 seconds with a developer to dissolve and remove the resist on the electrode extraction window 6 and the effective display area 5. Further, rinse with pure water and post-bake at 150° C. for 100 minutes. Next, silver paste (manufactured by Tokuriki Chemical Co., Ltd.: P-2
80) is applied to the electrode extraction window frame using a dispenser, and after connecting each R (red) row, B (blue) row, and G (green) row of electrodes, it is baked at 150° C. for 100 minutes. Through the above process, an insulating protective film is formed on the substrate other than the effective display area, and at the same time, an electrode extraction window frame is formed.

Formation of three primary color pigment layers Add ferrocene derivative micelle agent FPE to 4 liters of pure water.
G (manufactured by Dojindo Chemical Co., Ltd.), LiBr (manufactured by Wako Pure Chemical Industries, Ltd.) and Cromophthal A2B (manufactured by Ciba Geigy) were added to make solutions of 2 mM, 0.1 M, and 10 g/liter, respectively.
After dispersing with an ultrasonic homogenizer for 30 minutes to obtain a micelle solution, the substrate with ITO electrodes for producing a color filter is inserted into the micelle solution, and a potentiostat is connected to the R row of the stripes. Constant potential electrolysis at 0.5 V is performed to obtain a dye thin film (dye layer) of color filter R. After washing with pure water, pre-bake in an oven (180°C). G uses Heliogen Green L9361 (manufactured by BASF) at 15g/liter, B uses Heliogen Blue K7.
080 (manufactured by BASF) was changed to a concentration of 9 g/liter, but the film was formed under the same conditions as the R dye layer to obtain an RGB dye layer. Finally, the silver paste applied to the electrode extraction window frame is peeled off using an acetone solution. Furthermore, it is completely peeled off by applying ultrasonic waves in an acetone solution.

Formation of top coat layer Next, the color separation filter substrate prepared above was heated at 10 rpm.
, and then apply a top coat agent (manufactured by Nagase Sangyo Co., Ltd.:
Spray 30cc of JSR7265). Next, the rotation speed of spin coating is set to 1,500 rpm, and a film is uniformly formed on the substrate. This substrate is post-baked at 220° C. for 100 minutes. In this way, a top coat film (smooth film) is formed on the RGB three primary color dye layer.

Formation of liquid crystal driving electrodes (later ITO electrodes) Using a sputtering device (SDP-550VT manufactured by ULVAC), an ITO film was deposited on the top coat film for about 10 minutes.
Sputter 300 angstroms. At this time, the color filter substrate was heated to 120° C., and the surface resistance of ITO was adjusted to 20Ω/□ by introducing water vapor and oxygen.

Preparation of color liquid crystal display (panel) A polyamic acid resin monomer is spin-coated on the surface of the color filter substrate prepared above. This at 250℃
After curing for 1 hour to form a polyimide resin, rubbing is performed to orient it. As a counter electrode, an ITO glass substrate with a TFT driving circuit was spin-coated with a polyamic acid resin monomer, cured at 250° C. for 1 hour to form a polyimide resin, and then rubbed. Glass beads and TN liquid crystal were placed in this order between the color filter substrate and the glass substrate with a TFT driving circuit (liquid crystal cell) and sealed with adhesive to complete a color liquid crystal display (panel). After connecting an extraction electrode with a driver IC mounted on an FPC to a color liquid crystal panel and adhering polarizing plates to both sides, the TFT driving circuit was activated and the driving of the liquid crystal was confirmed.

Evaluation of the insulating protective film of the seal portion The gap in the prepared color liquid crystal display cell was measured using an interference film thickness meter, and the in-plane distribution of the cell gap was expressed by contour lines of 0.1 μm. The results are shown in FIG. Furthermore, as part of the cell reliability test, we tested the humidity at 90% and the temperature at 80°C to 20°C.
%, and a cycle durability test (2 hour cycle) at a temperature of -10°C was conducted. The results are shown in Table 1.

Comparative Example 2 A color liquid crystal display was produced in the same manner as in Example 2, except that no insulating protective film was formed on the substrate before forming the dye layer except for the effective display area. Note that the mask shown in FIG. 9 was used for forming the electrode extraction window frame. The gap in the fabricated color liquid crystal display cell was measured using an interference film thickness meter, and the in-plane distribution of the cell gap was determined to be 0.1.
Expressed by contour lines in μm. The results are shown in FIG. Furthermore, as a cell reliability test, humidity was 90% and temperature was 80%.
Cycle durability test from ℃ to 20% humidity, temperature -10℃ (
A 2-hour cycle) was performed. The results are shown in Table 1.

As is clear from FIGS. 13 and 14, the color liquid crystal display of the present invention (Example 2) is different from that of Comparative Example 2.
It can be seen that the gap strain in the seal part is extremely low compared to the above, and it can be seen that the insulating protective film in the seal part is effective. Furthermore, as is clear from Table 2, the color liquid crystal display of the present invention (Example 2) has 22 times or more durability compared to the case where the seal part does not have an insulating protective film (Comparative Example 2). It turns out.

[0034]

Effects of the Invention As explained above, the color filter of the present invention and the color liquid crystal display using the color filter have improved durability and production efficiency (
yield) can be improved. Moreover, according to the method for manufacturing a color filter of the present invention, the above color filter of the present invention can be efficiently manufactured.

[Brief explanation of the drawing]

FIG. 1 is a diagram showing the configuration of a color filter of the present invention, in which (a) is a plan view, (b) is a sectional view taken along line A-A in (a), and (c) is a B-B in (a). -B sectional view.

FIG. 2 shows steps showing an example of a method for manufacturing a color filter of the present invention.

FIG. 3 is a cross-sectional view showing a color filter created by the process of FIG. 2;

FIG. 4 is a plan view showing a mask used in the process of FIG. 2;

FIG. 5 is a process diagram showing another example of the method for manufacturing a color filter of the present invention.

6 is a cross-sectional view showing a color filter created by the process of FIG. 5. FIG.

FIG. 7 is a process diagram showing the assembly process of a color liquid crystal display.

FIG. 8 is a plan view showing a mask used in Examples.

FIG. 9 is a plan view showing a mask used in a comparative example.

FIG. 10 is a plan view showing a mask used in another example.

FIG. 11 is a diagram showing the in-plane distribution of the cell gap of the color liquid crystal display produced in the example.

FIG. 12 is a diagram showing the in-plane cell gap distribution of a color liquid crystal display prepared in a comparative example.

FIG. 13 is a diagram showing the in-plane distribution of the cell gap of a color liquid crystal display produced in another example.

FIG. 14 is a diagram showing the in-plane distribution of the cell gap of a color liquid crystal display prepared in another comparative example.

FIG. 15 is a sectional view showing the configuration of a conventional color filter.

FIG. 16 is a diagram showing the configuration of a conventional color filter, in which (a) is a plan view and (b) is a cross-sectional view taken along the line A-A in (a).

[Explanation of symbols]

1...Insulating substrate 2...Transparent electrode for dye layer formation 3...Insulating protective film 4...Pigment layer 6...Electrode extraction window 7...Black Matrix 8...Smooth membrane 9...Liquid crystal driving electrode 10...Color filter substrate 20...Drive board 30...Liquid crystal 40...Sealant S...Valid display area H...Adhesive seal part

Claims (11)

[Claims] 1. A color filter comprising a transparent electrode for forming a dye layer and a dye layer formed on at least an insulating substrate, wherein a portion other than an effective display area on the substrate before forming the dye layer, A color filter characterized by forming an insulating protective film. [Claim 2] A black matrix, an insulating film, a transparent electrode for forming a dye layer, an insulating protective film, a dye layer, a smooth film, and a liquid crystal driving electrode are sequentially laminated on an insulating substrate. The color filter according to claim 1. 3. Claim 1, characterized in that a transparent electrode for forming a dye layer, a black matrix, an insulating protective film, a dye layer, a smoothing film, and a liquid crystal driving electrode are sequentially laminated on an insulating substrate. Color filters listed. 4. The color filter according to claim 1, wherein the dye layer is produced by a micelle electrolysis method or an electrodeposition method. 5. The color filter according to claim 1, wherein an electrode extraction window frame is formed in a part of the insulating protective film. 6. The insulating protective film is made of a resist agent selected from at least one of an acrylic resin, an epoxy resin, and a siloxane resin that has ultraviolet sensitivity, or a resist agent selected from at least one of a heat-resistant acrylic resin, an epoxy resin, and a siloxane resin. 6. The color filter according to claim 1, wherein the color filter is made of a thermosetting resin whose main ingredient is a resin. 7. A method for manufacturing a color filter, in which a transparent electrode for forming a dye layer formed on an insulating substrate is energized to form a dye layer on the transparent electrode, in which the dye layer is formed on the substrate before the dye layer is formed. A method for manufacturing a color filter, comprising forming an insulating protective film on a portion other than the effective display area, and then forming a dye layer by applying electricity. 8. The method of manufacturing a color filter according to claim 7, wherein when forming the insulating protective film on a portion of the substrate other than the effective display area, an electrode extraction window is formed at the same time. 9. A resist selected from at least one of acrylic resin, epoxy resin, and siloxane resin having ultraviolet sensitivity is applied using a spin coater or roll coater, and exposed using a mask for forming an insulating protective film. 9. The method of manufacturing a color filter according to claim 7, wherein the insulating protective film is formed by developing, patterning, and thermosetting the insulating protective film. 10. By printing a resin oligomer containing at least one of heat-resistant acrylic resin, epoxy resin, and siloxane resin as a main ingredient into the shape of a desired insulating protective film using an offset printing machine, and then thermosetting the resin oligomer. 9. The method of manufacturing a color filter according to claim 7, further comprising forming the insulating protective film. 11. A color liquid crystal display comprising the color filter according to claim 1, a liquid crystal driving electrode substrate, and a liquid crystal sealed between these.