JPH0427540B2 - - Google Patents

Info

Publication number
JPH0427540B2
JPH0427540B2 JP63244067A JP24406788A JPH0427540B2 JP H0427540 B2 JPH0427540 B2 JP H0427540B2 JP 63244067 A JP63244067 A JP 63244067A JP 24406788 A JP24406788 A JP 24406788A JP H0427540 B2 JPH0427540 B2 JP H0427540B2
Authority
JP
Japan
Prior art keywords
ion beam
sample
mask
aperture
spot
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP63244067A
Other languages
English (en)
Japanese (ja)
Other versions
JPH01124856A (ja
Inventor
Hiroshi Yamaguchi
Takeoki Myauchi
Akira Shimase
Mikio Ppongo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP63244067A priority Critical patent/JPH01124856A/ja
Publication of JPH01124856A publication Critical patent/JPH01124856A/ja
Publication of JPH0427540B2 publication Critical patent/JPH0427540B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP63244067A 1988-09-30 1988-09-30 マスクの欠陥修正方法 Granted JPH01124856A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63244067A JPH01124856A (ja) 1988-09-30 1988-09-30 マスクの欠陥修正方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63244067A JPH01124856A (ja) 1988-09-30 1988-09-30 マスクの欠陥修正方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP56153806A Division JPS5856332A (ja) 1981-09-30 1981-09-30 マスクの欠陥修正方法

Publications (2)

Publication Number Publication Date
JPH01124856A JPH01124856A (ja) 1989-05-17
JPH0427540B2 true JPH0427540B2 (enrdf_load_stackoverflow) 1992-05-12

Family

ID=17113243

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63244067A Granted JPH01124856A (ja) 1988-09-30 1988-09-30 マスクの欠陥修正方法

Country Status (1)

Country Link
JP (1) JPH01124856A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8409672B2 (en) * 2008-04-24 2013-04-02 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing evaporation donor substrate and method of manufacturing light-emitting device

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5487479A (en) * 1977-12-23 1979-07-11 Nec Corp Photo mask blank substrate
JPS55150225A (en) * 1979-05-11 1980-11-22 Hitachi Ltd Method of correcting white spot fault of photomask

Also Published As

Publication number Publication date
JPH01124856A (ja) 1989-05-17

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