JPH0425706B2 - - Google Patents
Info
- Publication number
- JPH0425706B2 JPH0425706B2 JP58068534A JP6853483A JPH0425706B2 JP H0425706 B2 JPH0425706 B2 JP H0425706B2 JP 58068534 A JP58068534 A JP 58068534A JP 6853483 A JP6853483 A JP 6853483A JP H0425706 B2 JPH0425706 B2 JP H0425706B2
- Authority
- JP
- Japan
- Prior art keywords
- type
- region
- forming
- collector
- transistor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/01—Manufacture or treatment
- H10D84/0112—Integrating together multiple components covered by H10D8/00, H10D10/00 or H10D18/00, e.g. integrating multiple BJTs
- H10D84/0119—Integrating together multiple components covered by H10D8/00, H10D10/00 or H10D18/00, e.g. integrating multiple BJTs the components including complementary BJTs
- H10D84/0121—Integrating together multiple components covered by H10D8/00, H10D10/00 or H10D18/00, e.g. integrating multiple BJTs the components including complementary BJTs the complementary BJTs being vertical BJTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/01—Manufacture or treatment
- H10D84/02—Manufacture or treatment characterised by using material-based technologies
- H10D84/03—Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology
- H10D84/038—Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology using silicon technology, e.g. SiGe
Landscapes
- Bipolar Transistors (AREA)
- Element Separation (AREA)
- Bipolar Integrated Circuits (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58068534A JPS59194465A (ja) | 1983-04-19 | 1983-04-19 | 半導体集積回路の製造方法 |
| JP2417705A JPH03245562A (ja) | 1983-04-19 | 1990-12-14 | 半導体集積回路 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58068534A JPS59194465A (ja) | 1983-04-19 | 1983-04-19 | 半導体集積回路の製造方法 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2417705A Division JPH03245562A (ja) | 1983-04-19 | 1990-12-14 | 半導体集積回路 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59194465A JPS59194465A (ja) | 1984-11-05 |
| JPH0425706B2 true JPH0425706B2 (enEXAMPLES) | 1992-05-01 |
Family
ID=13376494
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58068534A Granted JPS59194465A (ja) | 1983-04-19 | 1983-04-19 | 半導体集積回路の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59194465A (enEXAMPLES) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0618203B2 (ja) * | 1986-03-14 | 1994-03-09 | 三洋電機株式会社 | 縦型pnpトランジスタの製造方法 |
| IT1218230B (it) * | 1988-04-28 | 1990-04-12 | Sgs Thomson Microelectronics | Procedimento per la formazione di un circuito integrato su un substrato di tipo n,comprendente transistori pnp e npn verticali e isolati fra loro |
| JPH0276843U (enEXAMPLES) * | 1988-12-01 | 1990-06-13 | ||
| EP0764365A2 (en) * | 1995-04-10 | 1997-03-26 | Koninklijke Philips Electronics N.V. | Level-shifting circuit and high-side driver including such a level-shifting circuit |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5252374A (en) * | 1976-06-21 | 1977-04-27 | Sony Corp | Semiconductor device |
-
1983
- 1983-04-19 JP JP58068534A patent/JPS59194465A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59194465A (ja) | 1984-11-05 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3202785B2 (ja) | モノリシック半導体装置及びその製造方法 | |
| JP3306273B2 (ja) | 半導体集積回路とその製造方法 | |
| JP2700180B2 (ja) | pnp型の縦型孤立コレクタトランジスタ | |
| US4564855A (en) | High current PNP transistor forming part of an integrated monolithic circuit | |
| JPH0425706B2 (enEXAMPLES) | ||
| WO1984001053A1 (fr) | Dispositif a semiconducteurs | |
| US4144106A (en) | Manufacture of an I2 device utilizing staged selective diffusion thru a polycrystalline mask | |
| JPS6133261B2 (enEXAMPLES) | ||
| JPH0472390B2 (enEXAMPLES) | ||
| JPH02114645A (ja) | バイポーラトランジスタ | |
| JPS6140140B2 (enEXAMPLES) | ||
| JPS6060753A (ja) | 半導体装置 | |
| JP2729059B2 (ja) | 半導体装置 | |
| JPH02251174A (ja) | 半導体装置 | |
| JPS6348189B2 (enEXAMPLES) | ||
| JP3343892B2 (ja) | 半導体集積回路 | |
| JP2783888B2 (ja) | 半導体装置およびその製造方法 | |
| JP2927843B2 (ja) | 半導体集積回路 | |
| JP2932076B2 (ja) | 半導体装置の製造方法 | |
| JP2723566B2 (ja) | 半導体装置 | |
| JPS58107645A (ja) | 半導体装置の製法 | |
| JPS6252466B2 (enEXAMPLES) | ||
| JPH0629374A (ja) | 半導体集積回路装置 | |
| JPS6031105B2 (ja) | 半導体装置 | |
| JPH02276271A (ja) | バイポーラ・cmos半導体装置及びその製造方法 |