JPH0425695B2 - - Google Patents
Info
- Publication number
- JPH0425695B2 JPH0425695B2 JP58031114A JP3111483A JPH0425695B2 JP H0425695 B2 JPH0425695 B2 JP H0425695B2 JP 58031114 A JP58031114 A JP 58031114A JP 3111483 A JP3111483 A JP 3111483A JP H0425695 B2 JPH0425695 B2 JP H0425695B2
- Authority
- JP
- Japan
- Prior art keywords
- resin film
- radiation
- sensitive resin
- sensitive
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000011347 resin Substances 0.000 claims description 69
- 229920005989 resin Polymers 0.000 claims description 69
- 230000005855 radiation Effects 0.000 claims description 29
- 238000000034 method Methods 0.000 claims description 17
- 239000000758 substrate Substances 0.000 claims description 9
- 230000001235 sensitizing effect Effects 0.000 claims description 4
- 238000009835 boiling Methods 0.000 claims description 2
- 238000010438 heat treatment Methods 0.000 claims description 2
- 239000002904 solvent Substances 0.000 claims description 2
- 230000018109 developmental process Effects 0.000 description 10
- 239000004065 semiconductor Substances 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000007261 regionalization Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0035—Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58031114A JPS59155924A (ja) | 1983-02-25 | 1983-02-25 | パタ−ン形成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58031114A JPS59155924A (ja) | 1983-02-25 | 1983-02-25 | パタ−ン形成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59155924A JPS59155924A (ja) | 1984-09-05 |
| JPH0425695B2 true JPH0425695B2 (enrdf_load_stackoverflow) | 1992-05-01 |
Family
ID=12322370
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58031114A Granted JPS59155924A (ja) | 1983-02-25 | 1983-02-25 | パタ−ン形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59155924A (enrdf_load_stackoverflow) |
-
1983
- 1983-02-25 JP JP58031114A patent/JPS59155924A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59155924A (ja) | 1984-09-05 |
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