JPH04246168A - Method and apparatus for forming compound thin film - Google Patents

Method and apparatus for forming compound thin film

Info

Publication number
JPH04246168A
JPH04246168A JP2501491A JP2501491A JPH04246168A JP H04246168 A JPH04246168 A JP H04246168A JP 2501491 A JP2501491 A JP 2501491A JP 2501491 A JP2501491 A JP 2501491A JP H04246168 A JPH04246168 A JP H04246168A
Authority
JP
Japan
Prior art keywords
raw material
exciting
vaporizing
thin film
compound thin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2501491A
Other languages
Japanese (ja)
Other versions
JPH0737666B2 (en
Inventor
Takashi Shibata
Hiroyuki Tokushige
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Japan Steel Works Ltd
Original Assignee
Japan Steel Works Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Steel Works Ltd filed Critical Japan Steel Works Ltd
Priority to JP2501491A priority Critical patent/JPH0737666B2/en
Publication of JPH04246168A publication Critical patent/JPH04246168A/en
Publication of JPH0737666B2 publication Critical patent/JPH0737666B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Abstract

PURPOSE: To form compound thin film having accurate composition at high speed by preventing mutual interference between vaporizing means or exciting means for solid raw material and exciting means for gas raw material. and independently exciting or activating each raw material to the desired condition in the case of forming the compound thin film by vaporizing or exciting the solid raw material and also exciting the gas raw material to bring these into reaction on a substrate.
CONSTITUTION: A shield member 16 composed of electric conductive material is arranged between the electron beam vaporizing source 6 for vaporizing the solid raw material 5 or the exciting means for the solid raw material 5 composed of this vaporizing source 6 and ionizing means 7 and the exciting means 10 for the gas raw material 14, and by impressing positive potential or negative potential to the shield member 16, internal between these is electrically shielded.
COPYRIGHT: (C)1992,JPO&Japio
JP2501491A 1991-01-28 1991-01-28 Method and apparatus for forming compound thin film Expired - Lifetime JPH0737666B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2501491A JPH0737666B2 (en) 1991-01-28 1991-01-28 Method and apparatus for forming compound thin film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2501491A JPH0737666B2 (en) 1991-01-28 1991-01-28 Method and apparatus for forming compound thin film

Publications (2)

Publication Number Publication Date
JPH04246168A true JPH04246168A (en) 1992-09-02
JPH0737666B2 JPH0737666B2 (en) 1995-04-26

Family

ID=12154062

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2501491A Expired - Lifetime JPH0737666B2 (en) 1991-01-28 1991-01-28 Method and apparatus for forming compound thin film

Country Status (1)

Country Link
JP (1) JPH0737666B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08181075A (en) * 1994-12-26 1996-07-12 Nec Corp Thin film depositing method
WO2003095698A3 (en) * 2002-05-10 2004-04-29 Fraunhofer Ges Forschung Device and method for the electron beam attenuation of reactively formed layers on substrates

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08181075A (en) * 1994-12-26 1996-07-12 Nec Corp Thin film depositing method
WO2003095698A3 (en) * 2002-05-10 2004-04-29 Fraunhofer Ges Forschung Device and method for the electron beam attenuation of reactively formed layers on substrates

Also Published As

Publication number Publication date
JPH0737666B2 (en) 1995-04-26

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