JPH04243006A - Production of magnetic head - Google Patents

Production of magnetic head

Info

Publication number
JPH04243006A
JPH04243006A JP452991A JP452991A JPH04243006A JP H04243006 A JPH04243006 A JP H04243006A JP 452991 A JP452991 A JP 452991A JP 452991 A JP452991 A JP 452991A JP H04243006 A JPH04243006 A JP H04243006A
Authority
JP
Japan
Prior art keywords
substrate
thin film
metal thin
ferromagnetic metal
groove
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP452991A
Other languages
Japanese (ja)
Inventor
Hideji Fujimoto
藤本 秀次
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP452991A priority Critical patent/JPH04243006A/en
Publication of JPH04243006A publication Critical patent/JPH04243006A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To suppress warpage of a substate and peeling of a ferromagnetic metal thin film and to improve the production yield. CONSTITUTION:On the upper surface 1a of a substrate 1 comprising ferromagnetic oxide material, there are provided a groove 2 to limit the track width and a strain cutting groove 3 which crosses the track width limiting groove 2. Then a ferromagnetic metal thin film is formed on the surface 1a of the substrate 1, and then the surface 1a of the substrate 1 is joined with another substrate with a gap spacer interposed to form a block. In this manufacturing process of a magnetic head, the film thickness (A) of the ferromagnetic metal thin film on the upper surface 1a and the film thickness (B) of the ferromagnetic metal thin film in the strain cutting groove 3 where the thickness is least are determined to satisfy B/A<=0.5.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】本発明は磁気コアのギャップ近傍
部に高飽和磁束密度の強磁性金属薄膜を配置した複合型
の磁気ヘッドの製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a composite magnetic head in which a ferromagnetic metal thin film having a high saturation magnetic flux density is disposed near a gap in a magnetic core.

【0002】0002

【従来の技術】近年、ビデオテープレコーダ等を磁気記
録再生装置に使用される磁気テープにおいては高密度化
が進められており、磁性粉としてFe、Co、Ni等の
強磁性金属粉末を用いた抗磁力の高いメタルテープが使
用されるようになっている。一方このメタルテープに記
録を行う磁気ヘッドとしては、例えば特開昭58−17
5122号公報(IPC:G11B  5/22)に開
示されているように、作動ギャップの近傍部分を磁気コ
アとして使用されるフェライトよりも飽和磁化の大きな
磁性材料(例えばパーマロイ、センダスト、アモルファ
ス磁性体)で構成した複合型の磁気ヘッドが提案されて
おり、この複合型の磁気ヘッドでは信頼性、磁気特性、
耐摩耗性等の点で優れた特性を有する。
[Prior Art] In recent years, the density of magnetic tapes used in magnetic recording and reproducing devices such as video tape recorders has been increased, and ferromagnetic metal powders such as Fe, Co, and Ni are used as magnetic powders. Metal tapes with high coercive force are now being used. On the other hand, as a magnetic head for recording on this metal tape, for example, JP-A-58-17
As disclosed in Publication No. 5122 (IPC: G11B 5/22), a magnetic material (for example, permalloy, sendust, amorphous magnetic material) having a higher saturation magnetization than ferrite is used as the magnetic core in the vicinity of the working gap. A composite magnetic head composed of
It has excellent properties such as wear resistance.

【0003】この種の磁気ヘッドの製造方法としては、
Mn−Znフェライト等よりなる強磁性酸化物基板に、
傾斜溝加工、強磁性金属薄膜形成、ガラス充填、研削・
研磨加工、トラック幅規制溝加工等の工程を経て一対の
コアブロックを作製し、該一対のコアブロックを従来の
ガラス溶融法によりギャップスペーサを介して接合した
後、所定の位置でチップに切断するという方法が採用さ
れている。
A method for manufacturing this type of magnetic head is as follows:
A ferromagnetic oxide substrate made of Mn-Zn ferrite etc.
Inclined groove processing, ferromagnetic metal thin film formation, glass filling, grinding,
A pair of core blocks is produced through processes such as polishing and track width regulating groove processing, and the pair of core blocks are joined via a gap spacer using a conventional glass melting method, and then cut into chips at predetermined positions. This method is adopted.

【0004】しかし乍ら、上述の製造方法の場合、強磁
性酸化物基板に傾斜溝加工を施した後、強磁性金属薄膜
をスパッタリング等により被着形成すると、スパッタリ
ング時の温度変化により前記基板と薄膜との間には熱膨
張係数の違いから歪が生じ、その後の鏡面研磨やトラッ
ク幅規制溝加工において前記基板にヒビが多数発生し、
歩留りが低下した。そして、前記強磁性金属薄膜の被着
する面積が大きくなれば、前述の熱膨張係数の差による
歪も増大する。このため、強磁性酸化物基板の寸法は制
限され、量産には適していなかった。
However, in the case of the above-mentioned manufacturing method, if a ferromagnetic metal thin film is deposited by sputtering or the like after forming an inclined groove on a ferromagnetic oxide substrate, temperature changes during sputtering cause the substrate to Distortion occurs between the substrate and the thin film due to the difference in thermal expansion coefficient, and many cracks occur in the substrate during subsequent mirror polishing and track width regulating groove processing.
Yield decreased. As the area to which the ferromagnetic metal thin film is deposited increases, the strain caused by the difference in thermal expansion coefficients described above also increases. For this reason, the dimensions of the ferromagnetic oxide substrate are limited, making it unsuitable for mass production.

【0005】[0005]

【発明が解決しようとする課題】本発明は上記従来例の
欠点に鑑みなされたもので、強磁性酸化物基板と強磁性
金属薄膜との熱膨張係数の差により生じる歪を抑え、量
産性に優れた磁気ヘッドの製造方法を提供することを目
的とするものである。
[Problems to be Solved by the Invention] The present invention was devised in view of the above-mentioned drawbacks of the conventional examples. The purpose of this invention is to provide an excellent method of manufacturing a magnetic head.

【0006】[0006]

【課題を解決するための手段】本発明は強磁性酸化物材
料よりなる基板の上面にトラック幅規制溝及び該トラッ
ク幅規制溝と交差する歪分断溝とを形成した後、前記基
板の上面に強磁性金属薄膜を形成し、その後前記基板の
上面をギャップスペーサを介して他の基板に接合してブ
ロックを形成する工程を有する磁気ヘッドの製造方法に
おいて、前記基板上面の強磁性金属薄膜の膜厚Aと前記
歪分断溝内の強磁性金属薄膜の最も薄い部分の膜厚Bと
の膜厚比率B/Aを0.5以下にしたことを特徴とする
[Means for Solving the Problems] The present invention forms track width regulating grooves and strain dividing grooves that intersect with the track width regulating grooves on the upper surface of a substrate made of a ferromagnetic oxide material. A method for manufacturing a magnetic head comprising a step of forming a ferromagnetic metal thin film and then bonding the upper surface of the substrate to another substrate via a gap spacer to form a block, the ferromagnetic metal thin film on the upper surface of the substrate. It is characterized in that the film thickness ratio B/A between the thickness A and the film thickness B of the thinnest portion of the ferromagnetic metal thin film in the strain dividing groove is set to 0.5 or less.

【0007】[0007]

【作用】上記製造方法に依れば、基板上に被着した強磁
性金属薄膜は、歪分断溝内の膜厚の薄い部分で実質的に
分断されるため、前記基板と強磁性金属薄膜との間の歪
も分断される。
[Operation] According to the above manufacturing method, the ferromagnetic metal thin film deposited on the substrate is substantially separated at the thin film thickness part within the strain separation groove, so that the substrate and the ferromagnetic metal thin film are separated. The distortion between them is also divided.

【0008】[0008]

【実施例】以下、図面を参照しつつ本発明の磁気ヘッド
の製造方法を詳細に説明する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS A method of manufacturing a magnetic head according to the present invention will be explained in detail below with reference to the drawings.

【0009】先ず、図2に示したMn−Znフェライト
単結晶等の強磁性酸化物の基板(1)を用意し、該基板
(1)の上面(1a)、即ち接合面に図3に示すように
斜面(2a)がθなる角度で傾斜している傾斜溝(2)
を回転砥石等を用いて複数形成する。
First, a substrate (1) of a ferromagnetic oxide such as Mn-Zn ferrite single crystal shown in FIG. Slanted groove (2) whose slope (2a) is inclined at an angle of θ as shown in FIG.
A plurality of shapes are formed using a rotating grindstone or the like.

【0010】次に、図4に示すように前記上面(1a)
に前記傾斜溝(2)と直交するように断面長方形状の歪
分断溝(3)を複数形成する。前記歪分断溝(3)は前
記傾斜溝(2)よりも深くなるように加工形成されてい
る。
Next, as shown in FIG. 4, the upper surface (1a)
A plurality of strain dividing grooves (3) each having a rectangular cross section are formed perpendicularly to the inclined groove (2). The strain dividing groove (3) is formed to be deeper than the inclined groove (2).

【0011】次に、図5に示すように前記基板(1)の
上面(1a)にセンダスト合金、アモルファス合金等の
強磁性金属薄膜(4)をスパッタリング法、蒸着法、イ
オンプレーテイング法の真空薄膜形成技術を用いて被着
する。
Next, as shown in FIG. 5, a ferromagnetic metal thin film (4) of Sendust alloy, amorphous alloy, etc. is deposited on the upper surface (1a) of the substrate (1) by sputtering, vapor deposition, or ion plating in a vacuum. Deposited using thin film deposition techniques.

【0012】次に、図6に示すように前記傾斜溝(2)
及び歪分断溝(3)内にガラス(5)を充填した後、前
記基板(1)上面(1a)に研削・研磨を施して余分な
ガラス及び強磁性金属薄膜を除去して前記斜面(2a)
上に被着している強磁性金属薄膜(4)の端面(4a)
を露出させる。
Next, as shown in FIG. 6, the inclined groove (2)
After filling the strain dividing groove (3) with glass (5), the upper surface (1a) of the substrate (1) is ground and polished to remove excess glass and the ferromagnetic metal thin film, and the slope (2a) is )
End face (4a) of the ferromagnetic metal thin film (4) deposited on top
expose.

【0013】次に、図7に示すように前記基板(1)の
上面に、前記傾斜溝(2)と平行に前記強磁性金属薄膜
(4)の端面(4a)を約1〜5μm切り込むようにト
ラック幅規制溝(6)を形成し、前記端面(4a)の幅
を磁気ギャップの所望のトラック幅Twに一致させる。
Next, as shown in FIG. 7, the end surface (4a) of the ferromagnetic metal thin film (4) is cut by approximately 1 to 5 μm into the upper surface of the substrate (1) parallel to the inclined groove (2). A track width regulating groove (6) is formed in the magnetic gap, and the width of the end surface (4a) is made to match the desired track width Tw of the magnetic gap.

【0014】次に、図7に示す基板を一対の用意し、一
方若しくは両方の基板の上面にSiO2等のギャップス
ペーサを形成する。次いで、図8に示すように一方の基
板( 1’)の上面に巻線溝(7)及びガラス棒挿入溝
(8)を形成した後、前記一対の基板(1)(1’)を
強磁性金属薄膜(4)(4)の端面(4a)(4a)同
士がギャップスペーサを介して対向するように衝き合わ
せ、その後、ガラス棒挿入溝(8)にガラス棒(9)を
挿入し、加熱昇温することにより前記傾斜溝(2)、歪
分断溝(3)、トラック幅規制溝(6)にガラスを充填
して前記一対の基板(1)(1’)をガラス接合してコ
アブロック(10)を形成する。
Next, a pair of substrates shown in FIG. 7 are prepared, and a gap spacer such as SiO2 is formed on the upper surface of one or both of the substrates. Next, as shown in FIG. 8, after forming a winding groove (7) and a glass rod insertion groove (8) on the upper surface of one substrate (1'), the pair of substrates (1) and (1') are The end surfaces (4a) (4a) of the magnetic metal thin films (4) (4) are abutted against each other with a gap spacer interposed therebetween, and then the glass rod (9) is inserted into the glass rod insertion groove (8). By heating and increasing the temperature, the inclined groove (2), the strain dividing groove (3), and the track width regulating groove (6) are filled with glass, and the pair of substrates (1) and (1') are glass-bonded to form a core. A block (10) is formed.

【0015】そして最後に、前記コアブロック(10)
を一点鎖線A−A’及び二点鎖線B−B’に沿って切断
し、そのテープ摺接面にR付加工を施すことにより強磁
性酸化物よりなる一対の磁気コア半体のギャップ近傍部
に強磁性金属薄膜(4)を有する複合型のヘッドチップ
が複数個形成される。
[0015] Finally, the core block (10)
The area near the gap between the pair of magnetic core halves made of ferromagnetic oxide is cut by cutting along the dashed-dot line A-A' and the dashed-double line B-B' and rounded the tape sliding surface. A plurality of composite head chips each having a ferromagnetic metal thin film (4) are formed thereon.

【0016】上述の製造方法において、図5に示す強磁
性金属薄膜(4)の成膜工程をスパッタリングで行う場
合、図9及び図10に示すように基板(1)の中心Qを
回転テーブル(11)の中心Oに配置しターゲット(1
2)の中心Pと基板(1)の中心Qとを結ぶ直線(13
)と、基板(1)の上面の垂線(14)との交角(以後
、入射角度という)θが0°であると、基板(1)上面
の強磁性金属薄膜(4)の膜厚Aと歪分断溝(3)内の
強磁性金属薄膜(4)の最も薄い部分の膜厚Bとの膜厚
比率B/A(図1参照)は0.8となる(試料No.1
)。この場合、成膜後の基板(1)の反りは大きく、後
加工での歩留りが悪い。また、図11及び図12に示す
ように基板(1)の中心Qを回転テーブル(11)の中
心Oから外し、且つ歪分断溝(3)がターゲット(12
)を中心とした同心円(15)の接線(16)と平行に
なるように基板(1)を配置して、所定の入射角度θを
つけた時の膜厚比率B/Aと、基板(1)の状態を調べ
た(試料No.2〜5)。更に、図13及び図14に示
すように基板(1)の中心Qを回転テーブル(11)の
中心Oから外し、且つ歪分断溝(3)がターゲット(1
2)を中心とした同心円(15)の接線(16)と直交
するように基板(1)を配置した時の膜厚比率B/Aと
、基板(1)の状態を調べた(試料No.6)。尚、タ
ーゲット(12)の中心Pと回転テーブル(11)の中
心Oとは同一の垂線(17)上にある。以上の結果を表
1に示す。
In the above-described manufacturing method, when the step of forming the ferromagnetic metal thin film (4) shown in FIG. 11) and place it at the center O of the target (1).
A straight line (13
) and the perpendicular line (14) to the top surface of the substrate (1) (hereinafter referred to as the incident angle) θ is 0°, the film thickness A of the ferromagnetic metal thin film (4) on the top surface of the substrate (1) The film thickness ratio B/A (see FIG. 1) with the film thickness B of the thinnest part of the ferromagnetic metal thin film (4) in the strain dividing groove (3) is 0.8 (Sample No. 1).
). In this case, the warpage of the substrate (1) after film formation is large, resulting in poor yield in post-processing. Further, as shown in FIGS. 11 and 12, the center Q of the substrate (1) is removed from the center O of the rotary table (11), and the strain dividing groove (3) is aligned with the target (12).
), and the film thickness ratio B/A when the substrate (1) is placed parallel to the tangent line (16) of the concentric circle (15) with a predetermined incident angle θ, and the substrate (1 ) (Samples Nos. 2 to 5). Furthermore, as shown in FIGS. 13 and 14, the center Q of the substrate (1) is removed from the center O of the rotary table (11), and the strain dividing groove (3) is aligned with the target (1).
The film thickness ratio B/A and the condition of the substrate (1) were investigated when the substrate (1) was placed so as to be orthogonal to the tangent (16) of the concentric circle (15) centered on the sample No. 2). 6). Note that the center P of the target (12) and the center O of the rotary table (11) are on the same perpendicular line (17). The above results are shown in Table 1.

【0017】[0017]

【表1】[Table 1]

【0018】表1から判るように膜厚比率B/Aが0.
5以下の場合、成膜後の基板(1)の反りは小さく、後
加工での加工歩留りが非常によい。
As can be seen from Table 1, the film thickness ratio B/A is 0.
When it is 5 or less, the warpage of the substrate (1) after film formation is small, and the processing yield in post-processing is very good.

【0019】また、上述の実施例では回転テーブル(1
1)を用いて基板(1)を回転させた状態で成膜を行っ
たが、基板(1)を固定させた状態で成膜を行っても同
様の効果を得ることが出来る。
Furthermore, in the above embodiment, the rotary table (1
1), the film was formed with the substrate (1) rotated, but the same effect can be obtained even if the film is formed with the substrate (1) fixed.

【0020】また、図15及び図16に示すように複数
個のターゲット(12a)(12b)(12c)を使用
した場合、各ターゲット(12a)(12b)(12c
)は回転テーブル(11)の中心Oの同心円上に各ター
ゲット(12a)(12b)(12c)の中心(P1)
(P2)(P3)が位置し、且つ歪分断溝(3)が回転
 テーブル(11)の中心Oの同心円の接線と平行にな
るように配置する。この時、歪分断溝(3)は最も近接
したターゲット(12a)の中心P1の同心円(1 8
)の接線(19)と平行になる。この場合においても、
前述の実施例と同様に所定の入射角度θがあれば膜厚比
率B/Aが0.5以下となる為、基板(1)の反りが小
さくなり、加工歩留りが良好になる。
Furthermore, when a plurality of targets (12a) (12b) (12c) are used as shown in FIGS. 15 and 16, each target (12a) (12b) (12c)
) is the center (P1) of each target (12a) (12b) (12c) on the concentric circle of the center O of the rotary table (11).
(P2) and (P3) are located, and the strain dividing groove (3) is arranged so as to be parallel to the tangent of the concentric circle of the center O of the rotary table (11). At this time, the strain dividing groove (3) is a concentric circle (1 8
) is parallel to the tangent line (19). Even in this case,
As in the previous embodiment, if the predetermined incident angle θ is present, the film thickness ratio B/A will be 0.5 or less, so the warpage of the substrate (1) will be reduced and the processing yield will be good.

【0021】[0021]

【発明の効果】本発明に依れば、基板と強磁性金属薄膜
との間に生じる歪みを小さくすることにより基板の反り
、強磁性金属薄膜の剥離等を抑え、製造歩留りを良好に
した磁気ヘッドの製造方法を提供し得る。
Effects of the Invention According to the present invention, by reducing the strain generated between the substrate and the ferromagnetic metal thin film, the warping of the substrate and the peeling of the ferromagnetic metal thin film are suppressed, and the manufacturing yield is improved. A method for manufacturing a head may be provided.

【図面の簡単な説明】[Brief explanation of the drawing]

【図1】強磁性金属薄膜の被着状態を示す断面図である
FIG. 1 is a cross-sectional view showing the state of adhesion of a ferromagnetic metal thin film.

【図2】製造方法を示す斜視図である。FIG. 2 is a perspective view showing a manufacturing method.

【図3】製造方法を示す斜視図である。FIG. 3 is a perspective view showing a manufacturing method.

【図4】製造方法を示す斜視図である。FIG. 4 is a perspective view showing a manufacturing method.

【図5】製造方法を示す斜視図である。FIG. 5 is a perspective view showing a manufacturing method.

【図6】製造方法を示す斜視図である。FIG. 6 is a perspective view showing a manufacturing method.

【図7】製造方法を示す斜視図である。FIG. 7 is a perspective view showing a manufacturing method.

【図8】製造方法を示す斜視図である。FIG. 8 is a perspective view showing a manufacturing method.

【図9】成膜時の基板の配置を示す上面図である。FIG. 9 is a top view showing the arrangement of substrates during film formation.

【図10】図9のC−C’断面図である。10 is a sectional view taken along line C-C' in FIG. 9;

【図11】成膜時の基板の配置を示す上面図である。FIG. 11 is a top view showing the arrangement of substrates during film formation.

【図12】図11のD−D’断面図である。FIG. 12 is a sectional view taken along line D-D' in FIG. 11;

【図13】成膜時の基板の配置を示す上面図である。FIG. 13 is a top view showing the arrangement of substrates during film formation.

【図14】図13のE−E’断面図である。FIG. 14 is a sectional view taken along line E-E' in FIG. 13;

【図15】成膜時の基板の配置を示す上面図である。FIG. 15 is a top view showing the arrangement of substrates during film formation.

【図16】図15のF−F’断面図である。16 is a sectional view taken along line F-F' in FIG. 15. FIG.

【符号の説明】[Explanation of symbols]

1  基板 1a  上面 2  トラック幅規制溝 3  歪分断溝 4  強磁性金属薄膜 10  コアブロック 1 Board 1a Top surface 2 Track width regulation groove 3 Strain dividing groove 4 Ferromagnetic metal thin film 10 Core block

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】  強磁性酸化物材料よりなる基板の上面
にトラック幅規制溝及び該トラック幅規制溝と交差する
歪分断溝とを形成した後、前記基板の上面に強磁性金属
薄膜を形成し、その後前記基板の上面をギャップスペー
サを介して他の基板に接合してブロックを形成する工程
を有する磁気ヘッドの製造方法において、前記基板上面
の強磁性金属薄膜の膜厚Aと前記歪分断溝内の強磁性金
属薄膜の最も薄い部分の膜厚Bとの膜厚比率B/Aを0
.5以下にしたことを特徴とする磁気ヘッドの製造方法
1. After forming a track width regulating groove and a strain dividing groove intersecting the track width regulating groove on the upper surface of a substrate made of a ferromagnetic oxide material, a ferromagnetic metal thin film is formed on the upper surface of the substrate. , a method for manufacturing a magnetic head comprising the step of thereafter joining the upper surface of the substrate to another substrate via a gap spacer to form a block, the film thickness A of the ferromagnetic metal thin film on the upper surface of the substrate and the strain dividing groove. The film thickness ratio B/A with the film thickness B of the thinnest part of the ferromagnetic metal thin film within is 0.
.. 5 or less.
JP452991A 1991-01-18 1991-01-18 Production of magnetic head Pending JPH04243006A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP452991A JPH04243006A (en) 1991-01-18 1991-01-18 Production of magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP452991A JPH04243006A (en) 1991-01-18 1991-01-18 Production of magnetic head

Publications (1)

Publication Number Publication Date
JPH04243006A true JPH04243006A (en) 1992-08-31

Family

ID=11586576

Family Applications (1)

Application Number Title Priority Date Filing Date
JP452991A Pending JPH04243006A (en) 1991-01-18 1991-01-18 Production of magnetic head

Country Status (1)

Country Link
JP (1) JPH04243006A (en)

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