JPH0423551Y2 - - Google Patents

Info

Publication number
JPH0423551Y2
JPH0423551Y2 JP1987135349U JP13534987U JPH0423551Y2 JP H0423551 Y2 JPH0423551 Y2 JP H0423551Y2 JP 1987135349 U JP1987135349 U JP 1987135349U JP 13534987 U JP13534987 U JP 13534987U JP H0423551 Y2 JPH0423551 Y2 JP H0423551Y2
Authority
JP
Japan
Prior art keywords
water
pipe
branch pipe
tip
human body
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1987135349U
Other languages
English (en)
Japanese (ja)
Other versions
JPS6439728U (enrdf_load_stackoverflow
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1987135349U priority Critical patent/JPH0423551Y2/ja
Publication of JPS6439728U publication Critical patent/JPS6439728U/ja
Application granted granted Critical
Publication of JPH0423551Y2 publication Critical patent/JPH0423551Y2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Massaging Devices (AREA)
JP1987135349U 1987-09-04 1987-09-04 Expired JPH0423551Y2 (enrdf_load_stackoverflow)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1987135349U JPH0423551Y2 (enrdf_load_stackoverflow) 1987-09-04 1987-09-04

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1987135349U JPH0423551Y2 (enrdf_load_stackoverflow) 1987-09-04 1987-09-04

Publications (2)

Publication Number Publication Date
JPS6439728U JPS6439728U (enrdf_load_stackoverflow) 1989-03-09
JPH0423551Y2 true JPH0423551Y2 (enrdf_load_stackoverflow) 1992-06-02

Family

ID=31394893

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1987135349U Expired JPH0423551Y2 (enrdf_load_stackoverflow) 1987-09-04 1987-09-04

Country Status (1)

Country Link
JP (1) JPH0423551Y2 (enrdf_load_stackoverflow)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2563920Y2 (ja) * 1992-03-30 1998-03-04 株式会社イナックス 浴槽用ノズル
JP3510993B2 (ja) 1999-12-10 2004-03-29 トーカロ株式会社 プラズマ処理容器内部材およびその製造方法
US6798519B2 (en) 2002-09-30 2004-09-28 Tokyo Electron Limited Method and apparatus for an improved optical window deposition shield in a plasma processing system
US6837966B2 (en) 2002-09-30 2005-01-04 Tokyo Electron Limeted Method and apparatus for an improved baffle plate in a plasma processing system
US7166200B2 (en) 2002-09-30 2007-01-23 Tokyo Electron Limited Method and apparatus for an improved upper electrode plate in a plasma processing system
US7147749B2 (en) 2002-09-30 2006-12-12 Tokyo Electron Limited Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system
US7137353B2 (en) 2002-09-30 2006-11-21 Tokyo Electron Limited Method and apparatus for an improved deposition shield in a plasma processing system
US7204912B2 (en) 2002-09-30 2007-04-17 Tokyo Electron Limited Method and apparatus for an improved bellows shield in a plasma processing system
US7166166B2 (en) 2002-09-30 2007-01-23 Tokyo Electron Limited Method and apparatus for an improved baffle plate in a plasma processing system
US7780786B2 (en) 2002-11-28 2010-08-24 Tokyo Electron Limited Internal member of a plasma processing vessel
JP4597972B2 (ja) 2003-03-31 2010-12-15 東京エレクトロン株式会社 処理部材上に隣接するコーティングを接合する方法。
KR101016913B1 (ko) 2003-03-31 2011-02-22 도쿄엘렉트론가부시키가이샤 처리요소용 배리어층 및 그의 형성방법
US7552521B2 (en) 2004-12-08 2009-06-30 Tokyo Electron Limited Method and apparatus for improved baffle plate
US7601242B2 (en) 2005-01-11 2009-10-13 Tokyo Electron Limited Plasma processing system and baffle assembly for use in plasma processing system
WO2007013184A1 (ja) 2005-07-29 2007-02-01 Tocalo Co., Ltd. Y2o3溶射皮膜被覆部材およびその製造方法
JP4571561B2 (ja) 2005-09-08 2010-10-27 トーカロ株式会社 耐プラズマエロージョン性に優れる溶射皮膜被覆部材およびその製造方法
US7850864B2 (en) 2006-03-20 2010-12-14 Tokyo Electron Limited Plasma treating apparatus and plasma treating method
US7648782B2 (en) 2006-03-20 2010-01-19 Tokyo Electron Limited Ceramic coating member for semiconductor processing apparatus

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6180026U (enrdf_load_stackoverflow) * 1984-10-30 1986-05-28
JPS624329U (enrdf_load_stackoverflow) * 1985-06-25 1987-01-12

Also Published As

Publication number Publication date
JPS6439728U (enrdf_load_stackoverflow) 1989-03-09

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