JPH0423130U - - Google Patents

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Publication number
JPH0423130U
JPH0423130U JP6454090U JP6454090U JPH0423130U JP H0423130 U JPH0423130 U JP H0423130U JP 6454090 U JP6454090 U JP 6454090U JP 6454090 U JP6454090 U JP 6454090U JP H0423130 U JPH0423130 U JP H0423130U
Authority
JP
Japan
Prior art keywords
plasma
extraction window
disposed
reaction chamber
sample holder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6454090U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP6454090U priority Critical patent/JPH0423130U/ja
Publication of JPH0423130U publication Critical patent/JPH0423130U/ja
Pending legal-status Critical Current

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Description

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は本考案に係るプラズマプロセス装置の
概略縦断面図、第２図は従来装置の概略縦断面図
である。 １……プラズマ生成室、２……導波管、３……
反応室、４……励磁コイル、５……試料保持台、
６，７……遮断板、６ａ，７ａ……プラズマ投射
孔。 FIG. 1 is a schematic vertical cross-sectional view of a plasma processing apparatus according to the present invention, and FIG. 2 is a schematic vertical cross-sectional view of a conventional apparatus. 1... Plasma generation chamber, 2... Waveguide, 3...
Reaction chamber, 4...excitation coil, 5...sample holding stand,
6, 7...Blocking plate, 6a, 7a...Plasma projection hole.

Claims (1)

【実用新案登録請求の範囲】 プラズマ引出窓が設けられた壁面を隔てプラズ
マ生成室と反応室とが連設されており、該反応室
内に、該プラズマ引出窓に対向する試料保持台が
配置されたプラズマプロセス装置において、 試料保持台に対向するプラズマ投射孔が設けら
れた、プラズマイオンの拡散を遮断する遮断板を
前記プラズマ引出窓と前記試料保持台との間に配
設したことを特徴とするプラズマプロセス装置。[Scope of Claim for Utility Model Registration] A plasma generation chamber and a reaction chamber are connected to each other with a wall provided with a plasma extraction window separated from each other, and a sample holding table facing the plasma extraction window is disposed within the reaction chamber. In the plasma processing apparatus, a shielding plate for blocking diffusion of plasma ions, which is provided with a plasma projection hole facing the sample holder, is disposed between the plasma extraction window and the sample holder. plasma processing equipment.
JP6454090U 1990-06-18 1990-06-18 Pending JPH0423130U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6454090U JPH0423130U (en) 1990-06-18 1990-06-18

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6454090U JPH0423130U (en) 1990-06-18 1990-06-18

Publications (1)

Publication Number Publication Date
JPH0423130U true JPH0423130U (en) 1992-02-26

Family

ID=31595580

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6454090U Pending JPH0423130U (en) 1990-06-18 1990-06-18

Country Status (1)

Country Link
JP (1) JPH0423130U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0932127A (en) * 1995-07-13 1997-02-04 Kaneko:Kk Vaporproof structure of house and method of integral panel construction

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63241182A (en) * 1987-03-27 1988-10-06 Matsushita Electric Ind Co Ltd Film forming device
JPH02156088A (en) * 1988-12-07 1990-06-15 Anelva Corp Bias ecr device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63241182A (en) * 1987-03-27 1988-10-06 Matsushita Electric Ind Co Ltd Film forming device
JPH02156088A (en) * 1988-12-07 1990-06-15 Anelva Corp Bias ecr device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0932127A (en) * 1995-07-13 1997-02-04 Kaneko:Kk Vaporproof structure of house and method of integral panel construction

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