JPS64326U - - Google Patents
Info
- Publication number
- JPS64326U JPS64326U JP9509887U JP9509887U JPS64326U JP S64326 U JPS64326 U JP S64326U JP 9509887 U JP9509887 U JP 9509887U JP 9509887 U JP9509887 U JP 9509887U JP S64326 U JPS64326 U JP S64326U
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- partition wall
- generation chamber
- drawer window
- plasma generation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005192 partition Methods 0.000 claims description 3
- 230000005284 excitation Effects 0.000 claims description 2
- 239000010453 quartz Substances 0.000 claims description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 2
- 239000002184 metal Substances 0.000 claims 1
- 238000000605 extraction Methods 0.000 description 2
Landscapes
- Drying Of Semiconductors (AREA)
Description
第１図は本考案に係るプラズマ装置の模式的断
面図、第２図はプラズマ引出窓の部分拡大断面図
、第３図は従来装置におけるプラズマ引出窓の部
分拡大断面図である。
１……プラズマ生成室、２……導波管、３……
試料室、４……励磁コイル、５……隔壁、５ａ…
…プラズマ引出窓、５ｂ……石英板、６……真空
ポンプ、７……載置台、Ｓ……試料。
FIG. 1 is a schematic sectional view of a plasma device according to the present invention, FIG. 2 is a partially enlarged sectional view of a plasma extraction window, and FIG. 3 is a partially enlarged sectional view of a plasma extraction window in a conventional device. 1... Plasma generation chamber, 2... Waveguide, 3...
Sample chamber, 4... Excitation coil, 5... Partition wall, 5a...
...Plasma drawer window, 5b...quartz plate, 6...vacuum pump, 7...mounting table, S...sample.
Claims (1)
プラズマを金属製隔壁に開口した引出窓を通じて
プラズマ生成室から試料室内に導入するようにし
たプラズマ装置において、前記隔壁のプラズマ生
成室側の面及び前記プラズマ引出窓の周面にこれ
を覆うべく石英板を設けたことを特徴とするプラ
ズマ装置。 In a plasma device in which plasma generated by electron cyclotron resonance excitation is introduced from a plasma generation chamber into a sample chamber through a drawer window opened in a metal partition wall, the surface of the partition wall on the plasma generation chamber side and the plasma drawer window A plasma device characterized in that a quartz plate is provided on the circumferential surface to cover it.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9509887U JPS64326U (en) | 1987-06-19 | 1987-06-19 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9509887U JPS64326U (en) | 1987-06-19 | 1987-06-19 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS64326U true JPS64326U (en) | 1989-01-05 |
Family
ID=30959243
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9509887U Pending JPS64326U (en) | 1987-06-19 | 1987-06-19 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS64326U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02197122A (en) * | 1989-01-26 | 1990-08-03 | Fujitsu Ltd | Microwave plasma processor |
| JPH02127031U (en) * | 1989-03-28 | 1990-10-19 |
-
1987
- 1987-06-19 JP JP9509887U patent/JPS64326U/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02197122A (en) * | 1989-01-26 | 1990-08-03 | Fujitsu Ltd | Microwave plasma processor |
| JPH02127031U (en) * | 1989-03-28 | 1990-10-19 |
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