JPH04222862A - Polyimide resin composition, prepreg and laminate thereof - Google Patents
Polyimide resin composition, prepreg and laminate thereofInfo
- Publication number
- JPH04222862A JPH04222862A JP40609490A JP40609490A JPH04222862A JP H04222862 A JPH04222862 A JP H04222862A JP 40609490 A JP40609490 A JP 40609490A JP 40609490 A JP40609490 A JP 40609490A JP H04222862 A JPH04222862 A JP H04222862A
- Authority
- JP
- Japan
- Prior art keywords
- polyimide resin
- resin
- weight
- parts
- polyimide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229920001721 polyimide Polymers 0.000 title claims abstract description 96
- 239000009719 polyimide resin Substances 0.000 title claims abstract description 93
- 239000000203 mixture Substances 0.000 title claims abstract description 30
- 239000011347 resin Substances 0.000 claims abstract description 44
- 229920005989 resin Polymers 0.000 claims abstract description 44
- 239000004641 Diallyl-phthalate Substances 0.000 claims abstract description 19
- 239000011342 resin composition Substances 0.000 claims abstract description 14
- 125000002947 alkylene group Chemical group 0.000 claims abstract description 13
- 239000002904 solvent Substances 0.000 claims abstract description 12
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 10
- 150000004985 diamines Chemical class 0.000 claims abstract description 9
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims abstract description 8
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims abstract description 8
- 229910052794 bromium Inorganic materials 0.000 claims abstract description 8
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 claims abstract description 6
- 239000003822 epoxy resin Substances 0.000 claims abstract description 6
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 6
- 239000000463 material Substances 0.000 claims description 12
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 claims description 5
- 239000004642 Polyimide Substances 0.000 claims 3
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 abstract description 13
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 abstract description 13
- 239000011976 maleic acid Substances 0.000 abstract description 13
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 abstract description 13
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 abstract description 12
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 abstract description 6
- 238000007865 diluting Methods 0.000 abstract description 4
- DZIHTWJGPDVSGE-UHFFFAOYSA-N 4-[(4-aminocyclohexyl)methyl]cyclohexan-1-amine Chemical compound C1CC(N)CCC1CC1CCC(N)CC1 DZIHTWJGPDVSGE-UHFFFAOYSA-N 0.000 abstract description 2
- 125000000325 methylidene group Chemical group [H]C([H])=* 0.000 abstract 1
- 125000004432 carbon atom Chemical group C* 0.000 description 13
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 12
- 238000007747 plating Methods 0.000 description 9
- 239000000126 substance Substances 0.000 description 9
- 239000010410 layer Substances 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 7
- 230000000694 effects Effects 0.000 description 7
- 230000035515 penetration Effects 0.000 description 7
- 230000007423 decrease Effects 0.000 description 6
- 239000003063 flame retardant Substances 0.000 description 6
- 238000000465 moulding Methods 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 5
- 239000011229 interlayer Substances 0.000 description 5
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 4
- 239000000835 fiber Substances 0.000 description 4
- 239000012778 molding material Substances 0.000 description 4
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 3
- 239000011889 copper foil Substances 0.000 description 3
- 230000003247 decreasing effect Effects 0.000 description 3
- 238000009472 formulation Methods 0.000 description 3
- 238000010030 laminating Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 230000003746 surface roughness Effects 0.000 description 3
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- 239000003085 diluting agent Substances 0.000 description 2
- 238000005553 drilling Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000005538 encapsulation Methods 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- -1 ethylene anhydride Chemical class 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 125000002950 monocyclic group Chemical group 0.000 description 2
- 239000004745 nonwoven fabric Substances 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 2
- 239000001294 propane Substances 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- HIDBROSJWZYGSZ-UHFFFAOYSA-N 1-phenylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=CC=C1 HIDBROSJWZYGSZ-UHFFFAOYSA-N 0.000 description 1
- ZVDSMYGTJDFNHN-UHFFFAOYSA-N 2,4,6-trimethylbenzene-1,3-diamine Chemical group CC1=CC(C)=C(N)C(C)=C1N ZVDSMYGTJDFNHN-UHFFFAOYSA-N 0.000 description 1
- BWAPJIHJXDYDPW-UHFFFAOYSA-N 2,5-dimethyl-p-phenylenediamine Chemical compound CC1=CC(N)=C(C)C=C1N BWAPJIHJXDYDPW-UHFFFAOYSA-N 0.000 description 1
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- AYKYXWQEBUNJCN-UHFFFAOYSA-N 3-methylfuran-2,5-dione Chemical compound CC1=CC(=O)OC1=O AYKYXWQEBUNJCN-UHFFFAOYSA-N 0.000 description 1
- OFNISBHGPNMTMS-UHFFFAOYSA-N 3-methylideneoxolane-2,5-dione Chemical compound C=C1CC(=O)OC1=O OFNISBHGPNMTMS-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- VIDPINWAGZKWJR-UHFFFAOYSA-N 4-(4,4-diaminocyclohexa-1,5-dien-1-yl)oxycyclohexa-2,4-diene-1,1-diamine Chemical compound C1=CC(N)(N)CC=C1OC1=CCC(N)(N)C=C1 VIDPINWAGZKWJR-UHFFFAOYSA-N 0.000 description 1
- BLMSGSGJGUHKFW-UHFFFAOYSA-N 4-[(4-aminophenyl)-diphenylsilyl]aniline Chemical compound C1=CC(N)=CC=C1[Si](C=1C=CC(N)=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 BLMSGSGJGUHKFW-UHFFFAOYSA-N 0.000 description 1
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical group CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 1
- 238000005698 Diels-Alder reaction Methods 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- IJHNSHDBIRRJRN-UHFFFAOYSA-N N,N-dimethyl-3-phenyl-3-(2-pyridinyl)-1-propanamine Chemical compound C=1C=CC=NC=1C(CCN(C)C)C1=CC=CC=C1 IJHNSHDBIRRJRN-UHFFFAOYSA-N 0.000 description 1
- HEHUZGFZNPSQMW-UHFFFAOYSA-N NC1=CC=C(C=C1)C(C1=CC=C(C=C1)N)[PH2]=O Chemical compound NC1=CC=C(C=C1)C(C1=CC=C(C=C1)N)[PH2]=O HEHUZGFZNPSQMW-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- FDLQZKYLHJJBHD-UHFFFAOYSA-N [3-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC(CN)=C1 FDLQZKYLHJJBHD-UHFFFAOYSA-N 0.000 description 1
- ISKQADXMHQSTHK-UHFFFAOYSA-N [4-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=C(CN)C=C1 ISKQADXMHQSTHK-UHFFFAOYSA-N 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- 125000000732 arylene group Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical compound C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 description 1
- IWZNWGDJJJKIOC-UHFFFAOYSA-N bis(3-aminophenyl)methyl-oxidophosphanium Chemical compound NC=1C=C(C=CC1)C(C1=CC(=CC=C1)N)[PH2]=O IWZNWGDJJJKIOC-UHFFFAOYSA-N 0.000 description 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 125000006165 cyclic alkyl group Chemical group 0.000 description 1
- VKIRRGRTJUUZHS-UHFFFAOYSA-N cyclohexane-1,4-diamine Chemical compound NC1CCC(N)CC1 VKIRRGRTJUUZHS-UHFFFAOYSA-N 0.000 description 1
- UKJLNMAFNRKWGR-UHFFFAOYSA-N cyclohexatrienamine Chemical group NC1=CC=C=C[CH]1 UKJLNMAFNRKWGR-UHFFFAOYSA-N 0.000 description 1
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Natural products C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- 239000012784 inorganic fiber Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- KQSABULTKYLFEV-UHFFFAOYSA-N naphthalene-1,5-diamine Chemical compound C1=CC=C2C(N)=CC=CC2=C1N KQSABULTKYLFEV-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 229960001190 pheniramine Drugs 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- SFLGSKRGOWRGBR-UHFFFAOYSA-N phthalane Chemical compound C1=CC=C2COCC2=C1 SFLGSKRGOWRGBR-UHFFFAOYSA-N 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- VHNQIURBCCNWDN-UHFFFAOYSA-N pyridine-2,6-diamine Chemical compound NC1=CC=CC(N)=N1 VHNQIURBCCNWDN-UHFFFAOYSA-N 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/0353—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
Landscapes
- Reinforced Plastic Materials (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は、プリント配線板などに
供されるポリイミド樹脂組成物、この樹脂組成物を用い
たポリイミド樹脂のプリプレグ、およびこのプリプレグ
が硬化したポリイミド樹脂の積層板に関するものである
。[Field of Industrial Application] The present invention relates to a polyimide resin composition used for printed wiring boards, etc., a polyimide resin prepreg using this resin composition, and a polyimide resin laminate obtained by curing this prepreg. be.
【0002】0002
【従来の技術】従来よりポリイミド樹脂やエポキシ樹脂
は、積層板用等の樹脂として多用されている。なかでも
、ポリイミド樹脂は特開昭59−20659号公報、特
開昭61−40322号公報に記載のごとく、高密度実
装用の高多層配線基板に多用されてきている。2. Description of the Related Art Polyimide resins and epoxy resins have been widely used as resins for laminated boards and the like. Among these, polyimide resins have been widely used in highly multilayer wiring boards for high-density packaging, as described in Japanese Patent Laid-Open Nos. 59-20659 and 61-40322.
【0003】しかしながら、近年、ポリイミド樹脂の積
層板において、コンピュ−タ−をはじめ半導体装置を使
った電子機械装置の高速化に対応し、電気信号の伝播速
度の高速化のための誘電率の低減化と、多層化がますま
す進展する中で信頼性向上のためのスルホールめっきの
染み込みの阻止化と、さらに、安全性の向上などが強く
切望されていた。However, in recent years, the dielectric constant of polyimide resin laminates has been reduced in order to increase the propagation speed of electrical signals in response to the increasing speed of computers and other electromechanical devices using semiconductor devices. As the number of layers increases, there is a strong desire to prevent penetration of through-hole plating in order to improve reliability, and to improve safety.
【0004】0004
【発明が解決しょうとする課題】本発明は、電気信号の
伝播速度の高速化に適合するための積層板の誘電率の低
減化、スルホ−ル信頼性を高めるための樹脂の基材への
良好な含浸性を確保しスルホールめっきの染み込みの阻
止化、さらに、難燃性による安全性の向上を可能にする
ことのできるポリイミド樹脂組成物、そのプリプレグ、
およびその積層板を提供することにある。[Problems to be Solved by the Invention] The present invention aims to reduce the dielectric constant of a laminate in order to adapt to higher propagation speeds of electrical signals, and to improve the through-hole reliability of resin base materials. A polyimide resin composition that can ensure good impregnability, prevent penetration of through-hole plating, and further improve safety due to flame retardancy, a prepreg thereof,
and to provide a laminate thereof.
【0005】[0005]
【問題を解決するための手段】本発明は、上記の点に鑑
みて為されたものである。本発明者らは、一般に知られ
ている付加型ポリイミド樹脂について誘電率を低減化さ
せる研究を行った結果、誘電率を低下させるのに有効な
化学構造とその量的な寄与を見出した。加えて、ジアリ
ルフタレート(以下DAPと記載する)を所定量配合す
ると、さらに、誘電率が低下することを見出した。なお
、DAPを用いると、樹脂の固有粘度が低下し、樹脂の
基材への含浸性が良好になり均質で安定したプリプレグ
を得ることができ、スルホ−ル信頼性に優れた低誘電率
の積層板を得ることができるポリイミド樹脂組成物、そ
のプリプレグを見出したのである。さらに、反応基を有
する臭素化樹脂を所定量配合することにより、接着性の
低下、耐熱性の低下などの副作用を引き起こさず、難燃
性を有する低誘電率、優れたスルホール信頼性を兼備し
た積層板を得ることができるポリイミド樹脂組成物、そ
のプリプレグを見出したのである。[Means for Solving the Problems] The present invention has been made in view of the above points. The present inventors conducted research on reducing the dielectric constant of commonly known addition-type polyimide resins, and as a result, discovered a chemical structure effective for lowering the dielectric constant and its quantitative contribution. In addition, it has been found that when a predetermined amount of diallyl phthalate (hereinafter referred to as DAP) is blended, the dielectric constant further decreases. Furthermore, when DAP is used, the intrinsic viscosity of the resin is reduced, and the impregnation of the resin into the base material is improved, making it possible to obtain a homogeneous and stable prepreg. We have discovered a polyimide resin composition and its prepreg that can be used to produce laminates. Furthermore, by blending a predetermined amount of brominated resin with reactive groups, it does not cause side effects such as reduced adhesion or heat resistance, and has flame retardant, low dielectric constant, and excellent through-hole reliability. We have discovered a polyimide resin composition and its prepreg that can be used to produce laminates.
【0006】ポリイミド樹脂組成物は、1)ポリイミド
樹脂、2)前記ポリイミド樹脂100重量部に対して2
0〜200重量部の範囲となる量で配合されるDAP、
3)および、促進剤、溶媒などからなることを特徴とす
るものであり、さらに、難燃性をえるためにはポリイミ
ド樹脂100重量部に対して臭素含有重量で1〜50重
量部の範囲の反応基を有する臭素化樹脂を配合してなる
ことを特徴とするものである。The polyimide resin composition contains 1) polyimide resin, 2) 2 parts by weight based on 100 parts by weight of the polyimide resin.
DAP blended in an amount ranging from 0 to 200 parts by weight,
3) It is characterized by comprising an accelerator, a solvent, etc. Furthermore, in order to obtain flame retardancy, a bromine content range of 1 to 50 parts by weight is added to 100 parts by weight of the polyimide resin. It is characterized by containing a brominated resin having a reactive group.
【0007】また、ポリイミド樹脂のプリプレグは、1
)ポリイミド樹脂、2)前記ポリイミド樹脂100重量
部に対して20〜200重量部の範囲となる量で配合さ
れるDAP、3)および、促進剤、溶媒などからなるポ
リイミド樹脂組成物を基材に含浸させ、半硬化させたこ
とを特徴とするものであり、さらに、難燃性を得るため
にはポリイミド樹脂100重量部に対して臭素含有重量
で1〜50重量部の範囲の反応基を有する臭素化樹脂を
配合してなることを特徴とするものである。[0007] Furthermore, polyimide resin prepreg has 1
) a polyimide resin, 2) DAP blended in an amount ranging from 20 to 200 parts by weight per 100 parts by weight of the polyimide resin, 3) a polyimide resin composition consisting of an accelerator, a solvent, etc. as a base material. It is characterized by being impregnated and semi-cured, and furthermore, in order to obtain flame retardance, it has a reactive group in the range of 1 to 50 parts by weight of bromine per 100 parts by weight of the polyimide resin. It is characterized by containing a brominated resin.
【0008】また、ポリイミド樹脂の積層板は、1)ポ
リイミド樹脂、2)前記ポリイミド樹脂100重量部に
対して20〜200重量部の範囲となる量で配合される
DAP、3)および、促進剤、溶媒などからなるポリイ
ミド樹脂組成物を基材に含浸させ、半硬化させたプリプ
レグを1枚以上、積層して硬化させたことを特徴とする
ものであり、さらに、難燃性を得るためにはポリイミド
樹脂100重量部に対して臭素含有重量で1〜50重量
部の範囲の反応基を有する臭素化樹脂を配合してなるこ
とを特徴とするものである。[0008] The polyimide resin laminate also contains 1) a polyimide resin, 2) DAP blended in an amount ranging from 20 to 200 parts by weight per 100 parts by weight of the polyimide resin, 3) and an accelerator. , a base material is impregnated with a polyimide resin composition consisting of a solvent, etc., and one or more sheets of semi-cured prepreg are laminated and cured. is characterized in that it contains a brominated resin having a reactive group in an amount of 1 to 50 parts by weight based on bromine content per 100 parts by weight of a polyimide resin.
【0009】以下に、これらを詳しく説明する。ポリイ
ミド樹脂は、不飽和ビス−イミド類とジアミン類などを
反応させて得ることができる。このようにして得るポリ
イミド樹脂には、アルキル基または、メチレン基を除く
アルキレン基の少なくとも一方をポリイミド樹脂中に1
1重量%以上含有するのが好ましい。なぜならば、アル
キル基または、メチレン基を除くアルキレン基が樹脂の
分子中に11重量%未満の化学構造の場合には、ポリイ
ミド樹脂の誘電率を低下させることができないからであ
る。[0009] These will be explained in detail below. Polyimide resins can be obtained by reacting unsaturated bis-imides with diamines and the like. In the polyimide resin obtained in this way, at least one of an alkyl group or an alkylene group other than a methylene group is added to the polyimide resin.
The content is preferably 1% by weight or more. This is because if the chemical structure includes less than 11% by weight of alkyl groups or alkylene groups other than methylene groups in the resin molecule, the dielectric constant of the polyimide resin cannot be lowered.
【0010】前記不飽和ビス−イミドは明細書末の化学
式1の(a)で式(a)中Dは炭素−炭素間の二重結合
を含む2価の基を表し、Aは少なくとも2個の炭素原子
を含む2価の基を表すものを、また、ジアミンは次の式
(b)で式(b)中のBは30個以下の炭素原子を有す
る2価の基で表すものをそれぞれ用いることができる。
H2 N−B−NH2 (b
)なお、式(a)のAおよび、式(b)のBは同一か、
または異なることができ、また13個よりも少ない炭素
原子を持っている直鎖のもしくは分岐したアルキレン基
か、環の中に5個もしくは6個の炭素原子をもっている
環状アルキレン基か、O,NおよびS原子の少なくとも
1個を含む異種環状基か、またはフェニレンもしくは多
環状芳香族基であることもできる。これらの種々の基は
反応温度70〜170℃、反応時間30〜350分の反
応条件のもとで不必要な副反応を与えない置換基をもっ
ていてもよい。The unsaturated bis-imide is represented by (a) in Chemical Formula 1 at the end of the specification, in which D represents a divalent group containing a carbon-carbon double bond, and A represents at least two Diamines are represented by the following formula (b), and B in formula (b) is a divalent group having 30 or less carbon atoms. Can be used. H2 NB-NH2 (b
) Furthermore, are A in formula (a) and B in formula (b) the same?
or a straight-chain or branched alkylene group having fewer than 13 carbon atoms or a cyclic alkylene group having 5 or 6 carbon atoms in the ring, O,N and a heterocyclic group containing at least one S atom, or a phenylene or polycyclic aromatic group. These various groups may have substituents that do not cause unnecessary side reactions under the reaction conditions of a reaction temperature of 70 to 170°C and a reaction time of 30 to 350 minutes.
【0011】式(a)のAおよび、式(b)のBはまた
、沢山のフェニレン基か、または直接にまたは2価の原
子または次の様な群で結合された脂環状の基を表わすこ
ともできる。たとえば、それらは酸素もしくは硫黄か、
炭素原子1個から3個のアルキレンの群か、または次の
群の内の1つである。A in formula (a) and B in formula (b) also represent a number of phenylene groups or alicyclic groups bonded directly or by divalent atoms or groups such as You can also do that. For example, are they oxygen or sulfur?
An alkylene group of 1 to 3 carbon atoms or one of the following groups:
【0012】−NR4 −,−P(O)R3 −,−N
=N−, −O=N−,−CO−O−,−CONH−
,−SiR3 R4−, −NY−CO−X−CO−
NY−,−O−CO−X−CO−O−,−SO2 −,
および、明細書末の化学式1の(c)の群の中の一つな
ど。これら式中のR3 ,R4 およびYはおのおの炭
素原子1個から4個のアルキル基、環中に5個もしく6
個の炭素原子を持つ環状アルキル基、もしくはフェニル
もしくは多環状芳香族基を表し、Xは13個よりも少な
い炭素原子を持っている直鎖もしくは分岐したアルキレ
ン基、環の中に5個もしくは6個の炭素原子をもってい
る環状アルキレン基、または単環もしくは多環状アリレ
ン基を表す。-NR4 -, -P(O)R3 -, -N
=N-, -O=N-, -CO-O-, -CONH-
, -SiR3 R4-, -NY-CO-X-CO-
NY-, -O-CO-X-CO-O-, -SO2 -,
and one of the group (c) of chemical formula 1 at the end of the specification. In these formulas, R3, R4 and Y each have 1 to 4 carbon atoms, and 5 or 6 carbon atoms in the ring.
represents a cyclic alkyl group having 5 or 6 carbon atoms, or a phenyl or polycyclic aromatic group, where X is a linear or branched alkylene group having fewer than 13 carbon atoms, represents a cyclic alkylene group having 5 carbon atoms, or a monocyclic or polycyclic arylene group.
【0013】なお、前記の式(a)の基Dは明細書末の
化学式1の(d)のエチレン系無水物から誘導されるも
ので、例えばマレイン酸無水物、シトラコン酸無水物、
テトラヒドロフタル酸無水物、イタコン酸無水物、およ
びシクロジエンとこれらの無水物の1つとの間に起こる
ディ−ルスアルダ−反応の生成物を表すこともできる。The group D in formula (a) above is derived from the ethylene anhydride of chemical formula 1 (d) at the end of the specification, such as maleic anhydride, citraconic anhydride,
It can also represent tetrahydrophthalic anhydride, itaconic anhydride, and the product of a Diels-Alder reaction between a cyclodiene and one of these anhydrides.
【0014】使用することのできる式(a)の好ましい
不飽和ビス−イミドには次のものが挙げられる。Preferred unsaturated bis-imides of formula (a) that can be used include:
【0015】マレイン酸N・N−エチレン−ビス−イミ
ド、マレイン酸N・N−ヘキサメチレン−ビス−イミド
、マレイン酸N・N−メタフェニレン−ビス−イミド、
マレイン酸N・N−パラフェニレン−ビス−イミド、マ
レイン酸N・N−4・4−ジフェニルメタン−ビス−イ
ミド〔通常、N・N−メチレンビス(N−フェニルマレ
イミド)とも言われる〕、マレイン酸N・N−4・4−
ジフェニルエ−テル−ビス−イミド、マレイン酸N・N
−4・4−ジフェニルスルフォン−ビス−イミド、マレ
イン酸N・N−4・4−ジシクロヘキシルメタン−ビス
−イミド、マレイン酸N・N−α・α−4・4−ジメチ
レンシクロヘキサン−ビス−イミド、マレイン酸N・N
−メタキシリレン−ビス−イミド、マレイン酸N・N−
ジフェニルシクロキサン−ビス−イミド、1・3−ビス
(2−p−アニリノプロピリデン)ベンゼン−ビス−イ
ミド、1・4−ビス(2−p−アニリノプロピリデン)
ベンゼン−ビス−イミド、1・4−ビス(2−m−アニ
リノプロピリデン)ベンゼン−ビス−イミド、4・4−
メチレンジ−2・6−キシリジン−ビス−イミド、4・
4−メチレンジ−2・6−ジエチルアニリン−ビス−イ
ミド、4・4−ジアミノ−3・3−ジエチル−5・5−
ジメチルジフェニルメタン−ビス−イミド、4・4−メ
チレンジ−2・6−ジイソプロピルアニリン−ビス−イ
ミド、2・5−ジメチル−p−フェニレンジアミン−ビ
ス−イミド、2・2−ビス(4−アミノフェニル)プロ
パン−ビス−イミド、2・4−ジアミノメシチレン−ビ
ス−イミド、および、3・5−ジエチル−2・4−トリ
レンジアミン−ビス−イミドなど。Maleic acid N·N-ethylene-bis-imide, maleic acid N·N-hexamethylene-bis-imide, maleic acid N·N-metaphenylene-bis-imide,
Maleic acid N.N-paraphenylene-bis-imide, maleic acid N.N-4.4-diphenylmethane-bis-imide [usually also referred to as N.N-methylenebis (N-phenylmaleimide)], maleic acid N.・N-4・4-
Diphenyl ether bis-imide, maleic acid N/N
-4,4-diphenylsulfone-bis-imide, maleic acid N・N-4,4-dicyclohexylmethane-bis-imide, maleic acid N・N-α・α-4,4-dimethylenecyclohexane-bis-imide , maleic acid N・N
- metaxylylene-bis-imide, maleic acid N/N-
Diphenylcycloxane-bis-imide, 1,3-bis(2-p-anilinopropylidene)benzene-bis-imide, 1,4-bis(2-p-anilinopropylidene)
Benzene-bis-imide, 1,4-bis(2-m-anilinopropylidene)benzene-bis-imide, 4,4-
Methylenedi-2,6-xylidine-bis-imide, 4.
4-methylenedi-2,6-diethylaniline-bis-imide, 4,4-diamino-3,3-diethyl-5,5-
Dimethyldiphenylmethane-bis-imide, 4,4-methylenedi-2,6-diisopropylaniline-bis-imide, 2,5-dimethyl-p-phenylenediamine-bis-imide, 2,2-bis(4-aminophenyl) Propane-bis-imide, 2,4-diaminomesitylene-bis-imide, 3,5-diethyl-2,4-tolylenediamine-bis-imide, and the like.
【0016】また、使用することのできる式(b)のジ
アミンの実例には次のものがある。4・4−ジアミノジ
シクロヘキシルメタン、1・4−ジアミノシクロヘキサ
ン、2・6−ジアミノピリジン、メタフェニンジアミン
、パラフェニンジアミン、4・4−ジアミノジフェニル
メタン、2・2−ビス−(4−アミノフェニル)プロパ
ン、ベンジジン、4・4−ジアミノフェニルオキサイド
、4・4−ジアミノジフェニルサルファイド、4・4−
ジアミノジフェニルスルフォン、ビス−(4−アミノフ
ェニル)ジフェニルシラン、ビス−(4−アミノフェニ
ル)メチルホスフィンオキサイド、ビス−(3−アミノ
フェニル)メチルホスフィンオキサイド、ビス−(4−
アミノフェニル)フェニルホスフィンオキサイド、ビス
−(4−アミノフェニル)フェニラミン、1・5−ジア
ミノナフタレン、メタキシリレンジアミン、パラキシリ
レンジアミン、1・1−ビス−(パラアミノフェニル)
フタラン、ヘキサメチレンジアミン、1・3−ビス(2
−p−アニリノプロピリデン)ベンゼン、1・4−ビス
(2−p−アニリノプロピリデン)ベンゼン、1・4−
ビス(2−m−アニリノプロピリデン)ベンゼン、4・
4−メチレンジ−2・6−キシリジン、4・4−メチレ
ンジ−2・6−ジエチルアニリン、4・4−ジアミノ−
3・3−ジエチル−5・5−ジメチルジフェニルメタン
、4・4−メチレンジ−2・6−ジイソプロピルアニリ
ン、2・5−ジメチル−p−フェニレンジアミン、2・
2−ビス(4−アミノフェニル)プロパン、2・4−ジ
アミノメシチレン、および、3・5−ジエチル−2・4
−トリレンジアミンなど。Examples of diamines of formula (b) that can be used include the following: 4,4-diaminodicyclohexylmethane, 1,4-diaminocyclohexane, 2,6-diaminopyridine, metaphenynediamine, paraphenynediamine, 4,4-diaminodiphenylmethane, 2,2-bis-(4-aminophenyl) ) Propane, benzidine, 4,4-diaminophenyl oxide, 4,4-diaminodiphenyl sulfide, 4,4-
Diaminodiphenylsulfone, bis-(4-aminophenyl)diphenylsilane, bis-(4-aminophenyl)methylphosphine oxide, bis-(3-aminophenyl)methylphosphine oxide, bis-(4-
(aminophenyl) phenylphosphine oxide, bis-(4-aminophenyl) pheniramine, 1,5-diaminonaphthalene, meta-xylylene diamine, para-xylylene diamine, 1,1-bis-(para-aminophenyl)
Phthalane, hexamethylene diamine, 1,3-bis(2
-p-anilinopropylidene)benzene, 1,4-bis(2-p-anilinopropylidene)benzene, 1,4-
Bis(2-m-anilinopropylidene)benzene, 4.
4-methylenedi-2,6-xylidine, 4,4-methylenedi-2,6-diethylaniline, 4,4-diamino-
3,3-diethyl-5,5-dimethyldiphenylmethane, 4,4-methylenedi-2,6-diisopropylaniline, 2,5-dimethyl-p-phenylenediamine, 2.
2-bis(4-aminophenyl)propane, 2,4-diaminomesitylene, and 3,5-diethyl-2,4
-Tolylene diamine etc.
【0017】そして、上記のビス−イミドとジアミンと
を反応させることによって付加型のポリイミド樹脂を調
製することができる。ビス−イミドとジアミンとの配合
比は、モル比でジアミン1に対してビス−イミドが1.
7〜2.5の範囲が好ましい。1.7よりビス−イミド
が少ないと高分子量の生成が多くなって硬化時間が短く
なり取扱に問題が生じる傾向があり、また、2.5より
ビス−イミドが多いと未反応原料が多く残存し易くなる
。反応はビス−イミドとジアミンとをN−メチルピロリ
ドン(NMP)やN,N−ジメチルアセトアミド(DM
Ac)などの溶剤に溶解した状態で行うことができるも
のであり、反応の際の加熱温度は70〜170℃程度の
範囲で行うことができ、反応時間は30〜350分程度
の範囲で行うことができる。An addition type polyimide resin can be prepared by reacting the above bis-imide with a diamine. The molar ratio of bis-imide and diamine is 1 part bis-imide to 1 part diamine.
The range of 7 to 2.5 is preferable. If the bis-imide content is less than 1.7, the production of high molecular weight increases, resulting in a short curing time, which tends to cause problems in handling, while if the bis-imide content is more than 2.5, a large amount of unreacted raw material remains. It becomes easier to do. The reaction involves combining bis-imide and diamine with N-methylpyrrolidone (NMP) or N,N-dimethylacetamide (DM).
It can be carried out in a state dissolved in a solvent such as Ac), and the heating temperature during the reaction can be carried out in the range of about 70 to 170°C, and the reaction time can be carried out in the range of about 30 to 350 minutes. be able to.
【0018】本発明のポリイミド樹脂組成物は、前記の
ポリイミド樹脂100重量部(以下、部と記す)にDA
Pを20〜200部の範囲となる量を配合し、さらに、
促進剤としてイミダゾ−ル類や有機過酸化物などと、希
釈溶媒としてジメチルホルムアミド(DMF),DMA
c,ジオキサン、NMP,MEKなどの中から適宜、単
独または、混合して用いたものからなる樹脂組成物であ
る。DAPの添加量を増すと、それから得られる積層板
の誘電率が低下する傾向にあり、10部未満の添加では
誘電率の低下の効果が殆ど認められず、200部を超し
て使用すると誘電率は低下するが、積層板として硬く、
脆いものとなり好ましくない。また、DAPは反応性希
釈剤としても作用するために、樹脂組成物の固有粘度と
表面張力を低下させる。したがって、基材の繊維間に樹
脂組成物が良く浸透し、基材への樹脂の充填が著しく向
上したプリプレグを得ることができる。そして、このプ
リプレグが硬化した積層板においては、スルホ−ルメッ
キのメッキの染み込み長さが著しく短かくなり、同時に
スルホ−ルの内壁が著しく平滑に仕上がり、これらによ
ってスルホ−ルと内層回路との絶縁性が確保されスルホ
−ルの信頼性が著しく向上するなどの効果を得ることが
できる。The polyimide resin composition of the present invention contains DA in 100 parts by weight (hereinafter referred to as parts) of the polyimide resin.
P is blended in an amount ranging from 20 to 200 parts, and further,
Imidazole and organic peroxides are used as accelerators, and dimethylformamide (DMF) and DMA are used as diluting solvents.
It is a resin composition consisting of one or a mixture of one or more of the following: c, dioxane, NMP, MEK, etc. As the amount of DAP added increases, the dielectric constant of the resulting laminate tends to decrease; when less than 10 parts is added, there is almost no effect of lowering the dielectric constant, and when more than 200 parts are used, the dielectric constant decreases. The rate decreases, but it is hard as a laminate,
This is not desirable as it becomes brittle. Furthermore, since DAP also acts as a reactive diluent, it lowers the intrinsic viscosity and surface tension of the resin composition. Therefore, the resin composition penetrates well between the fibers of the base material, and it is possible to obtain a prepreg in which the filling of the resin into the base material is significantly improved. In the laminates cured with this prepreg, the penetration length of the through-hole plating is significantly shortened, and at the same time, the inner walls of the through-holes are finished extremely smooth, which improves the insulation between the through-holes and the inner layer circuits. Effects such as ensuring properties and significantly improving the reliability of the through hole can be obtained.
【0019】電子機械装置の安全化のために要求される
難燃性の確保には、難燃剤として反応基を有する臭素化
樹脂を前記ポリイミド樹脂組成物に配合するのが好まし
く、特に、反応基を有する臭素化樹脂の配合量をポリイ
ミド樹脂100重量部に対して、臭素含有重量で1〜5
0重量部の範囲で用いるのが好ましい。その理由は、1
重量部未満では、難燃性が得られず、50重量部を超し
て用いると得られる積層板の耐熱性が悪くなり、誘電率
も上昇するなど性能が低下するからである。また、反応
基を有する臭素化樹脂が好ましいのは、難燃剤を前記ポ
リイミド樹脂の側鎖、末端の基と反応させ、そのポリイ
ミド樹脂構造の骨格内に取り込むことによって、初めて
層間接着力、スルホ−ル信頼性、耐熱性などと難燃性の
性能を兼備したものが得られるからである。In order to ensure the flame retardancy required for the safety of electronic mechanical devices, it is preferable to blend a brominated resin having a reactive group as a flame retardant into the polyimide resin composition. The blending amount of the brominated resin having a bromine content is 1 to 5 by weight based on 100 parts by weight of the polyimide resin.
It is preferable to use it in a range of 0 parts by weight. The reason is 1.
If the amount is less than 50 parts by weight, flame retardancy cannot be obtained, and if the amount exceeds 50 parts by weight, the heat resistance of the resulting laminate will be poor and the dielectric constant will also increase, resulting in decreased performance. Furthermore, brominated resins having reactive groups are preferable because the flame retardant is reacted with the side chains and terminal groups of the polyimide resin, and is incorporated into the skeleton of the polyimide resin structure. This is because it is possible to obtain a product that combines reliability, heat resistance, and flame retardant performance.
【0020】したがって、反応基として、エポキシ基、
アリル基、ビニル基などを有する炭素原子1個から4個
のアルキル、環中に5個もしくは6個の炭素原子を持つ
環状アルキル、もしくはフェニルもしくは多環状芳香族
、または、13個よりも少ない炭素原子を持っている直
鎖もしくは分岐したアルキレン、環の中に5個もしくは
6個の炭素原子をもっている環状アルキレン、または単
環もしくは多環状アリレンなどの臭素化樹脂の中から適
宜用いることができる。特に、好ましい反応基としては
、耐熱性、層間接着力を維持、もしくは向上させる点で
、エポキシ基をあげることができる。[0020] Therefore, as a reactive group, an epoxy group,
Alkyl of 1 to 4 carbon atoms with allyl group, vinyl group, etc., cyclic alkyl with 5 or 6 carbon atoms in the ring, or phenyl or polycyclic aromatic, or less than 13 carbon atoms A brominated resin such as a linear or branched alkylene having atoms, a cyclic alkylene having 5 or 6 carbon atoms in the ring, or a monocyclic or polycyclic arylene can be used as appropriate. In particular, an epoxy group can be mentioned as a preferable reactive group since it maintains or improves heat resistance and interlayer adhesive strength.
【0021】以上のポリイミド樹脂組成物からプリプレ
グを得るには、前記のポリイミド樹脂組成物を基材に含
浸させた後、希釈溶媒を乾燥蒸発させつつポリイミド樹
脂と反応性希釈剤であるDAPとの反応を進行させ基材
中の樹脂組成物を半硬化させて得られたものである。さ
らに難燃性を得るために含有した反応性を有する臭素化
樹脂もこのプリプレグ調製時に、反応基がポリイミド樹
脂の側鎖、末端の基と反応し、ポリイミド樹脂構造の骨
格内に取り込まれるのである。To obtain a prepreg from the above polyimide resin composition, after impregnating the base material with the above polyimide resin composition, the polyimide resin and DAP, which is a reactive diluent, are mixed together while drying and evaporating the diluting solvent. It is obtained by allowing the reaction to proceed and semi-curing the resin composition in the base material. Furthermore, the reactive brominated resin contained in order to obtain flame retardancy reacts with the side chains and terminal groups of the polyimide resin during the preparation of this prepreg, and is incorporated into the skeleton of the polyimide resin structure. .
【0022】前記のポリイミド樹脂組成物を含浸させる
基材の種類は、特に限定されない。通常は、ガラスクロ
ス等が用いられる。この他、石英繊維布等の無機繊維の
布、もしくはこれらの不織布、ポリイミド樹脂繊維の布
や不織布等の高耐熱性有機繊維布等が用いられてもよい
。The type of substrate impregnated with the polyimide resin composition is not particularly limited. Usually, glass cloth or the like is used. In addition, inorganic fiber cloths such as quartz fiber cloths, nonwoven fabrics thereof, and highly heat-resistant organic fiber cloths such as polyimide resin fiber cloths and nonwoven fabrics may be used.
【0023】半硬化させる時の温度は110 〜155
℃で行うのが好ましい。155 ℃を超えると、特に
DAPの反応が進み過ぎ、得られるプリプレグの層間接
着力が低下し、誘電率の低下する効果が小さくなり、1
10 ℃未満では、処理に時間がかかり実用的でないか
らである。半硬化とは、熱硬化性樹脂の硬化過程におい
て、一般にBステ−ジと言われる範囲のものであり、さ
らに熱が加われば樹脂が流動し、硬化反応が起こりえる
状態のものを言う。[0023] The temperature during semi-curing is 110 to 155
Preferably, it is carried out at °C. When the temperature exceeds 155°C, the reaction of DAP in particular progresses too much, the interlayer adhesive strength of the obtained prepreg decreases, and the effect of decreasing the dielectric constant becomes small.
This is because if the temperature is less than 10° C., the treatment takes a long time and is not practical. Semi-cured refers to the range generally referred to as the B stage in the curing process of thermosetting resins, and refers to a state in which the resin flows when heat is applied and a curing reaction can occur.
【0024】次には、前記のポリイミド樹脂のプリプレ
グをを1枚以上積層してポリイミド樹脂の積層板を作る
ことができる。すなわち、必要に応じて、銅、ニッケル
、アルミニウムなどの金属箔あるいは、回路形成された
金属箔などとプリプレグを積層成形してつくられる。
その積層成形は常法により行うことができる。Next, a polyimide resin laminate can be made by laminating one or more of the polyimide resin prepregs described above. That is, it is made by laminating and molding a prepreg with a metal foil such as copper, nickel, or aluminum, or a metal foil with a circuit formed thereon, as necessary. The lamination molding can be performed by a conventional method.
【0025】なお、この積層板には、前記の化学構造の
ポリイミド樹脂に、DAPを配合したポリイミド樹脂組
成物が用いられ、樹脂組成物の基材への充填が十分に行
われている。したがって、この積層板を用いれば、誘電
率が低く、スルホ−ル信頼性が高い積層板を得ることが
可能となり、このDAPを配合したポリイミド樹脂組成
物に、さらに反応基をもつ臭素化樹脂を配合したポリイ
ミド樹脂組成物を用いた積層板においては、層間接着力
、スルホ−ル信頼性、および、耐熱性と難燃性の兼備し
た積層板を得ることが可能となり、多層積層板、特に8
層以上の多層積層板においては、有用な特性を有するこ
とになるのである。[0025] In this laminate, a polyimide resin composition in which DAP is blended with a polyimide resin having the above chemical structure is used, and the base material is sufficiently filled with the resin composition. Therefore, by using this laminate, it is possible to obtain a laminate with a low dielectric constant and high through hole reliability, and a brominated resin having a reactive group is added to the polyimide resin composition containing this DAP. In a laminate using a blended polyimide resin composition, it is possible to obtain a laminate that has interlayer adhesion strength, through-hole reliability, and heat resistance and flame retardancy.
Multilayer laminates with more than one layer have useful properties.
【0026】なお、本発明の樹脂組成物は、以上の記載
に限定されるものではなく、他に電線被覆用樹脂、半導
体封止用樹脂、耐熱性成形材料用樹脂、低誘電率や低吸
湿性成形材料用樹脂としても有用なものである。The resin composition of the present invention is not limited to the above description, and may also be used as resins for covering electric wires, resins for semiconductor encapsulation, resins for heat-resistant molding materials, low dielectric constant and low moisture absorption. It is also useful as a resin for molding materials.
【0027】次に、以上の発明を実施例と比較例によっ
て説明する。Next, the above invention will be explained by referring to examples and comparative examples.
【0028】[0028]
【実施例】実施例1〜8と比較例1、2は、表1の上半
分に示される各々の配合のポリイミド樹脂組成物でなり
、これらの樹脂組成物からなる積層板の特性値を表1の
下半分に示した。[Example] Examples 1 to 8 and Comparative Examples 1 and 2 were made of polyimide resin compositions having the respective formulations shown in the upper half of Table 1, and the characteristic values of laminates made of these resin compositions are shown below. It is shown in the lower half of 1.
【0029】表1のポリイミド樹脂は、それぞれ次のも
のを用いた。#1は、マレイン酸N,N−4・4−ジフ
ェニルメタン−ビス−イミドと4・4−ジアミノジフェ
ニルメタンとから合成されたもので、アルキル基または
、アルキレン基を樹脂の分子中に含有しない。#2は、
1・4−ビス(2−p−アニリノプロピリデン)ベンゼ
ン−ビス−イミドと1・4−ビス(2−m−アニリノプ
ロピリデン)ベンゼンとから合成されたもので、アルキ
ル基を樹脂の分子中に17重量%含有する。The following polyimide resins in Table 1 were used. #1 is synthesized from maleic acid N,N-4.4-diphenylmethane-bis-imide and 4.4-diaminodiphenylmethane, and does not contain an alkyl group or an alkylene group in the resin molecule. #2 is
It is synthesized from 1,4-bis(2-p-anilinopropylidene)benzene-bis-imide and 1,4-bis(2-m-anilinopropylidene)benzene, and the alkyl group is added to the resin. Contains 17% by weight in the molecule.
【0030】難燃剤の臭素化樹脂は、それぞれ明細書末
の化学式1の■、■のものを用い、表1の配合量の前に
■■で種類を明示した。■は、反応型の臭素化フェノ−
ルノボラック型エポキシ樹脂(日本化薬社製、BREN
−S)■は、非反応型の多環状芳香族の臭素化樹脂(グ
レ−トレ−ク社製、BC58)また、促進剤は、いずれ
も2エチル−4メチルイミダゾ−ル( 2E4MZ、四
国化成社製)を、希釈溶媒は、樹脂固形分率が約55〜
70%になるようにDMFをそれぞれに用いた。The brominated resins used as flame retardants are those represented by (1) and (2) in Chemical Formula 1 at the end of the specification, respectively, and the types are specified with (■) in front of the compounding amounts in Table 1. ■ is a reactive brominated phenol.
Lunovolac type epoxy resin (manufactured by Nippon Kayaku Co., Ltd., BREN
-S) ■ is a non-reactive polycyclic aromatic brominated resin (manufactured by Gray Lake Co., Ltd., BC58), and the accelerator is 2-ethyl-4-methylimidazole (2E4MZ, Shikoku Kasei Co., Ltd.). The diluting solvent has a resin solids content of about 55~
DMF was used in each case to give a concentration of 70%.
【0031】表1の実施例1〜3と5〜7および、比較
例1の誘電率の特性値の対比からポリイミド樹脂へのD
APの添加量が増すほど誘電率の低下することが確認で
きた。さらに、実施例1〜3、5〜7の#1のポリイミ
ド樹脂と実施例4、8の#2のポリイミド樹脂の化学構
造の対比から、アルキル基を樹脂の分子中に11重量%
以上含有する#2の場合、一層誘電率の低下の効果を奏
することが確認できた。この誘電率の測定はJIS、C
6481によって行った。From the comparison of the dielectric constant characteristic values of Examples 1 to 3 and 5 to 7 and Comparative Example 1 in Table 1, the D
It was confirmed that the dielectric constant decreased as the amount of AP added increased. Furthermore, from a comparison of the chemical structures of #1 polyimide resin in Examples 1 to 3 and 5 to 7 and #2 polyimide resin in Examples 4 and 8, it was found that 11% by weight of alkyl groups were contained in the resin molecules.
In the case of #2 containing the above, it was confirmed that the effect of further lowering the dielectric constant was achieved. This dielectric constant measurement is based on JIS, C
6481.
【0032】また、実施例5〜8、の反応基を有する反
応型の臭素化樹脂の配合では、実施例3の反応基を持た
ない非反応型の臭素化樹脂の配合に比べ層間接着力、耐
熱性を高水準に維持したまま難燃性を確保できることが
確認できた。この難燃性の試験はUL−94 に準じて
行った。[0032] Furthermore, in the formulations of reactive brominated resins having reactive groups in Examples 5 to 8, the interlayer adhesion strength and It was confirmed that flame retardancy could be ensured while maintaining a high level of heat resistance. This flame retardancy test was conducted according to UL-94.
【0033】次に、表1の樹脂組成物を厚み0.1 m
m、95g/m2 のEガラス布に含浸させ、140
℃の乾燥機中で35〜60分間乾燥させることにより各
々のプリプレグを得た。このプリプレグを用いて積層板
は次のようにして形成した。Next, the resin composition shown in Table 1 was applied to a thickness of 0.1 m.
m, 95 g/m2 E glass cloth impregnated, 140
Each prepreg was obtained by drying for 35 to 60 minutes in a dryer at .degree. A laminate was formed using this prepreg in the following manner.
【0034】前記のプリプレグの両面に18μm の両
面粗面化銅箔を置いて蒸気プレスを用いて、成形温度1
30 ℃、成形圧力30kg/cm2 、成形時間90
分間の条件で積層成形を行い内層プリント配線板用の両
面銅張積層板を得た。このようにして得た両面銅張積層
板の銅箔をエッチング処理して回路形成し、黒化処理す
ることによって内層プリント配線板を作成し、35枚の
内層プリント配線板をそれぞれの間に上記と同じ4枚の
プリプレグを介して重ねると共にその上下にさらに4枚
のプリプレグを介して35μm 厚みの銅箔を重ね、6
mmの金型に納め、蒸気プレスを用いて5 kg/cm
2 の加圧を行いつつ直ちに130 ℃まで加熱し、2
0分間保持した。この後、30kg/cm2 の圧力で
200 ℃に加熱し、120 分間保持した後、圧力を
かけたまま室温まで冷却して両面銅張多層積層板を得た
。[0034] A double-sided roughened copper foil of 18 μm was placed on both sides of the prepreg, and a steam press was used to heat the molding temperature to 1.
30℃, molding pressure 30kg/cm2, molding time 90
Lamination molding was carried out under conditions of 1 minute to obtain a double-sided copper-clad laminate for an inner layer printed wiring board. The copper foil of the double-sided copper-clad laminate thus obtained was etched to form a circuit and blackened to create an inner layer printed wiring board, and 35 inner layer printed wiring boards were placed between each of the above-mentioned inner layer printed wiring boards. The same 4 sheets of prepreg as above are layered, and 35 μm thick copper foil is layered above and below through 4 sheets of prepreg, 6
Place it in a mold of 5 kg/cm using a steam press.
Immediately heat to 130 °C while applying pressure in step 2.
It was held for 0 minutes. Thereafter, it was heated to 200° C. under a pressure of 30 kg/cm 2 and held for 120 minutes, and then cooled to room temperature while the pressure was applied to obtain a double-sided copper-clad multilayer laminate.
【0035】この積層板の層と層の間を90度方向に剥
がしたときの接着力を、1表の特性値の層間接着力〔k
g/cm〕に示した。また、この積層板に0.4 mm
φのドリルビットを用い、40000 rpmの回転数
、1回転当たりの送り速度50μ/revの条件で10
00穴あけ、常法によりスルホ−ルメッキを無電解メッ
キと電解メッキとを併用して行い、990〜1000穴
目のスルホ−ルの断面を顕微鏡で観察し、スルホ−ルメ
ッキの際に生じるスルホ−ルのメッキ染み込み長さとス
ルホ−ルの壁面粗さをそれぞれ測定し、その結果を1表
の特性値の欄に示した。DAPを配合した実施例は、さ
らに、反応型の難燃剤を配合した実施例5〜8のいずれ
においてもスルホ−ルのメッキ染み込み長さもスルホ−
ルの壁面粗さも比較例1、2に比べ低減している。しか
し、難燃性を付与するのに、非反応型の臭素化樹脂の配
合の実施例3では、難燃性は得られるものの耐熱性が低
下する。この耐熱性の低下に原因してドリル加工時の発
熱でスルホ−ル壁面が荒れたり、クラックが発生する結
果、スルホ−ルのメッキ染み込み長さもスルホ−ルの壁
面粗さも悪くなり、DAPの配合量を多く用いた効果が
なくなってしまうことになる。しかし、前記のように反
応型の臭素化樹脂の配合では、難燃性が確保でき、耐熱
性を低下させることがない。したがって、ドリル加工時
の発熱でスルホ−ル壁面が荒れたり、クラックが発生す
ることを阻止するので、スルホ−ルのメッキ染み込み長
さもスルホ−ルの壁面粗さも比較例に比べ著しく低減し
ている。The adhesion force when the layers of this laminate are peeled off in a 90 degree direction is expressed as the interlayer adhesion force [k] of the characteristic values in Table 1.
g/cm]. Also, 0.4 mm on this laminate
Using a φ drill bit, the rotation speed is 40,000 rpm, and the feed rate per rotation is 50 μ/rev.
00 holes were drilled and throughhole plating was performed using a combination of electroless plating and electrolytic plating using a conventional method, and the cross section of the throughholes at holes 990 to 1000 was observed with a microscope to determine the throughholes produced during throughhole plating. The plating penetration length and through-hole wall surface roughness were measured, respectively, and the results are shown in the characteristic value column of Table 1. Furthermore, in Examples 5 to 8 in which reactive flame retardants were added, the penetration length of throughhole plating was also lower than in Examples 5 to 8, in which DAP was added.
The wall surface roughness of the sample was also reduced compared to Comparative Examples 1 and 2. However, in Example 3, in which a non-reactive brominated resin is blended to impart flame retardancy, although flame retardance is obtained, heat resistance is reduced. Due to this decrease in heat resistance, the through-hole wall surface becomes rough and cracks occur due to the heat generated during drilling, resulting in poor plating penetration length and through-hole wall surface roughness, and the DAP formulation. The effect of using a large amount will be lost. However, when a reactive brominated resin is blended as described above, flame retardancy can be ensured and heat resistance is not reduced. This prevents the through-hole wall surface from becoming rough or cracking due to heat generated during drilling, and the through-hole plating penetration length and through-hole wall roughness are significantly reduced compared to comparative examples. .
【0036】なお、本発明の樹脂組成物は、以上の記載
に限定されるものではなく、他に電線被覆用樹脂、半導
体封止用樹脂、耐熱性成形材料用樹脂、低誘電率や低吸
湿性成形材料用樹脂としても有用なものである。The resin composition of the present invention is not limited to the above description, and may also be used as a resin for covering electric wires, a resin for semiconductor encapsulation, a resin for heat-resistant molding materials, a resin with a low dielectric constant or a low moisture absorption. It is also useful as a resin for molding materials.
【0037】[0037]
【発明の効果】本発明のポリイミド樹脂組成物を用いて
、そのプリプレグを得、そのプリプレグを積層し硬化さ
せてなる積層板は、積層板の誘電率を低下させ電気信号
の伝播速度の高速化に適合し、樹脂の基材への良好な充
填性による高いスルホ−ル信頼性などよって一層の多層
積層板を、さらに、難燃性によって安全性の向上を可能
にするものである。Effects of the Invention: A laminate obtained by obtaining a prepreg using the polyimide resin composition of the present invention, laminating and curing the prepreg reduces the dielectric constant of the laminate, and increases the propagation speed of electric signals. It is suitable for use in a single-layer multilayer laminate due to high through-hole reliability due to good filling properties of the resin into the base material, and furthermore, it is possible to improve safety due to flame retardancy.
【0038】[0038]
【化学式1】[Chemical formula 1]
【0039】[0039]
【表1】[Table 1]
Claims (12)
ミド樹脂100重量部に対して20〜200重量部の範
囲となる量で配合されるジアリルフタレート、3)およ
び、促進剤、溶媒などからなるポリイミド樹脂組成物。1. A polyimide comprising: 1) a polyimide resin, 2) diallyl phthalate blended in an amount ranging from 20 to 200 parts by weight per 100 parts by weight of the polyimide resin, and 3) a promoter, a solvent, etc. Resin composition.
ス−イミドとジアミンとを反応させて調製されるポリイ
ミド樹脂で,アルキル基または、メチレン基を除くアル
キレン基の少なくとも一方をポリイミド樹脂中に11重
量%以上含有することを特徴とする請求項1記載のポリ
イミド樹脂組成物。2. The polyimide resin of claim 1 is a polyimide resin prepared by reacting an unsaturated bis-imide with a diamine, and wherein at least one of an alkyl group or an alkylene group other than a methylene group is added to the polyimide resin. The polyimide resin composition according to claim 1, wherein the polyimide resin composition contains at least % by weight.
にポリイミド樹脂100重量部に対して臭素含有重量で
1〜50重量部の範囲の反応基を有する臭素化樹脂を配
合してなることを特徴とする請求項1記載のポリイミド
樹脂組成物。3. The polyimide resin composition according to claim 1 is blended with a brominated resin having a reactive group in an amount of 1 to 50 parts by weight of bromine based on 100 parts by weight of the polyimide resin. The polyimide resin composition according to claim 1.
樹脂が、臭素化エポキシ樹脂であることを特徴とする請
求項1記載のポリイミド樹脂組成物。4. The polyimide resin composition according to claim 1, wherein the brominated resin having a reactive group according to claim 3 is a brominated epoxy resin.
ミド樹脂100重量部に対して20〜200重量部の範
囲となる量で配合されるジアリルフタレート、3)およ
び、促進剤、溶媒などからなるポリイミド樹脂組成物を
基材に含浸させ、半硬化させたことを特徴とするポリイ
ミド樹脂のプリプレグ。5. 1) a polyimide resin; 2) diallyl phthalate blended in an amount ranging from 20 to 200 parts by weight per 100 parts by weight of the polyimide resin; 3) a polyimide comprising an accelerator, a solvent, etc. A polyimide resin prepreg characterized by impregnating a base material with a resin composition and semi-curing it.
ス−イミドとジアミとを反応させて調製されるポリイミ
ド樹脂で,アルキル基または、メチレン基を除くアルキ
レン基の少なくとも一方をポリイミド樹脂中に11重量
%以上含有することを特徴とする請求項5記載のポリイ
ミド樹脂のプリプレグ。6. The polyimide resin of claim 5 is a polyimide resin prepared by reacting an unsaturated bis-imide with diamide, and wherein at least one of an alkyl group or an alkylene group other than a methylene group is added to the polyimide resin. The polyimide resin prepreg according to claim 5, wherein the polyimide resin prepreg contains at least % by weight.
にポリイミド樹脂100重量部に対して臭素含有重量で
1〜50重量部の範囲の反応基を有する臭素化樹脂を配
合してなることを特徴とする請求項5記載のポリイミド
樹脂のプリプレグ。7. The polyimide resin composition according to claim 5 is blended with a brominated resin having a reactive group in an amount of 1 to 50 parts by weight of bromine based on 100 parts by weight of the polyimide resin. The polyimide resin prepreg according to claim 5.
樹脂が、臭素化エポキシ樹脂であることを特徴とする請
求項5記載のポリイミド樹脂のプリプレグ。8. The polyimide resin prepreg according to claim 5, wherein the brominated resin having a reactive group according to claim 7 is a brominated epoxy resin.
ミド樹脂100重量部に対して20〜200重量部の範
囲となる量で配合されるジアリルフタレート、3)およ
び、促進剤、溶媒などからなるポリイミド樹脂組成物を
基材に含浸させ、半硬化させたプリプレグを1枚以上積
層して硬化させたことを特徴とするポリイミド樹脂の積
層板。9. 1) a polyimide resin; 2) diallyl phthalate blended in an amount ranging from 20 to 200 parts by weight per 100 parts by weight of the polyimide resin; 3) a polyimide comprising an accelerator, a solvent, etc. A polyimide resin laminate, characterized in that one or more semi-cured prepregs are laminated and cured by impregnating a base material with a resin composition.
ビス−イミドとジアミとを反応させて調製されるポリイ
ミド樹脂で,アルキル基または、メチレン基を除くアル
キレン基の少なくとも一方をポリイミド樹脂中に11重
量%以上含有することを特徴とする請求項9記載のポリ
イミド樹脂の積層板。10. The polyimide resin of claim 9 is a polyimide resin prepared by reacting an unsaturated bis-imide with diamide, and wherein at least one of an alkyl group or an alkylene group other than a methylene group is added to the polyimide resin. The polyimide resin laminate according to claim 9, characterized in that the polyimide resin contains at least % by weight.
物にポリイミド樹脂100重量部に対して臭素含有重量
で1〜50重量部の範囲の反応基を有する臭素化樹脂を
配合してなることを特徴とする請求項9記載のポリイミ
ド樹脂の積層板。11. The polyimide resin composition according to claim 9 is blended with a brominated resin having a reactive group in an amount of 1 to 50 parts by weight of bromine based on 100 parts by weight of the polyimide resin. The polyimide resin laminate according to claim 9.
樹脂が、臭素化エポキシ樹脂であることを特徴とする請
求項9記載のポリイミド樹脂の積層板。12. The polyimide resin laminate according to claim 9, wherein the brominated resin having a reactive group according to claim 11 is a brominated epoxy resin.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP40609490A JPH04222862A (en) | 1990-12-25 | 1990-12-25 | Polyimide resin composition, prepreg and laminate thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP40609490A JPH04222862A (en) | 1990-12-25 | 1990-12-25 | Polyimide resin composition, prepreg and laminate thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04222862A true JPH04222862A (en) | 1992-08-12 |
Family
ID=18515718
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP40609490A Pending JPH04222862A (en) | 1990-12-25 | 1990-12-25 | Polyimide resin composition, prepreg and laminate thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04222862A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2020054601A1 (en) * | 2018-09-12 | 2020-03-19 | 日本化薬株式会社 | Maleimide resin, curable resin composition, and cured product thereof |
-
1990
- 1990-12-25 JP JP40609490A patent/JPH04222862A/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2020054601A1 (en) * | 2018-09-12 | 2020-03-19 | 日本化薬株式会社 | Maleimide resin, curable resin composition, and cured product thereof |
JP6689475B1 (en) * | 2018-09-12 | 2020-04-28 | 日本化薬株式会社 | Maleimide resin, curable resin composition and cured product thereof |
CN112334513A (en) * | 2018-09-12 | 2021-02-05 | 日本化药株式会社 | Maleimide resin, curable resin composition, and cured product thereof |
CN112334513B (en) * | 2018-09-12 | 2023-08-08 | 日本化药株式会社 | Maleimide resin, curable resin composition, and cured product thereof |
TWI820204B (en) * | 2018-09-12 | 2023-11-01 | 日商日本化藥股份有限公司 | Maleimide resin, curable resin composition and cured product |
US11958940B2 (en) | 2018-09-12 | 2024-04-16 | Nippon Kayaku Kabushiki Kaisha | Maleimide resin, curable resin composition, and cured product thereof |
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