JPH04222863A - Polyimide resin composition, prepreg and laminate thereof - Google Patents

Polyimide resin composition, prepreg and laminate thereof

Info

Publication number
JPH04222863A
JPH04222863A JP40609590A JP40609590A JPH04222863A JP H04222863 A JPH04222863 A JP H04222863A JP 40609590 A JP40609590 A JP 40609590A JP 40609590 A JP40609590 A JP 40609590A JP H04222863 A JPH04222863 A JP H04222863A
Authority
JP
Japan
Prior art keywords
polyimide resin
weight
group
parts
prepreg
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP40609590A
Other languages
Japanese (ja)
Other versions
JP2718268B2 (en
Inventor
Shingo Yoshioka
吉岡 慎悟
Tokio Yoshimitsu
吉光 時夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Electric Works Co Ltd
Original Assignee
Matsushita Electric Works Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Works Ltd filed Critical Matsushita Electric Works Ltd
Priority to JP40609590A priority Critical patent/JP2718268B2/en
Publication of JPH04222863A publication Critical patent/JPH04222863A/en
Application granted granted Critical
Publication of JP2718268B2 publication Critical patent/JP2718268B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0313Organic insulating material
    • H05K1/0353Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement

Landscapes

  • Reinforced Plastic Materials (AREA)
  • Laminated Bodies (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

PURPOSE:To obtain a polyimide resin composition and prepreg thereof capable of producing laminates having excellent through-hole reliability and low dielectric constant, comprising a polyimide resin, a triallyl isocyanurate, an allyl group-containing bisphenol A derivative, a promoter, a solvent, etc. CONSTITUTION:A resin composition comprising (A) 100 pts.wt. polyimide resin obtained by reacting an unsaturated bis-imide with a diamine, containing >=11wt.% preferably at least one of alkyl and alkylene except methylene in the polyimide resin, (B) 10-200 pts.wt. total amounts of B1: a triallyl isocyanurate (including polymer) and B2: an allyl group-containing bisphenol A derivative, preferably allyl ether of bisphenol A and/or diallyl bisphenol A, (C) a promoter and a solvent and preferably for flame retardance (D) 1-50 pts.wt. calculated as bromine content of a reactive group-containing brominated resin (preferably brominated epoxy resin), prepreg and a laminate thereof. The composition is impregnated into a material and semicured to give prepreg. The prepreg is laminated and cured to give a laminate.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】本発明は、プリント配線板などに
供されるポリイミド樹脂組成物、この樹脂組成物を用い
たポリイミド樹脂のプリプレグ、およびこのプリプレグ
が硬化したポリイミド樹脂の積層板に関するものである
[Field of Industrial Application] The present invention relates to a polyimide resin composition used for printed wiring boards, etc., a polyimide resin prepreg using this resin composition, and a polyimide resin laminate obtained by curing this prepreg. be.

【0002】0002

【従来の技術】従来よりポリイミド樹脂やエポキシ樹脂
は、積層板用などの樹脂として多用されている。なかで
も、ポリイミド樹脂は特開昭59−20659号公報、
特開昭61−40322号公報に記載のごとく、高密度
実装用の高多層配線基板に多用されてきている。
2. Description of the Related Art Polyimide resins and epoxy resins have heretofore been widely used as resins for laminated boards and the like. Among them, polyimide resins are disclosed in Japanese Patent Application Laid-Open No. 59-20659,
As described in Japanese Unexamined Patent Publication No. 61-40322, it has been widely used in high multilayer wiring boards for high-density packaging.

【0003】特に近年、ポリイミド樹脂の積層板におい
て、コンピュ−タ−をはじめ半導体装置を使った電子機
械装置の電気信号の伝播速度の高速化に適合するための
積層板の誘電率の低減化、スルホ−ル信頼性を高めるた
めの樹脂の基材への良好な含浸性を確保しスルホールめ
っきの染み込みの阻止化、さらに、難燃性による安全性
の向上が期待されていた。これらに対応する技術として
本発明者らは、先に特願平1−333456を開示した
Particularly in recent years, efforts have been made to reduce the dielectric constant of polyimide resin laminates in order to accommodate the increased propagation speed of electrical signals in electronic and mechanical devices using semiconductor devices, including computers. It was expected to ensure good impregnation of the resin into the base material in order to improve throughhole reliability, prevent penetration of throughhole plating, and improve safety due to flame retardancy. As a technique corresponding to these, the present inventors previously disclosed Japanese Patent Application No. 1-333456.

【0004】しかし、電気信号の伝播速度の高速化のた
めの低誘電率、安全のための耐燃性を維持しつつ、多層
化がますます進展する中でさらなるスルホールの信頼性
向上のため、スルホールめっき液の染み込みのより低減
化とスルホールクラックの発生の阻止が強く切望されて
いた。
[0004] However, as through-holes are becoming more and more multi-layered, in order to further improve the reliability of through-holes, while maintaining a low dielectric constant for increasing the propagation speed of electrical signals and flame resistance for safety, through-holes have been developed. There has been a strong desire to further reduce the penetration of plating solutions and prevent the occurrence of through-hole cracks.

【0005】[0005]

【発明が解決しょうとする課題】そこで、電気信号の伝
播速度の高速化のための低誘電率、安全のための耐燃性
を維持しつつ、多層化がますます進展する中でさらなる
スルホールの信頼性向上のため、スルホールめっき液の
染み込みのより低減化とスルホールクラックの発生の阻
止を可能にすることのできるポリイミド樹脂組成物、そ
のプリプレグ、およびその積層板を提供することにある
[Problem to be solved by the invention]Thus, while maintaining a low dielectric constant for increasing the propagation speed of electrical signals and flame resistance for safety, through-holes have become even more reliable as multi-layering continues to progress. An object of the present invention is to provide a polyimide resin composition, a prepreg thereof, and a laminate thereof, which can further reduce the penetration of a through-hole plating solution and prevent the occurrence of through-hole cracks in order to improve the properties of the polyimide resin composition.

【0006】[0006]

【問題を解決するための手段】本発明は、上記の点に鑑
みて為されたものである。本発明者らは、一般に知られ
ている付加型ポリイミド樹脂について誘電率を低減化さ
せる研究を行った結果、誘電率を低下させるのに有効な
化学構造とその量的な寄与を見出した。加えて、トリア
リルイソシアヌレ−ト類とアリル基を有するビスフェノ
−ルAの誘導体を所定量配合すると、さらに、誘電率が
低下することを見出した。なお、トリアリルイソシアヌ
レ−ト類やアリル基を有するビスフェノ−ルAの誘導体
を用いると、樹脂の固有粘度が低下し、均質で安定した
プリプレグを得ることができ、スルホ−ル信頼性に優れ
た低誘電率の積層板を得ることができるポリイミド樹脂
組成物、そのプリプレグを見出したのである。さらに反
応基を有する臭素化樹脂を所定量配合することにより、
接着性の低下、耐熱性の低下等の副作用を引き起こさず
、難燃性を有する低誘電率、優れたスルホール信頼性を
兼備した積層板を得ることができるポリイミド樹脂組成
物、そのプリプレグを見出したのである。
[Means for Solving the Problems] The present invention has been made in view of the above points. The present inventors conducted research on reducing the dielectric constant of commonly known addition-type polyimide resins, and as a result, discovered a chemical structure effective for lowering the dielectric constant and its quantitative contribution. In addition, it has been found that when a predetermined amount of triallylisocyanurates and a derivative of bisphenol A having an allyl group are blended, the dielectric constant is further reduced. In addition, when triallylisocyanurates or derivatives of bisphenol A having an allyl group are used, the intrinsic viscosity of the resin decreases, a homogeneous and stable prepreg can be obtained, and it has excellent throughhole reliability. They have discovered a polyimide resin composition and its prepreg that can produce a laminate with a low dielectric constant. Furthermore, by blending a predetermined amount of brominated resin with reactive groups,
We have discovered a polyimide resin composition and prepreg thereof that can produce a laminate that has flame retardancy, low dielectric constant, and excellent through-hole reliability without causing side effects such as decreased adhesion and heat resistance. It is.

【0007】ポリイミド樹脂組成物は、1)ポリイミド
樹脂、2)前記ポリイミド樹脂100重量部に対して合
計量が10〜200重量部の範囲となる量で配合される
トリアリルイソシアヌレ−ト類とアリル基を有するビス
フェノ−ルAの誘導体、3)および、促進剤、溶媒など
からなることを特徴とするものであり、さらに、難燃性
をえるためにはポリイミド樹脂100重量部に対して臭
素含有重量で1〜50重量部の範囲の反応基を有する臭
素化樹脂を配合してなることを特徴とするものである。
The polyimide resin composition comprises: 1) a polyimide resin; 2) triallylisocyanurate compounded in a total amount in the range of 10 to 200 parts by weight based on 100 parts by weight of the polyimide resin; It is characterized by consisting of a derivative of bisphenol A having an allyl group, 3), an accelerator, a solvent, etc. Furthermore, in order to obtain flame retardancy, bromine is added to 100 parts by weight of the polyimide resin. It is characterized by containing a brominated resin having a reactive group in a content range of 1 to 50 parts by weight.

【0008】また、ポリイミド樹脂のプリプレグは、1
)ポリイミド樹脂、2)前記ポリイミド樹脂100重量
部に対して合計量が10〜200重量部の範囲となる量
で配合されるトリアリルイソシアヌレ−ト類とアリル基
を有するビスフェノ−ルAの誘導体、3)および、促進
剤、溶媒などからなるポリイミド樹脂組成物を基材に含
浸させ、半硬化させたことを特徴とするものであり、さ
らに、難燃性を得るためにはポリイミド樹脂100重量
部に対して臭素含有重量で1〜50重量部の範囲の反応
基を有する臭素化樹脂を配合してなることを特徴とする
ものである。
[0008] Furthermore, polyimide resin prepreg has 1
) polyimide resin, 2) a derivative of bisphenol A having triallyl isocyanurate and an allyl group, which are blended in a total amount of 10 to 200 parts by weight based on 100 parts by weight of the polyimide resin. , 3) and is characterized in that the base material is impregnated with a polyimide resin composition consisting of an accelerator, a solvent, etc. and semi-cured. It is characterized by containing a brominated resin having a reactive group in an amount of 1 to 50 parts by weight based on the weight of bromine.

【0009】また、ポリイミド樹脂の積層板は、1)ポ
リイミド樹脂、2)前記ポリイミド樹脂100重量部に
対して合計量が10〜200重量部の範囲となる量で配
合されるトリアリルイソシアヌレ−ト類とアリル基を有
するビスフェノ−ルAの誘導体、3)および、促進剤、
溶媒などからなるポリイミド樹脂組成物を基材に含浸さ
せ、半硬化させたプリプレグを1枚以上、積層して硬化
させたことを特徴とするものであり、さらに、難燃性を
得るためにはポリイミド樹脂100重量部に対して臭素
含有重量で1〜50重量部の範囲の反応基を有する臭素
化樹脂を配合してなることを特徴とするものである。
[0009] Furthermore, the polyimide resin laminate includes 1) a polyimide resin, and 2) triallyl isocyanurate, which is blended in a total amount in the range of 10 to 200 parts by weight based on 100 parts by weight of the polyimide resin. a derivative of bisphenol A having a group and an allyl group, 3) and an accelerator;
It is characterized by laminating and curing one or more semi-cured prepregs in which a base material is impregnated with a polyimide resin composition consisting of a solvent etc. Furthermore, in order to obtain flame retardancy, It is characterized in that it contains a brominated resin having a reactive group in an amount of 1 to 50 parts by weight based on bromine content per 100 parts by weight of the polyimide resin.

【0010】以下に、これらを詳しく説明する。ポリイ
ミド樹脂は、不飽和ビス−イミド類とジアミン類などを
反応させて得ることができる。このようにして得るポリ
イミド樹脂には、アルキル基または、メチレン基を除く
アルキレン基の少なくとも一方をポリイミド樹脂中に1
1重量%以上含有するのが好ましい。なぜならば、アル
キル基または、メチレン基を除くアルキレン基が樹脂の
分子中に11重量%未満の化学構造の場合には、ポリイ
ミド樹脂の誘電率を低下させることができないからであ
る。
[0010] These will be explained in detail below. Polyimide resins can be obtained by reacting unsaturated bis-imides with diamines and the like. In the polyimide resin obtained in this way, at least one of an alkyl group or an alkylene group other than a methylene group is added to the polyimide resin.
The content is preferably 1% by weight or more. This is because if the chemical structure includes less than 11% by weight of alkyl groups or alkylene groups other than methylene groups in the resin molecule, the dielectric constant of the polyimide resin cannot be lowered.

【0011】前記不飽和ビス−イミドは明細書末の化学
式1の(a)で式(a)中Dは炭素−炭素間の二重結合
を含む2価の基を表し、Aは少なくとも2個の炭素原子
を含む2価の基を表すものを、またジアミンは次の式(
b)で式(b)中のBは30個以下の炭素原子を有する
2価の基で表すものをそれぞれ用いることができる。
The unsaturated bis-imide is represented by (a) in Chemical Formula 1 at the end of the specification, in which D represents a divalent group containing a carbon-carbon double bond, and A represents at least two Diamines are represented by the following formula (
In b), B in formula (b) can be represented by a divalent group having 30 or less carbon atoms.

【0012】H2 N−B−NH2         
  (b)なお、式(a)のAおよび、式(b)のBは
同一か、または異なることができ、また13個よりも少
ない炭素原子を持っている直鎖のもしくは分岐したアル
キレン基か、環の中に5個もしくは6個の炭素原子をも
っている環状アルキレン基か、O,NおよびS原子の少
なくとも1個を含む異種環状基か、またはフェニレンも
しくは多環状芳香族基であることもできる。これらの種
々の基は反応温度70〜170℃、反応時間30〜35
0分の反応条件のもとで不必要な副反応を与えない置換
基をもっていてもよい。
H2 NB-NH2
(b) Note that A in formula (a) and B in formula (b) can be the same or different and are straight-chain or branched alkylene groups having fewer than 13 carbon atoms. , a cyclic alkylene group having 5 or 6 carbon atoms in the ring, a heterocyclic group containing at least one of O, N and S atoms, or a phenylene or polycyclic aromatic group. . These various groups have a reaction temperature of 70 to 170°C and a reaction time of 30 to 35°C.
It may have a substituent that does not cause unnecessary side reactions under the reaction conditions of 0 minutes.

【0013】なお、式(a)のAおよび、式(b)のB
はまた、沢山のフェニレン基か、または直接にまたは2
価の原子または次の様な群で結合された脂環状の基を表
わすこともできる。たとえば、それらは酸素もしくは硫
黄か、炭素原子1個から3個のアルキレンの群か、また
は次の群の内の1つである。
Note that A in formula (a) and B in formula (b)
also has many phenylene groups or directly or two
It can also represent a valence atom or an alicyclic group bonded by the following groups. For example, they are oxygen or sulfur, the group of alkylenes of 1 to 3 carbon atoms, or one of the following groups:

【0014】−NR4 −,−P(O)R3 −,−N
=N−,  −O=N−,−CO−O−,−CONH−
,−SiR3 R4−,  −NY−CO−X−CO−
NY−,−O−CO−X−CO−O−,−SO2 −,
及び明細書末の化学式(c)の群の中の一つなど。これ
ら化学式中R3 ,R4 およびYはおのおの炭素原子
1個から4個のアルキル基、環中に5個もしく6個の炭
素原子を持つ環状アルキル基、もしくはフェニルもしく
は多環状芳香族基を表し、Xは13個よりも少ない炭素
原子を持っている直鎖もしくは分岐したアルキレン基、
環の中に5個もしくは6個の炭素原子をもっている環状
アルキレン基、または単環もしくは多環状アリレン基を
表す。
-NR4 -, -P(O)R3 -, -N
=N-, -O=N-, -CO-O-, -CONH-
, -SiR3 R4-, -NY-CO-X-CO-
NY-, -O-CO-X-CO-O-, -SO2 -,
and one of the group of chemical formula (c) at the end of the specification. In these chemical formulas, R3, R4 and Y each represent an alkyl group having 1 to 4 carbon atoms, a cyclic alkyl group having 5 or 6 carbon atoms in the ring, or phenyl or a polycyclic aromatic group, X is a straight-chain or branched alkylene group having fewer than 13 carbon atoms;
It represents a cyclic alkylene group having 5 or 6 carbon atoms in the ring, or a monocyclic or polycyclic arylene group.

【0015】なお、前記の式(a)の基Dは明細書末の
化学式1の(d)のエチレン系無水物から誘導されるも
ので、例えばマレイン酸無水物、シトラコン酸無水物、
テトラヒドロフタル酸無水物、イタコン酸無水物、およ
びシクロジエンとこれらの無水物の1つとの間に起こる
ディ−ルスアルダ−反応の生成物を表すこともできる。
The group D in formula (a) above is derived from the ethylene anhydride of chemical formula 1 (d) at the end of the specification, such as maleic anhydride, citraconic anhydride,
It can also represent tetrahydrophthalic anhydride, itaconic anhydride, and the product of a Diels-Alder reaction between a cyclodiene and one of these anhydrides.

【0016】使用することのできる式(a)の好ましい
不飽和ビス−イミドには次のものが挙げられる。
Preferred unsaturated bis-imides of formula (a) that can be used include:

【0017】マレイン酸N・N−エチレン−ビス−イミ
ド、マレイン酸N・N−ヘキサメチレン−ビス−イミド
、マレイン酸N・N−メタフェニレン−ビス−イミド、
マレイン酸N・N−パラフェニレン−ビス−イミド、マ
レイン酸N・N−4・4−ジフェニルメタン−ビス−イ
ミド〔通常、N・N−メチレンビス(N−フェニルマレ
イミド)とも言われる〕、マレイン酸N・N−4・4−
ジフェニルエ−テル−ビス−イミド、マレイン酸N・N
−4・4−ジフェニルスルフォン−ビス−イミド、マレ
イン酸N・N−4・4−ジシクロヘキシルメタン−ビス
−イミド、マレイン酸N・N−α・α−4・4−ジメチ
レンシクロヘキサン−ビス−イミド、マレイン酸N・N
−メタキシリレン−ビス−イミド、マレイン酸N・N−
ジフェニルシクロキサン−ビス−イミド、1・3−ビス
(2−p−アニリノプロピリデン)ベンゼン−ビス−イ
ミド、1・4−ビス(2−p−アニリノプロピリデン)
ベンゼン−ビス−イミド、1・4−ビス(2−m−アニ
リノプロピリデン)ベンゼン−ビス−イミド、4・4−
メチレンジ−2・6−キシリジン−ビス−イミド、4・
4−メチレンジ−2・6−ジエチルアニリン−ビス−イ
ミド、4・4−ジアミノ−3・3−ジエチル−5・5−
ジメチルジフェニルメタン−ビス−イミド、4・4−メ
チレンジ−2・6−ジイソプロピルアニリン−ビス−イ
ミド、2・5−ジメチル−p−フェニレンジアミン−ビ
ス−イミド、2・2−ビス(4−アミノフェニル)プロ
パン−ビス−イミド、2・4−ジアミノメシチレン−ビ
ス−イミド、および、3・5−ジエチル−2・4−トリ
レンジアミン−ビス−イミドなど。
Maleic acid N·N-ethylene-bis-imide, maleic acid N·N-hexamethylene-bis-imide, maleic acid N·N-metaphenylene-bis-imide,
Maleic acid N.N-paraphenylene-bis-imide, maleic acid N.N-4.4-diphenylmethane-bis-imide [usually also referred to as N.N-methylenebis (N-phenylmaleimide)], maleic acid N.・N-4・4-
Diphenyl ether bis-imide, maleic acid N/N
-4,4-diphenylsulfone-bis-imide, maleic acid N・N-4,4-dicyclohexylmethane-bis-imide, maleic acid N・N-α・α-4,4-dimethylenecyclohexane-bis-imide , maleic acid N・N
- metaxylylene-bis-imide, maleic acid N/N-
Diphenylcycloxane-bis-imide, 1,3-bis(2-p-anilinopropylidene)benzene-bis-imide, 1,4-bis(2-p-anilinopropylidene)
Benzene-bis-imide, 1,4-bis(2-m-anilinopropylidene)benzene-bis-imide, 4,4-
Methylenedi-2,6-xylidine-bis-imide, 4.
4-methylenedi-2,6-diethylaniline-bis-imide, 4,4-diamino-3,3-diethyl-5,5-
Dimethyldiphenylmethane-bis-imide, 4,4-methylenedi-2,6-diisopropylaniline-bis-imide, 2,5-dimethyl-p-phenylenediamine-bis-imide, 2,2-bis(4-aminophenyl) Propane-bis-imide, 2,4-diaminomesitylene-bis-imide, 3,5-diethyl-2,4-tolylenediamine-bis-imide, and the like.

【0018】また、使用することのできる式(b)のジ
アミンの実例には次のものがある。4・4−ジアミノジ
シクロヘキシルメタン、1・4−ジアミノシクロヘキサ
ン、2・6−ジアミノピリジン、メタフェニンジアミン
、パラフェニンジアミン、4・4−ジアミノジフェニル
メタン、2・2−ビス−(4−アミノフェニル)プロパ
ン、ベンジジン、4・4−ジアミノフェニルオキサイド
、4・4−ジアミノジフェニルサルファイド、4・4−
ジアミノジフェニルスルフォン、ビス−(4−アミノフ
ェニル)ジフェニルシラン、ビス−(4−アミノフェニ
ル)メチルホスフィンオキサイド、ビス−(3−アミノ
フェニル)メチルホスフィンオキサイド、ビス−(4−
アミノフェニル)フェニルホスフィンオキサイド、ビス
−(4−アミノフェニル)フェニラミン、1・5−ジア
ミノナフタレン、メタキシリレンジアミン、パラキシリ
レンジアミン、1・1−ビス−(パラアミノフェニル)
フタラン、ヘキサメチレンジアミン、1・3−ビス(2
−p−アニリノプロピリデン)ベンゼン、1・4−ビス
(2−p−アニリノプロピリデン)ベンゼン、1・4−
ビス(2−m−アニリノプロピリデン)ベンゼン、4・
4−メチレンジ−2・6−キシリジン、4・4−メチレ
ンジ−2・6−ジエチルアニリン、4・4−ジアミノ−
3・3−ジエチル−5・5−ジメチルジフェニルメタン
、4・4−メチレンジ−2・6−ジイソプロピルアニリ
ン、2・5−ジメチル−p−フェニレンジアミン、2・
2−ビス(4−アミノフェニル)プロパン、2・4−ジ
アミノメシチレン、および、3・5−ジエチル−2・4
−トリレンジアミンなど。
Examples of diamines of formula (b) that can be used include the following: 4,4-diaminodicyclohexylmethane, 1,4-diaminocyclohexane, 2,6-diaminopyridine, metaphenynediamine, paraphenynediamine, 4,4-diaminodiphenylmethane, 2,2-bis-(4-aminophenyl) ) Propane, benzidine, 4,4-diaminophenyl oxide, 4,4-diaminodiphenyl sulfide, 4,4-
Diaminodiphenylsulfone, bis-(4-aminophenyl)diphenylsilane, bis-(4-aminophenyl)methylphosphine oxide, bis-(3-aminophenyl)methylphosphine oxide, bis-(4-
(aminophenyl) phenylphosphine oxide, bis-(4-aminophenyl) pheniramine, 1,5-diaminonaphthalene, meta-xylylene diamine, para-xylylene diamine, 1,1-bis-(para-aminophenyl)
Phthalane, hexamethylene diamine, 1,3-bis(2
-p-anilinopropylidene)benzene, 1,4-bis(2-p-anilinopropylidene)benzene, 1,4-
Bis(2-m-anilinopropylidene)benzene, 4.
4-methylenedi-2,6-xylidine, 4,4-methylenedi-2,6-diethylaniline, 4,4-diamino-
3,3-diethyl-5,5-dimethyldiphenylmethane, 4,4-methylenedi-2,6-diisopropylaniline, 2,5-dimethyl-p-phenylenediamine, 2.
2-bis(4-aminophenyl)propane, 2,4-diaminomesitylene, and 3,5-diethyl-2,4
- Tolylene diamine etc.

【0019】そして、上記のビス−イミドとジアミンと
を反応させることによって付加型のポリイミド樹脂を調
製することができる。ビス−イミドとジアミンとの配合
比は、モル比でジアミン1に対してビス−イミドが1.
7〜2.5の範囲が好ましい。1.7よりビス−イミド
が少ないと高分子量の生成が多くなって硬化時間が短く
なり取扱に問題が生じる傾向があり、また、2.5より
ビス−イミドが多いと未反応原料が多く残存し易くなる
。反応はビス−イミドとジアミンとをN−メチルピロリ
ドン(NMP)やN,N−ジメチルアセトアミド(DM
Ac)などの溶剤に溶解した状態で行うことができるも
のであり、反応の際の加熱温度は70〜170℃程度の
範囲で行うことができ、反応時間は30〜350分程度
の範囲で行うことができる。
An addition type polyimide resin can be prepared by reacting the above bis-imide with a diamine. The molar ratio of bis-imide and diamine is 1 part bis-imide to 1 part diamine.
The range of 7 to 2.5 is preferable. If the bis-imide content is less than 1.7, the production of high molecular weight increases, resulting in a short curing time, which tends to cause problems in handling, while if the bis-imide content is more than 2.5, a large amount of unreacted raw material remains. It becomes easier to do. The reaction involves combining bis-imide and diamine with N-methylpyrrolidone (NMP) or N,N-dimethylacetamide (DM).
It can be carried out in a state dissolved in a solvent such as Ac), and the heating temperature during the reaction can be carried out in the range of about 70 to 170°C, and the reaction time can be carried out in the range of about 30 to 350 minutes. be able to.

【0020】本発明のポリイミド樹脂組成物は、前記の
ポリイミド樹脂100重量部(以下、部と記す)にトリ
アリルイソシアヌレ−ト(以下TAICと記載する)類
とアリル基を有するビスフェノ−ルA(以下BPAと記
載する)の誘導体の合計量を10〜200重量部の範囲
となる量を配合し、さらに、促進剤としてイミダゾ−ル
類や有機過酸化物などと、希釈溶媒としてジメチルホル
ムアミド(DMF),DMAc,ジオキサン、NMP,
MEKなどの中から適宜、単独または、混合して用いた
ものからなる樹脂組成物である。TAIC類とアリル基
を有するBPAの誘導体の添加量を増すと、それから得
られる積層板の誘電率が低下する傾向にあり、これらの
合計量が10部未満の添加では誘電率の低下の効果が殆
ど認められず、200部を超して使用すると誘電率は低
下するが、積層板として硬く、脆いものとなり好ましく
ない。また、TAIC類はTAICポリマ−やTAIC
の総称である。TAICポリマ−とTAICの使用量は
、TAICポリマ−の使用量1重量部に対して0〜10
0重量部で配合されたものが好ましい。これらの理由は
以下にある。すなわち、TAICとそのポリマ−の使用
量については、TAICポリマ−はTAICのプレポリ
マ−も含むものであり、TAICポリマ−を添加すると
プリプレグ製造時の乾燥においてTAICの激しい揮発
を抑制することができる。このことによって基材に含浸
した樹脂組成物を十分に安定して半硬化させることがで
き、基材への樹脂の充填が著しく向上したプリプレグを
得ることができるのである。TAICポリマ−とTAI
Cの使用はポリイミド樹脂100重量部に対してそのポ
リマ−の使用量が1重量部と添加は少量でも効果を現し
、TAICポリマ−だけの使用であっても達成できる。
The polyimide resin composition of the present invention contains 100 parts by weight (hereinafter referred to as parts) of the polyimide resin, triallylisocyanurate (hereinafter referred to as TAIC), and bisphenol A having an allyl group. (hereinafter referred to as BPA) in a total amount in the range of 10 to 200 parts by weight, and further contains imidazoles and organic peroxides as accelerators, and dimethylformamide (hereinafter referred to as BPA) as a diluting solvent. DMF), DMAc, dioxane, NMP,
It is a resin composition consisting of MEK and the like, used alone or in combination. When the amount of TAICs and BPA derivatives having an allyl group added is increased, the dielectric constant of the resulting laminate tends to decrease, and if the total amount of these is less than 10 parts, the effect of decreasing the dielectric constant is It is hardly observed, and if it exceeds 200 parts, the dielectric constant decreases, but the laminate becomes hard and brittle, which is not preferable. In addition, TAIC types include TAIC polymer and TAIC
It is a general term for The amount of TAIC polymer and TAIC used is 0 to 10 parts by weight per 1 part by weight of TAIC polymer.
Preferably, the amount is 0 parts by weight. These reasons are below. That is, regarding the amount of TAIC and its polymer used, the TAIC polymer also includes a TAIC prepolymer, and the addition of the TAIC polymer can suppress the intense volatilization of TAIC during drying during prepreg production. This allows the resin composition impregnated into the base material to be semi-cured in a sufficiently stable manner, making it possible to obtain a prepreg in which the resin filling of the base material is significantly improved. TAIC polymer and TAI
When using C, the effect can be achieved even if the addition amount is as small as 1 part by weight per 100 parts by weight of the polyimide resin, and the effect can be achieved even if only TAIC polymer is used.

【0021】また、TAICポリマ−の重量平均分子量
は500〜10000のポリマ−が好ましく、中でも5
00〜3000のポリマ−が好ましい。なぜなら、重量
平均分子量500未満のポリマ−の場合は、上記のTA
ICポリマ−の作用が得られず、重量平均分子量100
00を越したポリマ−を用いると樹脂組成物の可塑性が
低下し、プリプレグの層間接着力が弱くなったり、積層
板では硬く、脆い積層板になる。このものは、スルホ−
ル加工時に、スルホ−ル内壁にクラックを生じる。この
結果、スルホ−ルメッキの際にメッキ液が染み込み、ス
ルホ−ルと内層回路との絶縁性が悪くなり、スルホ−ル
信頼性を低下させ好ましくないからである。なお、TA
ICポリマ−の重量平均分子量は、GPCチャ−トを使
いモノマ−の検量線に基づいて求めた値である。
[0021] The weight average molecular weight of the TAIC polymer is preferably 500 to 10,000, especially 500 to 10,000.
00 to 3000 polymers are preferred. This is because, in the case of a polymer with a weight average molecular weight of less than 500, the above TA
The effect of IC polymer cannot be obtained, and the weight average molecular weight is 100.
If a polymer exceeding 0.00 is used, the plasticity of the resin composition decreases, the interlayer adhesion of the prepreg becomes weak, and the laminate becomes hard and brittle. This stuff is sulfo-
Cracks occur on the inner wall of the through hole during hole processing. As a result, the plating solution permeates during through-hole plating, resulting in poor insulation between the through-holes and the inner layer circuit, which is undesirable as it reduces the reliability of the through-holes. In addition, T.A.
The weight average molecular weight of the IC polymer is a value determined based on a monomer calibration curve using a GPC chart.

【0022】そこで、低誘電率化のために用いたTAI
C類の使用で発生するスルホールクラックを低誘電率を
阻害するとなく阻止するのに、アリル基を有するBPA
の誘導体をTAIC類と併用することによって可能なこ
とを見いだした。アリル基を有するBPAの誘導体は、
TAIC類と同様の反応性、及び反応機構を有し、ポリ
イミド樹脂、TAIC類などと共重合し、層間接着力、
耐熱性、耐水性、電気絶縁接性などの特性を損なうこと
なく、ポリイミド樹脂組成物の全体の架橋密度を低下さ
せ、外部応力に対して樹脂の耐クラック性を向上させる
ものである。
Therefore, TAI used to lower the dielectric constant.
BPA with an allyl group can be used to prevent through-hole cracks that occur when using Class C without interfering with the low dielectric constant.
We have discovered that it is possible to use derivatives of TAIC in combination with TAICs. A derivative of BPA having an allyl group is
It has the same reactivity and reaction mechanism as TAICs, and can be copolymerized with polyimide resin, TAICs, etc., and has interlayer adhesive strength,
This method reduces the overall crosslink density of the polyimide resin composition and improves the crack resistance of the resin against external stress without impairing properties such as heat resistance, water resistance, and electrical insulation contact.

【0023】なお、アリル基を有するビスフェノ−ルA
の誘導体は、ビスフェノ−ルA(以下BPAと記載する
)のアリルエーテル類、たとえば三井東圧社製のBPA
−AEなどやジアリルビスフェノ−ルA類、たとえば三
井東圧社製のBPA−CAなどを用いることができる。 これらは液状でワニスに使用しやすく、揮発性が製造条
件に適するなどの点で好ましい。
[0023] Furthermore, bisphenol A having an allyl group
Derivatives include allyl ethers of bisphenol A (hereinafter referred to as BPA), such as BPA manufactured by Mitsui Toatsu Co., Ltd.
-AE, diallylbisphenol A, such as BPA-CA manufactured by Mitsui Toatsu Co., Ltd., can be used. These are preferred because they are liquid and easy to use in varnishes, and their volatility is suitable for manufacturing conditions.

【0024】TAIC類やアリル基を有するBPAの誘
導体は反応希釈剤としても作用し、樹脂組成物の固有粘
度と表面張力を低下させる。したがって、基材の繊維間
に樹脂組成物が良く浸透し、基材への樹脂の充填が著し
く向上したプリプレグを得ることができる。そして、こ
のプリプレグが硬化した積層板においては、スルホール
のドリル加工時に、スルホールクラックの発生がほとん
ど無くなり、スルホ−ルメッキのメッキの染み込み長さ
が著しく短かくなり、同時にスルホ−ルの内壁が著しく
平滑に仕上がり、これらによってスルホ−ルと内層回路
との絶縁性が確保されスルホ−ルの信頼性が著しく向上
するなどの効果を得ることができる。
[0024] TAICs and allyl group-containing BPA derivatives also act as reaction diluents and reduce the intrinsic viscosity and surface tension of the resin composition. Therefore, the resin composition penetrates well between the fibers of the base material, and it is possible to obtain a prepreg in which the filling of the resin into the base material is significantly improved. In a laminate made of hardened prepreg, there is almost no through-hole cracking during through-hole drilling, the penetration length of the through-hole plating is significantly shortened, and at the same time, the inner walls of the through-holes are extremely smooth. As a result, the insulation between the through hole and the inner layer circuit is ensured, and the reliability of the through hole is significantly improved.

【0025】電子機械装置の安全化のために要求される
難燃性の確保には、難燃剤として反応基を有する臭素化
樹脂を前記ポリイミド樹脂組成物に配合するのが好まし
く、特に、反応基を有する臭素化樹脂の配合量をポリイ
ミド樹脂100重量部に対して、臭素含有重量で1〜5
0重量部の範囲で用いるのが好ましい。その理由は、1
重量部未満では、難燃性が得られず、50重量部を超し
て用いると得られる積層板の耐熱性が悪くなり、誘電率
も上昇するなど性能が低下するからである。また、反応
基を有する臭素化樹脂が好ましいのは、難燃剤を前記ポ
リイミド樹脂の側鎖、末端の基と反応させ、そのポリイ
ミド樹脂構造の骨格内に取り込むことによって、初めて
層間接着力、スルホ−ル信頼性、耐熱性などと難燃性の
性能を兼備したものが得られるからである。
In order to ensure the flame retardancy required for the safety of electronic mechanical devices, it is preferable to blend a brominated resin having a reactive group as a flame retardant into the polyimide resin composition. The blending amount of the brominated resin having a bromine content is 1 to 5 by weight based on 100 parts by weight of the polyimide resin.
It is preferable to use it in a range of 0 parts by weight. The reason is 1.
If the amount is less than 50 parts by weight, flame retardancy cannot be obtained, and if the amount exceeds 50 parts by weight, the heat resistance of the resulting laminate will be poor and the dielectric constant will also increase, resulting in decreased performance. Furthermore, brominated resins having reactive groups are preferable because the flame retardant is reacted with the side chains and terminal groups of the polyimide resin, and is incorporated into the skeleton of the polyimide resin structure. This is because it is possible to obtain a product that combines reliability, heat resistance, and flame retardant performance.

【0026】したがって、反応基として、エポキシ基、
アリル基、ビニル基などを有する炭素原子1個から4個
のアルキル、環中に5個もしくは6個の炭素原子を持つ
環状アルキル、もしくはフェニルもしくは多環状芳香族
、または、13個よりも少ない炭素原子を持っている直
鎖もしくは分岐したアルキレン、環の中に5個もしくは
6個の炭素原子をもっている環状アルキレン、または単
環もしくは多環状アリレンなどの臭素化樹脂の中から適
宜用いることができる。特に、好ましい反応基としては
、耐熱性、層間接着力を維持、もしくは向上させる点で
、エポキシ基をあげることができる。
[0026] Therefore, as a reactive group, an epoxy group,
Alkyl of 1 to 4 carbon atoms with allyl group, vinyl group, etc., cyclic alkyl with 5 or 6 carbon atoms in the ring, or phenyl or polycyclic aromatic, or less than 13 carbon atoms A brominated resin such as a linear or branched alkylene having atoms, a cyclic alkylene having 5 or 6 carbon atoms in the ring, or a monocyclic or polycyclic arylene can be used as appropriate. In particular, an epoxy group can be mentioned as a preferable reactive group since it maintains or improves heat resistance and interlayer adhesive strength.

【0027】以上のポリイミド樹脂組成物からプリプレ
グを得るには、前記のポリイミド樹脂組成物を基材に含
浸させた後、希釈溶媒を乾燥蒸発させつつポリイミド樹
脂と反応性希釈剤であるTAIC類やアリル基を有する
BPAの誘導体との反応を進行させ基材中の樹脂組成物
を半硬化させて得られたものである。さらに難燃性を得
るために含有した反応性を有する臭素化樹脂もこのプリ
プレグ調製時に、反応基がポリイミド樹脂の側鎖、末端
の基と反応し、ポリイミド樹脂構造の骨格内に取り込ま
れるのである。
In order to obtain a prepreg from the above polyimide resin composition, after impregnating the base material with the above polyimide resin composition, the diluent is dried and evaporated while the polyimide resin is mixed with a reactive diluent such as TAIC or the like. It is obtained by semi-curing the resin composition in the base material by proceeding with the reaction with a BPA derivative having an allyl group. Furthermore, the reactive brominated resin contained in order to obtain flame retardancy reacts with the side chains and terminal groups of the polyimide resin during the preparation of this prepreg, and is incorporated into the skeleton of the polyimide resin structure. .

【0028】前記のポリイミド樹脂組成物を含浸させる
基材の種類は、特に限定されない。通常は、ガラスクロ
ス等が用いられる。この他、石英繊維布等の無機繊維の
布、もしくはこれらの不織布、ポリイミド樹脂繊維の布
や不織布等の高耐熱性有機繊維布等が用いられてもよい
The type of substrate impregnated with the polyimide resin composition is not particularly limited. Usually, glass cloth or the like is used. In addition, inorganic fiber cloths such as quartz fiber cloths, nonwoven fabrics thereof, and highly heat-resistant organic fiber cloths such as polyimide resin fiber cloths and nonwoven fabrics may be used.

【0029】半硬化させる時の温度は110 〜155
 ℃で行うのが好ましい。155 ℃を超えると、特に
TAIC類やアリル基を有するBPAの誘導体の反応が
進み過ぎ、得られるプリプレグの層間接着力が低下し、
誘電率の低下する効果が小さくなり、110 ℃未満で
は、処理に時間がかかり実用的でないからである。半硬
化とは、熱硬化性樹脂の硬化過程において、一般にBス
テ−ジと言われる範囲のものであり、さらに熱が加われ
ば樹脂が流動し、硬化反応が起こりえる状態のものを言
う。
[0029] The temperature during semi-curing is 110 to 155
Preferably, it is carried out at °C. If the temperature exceeds 155°C, the reaction of TAICs and allyl group-containing BPA derivatives will proceed too much, and the interlayer adhesion of the resulting prepreg will decrease.
This is because the effect of lowering the dielectric constant becomes small, and if the temperature is lower than 110° C., the processing takes time and is not practical. Semi-cured refers to the range generally referred to as the B stage in the curing process of thermosetting resins, and refers to a state in which the resin flows when heat is applied and a curing reaction can occur.

【0030】次には、前記のポリイミド樹脂のプリプレ
グをを1枚以上積層してポリイミド樹脂の積層板を作る
ことができる。すなわち、必要に応じて、銅、ニッケル
、アルミニウムなどの金属箔あるいは、回路形成された
金属箔などとプリプレグを積層成形してつくられる。 その積層成形は常法により行うことができる。
Next, a polyimide resin laminate can be made by laminating one or more of the polyimide resin prepregs described above. That is, it is made by laminating and molding a prepreg with a metal foil such as copper, nickel, or aluminum, or a metal foil with a circuit formed thereon, as necessary. The lamination molding can be performed by a conventional method.

【0031】なお、この積層板には、前記の化学構造の
ポリイミド樹脂に、TAIC類やアリル基を有するBP
Aの誘導体などを配合したポリイミド樹脂組成物が用い
られ、樹脂組成物の基材への充填が十分に行われている
。したがって、このプリプレグを用いれば、誘電率が低
く、スルホールのめっき染み込みがより低減化でき、ス
ルホールクラックの発生も阻止できるスルホ−ル信頼性
が特に高い積層板を得ることが可能となり、このTAI
C類とアリル基を有するBPAの誘導体を配合したポリ
イミド樹脂組成物に、さらに反応基をもつ臭素化樹脂を
配合したポリイミド樹脂組成物を用いた積層板において
は、高いスルホ−ル信頼性、層間接着力、及び耐熱性と
難燃性の兼備した積層板を得ることが可能となり、多層
積層板、特に、8層以上の多層積層板では、有用な特性
を有することになるのである。
[0031] This laminate includes a polyimide resin having the above chemical structure, TAICs, and BP having an allyl group.
A polyimide resin composition containing a derivative of A and the like is used, and the base material is sufficiently filled with the resin composition. Therefore, by using this prepreg, it is possible to obtain a laminate with particularly high through-hole reliability, which has a low dielectric constant, can further reduce through-hole plating penetration, and can prevent the occurrence of through-hole cracks.
In a laminate using a polyimide resin composition in which a BPA derivative having group C and an allyl group is further blended with a brominated resin having a reactive group, high sulfol reliability and layer It becomes possible to obtain a laminate that has both interlayer adhesive strength, heat resistance, and flame retardancy, and multilayer laminates, especially multilayer laminates with eight or more layers, have useful properties.

【0032】なお、本発明の樹脂組成物は、以上の記載
に限定されるものではなく、他に電線被覆用樹脂、半導
体封止用樹脂、耐熱性成形材料用樹脂、低誘電率や低吸
湿性成形材料用樹脂としても有用なものである。
[0032] The resin composition of the present invention is not limited to the above description, and may also be used as a resin for coating electric wires, a resin for semiconductor encapsulation, a resin for heat-resistant molding materials, a resin with a low dielectric constant, and a low moisture absorption. It is also useful as a resin for molding materials.

【0033】次に、以上の発明を実施例と比較例によっ
て説明する。
Next, the above invention will be explained using examples and comparative examples.

【0034】[0034]

【実施例】実施例1〜8と比較例1〜3は、表1の上半
分に示される各々の配合のポリイミド樹脂組成物でなり
、これらの樹脂組成物からなる積層板の特性値を表1の
下半分に示した。
[Example] Examples 1 to 8 and Comparative Examples 1 to 3 were made of polyimide resin compositions having the respective formulations shown in the upper half of Table 1, and the characteristic values of laminates made of these resin compositions are shown below. It is shown in the lower half of 1.

【0035】表1のポリイミド樹脂は、それぞれ次のも
のを用いた。#1は、マレイン酸N,N−4・4−ジフ
ェニルメタン−ビス−イミドと4・4−ジアミノジフェ
ニルメタンとから合成されたもので、アルキル基または
、アルキレン基を樹脂の分子中に含有しない。#2は、
1・4−ビス(2−p−アニリノプロピリデン)ベンゼ
ン−ビス−イミドと1・4−ビス(2−m−アニリノプ
ロピリデン)ベンゼンとから合成されたもので、アルキ
ル基を樹脂の分子中に17重量%含有する。
The following polyimide resins in Table 1 were used. #1 is synthesized from maleic acid N,N-4.4-diphenylmethane-bis-imide and 4.4-diaminodiphenylmethane, and does not contain an alkyl group or an alkylene group in the resin molecule. #2 is
It is synthesized from 1,4-bis(2-p-anilinopropylidene)benzene-bis-imide and 1,4-bis(2-m-anilinopropylidene)benzene, and the alkyl group is added to the resin. Contains 17% by weight in the molecule.

【0036】TAICは日本化成社製のもので誘電率2
.9のものを、アリル基を有するBPAの誘導体はBP
Aのアリルエーテル類として三井東圧社製のBPA−A
E、誘電率2.5のものを、ジアリルビスフェノ−ルA
類として、三井東圧社製のBPA−CA、誘電率3.7
のものをそれぞれ用いた。
TAIC is manufactured by Nippon Kasei Co., Ltd. and has a dielectric constant of 2.
.. 9, the allyl group-containing BPA derivative is BP
As the allyl ether of A, BPA-A manufactured by Mitsui Toatsu Co., Ltd.
E, dielectric constant 2.5, diallylbisphenol A
As a similar product, BPA-CA manufactured by Mitsui Toatsu Co., Ltd. has a dielectric constant of 3.7.
Each of these was used.

【0037】難燃剤の臭素化樹脂は、それぞれ明細書末
の化学式1の■、■のものを用い、表1の配合量の前に
■■で種類を明示した。■は、反応型の臭素化フェノ−
ルノボラック型エポキシ樹脂(日本化薬社製、BREN
−S)■は、非反応型の多環状芳香族の臭素化樹脂(グ
レ−トレ−ク社製、BC58)また、促進剤は、いずれ
も2エチル−4メチルイミダゾ−ル( 2E4MZ、四
国化成社製)を、希釈溶媒は、樹脂固形分率が約55〜
70%になるようにDMFをそれぞれに用いた。
The brominated resins used as flame retardants are those represented by (1) and (2) in Chemical Formula 1 at the end of the specification, respectively, and the types are specified with (■) in front of the blending amounts in Table 1. ■ is a reactive brominated phenol.
Lunovolac type epoxy resin (manufactured by Nippon Kayaku Co., Ltd., BREN
-S) ■ is a non-reactive polycyclic aromatic brominated resin (manufactured by Gray Lake Co., Ltd., BC58), and the accelerator is 2-ethyl-4-methylimidazole (2E4MZ, Shikoku Kasei Co., Ltd.). The diluting solvent has a resin solids content of about 55~
DMF was used in each case to give a concentration of 70%.

【0038】表1の実施例1〜8、比較例1〜3の誘電
率の特性値の対比からポリイミド樹脂とTAICの樹脂
組成物にアリル基を有するBPAの誘導体であるBPA
−AEまたは、および、BPA−CAを添加あるいは代
替配合しても低誘電率を維持または、より低下すること
が確認できた。
From the comparison of the dielectric constant characteristic values of Examples 1 to 8 and Comparative Examples 1 to 3 in Table 1, BPA, which is a derivative of BPA having an allyl group, was found in the resin composition of polyimide resin and TAIC.
It was confirmed that even when -AE or BPA-CA was added or alternatively blended, a low dielectric constant was maintained or further reduced.

【0039】さらに、実施例1、2の#1のポリイミド
樹脂と実施例3〜8の#2のポリイミド樹脂の化学構造
の対比から、アルキル基を樹脂の分子中に11重量%以
上含有する#2の場合、一層誘電率の低下の効果を奏す
ることが確認できた。この誘電率の測定はJIS、C6
481によって行った。
Furthermore, from a comparison of the chemical structures of #1 polyimide resin of Examples 1 and 2 and #2 polyimide resin of Examples 3 to 8, #1 containing an alkyl group in the resin molecule in an amount of 11% by weight or more was found. In the case of No. 2, it was confirmed that the dielectric constant was further reduced. This dielectric constant measurement is based on JIS, C6
It was done by 481.

【0040】また、実施例2、実施例4〜8の反応基を
有する反応型の臭素化樹脂の配合では、実施例1と3の
反応基を持たない非反応型の臭素化樹脂の配合に比べ層
間接着力、耐熱性を高水準に維持したまま難燃性を確保
できることが確認できた。この難燃性の試験はUL−9
4 に準じて行った。
In addition, in the formulation of the reactive brominated resin having a reactive group in Examples 2 and 4 to 8, the formulation of the non-reactive brominated resin without a reactive group in Examples 1 and 3 was In comparison, it was confirmed that flame retardancy could be ensured while maintaining interlayer adhesion and heat resistance at a high level. This flame retardant test is UL-9
It was carried out according to 4.

【0041】次に、表1の樹脂組成物を厚み0.1 m
m、95g/m2 のEガラス布に含浸させ、140 
℃の乾燥機中で35〜60分間乾燥させることにより各
々のプリプレグを得た。このプリプレグを用いて積層板
は次のようにして形成した。
Next, the resin composition shown in Table 1 was applied to a thickness of 0.1 m.
m, 95 g/m2 E glass cloth impregnated, 140
Each prepreg was obtained by drying for 35 to 60 minutes in a dryer at .degree. A laminate was formed using this prepreg in the following manner.

【0042】前記のプリプレグの両面に18μm の両
面粗面化銅箔を置いて蒸気プレスを用いて、成形温度1
30 ℃、成形圧力30kg/cm2 、成形時間90
分間の条件で積層成形を行い内層プリント配線板用の両
面銅張積層板を得た。このようにして得た両面銅張積層
板の銅箔をエッチング処理して回路形成し、黒化処理す
ることによって内層プリント配線板を作成し、45枚の
内層プリント配線板をそれぞれの間に上記と同じ4枚の
プリプレグを介して重ねると共にその上下にさらに4枚
のプリプレグを介して35μm 厚みの銅箔を重ね、5
mmの金型に納め、蒸気プレスを用いて5 kg/cm
2 の加圧を行いつつ直ちに130 ℃まで加熱し、2
0分間保持した。この後、30kg/cm2 の圧力で
200 ℃に加熱し、120 分間保持した後、圧力を
かけたまま室温まで冷却して両面銅張多層積層板を得た
[0042] A double-sided roughened copper foil of 18 μm was placed on both sides of the prepreg, and a steam press was used to heat the molding temperature to 1.
30℃, molding pressure 30kg/cm2, molding time 90
Lamination molding was carried out under conditions of 1 minute to obtain a double-sided copper-clad laminate for an inner layer printed wiring board. The copper foil of the double-sided copper-clad laminate thus obtained was etched to form a circuit and blackened to create an inner layer printed wiring board, and 45 inner layer printed wiring boards were placed between each of the above The same 4 sheets of prepreg as above are layered, and 35 μm thick copper foil is layered above and below through 4 sheets of prepreg.
Place it in a mold of 5 kg/cm using a steam press.
Immediately heat to 130 °C while applying pressure in step 2.
It was held for 0 minutes. Thereafter, it was heated to 200° C. under a pressure of 30 kg/cm 2 and held for 120 minutes, and then cooled to room temperature while the pressure was applied to obtain a double-sided copper-clad multilayer laminate.

【0043】この積層板の層と層の間を90度方向に剥
がしたときの接着力を、1表の特性値の層間接着力〔k
g/cm〕に示した。また、この積層板に0.4 mm
φのドリルビットを用い、40000 rpmの回転数
、1回転当たりの送り速度50μ/revの条件で10
00穴あけ、常法によりスルホ−ルメッキを無電解メッ
キと電解メッキとを併用して行い、990〜1000穴
目のスルホ−ルの断面を顕微鏡で観察し、スルホ−ルメ
ッキの際に生じるスルホ−ルのメッキ染み込み長さを測
定し、その結果を表1の特性値の欄に示した。
The adhesive force when the layers of this laminate are peeled off in a 90 degree direction is determined by the interlayer adhesive force [k] of the characteristic values in Table 1.
g/cm]. Also, 0.4 mm on this laminate
Using a φ drill bit, the rotation speed is 40,000 rpm, and the feed rate per rotation is 50 μ/rev.
00 holes were drilled and throughhole plating was performed using a combination of electroless plating and electrolytic plating using a conventional method, and the cross section of the throughholes at holes 990 to 1000 was observed with a microscope to determine the throughholes produced during throughhole plating. The plating penetration length was measured, and the results are shown in the characteristic value column of Table 1.

【0044】スルホールクラックは、この積層板に0.
3mmφのドリルビットを用い、80000 rpmの
回転数、1回転当たりの送り速度10μ/revの条件
で穴あけ、500 〜529 穴の30穴のスルホ−ル
を顕微鏡で観察し、30μm 以上のクラックの数を評
価し、その結果を表1の特性値の欄に示した。
[0044]Through-hole cracks occur in this laminate at a rate of 0.
Using a 3 mmφ drill bit, holes were drilled at a rotation speed of 80,000 rpm and a feed rate of 10 μ/rev per rotation, and 30 through holes (500 to 529 holes) were observed with a microscope to determine the number of cracks larger than 30 μm. were evaluated, and the results are shown in the column of characteristic values in Table 1.

【0045】さらに、反応型の難燃剤を配合した実施例
2、4〜8のいずれにおいてもスルホ−ルのメッキ染み
込み長さもスルホ−ルクラックの発生回数も非反応型の
臭素化樹脂の配合の実施例3に比べ低減している。難燃
性を付与するのに、非反応型の臭素化樹脂でも、反応型
の臭素化樹脂と同様に難燃性は得られるものの、耐熱性
が低下する。この耐熱性の低下に原因して、ドリル加工
時の発熱でスルホ−ル壁面が荒れたり、クラックが発生
する結果、スルホ−ルのメッキ染み込み長さも悪くなり
、TAIC類やアリル基を有するBPAの誘導体の配合
の効果がなくなってしまうことになる。しかし、反応型
の臭素化樹脂の配合では、難燃性が確保でき、耐熱性を
低下させることがない。したがって、ドリル加工時の発
熱でクラックが発生することが無くなり、スルホール壁
面の荒やスルホ−ルのメッキ染み込み長さも著しく低減
した。
Furthermore, in any of Examples 2 and 4 to 8 in which a reactive flame retardant was blended, the length of throughhole plating penetration and the number of occurrences of throughhole cracks were improved by blending a non-reactive brominated resin. This is reduced compared to Example 3. When imparting flame retardance, non-reactive brominated resins can provide the same flame retardancy as reactive brominated resins, but the heat resistance is reduced. Due to this decrease in heat resistance, the through-hole wall surface becomes rough and cracks occur due to the heat generated during drilling, and as a result, the penetration length of the through-hole plating becomes worse. The effect of the combination of derivatives will be lost. However, by blending a reactive brominated resin, flame retardancy can be ensured and heat resistance will not be reduced. Therefore, cracks do not occur due to heat generated during drilling, and the roughness of the through-hole wall surface and the length of plating penetration into the through-hole are significantly reduced.

【0046】[0046]

【発明の効果】本発明のポリイミド樹脂組成物を用いて
、そのプリプレグを得、そのプリプレグを積層し硬化さ
せてなる積層板は、積層板の誘電率を低下させ電気信号
の伝播速度の高速化に適合し、スルホールめっき液の染
み込みのより低減化とスルホールの発生の阻止による高
いスルホ−ル信頼性などよって一層の多層積層板を、さ
らに、難燃性によって安全性の向上を可能にするもので
ある。
Effects of the Invention: A laminate obtained by obtaining a prepreg using the polyimide resin composition of the present invention, laminating and curing the prepreg reduces the dielectric constant of the laminate, and increases the propagation speed of electric signals. It is compatible with the above, and enables higher through-hole reliability by reducing penetration of through-hole plating solution and preventing the formation of through-holes, and further improves safety through flame retardancy. It is.

【0047】[0047]

【化学式1】[Chemical formula 1]

【0048】[0048]

【表1】[Table 1]

Claims (15)

【特許請求の範囲】[Claims] 【請求項1】  1)ポリイミド樹脂、2)前記ポリイ
ミド樹脂100重量部に対して合計量が10〜200重
量部の範囲となる量で配合されるトリアリルイソシアヌ
レ−ト類とアリル基を有するビスフェノ−ルAの誘導体
、3)および、促進剤、溶媒などからなるポリイミド樹
脂組成物。
1. 1) a polyimide resin, 2) a triallylisocyanurate compound blended in a total amount of 10 to 200 parts by weight with respect to 100 parts by weight of the polyimide resin, and an allyl group. A polyimide resin composition comprising a bisphenol A derivative, 3), an accelerator, a solvent, and the like.
【請求項2】  請求項1のポリイミド樹脂が不飽和ビ
ス−イミドとジアミンとを反応させて調製されるポリイ
ミド樹脂で,アルキル基または、メチレン基を除くアル
キレン基の少なくとも一方をポリイミド樹脂中に11重
量%以上含有することを特徴とする請求項1記載のポリ
イミド樹脂組成物。
2. The polyimide resin of claim 1 is a polyimide resin prepared by reacting an unsaturated bis-imide with a diamine, and wherein at least one of an alkyl group or an alkylene group other than a methylene group is added to the polyimide resin. The polyimide resin composition according to claim 1, wherein the polyimide resin composition contains at least % by weight.
【請求項3】  請求項1のアリル基を有するビスフェ
ノ−ルAの誘導体が、ビスフェノ−ルAのアリルエーテ
ル類または、および、ジアリルビスフェノ−ルA類であ
ることを特徴とする請求項1記載のポリイミド樹脂組成
物。
3. Claim 1, wherein the derivative of bisphenol A having an allyl group according to claim 1 is an allyl ether of bisphenol A or a diallylbisphenol A class. The polyimide resin composition described.
【請求項4】  請求項1記載のポリイミド樹脂組成物
にポリイミド樹脂100重量部に対して臭素含有重量で
1〜50重量部の範囲の反応基を有する臭素化樹脂を配
合してなることを特徴とする請求項1記載のポリイミド
樹脂組成物。
4. The polyimide resin composition according to claim 1 is blended with a brominated resin having a reactive group in an amount of 1 to 50 parts by weight of bromine based on 100 parts by weight of the polyimide resin. The polyimide resin composition according to claim 1.
【請求項5】  請求項4記載の反応基を有する臭素化
樹脂が、臭素化エポキシ樹脂であることを特徴とする請
求項1記載のポリイミド樹脂組成物。
5. The polyimide resin composition according to claim 1, wherein the brominated resin having a reactive group according to claim 4 is a brominated epoxy resin.
【請求項6】  1)ポリイミド樹脂、2)前記ポリイ
ミド樹脂100重量部に対して合計量が10〜200重
量部の範囲となる量で配合されるトリアリルイソシアヌ
レ−ト類とアリル基を有するビスフェノ−ルAの誘導体
、3)および、促進剤、溶媒などからなるポリイミド樹
脂組成物を基材に含浸させ、半硬化させたことを特徴と
するポリイミド樹脂のプリプレグ。
6. 1) a polyimide resin, 2) a triallylisocyanurate compound blended in a total amount of 10 to 200 parts by weight with respect to 100 parts by weight of the polyimide resin, and an allyl group. A polyimide resin prepreg characterized in that a base material is impregnated with a polyimide resin composition comprising a bisphenol A derivative, 3), an accelerator, a solvent, etc., and semi-cured.
【請求項7】  請求項6のポリイミド樹脂が不飽和ビ
ス−イミドとジアミンとを反応させて調製されるポリイ
ミド樹脂で,アルキル基または、メチレン基を除くアル
キレン基の少なくとも一方をポリイミド樹脂中に11重
量%以上含有することを特徴とする請求項6記載のポリ
イミド樹脂のプリプレグ。
7. The polyimide resin of claim 6 is a polyimide resin prepared by reacting an unsaturated bis-imide with a diamine, and wherein at least one of an alkyl group or an alkylene group other than a methylene group is added to the polyimide resin. The polyimide resin prepreg according to claim 6, characterized in that the polyimide resin prepreg contains at least % by weight.
【請求項8】  請求項6のアリル基を有するビスフェ
ノ−ルAの誘導体が、ビスフェノ−ルAのアリルエーテ
ル類または、および、ジアリルビスフェノ−ルA類であ
ることを特徴とする請求項6記載のポリイミド樹脂のプ
リプレグ。
8. Claim 6, wherein the derivative of bisphenol A having an allyl group according to claim 6 is an allyl ether of bisphenol A or a diallylbisphenol A class. Prepreg of the polyimide resin described.
【請求項9】  請求項6記載のポリイミド樹脂組成物
にポリイミド樹脂100重量部に対して臭素含有重量で
1〜50重量部の範囲の反応基を有する臭素化樹脂を配
合してなることを特徴とする請求項6記載のポリイミド
樹脂のプリプレグ。
9. The polyimide resin composition according to claim 6 is blended with a brominated resin having a reactive group in an amount of 1 to 50 parts by weight of bromine based on 100 parts by weight of the polyimide resin. The polyimide resin prepreg according to claim 6.
【請求項10】  請求項9記載の反応基を有する臭素
化樹脂が、臭素化エポキシ樹脂であることを特徴とする
請求項6記載のポリイミド樹脂のプリプレグ。
10. The polyimide resin prepreg according to claim 6, wherein the brominated resin having a reactive group according to claim 9 is a brominated epoxy resin.
【請求項11】  1)ポリイミド樹脂、2)前記ポリ
イミド樹脂100重量部に対して合計量が10〜200
重量部の範囲となる量で配合されるトリアリルイソシア
ヌレ−ト類とアリル基を有するビスフェノ−ルAの誘導
体、3)および、促進剤、溶媒などからなるポリイミド
樹脂組成物を基材に含浸させ、半硬化させたプリプレグ
を1枚以上積層して硬化させたことを特徴とするポリイ
ミド樹脂の積層板。
11. 1) a polyimide resin; 2) a total amount of 10 to 200 parts by weight based on 100 parts by weight of the polyimide resin;
A base material is impregnated with a polyimide resin composition consisting of triallyl isocyanurates, a derivative of bisphenol A having an allyl group, 3), an accelerator, a solvent, etc., blended in an amount within the range of parts by weight. 1. A polyimide resin laminate, characterized in that one or more semi-cured prepregs are laminated and cured.
【請求項12】  請求項11のポリイミド樹脂が不飽
和ビス−イミドとジアミとを反応させて調製されるポリ
イミド樹脂で,アルキル基または、メチレン基を除くア
ルキレン基の少なくとも一方をポリイミド樹脂中に11
重量%以上含有することを特徴とする請求項11記載の
ポリイミド樹脂の積層板。
12. The polyimide resin of claim 11 is a polyimide resin prepared by reacting an unsaturated bis-imide with diamide, wherein at least one of an alkyl group or an alkylene group other than a methylene group is added to the polyimide resin.
12. The polyimide resin laminate according to claim 11, wherein the polyimide resin contains at least % by weight.
【請求項13】  請求項11のアリル基を有するビス
フェノ−ルAの誘導体が、ビスフェノ−ルAのアリルエ
ーテル類または、および、ジアリルビスフェノ−ルA類
であることを特徴とする請求項11記載のポリイミド樹
脂の積層板。
13. Claim 11, wherein the derivative of bisphenol A having an allyl group according to claim 11 is an allyl ether of bisphenol A or a diallylbisphenol A class. A laminate of the polyimide resin described above.
【請求項14】  請求項11記載のポリイミド樹脂組
成物にポリイミド樹脂100重量部に対して臭素含有重
量で1〜50重量部の範囲の反応基を有する臭素化樹脂
を配合してなることを特徴とする請求項11記載のポリ
イミド樹脂の積層板。
14. The polyimide resin composition according to claim 11 is blended with a brominated resin having a reactive group in an amount of 1 to 50 parts by weight based on bromine content based on 100 parts by weight of the polyimide resin. The polyimide resin laminate according to claim 11.
【請求項15】  請求項14の反応基を有する臭素化
樹脂が、臭素化エポキシ樹脂であることを特徴とする請
求項11記載のポリイミド樹脂の積層板。
15. The polyimide resin laminate according to claim 11, wherein the brominated resin having a reactive group according to claim 14 is a brominated epoxy resin.
JP40609590A 1990-12-25 1990-12-25 Polyimide resin composition, prepreg and laminate thereof Expired - Fee Related JP2718268B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP40609590A JP2718268B2 (en) 1990-12-25 1990-12-25 Polyimide resin composition, prepreg and laminate thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP40609590A JP2718268B2 (en) 1990-12-25 1990-12-25 Polyimide resin composition, prepreg and laminate thereof

Publications (2)

Publication Number Publication Date
JPH04222863A true JPH04222863A (en) 1992-08-12
JP2718268B2 JP2718268B2 (en) 1998-02-25

Family

ID=18515719

Family Applications (1)

Application Number Title Priority Date Filing Date
JP40609590A Expired - Fee Related JP2718268B2 (en) 1990-12-25 1990-12-25 Polyimide resin composition, prepreg and laminate thereof

Country Status (1)

Country Link
JP (1) JP2718268B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011093079A1 (en) * 2010-01-28 2011-08-04 三井化学株式会社 Metal-resin composite
CN107760026A (en) * 2016-08-18 2018-03-06 臻鼎科技股份有限公司 The film of resin combination and the application resin combination and copper-clad plate

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011093079A1 (en) * 2010-01-28 2011-08-04 三井化学株式会社 Metal-resin composite
JPWO2011093079A1 (en) * 2010-01-28 2013-05-30 三井化学株式会社 Metal resin composite
CN107760026A (en) * 2016-08-18 2018-03-06 臻鼎科技股份有限公司 The film of resin combination and the application resin combination and copper-clad plate

Also Published As

Publication number Publication date
JP2718268B2 (en) 1998-02-25

Similar Documents

Publication Publication Date Title
US10689512B2 (en) Resin composition, and prepreg, metal-clad laminate, and printed circuit board using the same
KR102142753B1 (en) Thermosetting resin composition, and prepreg, insulating film with support, laminate plate, and printed wiring board, each obtained using same
CN106973490B (en) Use of siloxane compounds for printed wiring boards
JP5692201B2 (en) Thermosetting resin composition, and prepreg, laminate and multilayer printed wiring board using the same
KR101509018B1 (en) prepreg and laminate
US4526835A (en) Multi-layer printed circuit board and process for production thereof
US7601429B2 (en) Prepreg and laminate
JP5672788B2 (en) Bismaleimide derivative having polyazomethine and method for producing the same, thermosetting resin composition, prepreg and laminate
KR100624028B1 (en) Resin composition, prepreg and laminate using the composition
CN109988288A (en) Prepreg, metal foil laminated board and printed circuit board obtained by resin combination and use the composition
TWI765147B (en) Thermosetting resin composite for metal clad laminate and metal clad laminate using the same
EP3211035A1 (en) Epoxy resin composition as well as prepreg and laminated board using the same
CN105348741B (en) Compositions of thermosetting resin, laminate for high speed substrate
JP2016033195A (en) Thermosetting resin composition, and prepreg, laminate and multilayer printed wiring board using the same
CN109661422B (en) Resin composition for semiconductor encapsulation, prepreg using same, and metal clad laminate
JPH04222863A (en) Polyimide resin composition, prepreg and laminate thereof
US5160781A (en) Polyimide composition and prepreg and laminate thereof
JPH04222862A (en) Polyimide resin composition, prepreg and laminate thereof
JP2718267B2 (en) Polyimide resin composition, prepreg and laminate thereof
JP5447268B2 (en) Thermosetting resin composition, prepreg and laminate
JP2012167234A (en) Thermosetting resin composition, prepreg, and laminated board
JPH0480261A (en) Polyimide resin composition, its prepreg and its laminate
KR101181948B1 (en) Resin composition, and prepreg and laminate using the same
JPH0379667A (en) Polyamide resin composition, prepreg thereof and laminate board thereof
CA2012633C (en) Polyimide composition and prepreg and laminate thereof

Legal Events

Date Code Title Description
FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20081114

Year of fee payment: 11

S533 Written request for registration of change of name

Free format text: JAPANESE INTERMEDIATE CODE: R313533

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20081114

Year of fee payment: 11

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20091114

Year of fee payment: 12

LAPS Cancellation because of no payment of annual fees