JPH04222861A - Polyimide resin composition, prepreg and laminate thereof - Google Patents
Polyimide resin composition, prepreg and laminate thereofInfo
- Publication number
- JPH04222861A JPH04222861A JP40609390A JP40609390A JPH04222861A JP H04222861 A JPH04222861 A JP H04222861A JP 40609390 A JP40609390 A JP 40609390A JP 40609390 A JP40609390 A JP 40609390A JP H04222861 A JPH04222861 A JP H04222861A
- Authority
- JP
- Japan
- Prior art keywords
- polyimide resin
- weight
- group
- parts
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920001721 polyimide Polymers 0.000 title claims abstract description 99
- 239000009719 polyimide resin Substances 0.000 title claims abstract description 99
- 239000000203 mixture Substances 0.000 title claims abstract description 35
- 239000011347 resin Substances 0.000 claims abstract description 41
- 229920005989 resin Polymers 0.000 claims abstract description 41
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical class C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 claims abstract description 35
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims abstract description 24
- 239000000463 material Substances 0.000 claims abstract description 14
- 125000002947 alkylene group Chemical group 0.000 claims abstract description 12
- 239000002904 solvent Substances 0.000 claims abstract description 12
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 10
- 150000004985 diamines Chemical class 0.000 claims abstract description 10
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims abstract description 9
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims abstract description 9
- 229910052794 bromium Inorganic materials 0.000 claims abstract description 9
- WOCGGVRGNIEDSZ-UHFFFAOYSA-N 4-[2-(4-hydroxy-3-prop-2-enylphenyl)propan-2-yl]-2-prop-2-enylphenol Chemical compound C=1C=C(O)C(CC=C)=CC=1C(C)(C)C1=CC=C(O)C(CC=C)=C1 WOCGGVRGNIEDSZ-UHFFFAOYSA-N 0.000 claims abstract description 6
- 239000003822 epoxy resin Substances 0.000 claims abstract description 6
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 6
- ATVJXMYDOSMEPO-UHFFFAOYSA-N 3-prop-2-enoxyprop-1-ene Chemical compound C=CCOCC=C ATVJXMYDOSMEPO-UHFFFAOYSA-N 0.000 claims abstract description 5
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 claims description 5
- 229930185605 Bisphenol Natural products 0.000 claims 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims 1
- 239000011342 resin composition Substances 0.000 abstract description 9
- 125000000325 methylidene group Chemical group [H]C([H])=* 0.000 abstract 1
- 125000004432 carbon atom Chemical group C* 0.000 description 13
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 12
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 12
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 12
- 239000011976 maleic acid Substances 0.000 description 12
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 12
- 238000007747 plating Methods 0.000 description 11
- 239000000126 substance Substances 0.000 description 10
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 9
- 239000010410 layer Substances 0.000 description 9
- 230000007423 decrease Effects 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 7
- 230000035515 penetration Effects 0.000 description 7
- -1 cyclic alkylene radical Chemical class 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 239000003063 flame retardant Substances 0.000 description 6
- 238000000465 moulding Methods 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 5
- 239000011229 interlayer Substances 0.000 description 5
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- 239000000835 fiber Substances 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 3
- 239000011889 copper foil Substances 0.000 description 3
- 238000007865 diluting Methods 0.000 description 3
- 238000009472 formulation Methods 0.000 description 3
- 238000010030 laminating Methods 0.000 description 3
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 150000008064 anhydrides Chemical class 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 239000003085 diluting agent Substances 0.000 description 2
- 238000005553 drilling Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000012778 molding material Substances 0.000 description 2
- 125000002950 monocyclic group Chemical group 0.000 description 2
- 239000004745 nonwoven fabric Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 239000001294 propane Substances 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- HIDBROSJWZYGSZ-UHFFFAOYSA-N 1-phenylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=CC=C1 HIDBROSJWZYGSZ-UHFFFAOYSA-N 0.000 description 1
- SCZZNWQQCGSWSZ-UHFFFAOYSA-N 1-prop-2-enoxy-4-[2-(4-prop-2-enoxyphenyl)propan-2-yl]benzene Chemical compound C=1C=C(OCC=C)C=CC=1C(C)(C)C1=CC=C(OCC=C)C=C1 SCZZNWQQCGSWSZ-UHFFFAOYSA-N 0.000 description 1
- ZVDSMYGTJDFNHN-UHFFFAOYSA-N 2,4,6-trimethylbenzene-1,3-diamine Chemical group CC1=CC(C)=C(N)C(C)=C1N ZVDSMYGTJDFNHN-UHFFFAOYSA-N 0.000 description 1
- BWAPJIHJXDYDPW-UHFFFAOYSA-N 2,5-dimethyl-p-phenylenediamine Chemical compound CC1=CC(N)=C(C)C=C1N BWAPJIHJXDYDPW-UHFFFAOYSA-N 0.000 description 1
- AYKYXWQEBUNJCN-UHFFFAOYSA-N 3-methylfuran-2,5-dione Chemical compound CC1=CC(=O)OC1=O AYKYXWQEBUNJCN-UHFFFAOYSA-N 0.000 description 1
- OFNISBHGPNMTMS-UHFFFAOYSA-N 3-methylideneoxolane-2,5-dione Chemical compound C=C1CC(=O)OC1=O OFNISBHGPNMTMS-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- VIDPINWAGZKWJR-UHFFFAOYSA-N 4-(4,4-diaminocyclohexa-1,5-dien-1-yl)oxycyclohexa-2,4-diene-1,1-diamine Chemical compound C1=CC(N)(N)CC=C1OC1=CCC(N)(N)C=C1 VIDPINWAGZKWJR-UHFFFAOYSA-N 0.000 description 1
- DZIHTWJGPDVSGE-UHFFFAOYSA-N 4-[(4-aminocyclohexyl)methyl]cyclohexan-1-amine Chemical compound C1CC(N)CCC1CC1CCC(N)CC1 DZIHTWJGPDVSGE-UHFFFAOYSA-N 0.000 description 1
- BLMSGSGJGUHKFW-UHFFFAOYSA-N 4-[(4-aminophenyl)-diphenylsilyl]aniline Chemical compound C1=CC(N)=CC=C1[Si](C=1C=CC(N)=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 BLMSGSGJGUHKFW-UHFFFAOYSA-N 0.000 description 1
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 1
- 238000005698 Diels-Alder reaction Methods 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- IJHNSHDBIRRJRN-UHFFFAOYSA-N N,N-dimethyl-3-phenyl-3-(2-pyridinyl)-1-propanamine Chemical compound C=1C=CC=NC=1C(CCN(C)C)C1=CC=CC=C1 IJHNSHDBIRRJRN-UHFFFAOYSA-N 0.000 description 1
- HEHUZGFZNPSQMW-UHFFFAOYSA-N NC1=CC=C(C=C1)C(C1=CC=C(C=C1)N)[PH2]=O Chemical compound NC1=CC=C(C=C1)C(C1=CC=C(C=C1)N)[PH2]=O HEHUZGFZNPSQMW-UHFFFAOYSA-N 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- FDLQZKYLHJJBHD-UHFFFAOYSA-N [3-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC(CN)=C1 FDLQZKYLHJJBHD-UHFFFAOYSA-N 0.000 description 1
- ISKQADXMHQSTHK-UHFFFAOYSA-N [4-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=C(CN)C=C1 ISKQADXMHQSTHK-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 125000000732 arylene group Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical compound C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 description 1
- IWZNWGDJJJKIOC-UHFFFAOYSA-N bis(3-aminophenyl)methyl-oxidophosphanium Chemical compound NC=1C=C(C=CC1)C(C1=CC(=CC=C1)N)[PH2]=O IWZNWGDJJJKIOC-UHFFFAOYSA-N 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 125000006165 cyclic alkyl group Chemical group 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- VKIRRGRTJUUZHS-UHFFFAOYSA-N cyclohexane-1,4-diamine Chemical compound NC1CCC(N)CC1 VKIRRGRTJUUZHS-UHFFFAOYSA-N 0.000 description 1
- UKJLNMAFNRKWGR-UHFFFAOYSA-N cyclohexatrienamine Chemical group NC1=CC=C=C[CH]1 UKJLNMAFNRKWGR-UHFFFAOYSA-N 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Natural products C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 239000012784 inorganic fiber Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- KQSABULTKYLFEV-UHFFFAOYSA-N naphthalene-1,5-diamine Chemical compound C1=CC=C2C(N)=CC=CC2=C1N KQSABULTKYLFEV-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 229960001190 pheniramine Drugs 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- SFLGSKRGOWRGBR-UHFFFAOYSA-N phthalane Chemical compound C1=CC=C2COCC2=C1 SFLGSKRGOWRGBR-UHFFFAOYSA-N 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- VHNQIURBCCNWDN-UHFFFAOYSA-N pyridine-2,6-diamine Chemical compound NC1=CC=CC(N)=N1 VHNQIURBCCNWDN-UHFFFAOYSA-N 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/0353—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
Landscapes
- Reinforced Plastic Materials (AREA)
- Laminated Bodies (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は、プリント配線板などに
供されるポリイミド樹脂組成物、この樹脂組成物を用い
たポリイミド樹脂のプリプレグ、およびこのプリプレグ
が硬化したポリイミド樹脂の積層板に関するものである
。[Field of Industrial Application] The present invention relates to a polyimide resin composition used for printed wiring boards, etc., a polyimide resin prepreg using this resin composition, and a polyimide resin laminate obtained by curing this prepreg. be.
【0002】0002
【従来の技術】従来よりポリイミド樹脂やエポキシ樹脂
は、積層板用等の樹脂として多用されている。なかでも
、ポリイミド樹脂は特開昭59−20659号公報、特
開昭61−40322号公報に記載のごとく、高密度実
装用の高多層配線基板に多用されてきている。2. Description of the Related Art Polyimide resins and epoxy resins have been widely used as resins for laminated boards and the like. Among these, polyimide resins have been widely used in highly multilayer wiring boards for high-density packaging, as described in Japanese Patent Laid-Open Nos. 59-20659 and 61-40322.
【0003】しかしながら、近年、ポリイミド樹脂の積
層板において、コンピュ−タ−をはじめ半導体装置を使
った電子機械装置の高速化に対応し、電気信号の伝播速
度の高速化のための誘電率の低減化と、多層化がますま
す進展する中で信頼性向上のためのスルホールめっきの
染み込みの阻止化と、さらに、安全性の向上などが強く
切望されていた。However, in recent years, the dielectric constant of polyimide resin laminates has been reduced in order to increase the propagation speed of electrical signals in response to the increasing speed of computers and other electromechanical devices using semiconductor devices. As the number of layers increases, there is a strong desire to prevent penetration of through-hole plating in order to improve reliability, and to improve safety.
【0004】0004
【発明が解決しょうとする課題】本発明は、電気信号の
伝播速度の高速化に適合するための積層板の誘電率の低
減化、スルホ−ル信頼性を高めるための樹脂の基材への
良好な含浸性を確保しスルホールめっきの染み込みの阻
止化、さらに、難燃性による安全性の向上を可能にする
ことのできるポリイミド樹脂組成物、そのプリプレグ、
およびその積層板を提供することにある。[Problems to be Solved by the Invention] The present invention aims to reduce the dielectric constant of a laminate in order to adapt to higher propagation speeds of electrical signals, and to improve the through-hole reliability of resin base materials. A polyimide resin composition that can ensure good impregnability, prevent penetration of through-hole plating, and further improve safety due to flame retardancy, a prepreg thereof,
and to provide a laminate thereof.
【0005】[0005]
【問題を解決するための手段】本発明は、上記の点に鑑
みて為されたものである。本発明者らは、一般に知られ
ている付加型ポリイミド樹脂について誘電率を低減化さ
せる研究を行った結果、誘電率を低下させるのに有効な
化学構造とその量的な寄与を見出した。加えて、アリル
基を有するビスフェノ−ルAの誘導体を所定量配合する
と、さらに、誘電率が低下することを見出した。なお、
アリル基を有するビスフェノ−ルAの誘導体を用いると
、樹脂の固有粘度が低下し、均質で安定したプリプレグ
を得ることができ、スルホ−ル信頼性に優れた低誘電率
の積層板を得ることができるポリイミド樹脂組成物、そ
のプリプレグを見出したのである。さらに、反応基を有
する臭素化樹脂を所定量配合することにより、接着性の
低下、耐熱性の低下などの副作用を引き起こさず、難燃
性を有する低誘電率、優れたスルホール信頼性を兼備し
た積層板を得ることができるポリイミド樹脂組成物、そ
のプリプレグを見出したのである。[Means for Solving the Problems] The present invention has been made in view of the above points. The present inventors conducted research on reducing the dielectric constant of commonly known addition-type polyimide resins, and as a result, discovered a chemical structure effective for lowering the dielectric constant and its quantitative contribution. In addition, it has been found that when a predetermined amount of a bisphenol A derivative having an allyl group is blended, the dielectric constant further decreases. In addition,
By using a derivative of bisphenol A having an allyl group, the intrinsic viscosity of the resin decreases, a homogeneous and stable prepreg can be obtained, and a laminate with a low dielectric constant and excellent throughhole reliability can be obtained. They have discovered a polyimide resin composition and its prepreg that can be used. Furthermore, by blending a predetermined amount of brominated resin with reactive groups, it does not cause side effects such as reduced adhesion or heat resistance, and has flame retardant, low dielectric constant, and excellent through-hole reliability. We have discovered a polyimide resin composition and its prepreg that can be used to produce laminates.
【0006】ポリイミド樹脂組成物は、1)ポリイミド
樹脂、2)前記ポリイミド樹脂100重量部に対して1
0〜200重量部の範囲となる量で配合されるアリル基
を有するビスフェノ−ルAの誘導体、3)および、促進
剤、溶媒などからなることを特徴とするものであり、さ
らに、難燃性をえるためにはポリイミド樹脂100重量
部に対して臭素含有重量で1〜50重量部の範囲の反応
基を有する臭素化樹脂を配合してなることを特徴とする
ものである。[0006] The polyimide resin composition includes 1) a polyimide resin, and 2) 1 part by weight per 100 parts by weight of the polyimide resin.
It is characterized by consisting of a bisphenol A derivative having an allyl group, which is blended in an amount ranging from 0 to 200 parts by weight, 3), an accelerator, a solvent, etc. In order to achieve this, a brominated resin having a reactive group in a bromine content range of 1 to 50 parts by weight is blended with 100 parts by weight of the polyimide resin.
【0007】また、ポリイミド樹脂のプリプレグは、1
)ポリイミド樹脂、2)前記ポリイミド樹脂100重量
部に対して10〜200重量部の範囲となる量で配合さ
れるアリル基を有するビスフェノ−ルAの誘導体、3)
および、促進剤、溶媒などからなるポリイミド樹脂組成
物を基材に含浸させ、半硬化させたことを特徴とするも
のであり、さらに、難燃性を得るためにはポリイミド樹
脂100重量部に対して臭素含有重量で1〜50重量部
の範囲の反応基を有する臭素化樹脂を配合してなること
を特徴とするものである。[0007] Furthermore, polyimide resin prepreg has 1
) polyimide resin, 2) a derivative of bisphenol A having an allyl group, which is blended in an amount ranging from 10 to 200 parts by weight per 100 parts by weight of the polyimide resin, 3)
And, it is characterized by impregnating a base material with a polyimide resin composition consisting of an accelerator, a solvent, etc. and semi-curing it.Furthermore, in order to obtain flame retardance, It is characterized in that it contains a brominated resin having a reactive group in a range of 1 to 50 parts by weight based on the bromine content.
【0008】また、ポリイミド樹脂の積層板は、1)ポ
リイミド樹脂、2)前記ポリイミド樹脂100重量部に
対して10〜200重量部の範囲となる量で配合される
アリル基を有するビスフェノ−ルAの誘導体、3)およ
び、促進剤、溶媒などからなるポリイミド樹脂組成物を
基材に含浸させ、半硬化させたプリプレグを1枚以上、
積層して硬化させたことを特徴とするものであり、さら
に、難燃性を得るためにはポリイミド樹脂100重量部
に対して臭素含有重量で1〜50重量部の範囲の反応基
を有する臭素化樹脂を配合してなることを特徴とするも
のである。[0008] The polyimide resin laminate also contains 1) a polyimide resin, and 2) bisphenol A having an allyl group, which is blended in an amount ranging from 10 to 200 parts by weight per 100 parts by weight of the polyimide resin. one or more semi-cured prepregs obtained by impregnating a base material with a polyimide resin composition consisting of a derivative of 3), an accelerator, a solvent, etc.,
It is characterized by being laminated and cured, and in order to obtain flame retardancy, bromine having a reactive group in the range of 1 to 50 parts by weight of bromine per 100 parts by weight of the polyimide resin is added. It is characterized by containing a chemical resin.
【0009】以下に、これらを詳しく説明する。ポリイ
ミド樹脂は、不飽和ビス−イミド類とジアミン類などを
反応させて得ることができる。このようにして得るポリ
イミド樹脂には、アルキル基または、メチレン基を除く
アルキレン基の少なくとも一方をポリイミド樹脂中に1
1重量%以上含有するのが好ましい。なぜならば、アル
キル基または、メチレン基を除くアルキレン基が樹脂の
分子中に11重量%未満の化学構造の場合には、ポリイ
ミド樹脂の誘電率を低下させることができないからであ
る。[0009] These will be explained in detail below. Polyimide resins can be obtained by reacting unsaturated bis-imides with diamines and the like. In the polyimide resin obtained in this way, at least one of an alkyl group or an alkylene group other than a methylene group is added to the polyimide resin.
The content is preferably 1% by weight or more. This is because if the chemical structure includes less than 11% by weight of alkyl groups or alkylene groups other than methylene groups in the resin molecule, the dielectric constant of the polyimide resin cannot be lowered.
【0010】前記不飽和ビス−イミドは明細書末の化学
式1の(a)で式(a)中Dは炭素−炭素間の二重結合
を含む2価の基を表し、Aは少なくとも2個の炭素原子
を含む2価の基を表すものを、また、ジアミンは次の式
(b)で式(b)中のBは30個以下の炭素原子を有す
る2価の基で表すものをそれぞれ用いることができる。
H2 N−B−NH2 (b
)なお、 式(a)のAおよび、式(b)のBは同一
か、または異なることができ、また13個よりも少ない
炭素原子を持っている直鎖のもしくは分岐したアルキレ
ン基か、環の中に5個もしくは6個の炭素原子をもって
いる環状アルキレン基か、O,NおよびS原子の少なく
とも1個を含む異種環状基か、またはフェニレンもしく
は多環状芳香族基であることもできる。これらの種々の
基は反応温度70〜170℃、反応時間30〜350分
の反応条件のもとで不必要な副反応を与えない置換基を
もっていてもよい。The unsaturated bis-imide is represented by (a) in Chemical Formula 1 at the end of the specification, in which D represents a divalent group containing a carbon-carbon double bond, and A represents at least two Diamines are represented by the following formula (b), and B in formula (b) is a divalent group having 30 or less carbon atoms. Can be used. H2 NB-NH2 (b
) Note that A in formula (a) and B in formula (b) may be the same or different and may be a linear or branched alkylene group having fewer than 13 carbon atoms or a ring group. It can also be a cyclic alkylene radical having 5 or 6 carbon atoms in the radical, a heterocyclic radical containing at least one of O, N and S atoms, or a phenylene or polycyclic aromatic radical. These various groups may have substituents that do not cause unnecessary side reactions under the reaction conditions of a reaction temperature of 70 to 170°C and a reaction time of 30 to 350 minutes.
【0011】式(a)のAおよび、式(b)のBはまた
、沢山のフェニレン基か、または直接にまたは2価の原
子または次の様な群で結合された脂環状の基を表わすこ
ともできる。たとえば、それらは酸素もしくは硫黄か、
炭素原子1個から3個のアルキレンの群か、または次の
群の内の1つである。A in formula (a) and B in formula (b) also represent a number of phenylene groups or alicyclic groups bonded directly or by divalent atoms or groups such as You can also do that. For example, are they oxygen or sulfur?
An alkylene group of 1 to 3 carbon atoms or one of the following groups:
【0012】−NR4 −,−P(O)R3 −,−N
=N−, −O=N−,−CO−O−,−CONH−
,−SiR3 R4−, −NY−CO−X−CO−
NY−,−O−CO−X−CO−O−,−SO2 −,
および明細書末の化学式(c)の群の中の一つなど。-NR4 -, -P(O)R3 -, -N
=N-, -O=N-, -CO-O-, -CONH-
, -SiR3 R4-, -NY-CO-X-CO-
NY-, -O-CO-X-CO-O-, -SO2 -,
and one of the group of chemical formula (c) at the end of the specification.
【0013】なお、これらの式中R3 ,R4 および
Yは各々炭素原子1個から4個のアルキル基、環中に5
個もしく6個の炭素原子を持つ環状アルキル基、もしく
はフェニルもしくは多環状芳香族基を表し、Xは13個
よりも少ない炭素原子を持っている直鎖もしくは分岐し
たアルキレン基、環の中に5個もしくは6個の炭素原子
をもっている環状アルキレン基、または単環もしくは多
環状アリレン基を表す。In these formulas, R3, R4 and Y each have 1 to 4 carbon atoms, and each has 5 carbon atoms in the ring.
represents a cyclic alkyl group having 1 or 6 carbon atoms, or a phenyl or polycyclic aromatic group, where X is a straight-chain or branched alkylene group having fewer than 13 carbon atoms, It represents a cyclic alkylene group having 5 or 6 carbon atoms, or a monocyclic or polycyclic arylene group.
【0014】なお、前記の式(a)の基Dは、明細書末
の化学式1の(d)のエチレン系無水物から誘導される
もので、例えばマレイン酸無水物、シトラコン酸無水物
、テトラヒドロフタル酸無水物、イタコン酸無水物、お
よびシクロジエンとこれらの無水物の1つとの間に起こ
るディ−ルスアルダ−反応の生成物を表すこともできる
。The group D in formula (a) above is derived from the ethylene anhydride of chemical formula 1 (d) at the end of the specification, such as maleic anhydride, citraconic anhydride, tetrahydrocarbon anhydride, etc. It can also represent phthalic anhydride, itaconic anhydride, and the product of a Diels-Alder reaction between a cyclodiene and one of these anhydrides.
【0015】使用することのできる式(a)の好ましい
不飽和ビス−イミドには次のものが挙げられる。Preferred unsaturated bis-imides of formula (a) that can be used include:
【0016】マレイン酸N・N−エチレン−ビス−イミ
ド、マレイン酸N・N−ヘキサメチレン−ビス−イミド
、マレイン酸N・N−メタフェニレン−ビス−イミド、
マレイン酸N・N−パラフェニレン−ビス−イミド、マ
レイン酸N・N−4・4−ジフェニルメタン−ビス−イ
ミド〔通常、N・N−メチレンビス(N−フェニルマレ
イミド)とも言われる〕、マレイン酸N・N−4・4−
ジフェニルエ−テル−ビス−イミド、マレイン酸N・N
−4・4−ジフェニルスルフォン−ビス−イミド、マレ
イン酸N・N−4・4−ジシクロヘキシルメタン−ビス
−イミド、マレイン酸N・N−α・α−4・4−ジメチ
レンシクロヘキサン−ビス−イミド、マレイン酸N・N
−メタキシリレン−ビス−イミド、マレイン酸N・N−
ジフェニルシクロキサン−ビス−イミド、1・3−ビス
(2−p−アニリノプロピリデン)ベンゼン−ビス−イ
ミド、1・4−ビス(2−p−アニリノプロピリデン)
ベンゼン−ビス−イミド、1・4−ビス(2−m−アニ
リノプロピリデン)ベンゼン−ビス−イミド、4・4−
メチレンジ−2・6−キシリジン−ビス−イミド、4・
4−メチレンジ−2・6−ジエチルアニリン−ビス−イ
ミド、4・4−ジアミノ−3・3−ジエチル−5・5−
ジメチルジフェニルメタン−ビス−イミド、4・4−メ
チレンジ−2・6−ジイソプロピルアニリン−ビス−イ
ミド、2・5−ジメチル−p−フェニレンジアミン−ビ
ス−イミド、2・2−ビス(4−アミノフェニル)プロ
パン−ビス−イミド、2・4−ジアミノメシチレン−ビ
ス−イミド、および、3・5−ジエチル−2・4−トリ
レンジアミン−ビス−イミドなど。Maleic acid N·N-ethylene-bis-imide, maleic acid N·N-hexamethylene-bis-imide, maleic acid N·N-metaphenylene-bis-imide,
Maleic acid N.N-paraphenylene-bis-imide, maleic acid N.N-4.4-diphenylmethane-bis-imide [usually also referred to as N.N-methylenebis (N-phenylmaleimide)], maleic acid N.・N-4・4-
Diphenyl ether bis-imide, maleic acid N/N
-4,4-diphenylsulfone-bis-imide, maleic acid N・N-4,4-dicyclohexylmethane-bis-imide, maleic acid N・N-α・α-4,4-dimethylenecyclohexane-bis-imide , maleic acid N・N
- metaxylylene-bis-imide, maleic acid N/N-
Diphenylcycloxane-bis-imide, 1,3-bis(2-p-anilinopropylidene)benzene-bis-imide, 1,4-bis(2-p-anilinopropylidene)
Benzene-bis-imide, 1,4-bis(2-m-anilinopropylidene)benzene-bis-imide, 4,4-
Methylenedi-2,6-xylidine-bis-imide, 4.
4-methylenedi-2,6-diethylaniline-bis-imide, 4,4-diamino-3,3-diethyl-5,5-
Dimethyldiphenylmethane-bis-imide, 4,4-methylenedi-2,6-diisopropylaniline-bis-imide, 2,5-dimethyl-p-phenylenediamine-bis-imide, 2,2-bis(4-aminophenyl) Propane-bis-imide, 2,4-diaminomesitylene-bis-imide, 3,5-diethyl-2,4-tolylenediamine-bis-imide, and the like.
【0017】また、使用することのできる式(b)のジ
アミンの実例には次のものがある。4・4−ジアミノジ
シクロヘキシルメタン、1・4−ジアミノシクロヘキサ
ン、2・6−ジアミノピリジン、メタフェニンジアミン
、パラフェニンジアミン、4・4−ジアミノジフェニル
メタン、2・2−ビス−(4−アミノフェニル)プロパ
ン、ベンジジン、4・4−ジアミノフェニルオキサイド
、4・4−ジアミノジフェニルサルファイド、4・4−
ジアミノジフェニルスルフォン、ビス−(4−アミノフ
ェニル)ジフェニルシラン、ビス−(4−アミノフェニ
ル)メチルホスフィンオキサイド、ビス−(3−アミノ
フェニル)メチルホスフィンオキサイド、ビス−(4−
アミノフェニル)フェニルホスフィンオキサイド、ビス
−(4−アミノフェニル)フェニラミン、1・5−ジア
ミノナフタレン、メタキシリレンジアミン、パラキシリ
レンジアミン、1・1−ビス−(パラアミノフェニル)
フタラン、ヘキサメチレンジアミン、1・3−ビス(2
−p−アニリノプロピリデン)ベンゼン、1・4−ビス
(2−p−アニリノプロピリデン)ベンゼン、1・4−
ビス(2−m−アニリノプロピリデン)ベンゼン、4・
4−メチレンジ−2・6−キシリジン、4・4−メチレ
ンジ−2・6−ジエチルアニリン、4・4−ジアミノ−
3・3−ジエチル−5・5−ジメチルジフェニルメタン
、4・4−メチレンジ−2・6−ジイソプロピルアニリ
ン、2・5−ジメチル−p−フェニレンジアミン、2・
2−ビス(4−アミノフェニル)プロパン、2・4−ジ
アミノメシチレン、および、3・5−ジエチル−2・4
−トリレンジアミンなど。Examples of diamines of formula (b) that can be used include the following: 4,4-diaminodicyclohexylmethane, 1,4-diaminocyclohexane, 2,6-diaminopyridine, metaphenynediamine, paraphenynediamine, 4,4-diaminodiphenylmethane, 2,2-bis-(4-aminophenyl) ) Propane, benzidine, 4,4-diaminophenyl oxide, 4,4-diaminodiphenyl sulfide, 4,4-
Diaminodiphenylsulfone, bis-(4-aminophenyl)diphenylsilane, bis-(4-aminophenyl)methylphosphine oxide, bis-(3-aminophenyl)methylphosphine oxide, bis-(4-
(aminophenyl) phenylphosphine oxide, bis-(4-aminophenyl) pheniramine, 1,5-diaminonaphthalene, meta-xylylene diamine, para-xylylene diamine, 1,1-bis-(para-aminophenyl)
Phthalane, hexamethylene diamine, 1,3-bis(2
-p-anilinopropylidene)benzene, 1,4-bis(2-p-anilinopropylidene)benzene, 1,4-
Bis(2-m-anilinopropylidene)benzene, 4.
4-methylenedi-2,6-xylidine, 4,4-methylenedi-2,6-diethylaniline, 4,4-diamino-
3,3-diethyl-5,5-dimethyldiphenylmethane, 4,4-methylenedi-2,6-diisopropylaniline, 2,5-dimethyl-p-phenylenediamine, 2.
2-bis(4-aminophenyl)propane, 2,4-diaminomesitylene, and 3,5-diethyl-2,4
- Tolylene diamine etc.
【0018】そして、上記のビス−イミドとジアミンと
を反応させることによって付加型のポリイミド樹脂を調
製することができる。ビス−イミドとジアミンとの配合
比は、モル比でジアミン1に対してビス−イミドが1.
7〜2.5の範囲が好ましい。1.7よりビス−イミド
が少ないと高分子量の生成が多くなって硬化時間が短く
なり取扱に問題が生じる傾向があり、また、2.5より
ビス−イミドが多いと未反応原料が多く残存し易くなる
。反応はビス−イミドとジアミンとをN−メチルピロリ
ドン(NMP)やN,N−ジメチルアセトアミド(DM
Ac)などの溶剤に溶解した状態で行うことができるも
のであり、反応の際の加熱温度は70〜170℃程度の
範囲で行うことができ、反応時間は30〜350分程度
の範囲で行うことができる。An addition type polyimide resin can be prepared by reacting the above bis-imide with a diamine. The molar ratio of bis-imide and diamine is 1 part bis-imide to 1 part diamine.
The range of 7 to 2.5 is preferable. If the bis-imide content is less than 1.7, the production of high molecular weight increases, resulting in a short curing time, which tends to cause problems in handling, while if the bis-imide content is more than 2.5, a large amount of unreacted raw material remains. It becomes easier to do. The reaction involves combining bis-imide and diamine with N-methylpyrrolidone (NMP) or N,N-dimethylacetamide (DM).
It can be carried out in a state dissolved in a solvent such as Ac), and the heating temperature during the reaction can be carried out in the range of about 70 to 170°C, and the reaction time can be carried out in the range of about 30 to 350 minutes. be able to.
【0019】アリル基を有するビスフェノ−ルAの誘導
体としては、ビスフェノ−ルA(以下BPAと記載する
)のアリルエーテル類、たとえば三井東圧社製のBPA
−AEなどやジアリルビスフェノ−ルA類、たとえば三
井東圧社製のBPA−CAなどを用いることができる。
これらは液体のためワニスに用いるにのに適し、揮発性
が製造条件に適するなどの点で好ましい。As derivatives of bisphenol A having an allyl group, allyl ethers of bisphenol A (hereinafter referred to as BPA), such as BPA manufactured by Mitsui Toatsu Co., Ltd.
-AE, diallylbisphenol A, such as BPA-CA manufactured by Mitsui Toatsu Co., Ltd., can be used. These are preferable because they are liquid and suitable for use in varnishes, and their volatility is suitable for manufacturing conditions.
【0020】本発明のポリイミド樹脂組成物は、前記の
ポリイミド樹脂100重量部(以下、部と記す)にアリ
ル基を有するBPAの誘導体を10〜200重量部の範
囲となる量を配合し、さらに、促進剤としてイミダゾ−
ル類や有機過酸化物などと、希釈溶媒としてジメチルホ
ルムアミド(DMF),DMAc,ジオキサン、NMP
,MEKなどの中から適宜、単独または、混合して用い
たものからなる樹脂組成物である。アリル基を有するB
PAの誘導体の添加量を増すと、それから得られる積層
板の誘電率が低下する傾向にあり、10部未満の添加で
は誘電率の低下の効果が殆ど認められず、200部を超
して使用すると誘電率は低下するが、積層板として硬く
、脆いものとなり好ましくない。また、これらのアリル
基を有するBPAの誘導体は、反応性希釈剤としても作
用するために、樹脂組成物の固有粘度と表面張力を低下
させる。したがって、基材の繊維間に樹脂組成物が良く
浸透し、基材への樹脂の充填が著しく向上したプリプレ
グを得ることができる。そして、このプリプレグが硬化
した積層板においては、スルホ−ルメッキのメッキの染
み込み長さが著しく短かくなり、同時にスルホ−ルの内
壁が著しく平滑に仕上がり、これらによってスルホ−ル
と内層回路との絶縁性が確保されスルホ−ルの信頼性が
著しく向上するなどの効果を得ることができる。The polyimide resin composition of the present invention includes 100 parts by weight (hereinafter referred to as "parts") of the above-mentioned polyimide resin mixed with an amount ranging from 10 to 200 parts by weight of a BPA derivative having an allyl group; , imidazo- as accelerator
and organic peroxides, dimethylformamide (DMF), DMAc, dioxane, NMP as diluting solvents.
, MEK, etc., used alone or in combination. B having an allyl group
When the amount of the PA derivative added increases, the dielectric constant of the resulting laminate tends to decrease; when less than 10 parts is added, there is almost no effect of lowering the dielectric constant, and when more than 200 parts are added, the dielectric constant of the resulting laminate tends to decrease. This lowers the dielectric constant, but the laminate becomes hard and brittle, which is not preferable. In addition, these allyl group-containing BPA derivatives also act as reactive diluents, thereby lowering the intrinsic viscosity and surface tension of the resin composition. Therefore, the resin composition penetrates well between the fibers of the base material, and it is possible to obtain a prepreg in which the filling of the resin into the base material is significantly improved. In the laminates cured with this prepreg, the penetration length of the through-hole plating is significantly shortened, and at the same time, the inner walls of the through-holes are finished extremely smooth, which improves the insulation between the through-holes and the inner layer circuits. Effects such as ensuring properties and significantly improving the reliability of the through hole can be obtained.
【0021】電子機械装置の安全化のために要求される
難燃性の確保には、難燃剤として反応基を有する臭素化
樹脂を前記ポリイミド樹脂組成物に配合する必要があり
、特に、反応基を有する臭素化樹脂の配合量をポリイミ
ド樹脂100重量部に対して、臭素含有重量で1〜50
重量部の範囲で用いる必要がある。その理由は、1重量
部未満では、難燃性が得られず、50重量部を超して用
いると得られる積層板の耐熱性が悪くなり、誘電率も上
昇するなど性能が低下するからである。また、反応基を
有する臭素化樹脂でなければならないのは、難燃剤を前
記ポリイミド樹脂の側鎖、末端の基と反応させ、そのポ
リイミド樹脂構造の骨格内に取り込むことによって、初
めて層間接着力、スルホ−ル信頼性、耐熱性などと難燃
性の性能を兼備したものが得られるからである。[0021] In order to ensure the flame retardancy required for the safety of electronic mechanical devices, it is necessary to blend a brominated resin having a reactive group as a flame retardant into the polyimide resin composition. The blending amount of the brominated resin having the following is 1 to 50 parts by weight of bromine per 100 parts by weight of the polyimide resin.
It is necessary to use within the range of parts by weight. This is because if the amount is less than 1 part by weight, flame retardancy cannot be obtained, and if it is used in excess of 50 parts by weight, the heat resistance of the resulting laminate will deteriorate, the dielectric constant will increase, and the performance will deteriorate. be. In addition, the brominated resin must have a reactive group because the flame retardant is reacted with the side chains and terminal groups of the polyimide resin and incorporated into the skeleton of the polyimide resin structure, thereby increasing the interlayer adhesive strength. This is because it is possible to obtain a product that combines throughhole reliability, heat resistance, and flame retardant performance.
【0022】したがって、反応基として、エポキシ基、
アリル基、ビニル基などを有する炭素原子1個から4個
のアルキル、環中に5個もしくは6個の炭素原子を持つ
環状アルキル、もしくはフェニルもしくは多環状芳香族
、または、13個よりも少ない炭素原子を持っている直
鎖もしくは分岐したアルキレン、環の中に5個もしくは
6個の炭素原子をもっている環状アルキレン、または単
環もしくは多環状アリレンなどの臭素化樹脂の中から適
宜用いることができる。特に、好ましい反応基としては
、耐熱性、層間接着力を維持、もしくは向上させる点で
、エポキシ基をあげることができる。[0022] Therefore, as a reactive group, an epoxy group,
Alkyl of 1 to 4 carbon atoms with allyl group, vinyl group, etc., cyclic alkyl with 5 or 6 carbon atoms in the ring, or phenyl or polycyclic aromatic, or less than 13 carbon atoms A brominated resin such as a linear or branched alkylene having atoms, a cyclic alkylene having 5 or 6 carbon atoms in the ring, or a monocyclic or polycyclic arylene can be used as appropriate. In particular, an epoxy group can be mentioned as a preferable reactive group since it maintains or improves heat resistance and interlayer adhesive strength.
【0023】以上のポリイミド樹脂組成物からプリプレ
グを得るには、前記のポリイミド樹脂組成物を基材に含
浸させた後、希釈溶媒を乾燥蒸発させつつポリイミド樹
脂と反応性希釈剤であるアリル基を有するBPAの誘導
体との反応を進行させ基材中の樹脂組成物を半硬化させ
て得られたものである。さらに難燃性を得るために含有
した反応性を有する臭素化樹脂もこのプリプレグ調製時
に、反応基がポリイミド樹脂の側鎖、末端の基と反応し
、ポリイミド樹脂構造の骨格内に取り込まれるのである
。In order to obtain a prepreg from the above polyimide resin composition, after impregnating the base material with the above polyimide resin composition, the allyl group which is a reactive diluent with the polyimide resin is mixed with the polyimide resin while drying and evaporating the diluting solvent. It is obtained by semi-curing the resin composition in the base material by proceeding with the reaction with the BPA derivative contained in the base material. Furthermore, the reactive brominated resin contained in order to obtain flame retardancy reacts with the side chains and terminal groups of the polyimide resin during the preparation of this prepreg, and is incorporated into the skeleton of the polyimide resin structure. .
【0024】前記のポリイミド樹脂組成物を含浸させる
基材の種類は、特に限定されない。通常は、ガラスクロ
ス等が用いられる。この他、石英繊維布等の無機繊維の
布、もしくはこれらの不織布、ポリイミド樹脂繊維の布
や不織布等の高耐熱性有機繊維布等を用いることができ
る。[0024] The type of substrate impregnated with the polyimide resin composition is not particularly limited. Usually, glass cloth or the like is used. In addition, inorganic fiber cloths such as quartz fiber cloths, nonwoven fabrics thereof, and highly heat-resistant organic fiber cloths such as polyimide resin fiber cloths and nonwoven fabrics can be used.
【0025】半硬化させる時の温度は110 〜155
℃で行うのが好ましい。155 ℃を超えると、特に
アリル基を有するBPAの誘導体の反応が進み過ぎ、得
られるプリプレグの層間接着力が低下し、誘電率の低下
する効果が小さくなり、110 ℃未満では、処理に時
間がかかり実用的でないからである。半硬化とは、熱硬
化性樹脂の硬化過程において、一般にBステ−ジと言わ
れる範囲のものであり、さらに熱が加われば樹脂が流動
し、硬化反応が起こりえる状態のものを言う。[0025] The temperature during semi-curing is 110 to 155
Preferably, it is carried out at °C. If the temperature exceeds 155 °C, the reaction of BPA derivatives having allyl groups will proceed too much, the interlayer adhesion of the obtained prepreg will decrease, and the effect of lowering the dielectric constant will be reduced. This is because it is not practical. Semi-cured refers to the range generally referred to as the B stage in the curing process of thermosetting resins, and refers to a state in which the resin flows when heat is applied and a curing reaction can occur.
【0026】次には、前記のポリイミド樹脂のプリプレ
グをを1枚以上積層してポリイミド樹脂の積層板を作る
ことができる。すなわち、必要に応じて、銅、ニッケル
、アルミニウムなどの金属箔あるいは、回路形成された
金属箔などとプリプレグを積層成形してつくられる。
その積層成形は常法により行うことができる。Next, a polyimide resin laminate can be made by laminating one or more of the polyimide resin prepregs described above. That is, it is made by laminating and molding a prepreg with a metal foil such as copper, nickel, or aluminum, or a metal foil with a circuit formed thereon, as necessary. The lamination molding can be performed by a conventional method.
【0027】なお、この積層板には、前記の化学構造の
ポリイミド樹脂に、アリル基を有するBPAの誘導体を
配合したポリイミド樹脂組成物が用いられ、樹脂組成物
の基材への充填が十分に行われている。したがって、こ
の積層板を用いれば、誘電率が低く、スルホ−ル信頼性
が著しく高い積層板を得ることが可能となり、このアリ
ル基を有するBPAの誘導体を配合したポリイミド樹脂
組成物に、さらに反応基をもつ臭素化樹脂を配合したポ
リイミド樹脂組成物を用いた積層板においては、層間接
着力、スルホ−ル信頼性、および、耐熱性と難燃性の兼
備した積層板を得ることが可能となり、多層積層板、特
に、8層以上の多層積層板においては、有用な特性を有
することになるのである。[0027] This laminate uses a polyimide resin composition in which a BPA derivative having an allyl group is blended with a polyimide resin having the above chemical structure, and the resin composition is sufficiently filled into the base material. It is being done. Therefore, by using this laminate, it is possible to obtain a laminate with a low dielectric constant and extremely high throughhole reliability. It is possible to obtain a laminate using a polyimide resin composition blended with a brominated resin having a brominated resin having interlaminar adhesion strength, through-hole reliability, heat resistance, and flame retardancy. , multilayer laminates, especially multilayer laminates with eight or more layers, have useful properties.
【0028】本発明の樹脂組成物は、以上の記載に限定
されるものではなく、他に電線被覆用樹脂、半導体封止
用樹脂、耐熱性成形材料用樹脂、低誘電率や低吸湿性成
形材料用樹脂としても有用なものである。The resin composition of the present invention is not limited to the above description, but can also be used as a resin for covering electric wires, a resin for semiconductor encapsulation, a resin for heat-resistant molding materials, a low dielectric constant or low moisture absorption molding material, etc. It is also useful as a material resin.
【0029】次に、以上の発明を実施例と比較例によっ
て説明する。Next, the above invention will be explained with reference to Examples and Comparative Examples.
【0030】[0030]
【実施例】実施例1〜20と比較例1,2は、表1の上
半分に示される各々の配合のポリイミド樹脂組成物でな
り、これらの樹脂組成物からなる積層板の特性値を表1
の下半分に示した。[Example] Examples 1 to 20 and Comparative Examples 1 and 2 were made of polyimide resin compositions having the respective formulations shown in the upper half of Table 1, and the characteristic values of laminates made of these resin compositions are shown below. 1
Shown in the bottom half of .
【0031】表1のポリイミド樹脂は、それぞれ次のも
のを用いた。#1は、マレイン酸N,N−4・4−ジフ
ェニルメタン−ビス−イミドと4・4−ジアミノジフェ
ニルメタンとから合成されたもので、アルキル基または
、アルキレン基を樹脂の分子中に含有しない。#2は、
1・4−ビス(2−p−アニリノプロピリデン)ベンゼ
ン−ビス−イミドと1・4−ビス(2−m−アニリノプ
ロピリデン)ベンゼンとから合成されたもので、アルキ
ル基を樹脂の分子中に17重量%含有する。The following polyimide resins in Table 1 were used. #1 is synthesized from maleic acid N,N-4.4-diphenylmethane-bis-imide and 4.4-diaminodiphenylmethane, and does not contain an alkyl group or an alkylene group in the resin molecule. #2 is
It is synthesized from 1,4-bis(2-p-anilinopropylidene)benzene-bis-imide and 1,4-bis(2-m-anilinopropylidene)benzene, and the alkyl group is added to the resin. Contains 17% by weight in the molecule.
【0032】アリル基を有するBPAの誘導体は、BP
Aのアリルエーテル類として三井東圧社製のBPA−A
E、誘電率2.5のものを、ジアリルビスフェノ−ルA
類として、三井東圧社製のBPA−CA、誘電率3.7
のものをそれぞれ用いた。The derivative of BPA having an allyl group is BP
As the allyl ether of A, BPA-A manufactured by Mitsui Toatsu Co., Ltd.
E, dielectric constant 2.5, diallylbisphenol A
As a similar product, BPA-CA manufactured by Mitsui Toatsu Co., Ltd. has a dielectric constant of 3.7.
Each of these was used.
【0033】難燃剤の臭素化樹脂は、それぞれ明細書末
の化学式1の■、■のものを用い、表1、表2の配合量
の前に■■で種類を明示した。■は、反応型の臭素化フ
ェノ−ルノボラック型エポキシ樹脂(日本化薬社製、B
REN−S)■は、非反応型の多環状芳香族の臭素化樹
脂(グレ−トレ−ク社製、BC58)また、促進剤は、
いずれも2エチル−4メチルイミダゾ−ル( 2E4M
Z、四国化成社製)を、希釈溶媒は、樹脂固形分率が約
55 〜70%になるようにDMFをそれぞれに用い
た。The brominated resins used as flame retardants are the ones indicated by (1) and (2) in Chemical Formula 1 at the end of the specification, respectively, and the types are specified with (■) before the compounding amounts in Tables 1 and 2. ■ is a reactive brominated phenol novolac type epoxy resin (manufactured by Nippon Kayaku Co., Ltd., B
REN-S)■ is a non-reactive polycyclic aromatic brominated resin (manufactured by Gray Lake Co., Ltd., BC58), and the accelerator is
Both are 2ethyl-4methylimidazole (2E4M
Z, manufactured by Shikoku Kasei Co., Ltd.), and DMF was used as the diluting solvent so that the resin solid content was about 55 to 70%.
【0034】表1,表2の実施例1〜20、比較例1、
2の誘電率の値の対比からポリイミド樹脂にアリル基を
有するBPAの誘導体を配合すると誘電率の低下するこ
とが確認できた。Examples 1 to 20 in Tables 1 and 2, Comparative Example 1,
From the comparison of the dielectric constant values of No. 2, it was confirmed that the dielectric constant decreases when a BPA derivative having an allyl group is blended into the polyimide resin.
【0035】さらに、実施例1〜3、実施例6〜8、実
施例10〜14、実施例16〜18の#1のポリイミド
樹脂と実施例4、5、9、15、19、20の#2のポ
リイミド樹脂の化学構造の対比から、アルキル基を樹脂
の分子中に11重量%以上含有する#2の場合、一層誘
電率の低下の効果を奏することが確認できた。この誘電
率の測定はJIS、C6481によって行った。Further, #1 polyimide resin of Examples 1 to 3, Examples 6 to 8, Examples 10 to 14, and Examples 16 to 18 and #1 of Examples 4, 5, 9, 15, 19, and 20 were added. From a comparison of the chemical structures of polyimide resin No. 2, it was confirmed that in the case of No. 2 containing 11% by weight or more of alkyl groups in the resin molecule, the dielectric constant was further reduced. The dielectric constant was measured according to JIS C6481.
【0036】また、実施例6〜10、14、15、18
、20の反応基を有する反応型の臭素化樹脂の配合では
、実施例11の反応基を持たない非反応型の臭素化樹脂
の配合に比べ層間接着力、耐熱性を高水準に維持したま
ま難燃性を確保できることが確認できた。この難燃性の
試験はUL−94 に準じて行った。[0036] Also, Examples 6 to 10, 14, 15, 18
The formulation of the reactive brominated resin having 20 reactive groups maintained a high level of interlayer adhesion and heat resistance compared to the formulation of the non-reactive brominated resin having no reactive groups in Example 11. It was confirmed that flame retardancy could be ensured. This flame retardancy test was conducted according to UL-94.
【0037】次に、表1、表2の樹脂組成物を厚み0.
1 mm、95g/m2 のEガラス布に含浸させ、1
40 ℃の乾燥機中で35〜60分間乾燥させることに
より各々のプリプレグを得た。このプリプレグを用いて
積層板は次の様にして形成した。Next, the resin compositions shown in Tables 1 and 2 were applied to a thickness of 0.
1 mm, 95 g/m2 E glass cloth was impregnated with 1
Each prepreg was obtained by drying in a dryer at 40°C for 35 to 60 minutes. A laminate was formed using this prepreg in the following manner.
【0038】前記のプリプレグの両面に18μm の両
面粗面化銅箔を置いて蒸気プレスを用いて、成形温度1
30 ℃、成形圧力30kg/cm2 、成形時間90
分間の条件で積層成形し、内層プリント配線板用の両面
銅張積層板を得た。このようにして得た両面銅張積層板
の銅箔をエッチング処理して回路形成し、黒化処理する
ことによって内層プリント配線板を作成し、35枚の内
層プリント配線板をそれぞれの間に上記と同じ4枚のプ
リプレグを介して重ねると共にその上下にさらに4枚の
プリプレグを介して35μm厚みの銅箔を重ね、6mm
の金型に納め、蒸気プレスを用いて5 kg/cm2
の加圧を行いつつ直ちに130 ℃まで加熱し、20分
間保持した。この後、30kg/cm2 の圧力で20
0 ℃に加熱し、120 分間保持した後、圧力をかけ
たまま室温まで冷却して両面銅張多層積層板を得た。[0038] A double-sided roughened copper foil of 18 μm was placed on both sides of the prepreg, and a steam press was used to heat the molding temperature to 1.
30℃, molding pressure 30kg/cm2, molding time 90
A double-sided copper-clad laminate for an inner layer printed wiring board was obtained by lamination molding under conditions of 1 minute. The copper foil of the double-sided copper-clad laminate thus obtained was etched to form a circuit and blackened to create an inner layer printed wiring board, and 35 inner layer printed wiring boards were placed between each of the above-mentioned inner layer printed wiring boards. The same 4 sheets of prepreg as above are layered, and 35 μm thick copper foil is layered above and below through 4 sheets of prepreg, and 6 mm thick.
5 kg/cm2 using a steam press.
While applying pressure, the mixture was immediately heated to 130°C and held for 20 minutes. After this, at a pressure of 30 kg/cm2,
After heating to 0°C and holding for 120 minutes, the mixture was cooled to room temperature while applying pressure to obtain a double-sided copper-clad multilayer laminate.
【0039】この積層板の層と層の間を90度方向に剥
がしたときの接着力を、1表,2表の特性値の層間接着
力〔kg/cm〕に示した。また、この積層板に0.4
mmφのドリルビットを用い、40000 rpmの
回転数、1回転当たりの送り速度50μ/revの条件
で1000穴あけ、常法によりスルホ−ルメッキを無電
解メッキと電解メッキとを併用して行い、990 〜1
000穴目のスルホ−ルの断面を顕微鏡で観察し、スル
ホ−ルメッキの際に生じるスルホ−ルのメッキ染み込み
長さとスルホ−ルの壁面粗さをそれぞれ測定し、その結
果を表1、表2の特性値の欄に示した。BPA−AEま
たは、および、BPA−CAを配合した実施例は、さら
に、反応型の難燃剤を配合した実施例のいずれにおいて
もスルホ−ルのメッキ染み込み長さもスルホ−ルの壁面
粗さも比較例1、2に比べ低減している。しかし、難燃
性を付与するのに、非反応型の臭素化樹脂の配合の実施
例11では、実施例10の反応型の臭素化樹脂の配合と
同様に、難燃性は得られるものの、耐熱性が低下する。
この耐熱性の低下に原因して、ドリル加工時の発熱でス
ルホ−ル壁面が荒れたり、クラックが発生する結果、ス
ルホ−ルのメッキ染み込み長さもスルホ−ルの壁面粗さ
も比較例1と同様悪くなり、アリル基を有するBPAの
誘導体の配合の効果がなくなってしまうことになる。反
応型の臭素化樹脂の配合では、難燃性が確保でき、耐熱
性を低下させることがない。したがって、ドリル加工時
の発熱でスルホ−ル壁面が荒れたり、クラックが発生す
ることを阻止するので、スルホ−ルのメッキ染み込み長
さもスルホ−ルの壁面粗さも比較例に比べ著しく低減し
ている。The adhesive strength when the layers of this laminate were peeled off in a 90 degree direction is shown in Tables 1 and 2 as interlayer adhesive strength [kg/cm] in the characteristic values. Also, this laminate has 0.4
Using a mmφ drill bit, 1,000 holes were drilled at a rotation speed of 40,000 rpm and a feed rate of 50 μ/rev per rotation, and through-hole plating was performed using a combination of electroless plating and electrolytic plating using a conventional method. 1
The cross-section of the 000th hole was observed with a microscope, and the plating penetration length and through-hole wall roughness, which occur during through-hole plating, were measured, and the results are shown in Tables 1 and 2. shown in the column of characteristic values. In addition, the examples in which BPA-AE or BPA-CA were blended were the same as those in the examples in which reactive flame retardants were blended. This is reduced compared to 1 and 2. However, in Example 11, in which a non-reactive brominated resin was blended to impart flame retardancy, flame retardance was obtained in the same manner as in Example 10, in which a reactive brominated resin was blended. Heat resistance decreases. Due to this decrease in heat resistance, the through-hole wall surface becomes rough and cracks occur due to the heat generated during drilling, and as a result, the through-hole plating penetration length and through-hole wall surface roughness are the same as in Comparative Example 1. The effect of blending the BPA derivative having an allyl group will be lost. By blending a reactive brominated resin, flame retardancy can be ensured without reducing heat resistance. This prevents the through-hole wall surface from becoming rough or cracking due to heat generated during drilling, and the through-hole plating penetration length and through-hole wall roughness are significantly reduced compared to comparative examples. .
【0040】スルホ−ルのメッキ染み込み長さやスルホ
−ルの壁面粗さの両特性値の小さいことは、いずれもス
ルホ−ルメッキと内層回路との絶縁性が悪くなるのを阻
止し、スルホ−ル信頼性の向上をもたらすものである。The small characteristic values of the penetration length of the through hole plating and the roughness of the wall surface of the through hole both prevent deterioration of the insulation between the through hole plating and the inner layer circuit, and prevent the through hole plating from deteriorating. This improves reliability.
【0041】[0041]
【発明の効果】本発明のポリイミド樹脂組成物を用いて
、そのプリプレグを得、そのプリプレグを積層し硬化さ
せてなる積層板は、積層板の誘電率を低下させ電気信号
の伝播速度の高速化に適合し、樹脂の基材への良好な充
填性による高いスルホ−ル信頼性などよって一層の多層
積層板を、さらに、難燃性によって安全性の向上を可能
にする。Effects of the Invention: A laminate obtained by obtaining a prepreg using the polyimide resin composition of the present invention, laminating and curing the prepreg reduces the dielectric constant of the laminate, and increases the propagation speed of electric signals. It is suitable for use in a wide variety of applications, and has high through-hole reliability due to good filling properties of the resin into the base material, making it possible to create a single-layer multilayer laminate, and further improving safety due to its flame retardancy.
【0042】[0042]
【化学式1】[Chemical formula 1]
【0043】[0043]
【表1】[Table 1]
【0044】[0044]
【表2】[Table 2]
Claims (15)
ミド樹脂100重量部に対して10〜200重量部の範
囲となる量で配合されるアリル基を有するビスフェノ−
ルAの誘導体、3)および、促進剤、溶媒などからなる
ポリイミド樹脂組成物。1) 1) polyimide resin; 2) bisphenol having an allyl group, which is blended in an amount ranging from 10 to 200 parts by weight based on 100 parts by weight of the polyimide resin;
3) A polyimide resin composition comprising a derivative of Le A, 3), an accelerator, a solvent, and the like.
ス−イミドとジアミンとを反応させて調製されるポリイ
ミド樹脂で,アルキル基または、メチレン基を除くアル
キレン基の少なくとも一方をポリイミド樹脂中に11重
量%以上含有することを特徴とする請求項1記載のポリ
イミド樹脂組成物。2. The polyimide resin of claim 1 is a polyimide resin prepared by reacting an unsaturated bis-imide with a diamine, and wherein at least one of an alkyl group or an alkylene group other than a methylene group is added to the polyimide resin. The polyimide resin composition according to claim 1, wherein the polyimide resin composition contains at least % by weight.
ノ−ルAの誘導体が、ビスフェノ−ルAのアリルエーテ
ル類または、および、ジアリルビスフェノ−ルA類であ
ることを特徴とする請求項1記載のポリイミド樹脂組成
物。3. Claim 1, wherein the derivative of bisphenol A having an allyl group according to claim 1 is an allyl ether of bisphenol A or a diallylbisphenol A class. The polyimide resin composition described.
にポリイミド樹脂100重量部に対して臭素含有重量で
1〜50重量部の範囲の反応基を有する臭素化樹脂を配
合してなることを特徴とする請求項1記載のポリイミド
樹脂組成物。4. The polyimide resin composition according to claim 1 is blended with a brominated resin having a reactive group in an amount of 1 to 50 parts by weight of bromine based on 100 parts by weight of the polyimide resin. The polyimide resin composition according to claim 1.
樹脂が、臭素化エポキシ樹脂であることを特徴とする請
求項1記載のポリイミド樹脂組成物。5. The polyimide resin composition according to claim 1, wherein the brominated resin having a reactive group according to claim 4 is a brominated epoxy resin.
ミド樹脂100重量部に対して10〜200重量部の範
囲となる量で配合されるアリル基を有するビスフェノ−
ルAの誘導体、3)および、促進剤、溶媒などからなる
ポリイミド樹脂組成物を基材に含浸させ、半硬化させた
ことを特徴とするポリイミド樹脂のプリプレグ。6. 1) polyimide resin; 2) bisphenol having an allyl group, which is blended in an amount ranging from 10 to 200 parts by weight per 100 parts by weight of the polyimide resin;
1. A polyimide resin prepreg characterized in that a base material is impregnated with a polyimide resin composition comprising a derivative of Le A, 3), an accelerator, a solvent, etc., and semi-cured.
ス−イミドとジアミンとを反応させて調製されるポリイ
ミド樹脂で,アルキル基または、メチレン基を除くアル
キレン基の少なくとも一方をポリイミド樹脂中に11重
量%以上含有することを特徴とする請求項6記載のポリ
イミド樹脂のプリプレグ。7. The polyimide resin of claim 6 is a polyimide resin prepared by reacting an unsaturated bis-imide with a diamine, and wherein at least one of an alkyl group or an alkylene group other than a methylene group is added to the polyimide resin. The polyimide resin prepreg according to claim 6, characterized in that the polyimide resin prepreg contains at least % by weight.
ノ−ルAの誘導体が、ビスフェノ−ルAのアリルエーテ
ル類または、および、ジアリルビスフェノ−ルA類であ
ることを特徴とする請求項6記載のポリイミド樹脂のプ
リプレグ。8. Claim 6, wherein the derivative of bisphenol A having an allyl group according to claim 6 is an allyl ether of bisphenol A or a diallylbisphenol A class. Prepreg of the polyimide resin described.
にポリイミド樹脂100重量部に対して臭素含有重量で
1〜50重量部の範囲の反応基を有する臭素化樹脂を配
合してなることを特徴とする請求項6記載のポリイミド
樹脂のプリプレグ。9. The polyimide resin composition according to claim 6 is blended with a brominated resin having a reactive group in an amount of 1 to 50 parts by weight of bromine based on 100 parts by weight of the polyimide resin. The polyimide resin prepreg according to claim 6.
化樹脂が、臭素化エポキシ樹脂であることを特徴とする
請求項6記載のポリイミド樹脂のプリプレグ。10. The polyimide resin prepreg according to claim 6, wherein the brominated resin having a reactive group according to claim 9 is a brominated epoxy resin.
イミド樹脂100重量部に対して10〜200重量部の
範囲となる量で配合されるアリル基を有するビスフェノ
−ルAの誘導体、3)および、促進剤、溶媒などからな
るポリイミド樹脂組成物を基材に含浸させ、半硬化させ
たプリプレグを1枚以上積層して硬化させたことを特徴
とするポリイミド樹脂の積層板。11. 1) a polyimide resin, 2) a derivative of bisphenol A having an allyl group, which is blended in an amount ranging from 10 to 200 parts by weight per 100 parts by weight of the polyimide resin, 3), and A polyimide resin laminate, characterized in that a base material is impregnated with a polyimide resin composition comprising an accelerator, a solvent, etc., and one or more semi-cured prepregs are laminated and cured.
和ビス−イミドとジアミとを反応させて調製されるポリ
イミド樹脂で,アルキル基または、メチレン基を除くア
ルキレン基の少なくとも一方をポリイミド樹脂中に11
重量%以上含有することを特徴とする請求項11記載の
ポリイミド樹脂の積層板。12. The polyimide resin of claim 11 is a polyimide resin prepared by reacting an unsaturated bis-imide with diamide, wherein at least one of an alkyl group or an alkylene group other than a methylene group is added to the polyimide resin.
12. The polyimide resin laminate according to claim 11, wherein the polyimide resin contains at least % by weight.
フェノ−ルAの誘導体が、ビスフェノ−ルAのアリルエ
ーテル類または、および、ジアリルビスフェノ−ルA類
であることを特徴とする請求項11記載のポリイミド樹
脂の積層板。13. Claim 11, wherein the derivative of bisphenol A having an allyl group according to claim 11 is an allyl ether of bisphenol A or a diallylbisphenol A class. A laminate of the polyimide resin described above.
成物にポリイミド樹脂100重量部に対して臭素含有重
量で1〜50重量部の範囲の反応基を有する臭素化樹脂
を配合してなることを特徴とするポリイミド樹脂の積層
板。14. The polyimide resin composition according to claim 11 is blended with a brominated resin having a reactive group in an amount of 1 to 50 parts by weight based on bromine content based on 100 parts by weight of the polyimide resin. A laminate of polyimide resin.
樹脂が、臭素化エポキシ樹脂であることを特徴とする請
求項11記載のポリイミド樹脂の積層板。15. The polyimide resin laminate according to claim 11, wherein the brominated resin having a reactive group according to claim 14 is a brominated epoxy resin.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP40609390A JP2718267B2 (en) | 1990-12-25 | 1990-12-25 | Polyimide resin composition, prepreg and laminate thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP40609390A JP2718267B2 (en) | 1990-12-25 | 1990-12-25 | Polyimide resin composition, prepreg and laminate thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH04222861A true JPH04222861A (en) | 1992-08-12 |
JP2718267B2 JP2718267B2 (en) | 1998-02-25 |
Family
ID=18515717
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP40609390A Expired - Fee Related JP2718267B2 (en) | 1990-12-25 | 1990-12-25 | Polyimide resin composition, prepreg and laminate thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2718267B2 (en) |
-
1990
- 1990-12-25 JP JP40609390A patent/JP2718267B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP2718267B2 (en) | 1998-02-25 |
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