JPH0420985B2 - - Google Patents

Info

Publication number
JPH0420985B2
JPH0420985B2 JP61292859A JP29285986A JPH0420985B2 JP H0420985 B2 JPH0420985 B2 JP H0420985B2 JP 61292859 A JP61292859 A JP 61292859A JP 29285986 A JP29285986 A JP 29285986A JP H0420985 B2 JPH0420985 B2 JP H0420985B2
Authority
JP
Japan
Prior art keywords
magnetic field
thin film
microwave
film
space
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61292859A
Other languages
English (en)
Japanese (ja)
Other versions
JPS63145782A (ja
Inventor
Shunpei Yamazaki
Naoki Hirose
Mamoru Tashiro
Takashi Inushima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Semiconductor Energy Laboratory Co Ltd
Original Assignee
Semiconductor Energy Laboratory Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semiconductor Energy Laboratory Co Ltd filed Critical Semiconductor Energy Laboratory Co Ltd
Priority to JP29285986A priority Critical patent/JPS63145782A/ja
Publication of JPS63145782A publication Critical patent/JPS63145782A/ja
Publication of JPH0420985B2 publication Critical patent/JPH0420985B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
JP29285986A 1986-12-08 1986-12-08 薄膜形成方法 Granted JPS63145782A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP29285986A JPS63145782A (ja) 1986-12-08 1986-12-08 薄膜形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP29285986A JPS63145782A (ja) 1986-12-08 1986-12-08 薄膜形成方法

Publications (2)

Publication Number Publication Date
JPS63145782A JPS63145782A (ja) 1988-06-17
JPH0420985B2 true JPH0420985B2 (OSRAM) 1992-04-07

Family

ID=17787294

Family Applications (1)

Application Number Title Priority Date Filing Date
JP29285986A Granted JPS63145782A (ja) 1986-12-08 1986-12-08 薄膜形成方法

Country Status (1)

Country Link
JP (1) JPS63145782A (OSRAM)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63169387A (ja) * 1987-01-05 1988-07-13 Semiconductor Energy Lab Co Ltd 薄膜形成方法
JPH0715147B2 (ja) * 1987-01-05 1995-02-22 株式会社半導体エネルギ−研究所 薄膜形成方法
JPH0765177B2 (ja) * 1987-01-05 1995-07-12 株式会社半導体エネルギ−研究所 プラズマ処理方法
JPS63195266A (ja) * 1987-02-10 1988-08-12 Semiconductor Energy Lab Co Ltd 炭素膜がコーティングされた時計
JPH0676666B2 (ja) * 1987-02-10 1994-09-28 株式会社半導体エネルギ−研究所 炭素膜作製方法
US6835523B1 (en) 1993-05-09 2004-12-28 Semiconductor Energy Laboratory Co., Ltd. Apparatus for fabricating coating and method of fabricating the coating

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63121667A (ja) * 1986-11-10 1988-05-25 Semiconductor Energy Lab Co Ltd 薄膜形成装置

Also Published As

Publication number Publication date
JPS63145782A (ja) 1988-06-17

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term