JPH04206590A - Manufacture of flexible printed circuit board - Google Patents

Manufacture of flexible printed circuit board

Info

Publication number
JPH04206590A
JPH04206590A JP32955690A JP32955690A JPH04206590A JP H04206590 A JPH04206590 A JP H04206590A JP 32955690 A JP32955690 A JP 32955690A JP 32955690 A JP32955690 A JP 32955690A JP H04206590 A JPH04206590 A JP H04206590A
Authority
JP
Japan
Prior art keywords
film
flexible printed
printed circuit
circuit board
polyamic acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP32955690A
Other languages
Japanese (ja)
Inventor
Shinichi Mikami
真一 三上
Toshio Nakao
中尾 俊夫
Yoshiyuki Yamamori
義之 山森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Priority to JP32955690A priority Critical patent/JPH04206590A/en
Publication of JPH04206590A publication Critical patent/JPH04206590A/en
Pending legal-status Critical Current

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  • Manufacturing Of Printed Wiring (AREA)

Abstract

PURPOSE:To enable a two-layered flexible printed circuit board provided with no adhesive layer subjected to a boring process to be easily formed excellent in quality without deteriorating it in intrinsic characteristics by a method wherein a film of specific material is formed on a conductive foil, a prescribed hole is bored in it, and then the film is made to turn fully into imide. CONSTITUTION:When a semi-cured polyamic acid film is formed on a conductive foil, a prescribed hole can be easily, quickly, and surely provided to the foil provided with the film through etching resist application, development, and light exposure using a polyimide etching solution. Thereafter, the film concerned is made to turn fully into imide, whereby a flexible printed circuit board provided with a support film subjected to a hole boring process can be obtained without deteriorating in properties such as alkali resistance, solvent resistance, heat resistance, and electrical properties that a two-layered flexible printed circuit board with no adhesive layer intrinsically has.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は、接着剤層をもたない2層フレキシブル印刷回
路板において、孔加工された支持フィルム層を有するフ
レキシブル印刷回路用基板を製造する方法に関するもの
である。
Detailed Description of the Invention [Industrial Application Field] The present invention is for producing a flexible printed circuit board having a perforated support film layer in a two-layer flexible printed circuit board without an adhesive layer. It is about the method.

[従来の技術] 従来のフレキシブル印刷回路用基板は、電子機器の小型
・軽量化が進むにつれ、ますます用途が拡大し、最近は
従来の様な配線基板としてだけでなく、TAB用キャリ
アテープの様な支持フィルムに孔のあいた基板の利用も
増大してきている。
[Conventional technology] As electronic equipment becomes smaller and lighter, the uses of conventional flexible printed circuit boards are expanding, and recently they have been used not only as conventional wiring boards, but also as TAB carrier tapes. There is also an increasing use of perforated substrates in support films such as the following.

このような、支持フィルム層に孔加工がされ、かつ導体
配線を有するフレキシブル印刷回路用基板の製造方法と
しては、予め支持フィルム層にパンチング等で孔加工を
行い、接着剤を用いて導体層を貼合せた後、配線回路を
形成する方法や、導体層にポリアミック酸溶液を直接塗
布し、乾燥・イミド化を行うか、支持フィルム層に蒸着
法やスパッタリング法によって導体層を形成した後、レ
ーザーあるいは強アルカリ性溶液によって支持フィルム
層に孔加工を行い、その後配線回路を形成する方法が用
いられている。
As a manufacturing method of such a flexible printed circuit board having holes formed in the support film layer and conductor wiring, holes are formed in the support film layer in advance by punching, etc., and the conductor layer is attached using an adhesive. After lamination, there is a method to form a wiring circuit, a method of directly applying a polyamic acid solution to the conductor layer, drying and imidization, or a method of forming a conductor layer on the support film layer by vapor deposition or sputtering method, and then laser treatment. Alternatively, a method is used in which holes are formed in the support film layer using a strong alkaline solution and then a wiring circuit is formed.

しかし、従来用いられているこれらの方法においては、
それぞれに耐熱性、密着力、加工性、耐薬品性に欠点を
有している。まず、接着剤層をもつ3層フレキシブル印
刷回路用基板では、接着剤層の耐熱性が低いため、支持
フィルムにポリイミドを用いても、フレキシブル印刷回
路用基板としての耐熱性は接着剤層の耐熱性によって決
定されるという欠点を有している。導体層を蒸着やスパ
ッタリング法で形成した場合、支持フィルム層と導体層
の密着力が低いという欠点、あるいは導体層を厚くして
いった場合に厚さ及び密度が不均一になるという欠点を
有している。そして導体層にポリアミック酸溶液を直接
塗布・乾燥・イミド化した後孔加工する場合、加工に用
いるレーザーは装置が非常に高価となる、あるいはイミ
ド化後にアルカリエツチング可能な分子構造をもつポリ
イミドは、耐溶剤性が若干落ち、かつエツチング液とし
て強アルカリ性溶液を用いるために危険性が高く、また
安易に廃液処理ができないという欠点を有している。
However, in these conventionally used methods,
Each has drawbacks in heat resistance, adhesion, processability, and chemical resistance. First, in a three-layer flexible printed circuit board that has an adhesive layer, the heat resistance of the adhesive layer is low, so even if polyimide is used for the support film, the heat resistance of the adhesive layer is limited. It has the disadvantage of being determined by gender. When the conductor layer is formed by vapor deposition or sputtering, there are disadvantages such as low adhesion between the support film layer and the conductor layer, or the disadvantage that the thickness and density become uneven when the conductor layer is thickened. are doing. If a polyamic acid solution is directly applied to the conductor layer, dried, and imidized, then hole processing is performed, the laser used for processing is extremely expensive, or polyimide with a molecular structure that can be etched with alkali after imidization is It has the disadvantage that its solvent resistance is slightly lowered, and that it is highly dangerous because it uses a strong alkaline solution as an etching solution, and that it cannot be easily disposed of as a waste solution.

[発明が解決しようとする課題] 本発明の目的とするところは、接着剤層のない2層フレ
キシブル印刷回路板の本来もっている耐アルカリ性、耐
溶剤性、耐熱性、電気特性を低下させることなく、孔加
工された支持フィルムを有するフレキシブル印刷回路用
基板の製造法を提供するものである。
[Problems to be Solved by the Invention] The purpose of the present invention is to solve the problem without reducing the alkali resistance, solvent resistance, heat resistance, and electrical properties of a two-layer flexible printed circuit board without an adhesive layer. The present invention provides a method for manufacturing a flexible printed circuit board having a perforated support film.

[課題を解決するための手段〕 本発明は、導体箔上に半硬化させたポリアミック酸フィ
ルムを形成させ、次いで該フィルムに所定の開孔部を設
けた後、イミド化を完結させることを特徴とするフレキ
シブル印刷回路用基板の製造方法である。
[Means for Solving the Problems] The present invention is characterized in that a semi-cured polyamic acid film is formed on a conductive foil, and then, after predetermined openings are provided in the film, imidization is completed. This is a method for manufacturing a flexible printed circuit board.

即ち、導体層にポリアミック酸溶液を直接塗布し、タッ
クフリー状態になるまで乾燥し、ポリアミック酸フィル
ムを形成する。次にその上にエツチングレジストを塗布
・乾燥し、孔あけの必要な部分だけが除去されるように
現像・露光を行い、露出したポリアミック酸フィルムを
ポリイミドエ、ツチング溶液にて除去する。除去が終了
した後、エツチングレジストを剥離し、充分にイミド化
を行い、所定の位置に孔を設けたフレキシブル印刷回路
用基板を製造する方法である。
That is, a polyamic acid solution is directly applied to the conductor layer and dried until it becomes tack-free to form a polyamic acid film. Next, an etching resist is applied thereon and dried, developed and exposed so that only the areas where holes are required are removed, and the exposed polyamic acid film is removed with a polyimide etching solution. After the removal is completed, the etching resist is peeled off, imidized sufficiently, and a flexible printed circuit board with holes provided at predetermined positions is manufactured.

本発明において、ボτノアミック酸溶液を乾燥し、半硬
化させたポリアミック酸フィルムを形成させる条件とし
ては、80〜250℃、10〜30分が適当であり、こ
れより温度が低く時間が短い場合、エツチングされた境
界部においてシャープな線は得られず、エツチングレジ
スト下部へのオーバーエツチングが発生する。またこれ
より温度が高く時間が長い場合は、エツチングに時間を
要し、エツチング液でエツチングレジストが侵されたり
、エツジ部においてシャープな線が得られなくなる。さ
らに乾燥の温度・時間を調整することによって、エツチ
ング速度を自由に調整することが可能となる。ポリイミ
ドエツチング溶液としては、5〜30重量%に希釈した
ヒドラジン、エチレンジアミンなどの溶液を用いること
ができ、KOH,NaOHなどのアルカリ性溶液を用い
た場合には、低温、短時間でエツチングを行うことがで
きる。
In the present invention, the appropriate conditions for drying the bonoamic acid solution to form a semi-cured polyamic acid film are 80 to 250°C for 10 to 30 minutes; if the temperature is lower than this and the time is shorter, , a sharp line cannot be obtained at the etched boundary, and over-etching occurs to the lower part of the etching resist. On the other hand, if the temperature is higher than this and the time is longer, etching takes longer time, the etching resist is attacked by the etching solution, and sharp lines cannot be obtained at the edge portions. Furthermore, by adjusting the drying temperature and time, it becomes possible to freely adjust the etching rate. As the polyimide etching solution, a solution such as hydrazine or ethylenediamine diluted to 5 to 30% by weight can be used. When an alkaline solution such as KOH or NaOH is used, etching can be performed at low temperature and in a short time. can.

また、本発明におけるポリアミック酸は、通常ジアミン
と酸無水物とを反応させることにより得られる。ジアミ
ンとしては、■−フェニレンジナミン、ジアミノジフェ
ニルメタン、ジアミノジフェニルスルホン、ジアミノジ
フェニルエーテルなどを、酸無水物としては、トリメリ
ット酸無水物、ピロメリット酸二無水物、ベンゼンテト
ラカルボン酸二無水物、ベンゾフェノンテトラカルボン
酸二無水物などを使用することができ、それぞれ1種又
は2種以上を適宜組合せて用いることができる。ポリア
ミック酸フィルムの状態におけるイミド化率は10〜5
0%、望むべくは20〜40%が好ましい。
Moreover, the polyamic acid in the present invention is usually obtained by reacting a diamine and an acid anhydride. Examples of diamines include ■-phenylene diamine, diaminodiphenylmethane, diaminodiphenylsulfone, diaminodiphenyl ether, etc., and examples of acid anhydrides include trimellitic anhydride, pyromellitic dianhydride, benzenetetracarboxylic dianhydride, benzophenone. Tetracarboxylic dianhydride and the like can be used, and each can be used alone or in an appropriate combination of two or more. The imidization rate in the state of polyamic acid film is 10-5
0%, preferably 20-40%.

導体層として用いることのできる材料としては、銅、ア
ルミニウム、コンスタンタン、ニッケル等の金属箔が挙
げられる。
Examples of materials that can be used as the conductor layer include metal foils such as copper, aluminum, constantan, and nickel.

[作用] 本発明は、導体層上にポリアミック酸溶液を直接塗布・
乾燥し、ポリアミック酸の半硬化状態においてエツチン
グを行い、その後イミド化を完結させ、導体配線を形成
する工程をとることにより、容易にかつ安価に支持フィ
ルム層に孔のある2層フレキシブル印刷回路用基板を得
ることができる。
[Function] The present invention can be applied by directly applying a polyamic acid solution onto a conductor layer.
By drying and etching the polyamic acid in a semi-hardened state, then completing imidization and forming conductor wiring, it is possible to easily and inexpensively create two-layer flexible printed circuits with holes in the supporting film layer. A substrate can be obtained.

[実施例] 市販の銅箔上に、ポリアミック酸溶液をスピンナーで塗
布し、150°C15分乾燥を行い、ポリアミツク酸フ
ィルムを得た。この上に市販のエツチングレジストを全
面に塗布、乾燥を行った後、エツチング除去したい部分
を露光現像し、露出したポリアミック酸フィルムを、4
0°Cに加熱した25%のKOHOH液溶液中漬したと
ころ、約2分で露出部分のフィルムは溶解し、銅箔面が
露出した。その後、エツチングレジストを剥離し、38
0°Cで1時間加熱を行い、イミド化を完結した。得ら
れた2層フレキシブル印刷回路用基板の特性は、通常の
方法で銅箔上に直接塗布、乾燥、イミド化を行い作成し
たものと同等の特性を有していた。第1表に両者の特性
を示した。また、孔加工の容易さについても併記した。
[Example] A polyamic acid solution was applied onto a commercially available copper foil using a spinner, and dried at 150°C for 15 minutes to obtain a polyamic acid film. After applying a commercially available etching resist to the entire surface and drying it, the areas to be etched are exposed and developed, and the exposed polyamic acid film is
When the film was immersed in a 25% KOHOH solution heated to 0°C, the exposed portion of the film was dissolved in about 2 minutes, exposing the copper foil surface. After that, the etching resist was peeled off and 38
Heating was performed at 0°C for 1 hour to complete imidization. The properties of the obtained two-layer flexible printed circuit board were similar to those produced by directly coating, drying, and imidizing copper foil on a copper foil using a conventional method. Table 1 shows the characteristics of both. The ease of hole machining is also described.

第1表 [発明の効果] 本発明によれば、ボワイミド支持フィルムを非常に短時
間でかつ容易にエツチングすることが可能となり、イミ
ド化完結後の特性にも変化は認められないことから、工
業的な孔加工されたフレキシブル印刷回路用基板の製造
方法として好適である。
Table 1 [Effects of the Invention] According to the present invention, it is possible to easily etch the Voimide support film in a very short time, and there is no change in the properties after the completion of imidization. This method is suitable as a method for manufacturing a flexible printed circuit board having holes processed therein.

Claims (1)

【特許請求の範囲】[Claims] (1)導体箔上に半硬化させたポリアミック酸フィルム
を形成させ、次いで該フィルムに所定の開孔部を設けた
後、イミド化を完結させることを特徴とするフレキシブ
ル印刷回路用基板の製造方法。
(1) A method for manufacturing a flexible printed circuit board, which comprises forming a semi-cured polyamic acid film on a conductive foil, then forming predetermined openings in the film, and then completing imidization. .
JP32955690A 1990-11-30 1990-11-30 Manufacture of flexible printed circuit board Pending JPH04206590A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP32955690A JPH04206590A (en) 1990-11-30 1990-11-30 Manufacture of flexible printed circuit board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32955690A JPH04206590A (en) 1990-11-30 1990-11-30 Manufacture of flexible printed circuit board

Publications (1)

Publication Number Publication Date
JPH04206590A true JPH04206590A (en) 1992-07-28

Family

ID=18222678

Family Applications (1)

Application Number Title Priority Date Filing Date
JP32955690A Pending JPH04206590A (en) 1990-11-30 1990-11-30 Manufacture of flexible printed circuit board

Country Status (1)

Country Link
JP (1) JPH04206590A (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62200795A (en) * 1986-02-28 1987-09-04 住友ベークライト株式会社 Manufacture of laminate for flexible printed circuit
JPS63293996A (en) * 1987-05-27 1988-11-30 Sharp Corp Manufacture of multilayer interconnection substrate
JPH02180679A (en) * 1988-12-29 1990-07-13 Nippon Steel Chem Co Ltd Preparation of flexible printed wiring board

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62200795A (en) * 1986-02-28 1987-09-04 住友ベークライト株式会社 Manufacture of laminate for flexible printed circuit
JPS63293996A (en) * 1987-05-27 1988-11-30 Sharp Corp Manufacture of multilayer interconnection substrate
JPH02180679A (en) * 1988-12-29 1990-07-13 Nippon Steel Chem Co Ltd Preparation of flexible printed wiring board

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