JPH0420251U - - Google Patents

Info

Publication number
JPH0420251U
JPH0420251U JP6022690U JP6022690U JPH0420251U JP H0420251 U JPH0420251 U JP H0420251U JP 6022690 U JP6022690 U JP 6022690U JP 6022690 U JP6022690 U JP 6022690U JP H0420251 U JPH0420251 U JP H0420251U
Authority
JP
Japan
Prior art keywords
light
metal film
phototransistor
photodiode
semiconductor device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6022690U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP6022690U priority Critical patent/JPH0420251U/ja
Publication of JPH0420251U publication Critical patent/JPH0420251U/ja
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案の光半導体装置における遮光金
属膜の構造の一例を示す説明図、第2図は従来の
この種の光半導体装置における遮光金属膜の構造
の一例を示す説明図である。 1……Si基板ウエハ、2……SiO膜、3
……第1層目A膜、4……層間絶縁膜、5……
第2層目A膜の遮光金属膜、6……パシベーシ
ヨン膜、7……アイソレーシヨン領域。なお図中
同一符号は同一または相当するものを示す。
FIG. 1 is an explanatory diagram showing an example of the structure of a light-shielding metal film in an optical semiconductor device of the present invention, and FIG. 2 is an explanatory diagram showing an example of the structure of a light-shielding metal film in a conventional optical semiconductor device of this type. 1... Si substrate wafer, 2... SiO 2 film, 3
...First layer A film, 4... Interlayer insulating film, 5...
Light-shielding metal film of second layer A film, 6... Passivation film, 7... Isolation region. Note that the same reference numerals in the figures indicate the same or equivalent parts.

Claims (1)

【実用新案登録請求の範囲】 フオトダイオードまたはフオトトランジスタと
該フオトダイオードまたはフオトトランジスタか
らの信号を処理する回路を一体化したモノリシツ
ク型の光半導体装置において、 フオトダイオードまたはフオトトランジスタか
らの信号を処理する回路部分を遮光する遮光金属
膜を配線金属膜上部に重なり合わない領域にのみ
設け、該遮光金属膜をスルーホールを通じてアイ
ソレーシヨン領域に接続しアース電位にしたこと
を特徴とする光半導体装置。
[Claims for Utility Model Registration] A monolithic optical semiconductor device that integrates a photodiode or phototransistor and a circuit for processing a signal from the photodiode or phototransistor, which processes a signal from the photodiode or phototransistor. An optical semiconductor device characterized in that a light-shielding metal film for shielding a circuit portion from light is provided only in a region that does not overlap with the upper part of the wiring metal film, and the light-shielding metal film is connected to an isolation region through a through hole and set to a ground potential.
JP6022690U 1990-06-08 1990-06-08 Pending JPH0420251U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6022690U JPH0420251U (en) 1990-06-08 1990-06-08

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6022690U JPH0420251U (en) 1990-06-08 1990-06-08

Publications (1)

Publication Number Publication Date
JPH0420251U true JPH0420251U (en) 1992-02-20

Family

ID=31587410

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6022690U Pending JPH0420251U (en) 1990-06-08 1990-06-08

Country Status (1)

Country Link
JP (1) JPH0420251U (en)

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