JPH04194936A - Processing method for photosensitive material - Google Patents

Abstract

PURPOSE:To improve processing quality by carrying a photosensitive material when an exceeds processing liquid is squeezed out from the surface of the photosensitive material with roller pairs in a manner that the photosensitive material is bent downward by an angle corresponding to the deviation of an upper roller of the roller pair and then bent upward before the upper roller. CONSTITUTION:The photosensitive material PM carried with an elevation angle alphato the squeeze roller pair 109, 109A is bent downward by an angle according to the deviation angle beta of the upper roller of the roller pair 109, 109A and then bent upward just before the upper roller. Thereby, when the developer and stabilizer on the photosensitive material PM surface are drawn and squeezed by the squeeze roller pair 109, 109A, the drawn developer and stabilizer is stored in a space formed between the surface of the photosensitive material PM bent upward and the outer surface of upper roller of the roller pair 109, 109A till the photosensitive material PM passes through the roller pair 109, 109A. This prevents the old processing liquid from returning to the processing tank 96. Thus, development quality is improved.

Description

[Detailed description of the invention] [Field of industrial use] TECHNICAL FIELD The present invention relates to a photosensitive material processing apparatus for treating silver salt type photocatalysts on photographic paper, photosensitive paper for tie-left plate making, or film. [Conventional technology]

Conventionally, copy cameras that directly make printing plates for light printing use
The exposed photosensitive material was processed using a static developer. Sensitivity H used for these applications includes, for example, a water-resistant treated base (paper), a layer to prevent scratches and irradiation, a light-sensitive silver salt emulsion layer, and gelatin in which physical development nuclei such as silver are dispersed. A mainly hydrophilic layer is formed. The emulsion layer changes its properties when exposed to light, and in the emulsion layer exposed to light, diffusion of reduced silver to the surface layer is inhibited even when a developer is applied. On the other hand, in the emulsion layer that was not irradiated with light, silver halide was complexed and diffused into the surface layer.
There, it is physically developed to precipitate -2= metallic silver and is sensitized. After that, if a stabilization treatment and a desensitization treatment are performed, only the areas where the metallic silver is deposited will show lipophilicity and the printing ink will be applied, so that a printing plate will be obtained. Processing such as development and stabilization of the sensitive material is performed in a processing tank filled with a processing solution. Therefore, processing liquid adheres to the sensitive material carried out from the processing tank, and a configuration is adopted in which a pair of opposing rollers (a so-called squeezing roller pair) is arranged downstream of the processing tank to remove the processing liquid. ing. That is, the processing liquid is squeezed out by a pair of squeezing rollers to prevent this processing liquid from being brought into the next process. Such a pair of squeezing rollers constitutes a part of a conveying system that not only squeezes out the processing liquid deposited on the surface of the photosensitive material, but also pulls out the photosensitive material from the processing tank and sends the photosensitive material to the next process. [Problems to be Solved by the Invention] However, in such a photosensitive material processing apparatus, the old processing liquid squeezed out by the opposing pair of rollers accumulates on the photosensitive material loading side of the roller pair, so that it is squeezed out during the conveyance of the photosensitive material. There was a problem that the old processing solution flowed out along the surface of the trA. When the old processing solution that flowed out returned to the processing tank, it accelerated the deterioration of the processing solution, and if the processing solution was a developer, the developing performance In addition, when the old processing solution flows over the surface of the photosensitive material, it reacts with the photosensitive material and causes development problems such as deterioration, leading to a decrease in processing quality. (The pair of rollers that squeeze out the applied processing solution have sludge in the processing solution (generated from dust and molten gelatin produced when cutting the roll-shaped paper sheet to a predetermined size) adhering and accumulating. The present invention solves the above-mentioned problems and prevents particles from being carried out from the processing tank. An object of the present invention is to suitably squeeze out the processing liquid that has adhered to the device.The structure of the present invention that achieves this object will be described below.

[Means to solve the problem]

The photosensitive material processing device of the present invention is a processing device for processing silver salt type photosensitive materials such as photographic paper, photosensitive paper for direct plate making, or film, and includes a processing tank that stores the processing liquid for photolithography. A photosensitive material conveying means is provided for conveying the photosensitive material into the processing tank and conveying the photosensitive material from the processing tank at a predetermined angle of elevation, and a pair of rollers that are opposed to each other and are suppressed are used to sandwich the photosensitive material transported from the processing tank. The upper roller of the pair of rollers is arranged to be offset to the downstream side with respect to the conveyance direction of the abrasive material, and the roller pair is rotated in the feeding direction of the abrasive material. The present invention is characterized in that a processing liquid removing means is provided for squeezing out the processing liquid adhering to the surface of the sensitive material. It is also desirable to provide a scraper in contact with the outer periphery of at least one of the rollers to scrape off deposits such as treatment liquid and sludge on the roller surface.

[Effect]

In the photosensitive material processing apparatus of the present invention having the configuration described above, the photosensitive material is carried into the processing liquid of the processing tank that stores the processing liquid for the photosensitive material by a photosensitive material conveying means, and the carried photosensitive material is processed. After being treated with the liquid, it is transported out at a predetermined elevation angle. The photosensitive material is transported out with the processing liquid still attached to its surface. The conveyed photosensitive material is sandwiched between a pair of rollers pressed against each other, and the processing liquid that has adhered to the surface of the photosensitive material is squeezed out by the roller pair of the processing liquid removing means rotating in the feeding direction of the photosensitive material. It will be done. At this time, the photosensitive material transported at a predetermined angle of elevation is sandwiched between the upper roller and the pair of rollers that are offset toward the downstream side with respect to the conveying direction of the photosensitive material. Roller deviation amount (
angle). Therefore, the photosensitive material is curved in two directions before the pair of rollers. After that, the photosensitive material is sandwiched between a pair of rollers and squeezed, so that the processing liquid squeezed out from the surface of the photosensitive material curves upward with the outer periphery of the upper roller (transported downward) while the photosensitive material is being conveyed. It will remain in the space formed by the photosensitive material. Therefore, the old processing solution does not run down the surface of the sensitive material during transportation or return to the processing tank. In addition, if a scraper is provided that comes into contact with the outer periphery of at least one of the rollers, it is possible to scrape off the treatment liquid, sludge, etc. [Embodiment] In order to further clarify the structure and operation of the present invention explained above, a preferred embodiment of the photosensitive material processing apparatus of the present invention will be described below. A schematic configuration diagram of a developing processing apparatus which is an embodiment of the material processing apparatus, and FIG. 2 is a side sectional view of a main part showing a slit exposure type copying camera 1 incorporating this developing processing apparatus.Slit exposure type copying camera 1 is an apparatus for copying originals to produce printing plates for light printing. First, the overall structure of the slit exposure type copying camera 1 will be explained according to FIG. 2. As shown in the figure, this slit exposure type copying camera 1 The camera 1 incorporates a projection optical system and a sensitive material processing device, which will be described later, in a housing 2, and has a console panel 4 provided on the top surface of the housing 2, and a horizontal direction (in the figure) along the top surface of the housing 2. A document holder 1o configured to be able to reciprocate in the left-right direction), a photosensitive material conveying device 20 that conveys a sheet-like photosensitive material PM to an exposure position, and a document holder 1
a projection optical system 30 that irradiates light onto a document held within zero and projects the light reflected by the document onto the upper surface of a photosensitive material PM to expose it; and a development and stabilization process for the exposed photosensitive material PM. A drying unit 50 that dries the photosensitive material PM carried out from the development processing apparatus 40, and an electronic control unit 60 that controls the drive of various motors, electromagnetic valves, etc. to be described later. . The console panel 4 is provided with various setting switches for setting exposure conditions, a power switch, a start switch, etc., and is operated by an operator. Each switch on the console panel 4 is connected to an electronic control device 60. The document holder 10 includes a document table 11 made of a transparent glass plate and a document cover 12 that can be opened and closed, and the document is held downward between the document table 11 and the document cover 12. The document holder 10 is reciprocated in the horizontal direction by a motor 13 provided in the housing 2 via a drive system (not shown) such as a sprocket, chain, belt, etc., and conveys the document to an irradiation light source for exposure. . The photosensitive material conveying device 20 includes a first photosensitive material roll 21 , a second photosensitive material roll 22 , and a pair of rollers 23 . A pair of rollers 24 dedicated to feeding the photosensitive material from the second photosensitive material roll 22 and two pairs of rollers 2 commonly used for feeding the photosensitive material from each photosensitive material roll.
5.26, and if necessary, from either one of the sensitive material rolls 21 or 22, a sheet-like texture + APM
send out. In this example, Silver Master (product name: manufactured by Mitsubishi Paper Mills, model: SLM-
R2) was used, but if it is a silver salt-based photosensitive paper for plate making, Supermaster (product name: Agfagewald, Model 5PP) can also be used. FIG. 2 shows a state in which the photosensitive material PM is sequentially conveyed downstream from the first photosensitive material roll 21 by three pairs of rollers 23, 25, and 26. When using the photosensitive material PM of the second photosensitive material roll 22, the roller pair 24 replacing the roller pair 28 and the two roller pairs 25 and 26 are used to increase the sensitivity +lPM from the second photosensitive material roll 22. transported. Note that the first photosensitive material roll 21 or the second photosensitive material roll 2
The feeding of A+A'PM from 2 is performed in synchronization with the movement of the document holder 10 in the horizontal direction. The sense +, t P M transported in this way is exposed at the exposure position fZt set between the two roller pairs 25 and 26, and the sense +J' P M is provided on the back side of the sense +J' P M at this exposure position. By the J cutting device 27, the console panel 4
is cut to the set dimensions. The projection optical system 30 that exposes the photosensitive material PM is connected to the original holder 10.
A mirror 32 consisting of a light source 31 for irradiating light across the width of the document held therein, and three mirrors 32a, 32b, and 32c for reflecting the reflected light LB from the document.
, a projection lens 33 that forms an image of the original on the upper surface of the photosensitive material PM at the exposure position, and a reflected light L projected onto the surface of the photosensitive material PM1.
A slit 34 that limits the width of B is provided. The projection lens 33 and the mirrors 32b and 32c constituting the mirror group 32 are mounted on a tilting table 35 (=J-shaped mirror support plate 3).
6 and lens support stand 37, respectively.
The projection magnification in this projection optical system 30 is set to a value of 1. Note that the mirror support plate 36 and the lens support stand 37 are mounted on the tilt stand 35 when aligning the projection magnification.
Its position is adjusted at the top, and after the alignment is completed, it is fixed to the tilt table 35. The light irradiated from the light source 31 toward the original is reflected on the lower surface of the original, and this reflected light LB is sequentially reflected by each mirror of the mirror 1 and 32, passes through the projection lens 33 and the slit 34, and then is applied to the photosensitive material PM. The image is formed on the photosensitive surface. Therefore, a slit-shaped image extending across the width of the document is projected onto the photosensitive surface of the photosensitive material PM that is being transported. Since the conveyance of the photosensitive material PM is synchronized with the horizontal movement of the original holder 10, when the horizontal movement of the original holder 10 is completed, the exposure of the entire original is completed. Thereafter, the photosensitive material PM is cut by the cutting device 27. A plurality of LEDs 38 are provided in a line below the roller pair 26 in order to uniformly expose the photosensitive material PM. The peripheral portion of the photosensitive material PM that cannot be exposed with the reflected light LB from the original document is burned off as an unnecessary portion for image formation. The development processing device 40 is installed below the projection optical system 30, and the development processing device 40 is provided with a
It performs development processing and stabilization processing for PM. This development processing apparatus 40 can be equipped with a developer main tank 42 for storing a developer and a stabilizer main tank 43 for storing a stabilizer, and a processing unit 44 in which rollers and the like are integrally driven by a motor (not shown). It is housed in a housing 2. Development processing device 40
The details of the configuration will be described later. A drying unit 50 is disposed downstream of the development processing device 40 along the conveyance path of the photosensitive material PM. This drying unit)
Reference numeral 50 denotes two pairs of rollers 51 and 52 that convey the photosensitive material PM processed in the development processing device 40 while applying tension, and a conveyance l/ray 53 provided between the pair of rollers 51 and 52.
A heater 54 and a fan 55 for drying the photosensitive material are provided on the transfer tray 53 at positions facing each other across the transfer path for the photosensitive material PM, and a heater 54 and a fan 55 for drying the photosensitive material are attached to the outside of the housing 2 to store the dried photosensitive material PM. An external l-ray 56 is provided. Therefore, the exposed photosensitive material PM undergoes development and stabilization processing in the development processing device 40, is dried by the photosensitive material drying heater 54, and is sent to an external tray 56 outside the housing 2. In this way, a printing plate for offset printing is produced from the original document. Next, a description will be given of the development processing device 40 that performs development and stabilization processing on the photosensitive material PM. In the description of the development processing apparatus 40, in addition to FIG. 1 showing its schematic configuration, perspective views (FIGS. 3 and 3)
4) and a cross-sectional view (FIG. 5) as appropriate. As shown in FIG. 1, this developing processing apparatus 40 includes a developing section 70 that develops exposed photosensitive material PM introduced from an introduction roller 41 using a developer in a developer main tank 42.
Then, a stabilization processing section (hereinafter referred to as the stabilization section) performs stabilization processing on the developed photosensitive material PM using the stabilizer in the stabilizer main tank 43 and sends it to the roller pair 51 of the drying unit 50. ) 72. The developing section 70 includes a developer main tank 42 as a developer supply system, as well as a liquid level management cylinder 74 to which the developer main tank 42 is attached and detached, receives the developer from the main tank 42, and manages the liquid level at a constant level. and a conduit pipe 76 from the liquid level management cylinder 74.
A developer distern tank 78 into which the developer flows through
, an inflow electromagnetic valve 80 that opens and closes a conduit 79 for outflowing the developer from the developer distern tank 78, and a developer nozzle 82 that discharges the developer. This developer nozzle 82 includes a constriction portion (see FIG. 5), which limits the amount of developer discharged from the tip of the developer nozzle 82 during the opening period of the inflow electromagnetic valve 80. The amount of developer discharged from the tip of the developer nozzle 82 is determined by the pressure applied to the constriction portion, that is, the height of the liquid level in the liquid level management tube 74 and the diameter of the orifice. In this embodiment, since the liquid level is kept constant, the flow rate of the developer when the inflow solenoid valve 80 is opened is kept constant regardless of the amount of developer in the developer main tank 42. drooping A partition plate 84 is provided upright from the bottom of the developer distern tank 78 to divide the inside thereof into a liquid inflow chamber 78a and a liquid temperature retention chamber 78b, and a conduction pipe 76 is opened to the liquid inflow chamber 78a. ] 21 has been done. On the other hand, the upper surface of the liquid temperature retention chamber 78b has a heater 86 inserted toward the bottom surface and a float 87 that moves downward according to the amount of liquid in the tank. A float sensor 88 for detecting the amount is provided. Further, a mesh filter 90 is provided at the entrance of a conduit 79 communicating with the bottom of the developer distern tank 78 to remove dust and the like from the developer flowing out. Therefore, the cold developer flowing from the developer main tank 42 through the conduit pipe 76 first flows into the liquid inlet chamber 78a, passes over the upper end of the partition plate 84, and flows into the upper part of the liquid warming chamber 78b. The developer in the lacquerware storage chamber 78b is warmed by the heater 86. The temperature of the developer by the heater 86 is controlled to a predetermined temperature by an electronic control device, which will be described later. The developer maintained at a predetermined temperature flows out from the developer nozzle 82 when the inflow solenoid valve 80 opens. Next, a development processing tank 9 where the development of the photosensitive material PM is actually performed.
The general structure and function of the parts around 6 will be explained. Below the introduction roller 41 that introduces the photosensitive material PM into the developing section 70, there is provided an input L10-RA pair 92 that rotates in the direction of the arrow X in FIG. A free roller 94 is disposed in contact with the fed-in photosensitive material PM to guide the photosensitive material PM and give so-called stiffness to the photosensitive material PM during conveyance. The developing tank 96 has a substantially U-shaped cross section, has a width corresponding to the width of the photosensitive material PM, and forms a developer reservoir 95, as shown in FIG. A developer supply roller 98 is disposed within the developing tank 96 at a position leaving a slight distance from the bottom surface of the developing tank 96 in the width direction of the developing tank 96. Therefore, when the developer is stored in the storage section 95 of the development processing tank 96, the lower part of the developer supply roller 98 is partially immersed in the developer. The surface of the developer supply roller 98 is made of a spongy material, and the bubbles constituting the spongy material are individually independent bubbles (single bubbles). As shown in FIG. 4, the developer supply roller 98 has a developer storage section 100 that temporarily stores the developer dripping from the second section between the developer supply roller 98 and the developer supply roller 98. It is being Further, as shown in FIGS. 3 and 5, a bottom liquid reservoir chamber 101 is formed at the bottom of the developing tank 96 in the width direction thereof, and is opened at the bottom of the developing tank 96. The plurality of communication holes 102 allow the developer to flow in. Inside the bottom liquid reservoir chamber 101, two rod-shaped heaters 103 for heating the developer are arranged. Bottom liquid reservoir chamber 101
A developer discharge pipe 108 is connected to the bottom liquid storage chamber 101 through a discharge solenoid valve 104 that opens and closes the pipe, and discharges the used developer to the waste liquid receiving tray 106.
are installed in succession. A guide plate 110 having a predetermined elevation angle α toward the stable portion 72 is disposed on the side of the developing tank 96 from which the photosensitive material PM is taken out. The guide plate 110 is formed of a corrugated plate in order to reduce the contact resistance with the photosensitive material PM (see FIG. 3), and guides the developed photosensitive material PM toward the squeeze roller pair 109 of the stabilizing section 72. Form an approach route. A planar heater 112 having a self-temperature control function is attached to the lower surface of the guide plate 110. As shown in FIG. 3, the planar heater 112 is integrally fixed to the guide plate 110 by a mounting fitting 118 provided on the developing tank 96 side and other fittings (not shown). The detailed structure of the developing tank 96 will be explained. As shown in FIG. 3, the storage section 95 of the development processing tank 96 is
Approximately half-moon-shaped side plates 12 are provided on both sides of the curved peripheral plate 120.
2 (in the figure, the side plate on the left side is omitted) are respectively joined and fixed. A through hole 126 passing through the circumferential plate 120 is provided approximately at the center of the circumferential plate 120 on the guy F plate 110 side. When the developer is supplied from the developer nozzle 82 and the amount of the developer in the reservoir 95 increases, the developer flows out through the through hole 12B. Therefore, the liquid level of the developer in the storage section 95 is lower than that in the through hole 126.
is held at a height of In addition, the discharge solenoid valve 1°4 directly below the development processing tank 96 is equipped with the following:
As shown in FIG. 1, a drip-proof cover 114- is provided,
This prevents the developer from falling from the developing tank 96 and the guide plate 110 from adhering. As shown in detail in FIGS. 4 and 5, the developer storage unit 100 includes two end plates 134 that abut against both end surfaces of the developer supply roller 98 while allowing the roller to rotate.
and a support plate 136 having a V-shaped cross section and having the end plate 134 fixed to both ends thereof. Further, a liquid passage hole 138 is provided at the center of the upper plate 136a constituting the support plate 136 at a position corresponding to the tip of the developer nozzle 82.
The back plate 136b constituting the support plate 136 is provided with a plate spring 140, which is a thin plate of stainless steel and is biased toward the developer supply roller 98 and comes into contact with the outer periphery of the roller 98. Directly below the liquid passage hole 138, a liquid receiving plate 142 is connected from the center of the front end of the soil plate 136a toward the leaf spring 140. A small gap is provided between the tip of the plate 142 and the plate spring 140 in the liquid receiver. The developer supply roller 98, the end plate 134 in contact with both end surfaces thereof, and the roller 9
Since the developer supply roller 98 rotates upward in this region, the developer nozzle 82 drips from the region surrounded by the leaf spring 140 that is in contact with the outer peripheral surface of the developer. The developer can be temporarily stored (this part is called a liquid reservoir 143).
However, even if the plate 142 is not included in the liquid receiver, the developer is temporarily collected in the liquid reservoir 143, so the developer still spreads in the axial direction of the developer supply roller 98. . The developer dripping from the developer nozzle 82 passes through the liquid passage hole 138 and reaches the plate 142 as shown in FIGS. 4 and 5, and the liquid receiver reaches both ends of the plate 142 and the plate spring 140.
It flows down along the surface of the leaf spring 140 through a small gap formed between the two. In other words, the developer spreads along the axial direction of the developer supply roller 98 and reaches the reservoir 143, where it is temporarily stored. A part of the developer stored in the liquid reservoir 143 is
The arrow Y in FIG.
It is pumped out as it rotates in the direction. Since the lower part of the developer supply roller 98 is immersed in the developer stored in the development processing tank 96, the new developer pumped out as it rotates is already stored in the reservoir 95. Supplied in developer. The new developer is diffused and supplied to the input side of the photosensitive member 44'PM in the development processing tank 96. When the developer is supplied and the developer in the storage section 95 increases, an amount of the developer (the amount corresponding to the newly supplied developer minus the developer lost when the photosensitive material PM is carried out) is increased. The old developer) flows out from the through hole 126 of the peripheral plate 120, and the amount of developer in the developing tank 96 is balanced. The developer also flows into the bottom liquid storage chamber 101, and is heated by two wooden rod-shaped heaters 103 built therein. The added developer fluid convects with the storage section 95 through the communication hole 102 . Coupled with the fact that the energization of the rod-shaped heater 103 is feedback-controlled based on the developer temperature detected by the temperature detector, the developer in the development processing tank 96 is heated to a predetermined temperature in an extremely short time. maintained. When the photosensitive material PM passes through the developer reservoir 95 of the development processing tank 96, sludge mixes into the developer as the photosensitive material PM is developed. Such sludge flows from the storage section 95 into the bottom liquid storage chamber 101, and when the discharge solenoid valve 104 is opened, the waste liquid receiver is discharged together with the developer into the tray 10B via the developer discharge pipe 1.08. be done. Next, the conveyance of the sense U'PM will be explained. The exposed sensitive HPM sent by the input roller pair 92 is
It enters the storage section 95 while being kited by the free rollers 94, and passes through the storage section 95 along the inner circumferential surface of the peripheral plate 120. While passing through the storage section 95, it reacts with the developer stored there, and the development process is started. After passing through the gap between the developer supply roller 98 and the circumferential plate 120 and passing through the storage section 95, the developer is directed toward a squeeze roller pair 109° provided at the entrance of the stable section 72 along the inclined upper surface of the guide plate 110. Sent out. Since the ambient temperature of the guide plate 110 is maintained near a predetermined temperature by heating by the planar heater 112 having a temperature control function, the photosensitive material PM coating is transported on the guide plate 110. The development process of the photosensitive material PM continues due to the developer attached to the surface. The developing solution adhering to the surface of the photosensitive material PM is squeezed out and removed by a squeeze roller pair 109 provided in the stabilizer 72. Next, the stabilizing section 72, which is a system for stabilizing the photosensitive material PM using a stabilizing agent, will be explained with reference to FIG. Note that for the same members or members having the same functions as the developing section 70 described above, the explanation thereof will be omitted, and the auxiliary symbol A (=J will be added to the code (numerical value) used for the explanation of the developing section 70). The stabilizing section 72 serves as a stabilizer supply system for the developing section 7.
Similar to the developer supply system of No. 0, the stabilizer main tank 43
．． A liquid level management cylinder 74 to which the stabilizer main tank 43 is attached and detached. A, stabilizer di-stern tank 78A with a partition b>j plate 84A erected inside. It includes a conduction pipe 76A that connects the liquid level management cylinder 74A and the stabilizer distern tank 78A, a stabilizer nozzle 82A with an inflow solenoid valve 80A, and the like. In the stabilizer distern tank 78A, similarly to the developer distern tank 78, a float sensor 88A having a float 87A and a mesh filter 90A are also provided. When the stabilizer flows out from the stabilizer distern tank 78A via the inflow electromagnetic valve 80A and the stabilizer nozzle 82A, the stabilizer flows in the same amount from the conduction pipe 76A. The other components of the stabilizing section 72 will be briefly explained along the conveyance of the photosensitive material PM. The feeling of passing through the squeezing roller pair 109 arranged at the two ends of the guide plate 110 of the developing section 7o
J'PM is guided by a guide cover 144 and a free roller 146 arranged along the conveyance path of the photosensitive material PM, and is carried into the stabilization processing tank 96A. A free roller 94A is provided in the stabilization treatment tank 96A at the 1st position of the stabilization treatment tank 96A to give a so-called stiffness to the PM. The stabilization treatment tank 96A forming the stabilizing agent storage section 95A includes:
Similar to the development processing tank 96, a stabilizer storage section 100A is provided, in which a sponge-like stabilizer supply roller 98A and a stabilizer liquid reservoir 143A are formed by the stabilizer supply roller 98A. A stabilizing agent is supplied to the storage section 95A on the side where the photosensitive material PM is carried in. On the other hand, like the development processing tank 96, a bottom liquid storage chamber 101A is provided at the bottom of the stabilization processing tank 96A. When the discharge solenoid valve 104A with the drip-proof cover 114A is opened, the used stabilizer is discharged from the stabilizer and other agent discharge pipe 10.
8A, the waste liquid receiver is discharged from the bottom liquid storage chamber 101A to the tray 106A. Note that since the stabilizer does not require temperature control, no heater is provided in the bottom liquid reservoir chamber 101A. A guide plate 110A that forms an entry path for the stabilized photosensitive material PM is arranged downstream of the stabilization treatment tank 96A along the transport path of the photosensitive material PM so as to be inclined upward from the stabilization treatment tank 96A. At the upper end of the guide plate 110A, a drying unit 5 rotates in the Z direction in the figure to dry the stabilized photosensitive material PM.
A squeezing roller pair 10 squeezes out excess stabilizer from the surface of the photosensitive material while conveying it toward the roller pair 51 of 0 (see FIG. 5).
9A is installed. The stabilizer supply roller 98A and each squeezing roller pair 109, 1.09A are driven by a common drive source with each roller of the development processing tank 96 described above,
rotated synchronously. Pairs of squeezing rollers 109, 109 rotate in the two directions of the arrows in FIG. 1 to convey the developed and stabilized photosensitive material PM while squeezing excess developer and stabilizer from the surface of the photosensitive material PM.
As shown in the figure, the second roller is moved in the conveying direction of the photosensitive material so that the plane passing through the center of each roller is inclined counterclockwise by an angle β from the vertical plane passing through the center of the lower roller. In contrast, it is provided offset to the downstream side. Therefore,
The conveyance direction of the sensitive HPM when it passes between the squeezing roller pair 109, 109A is downward by an angle corresponding to the angle β. Sensation + 'J' P M is squeeze roller pair 109
．． Since up to 109A is transported at a predetermined elevation angle α,
In front of each roller pair 109, 1.09A, it curves upward as shown by the dashed line in FIG. Most of the developer or stabilizer adhering to the surface of the photosensitive material PM is squeezed out to the front side by a squeeze roller pair 109, 109A. As a result, the squeezed developer or stabilizer is curved upward (transported downward).
In the space formed by the surface of the photosensitive material PM and the outer periphery of the upper roller of the aperture roller pair 109, 109A, a +4'
It remains until PM passes through the squeeze roller pair 109, 109A. During feeding of photosensitive material PMIa2, each squeezing roller pair 109.109A
At the same time that the cut end surface of the photosensitive material PM passes through the squeeze roller pair 109 or 109A, the developer or stabilizer remaining in the squeeze roller pair 109 and 109A travels along the lower roller surface of the squeeze roller pair 109 and 109A. ,10
The waste liquid falls onto the right squeeze liquid collection plate 152 or the left squeeze liquid collection plate 1541- disposed below 9A, and the waste liquid receiver is placed in tray 1.
It flows into 06A. Each squeezing roller pair 109, 109A is provided with two scrapers 150 at positions where their tips abut against the outer periphery of the rollers. The scraper 150 is made of a stainless steel plate with a smoothly polished tip or a stainless steel plate with a plastic tip covered with a touch-resistant and elastic material, in order to prevent scratches on the roller surface and to extend the life of the scraper 150 itself. It is made of a material that has As the plastic covering the tip of the scraper 150, H materials having chemical resistance to processing liquids and abrasion resistance, such as fluororesin, polyester, and vinyl chloride, can be used. The sludge and waste liquid scraped off by the scraper 150 fall onto the right squeeze liquid collection plate 152 and the left squeeze liquid collection plate 154, and the waste liquid receiver is collected in the tray 106A. In addition, each waste liquid receiver l of the developing section 70 and the stabilizing section 72
A pipe 158 leading to a waste liquid tank 156 is provided in each tray 106 and 106A.
The waste liquid collected is finally collected into a waste liquid tank 156 via piping 158. In the stabilizing section 72 configured as described above, the developing section 70
The developed photosensitive material PM sent in from there is squeezed out of the developer by a pair of squeezing rollers 109, and is carried into the storage section 95A while being guided by a free roller 94A and the like. When the photosensitive material PM enters the stabilizing agent in the storage section 95A, stabilization processing is started, and after passing through the storage section 95A,
The stabilization process continues while being conveyed along the upper surface of the guide plate 110A. When passing through the squeeze roller pair 109A,
Excess stabilizer is squeezed out from the upper surface of the photosensitive material PM, and then the photosensitive material PM is transferred to a drying unit by a pair of rollers 51.
50. Next, the electronic control device 60, which controls the temperature control in the developer displacer tank 78 and the like and the drive control of the developer supply roller 98 and the like, will be explained using the block diagram shown in FIG. As shown in FIG. 6, the electronic control device 60 includes a well-known CP
U162. ROM164. It is configured as an arithmetic and logic operation circuit centered around a timer 168 with built-in RAM 1.66 and multiple self-running timer counters, and a common bus 1.
Exposure output ports 1-1.
72. Human-powered boat for development 174. Output capo for development) 1
Equipped with an input/output interface such as -76. The common bus 170 of the electronic control device 60 also includes a bottom liquid reservoir chamber 1.
A temperature adjustment circuit 178 is connected to a temperature adjustment circuit 178 that adjusts the temperature of the developer in the storage section 95 and the developer in the developer distern tank 78, which communicates with the controller 01, and the console panel 4 on which the operator makes various settings. . The exposure output port 172 includes a motor 13 for driving the document holder 10 and a cutting device 2 for cutting the photosensitive material PM.
7, a light source 31 for irradiating light onto the original in the original holder 10, a motor 28 for sending out the photosensitive material PM from the first photosensitive material roll 21 or the second photosensitive material roll 22, and a photosensitive material PM. An LED 38 for uniformly exposing the photosensitive material and a drying unit 50 for drying the stabilized photosensitive material are connected. On the other hand, the developing input port 174 is connected to a float sensor 88 in the developer distern tank 78 and a float sensor 88A in the stabilizer distern tank 78A, and the developing output port 176 is connected to the processing unit 4.
A drive motor 180 that synchronously drives each roller of No. 4;
An inflow solenoid valve 80 provided in the developer nozzle 82, an inflow solenoid valve 80A provided in the stabilizer nozzle 82A, and a discharge solenoid valve 1o4 provided in the developer discharge pipe 108.
A discharge solenoid valve 104A provided on the stabilizer discharge pipe 108A is connected to a planar heater 112 for heating the atmosphere near the guide plate 11.0 to a certain temperature. In addition, the temperature adjustment circuit 178 includes a heater 86 installed in the developer distern tank 78, a temperature sensor 85 for detecting the temperature of the liquid in this tank, and a bottom liquid storage chamber 101.
Two rod-shaped heaters 103 installed inside the chamber 101 and a temperature sensor 103a that detects the temperature of the liquid inside the liquid reservoir chamber 101 are connected. This temperature adjustment circuit 178 controls the heating of each of the heaters so as to maintain the temperatures of the developer in the storage section 95 and the developer in the developer distern tank 78 within a predetermined temperature range. A signal indicating whether or not the data is maintained within the CPU 62 is output to the CPU 62. Next, the overall operation of the slit exposure type copying camera 1 according to the embodiment will be briefly explained. When the power is turned on to the slit exposure copying camera 1, as shown in FIG. Wait for the human power of the start key (step 53)
00), and executes exposure/development processing (step 5400).
). Here, the initialization process refers to the discharge solenoid valve 104.10.
Open the valve 4A and open the development processing tank and stabilization processing tank 96A.
(Hereinafter, both will be collectively referred to as the processing tank 96 as necessary). Drain all remaining developer or stabilizer (hereinafter, both will be collectively referred to as the processing liquid as necessary), and After closing the valves IO4 and 104A, the inflow solenoid valve 80°80A is opened and the developer supply roller 98. The processing liquid is supplied to the processing tank 9 as the stabilizing agent supply roller 98A rotates.
6 and operates the temperature adjustment circuit 178 to raise the temperature of the developer in the developer distern tank 78 and the development processing tank 96 to a range of approximately 28°C to 31°C.
This is a process of maintaining. By executing the initialization process when the power is turned on, the processing liquid in the processing tank 96 is replaced with a new processing liquid for exposure and development processing, and the temperature is controlled to an appropriate temperature. In the standby process (step 5200), various settings for exposure and development are made, and the image forming apparatus is placed on standby in a state where development is possible. If the start key is pressed and turned on (step 5)
Exposure/development processing (step 540) performed in step 300)
0), as shown in the timing chart of Figure 8,
While performing exposure processing by the projection optical system 30, the light-sensitive material P
Before the tip of M enters the developing processing tank 96, the electromagnetic valve 80 for developer inflow is opened to start supplying new developer, and as the photosensitive material PM is transported, the stabilizer inflow valve 80 is opened. The electromagnetic valve 80A is opened to start supplying new stabilizer, and as the photosensitive material PM passes, the supply of these processing liquids is stopped. The operation of each part in the developing processing apparatus 40 is as already described in detail. As explained above, the development processing device 40 of the embodiment incorporated in the slit exposure type copying camera 1 carries out the development and stabilization processing on the photosensitive material PM while conveying the photosensitive material PM to form an offset printing plate. Create. The development processing device 40 is
In the process of conveying the photosensitive material PM, the squeezing roller pair 109,1
The conveyance direction of the photosensitive material PM, which has been conveyed at an elevation angle α up to 09A, is set downward by an angle corresponding to the deviation angle (angle β) of the − side roller of the squeezing roller pair 109, 109A.
Curve M in the - direction in front of each second roller. Therefore, when the developer and stabilizer on the surface of the photosensitive material PM are squeezed out by the squeezing roller pair 109, 109A, the squeezed out old developer or stabilizer is removed from the photosensitive material that is curved upward (transported downward). PM surface and squeezing roller pair 109,
The photosensitive material PM is placed in the space formed by the outer periphery of the upper roller in the pair of squeezing rollers 109. It will stay there until it passes through 109A. As a result, the old processing liquid does not return to the processing tank 96, and the processing performance in each processing tank 96 does not deteriorate. In addition, the old developer or stabilizer that has been squeezed out may become a part of the photosensitive material PM.
Since the particles are not transmitted over the surface of the abducted PM, it is possible to solve the problem of occurrence of processing unevenness (irregular streaks) on the surface of the abducted PM. Furthermore, the angle β of the second roller of the pair of squeeze rollers 109, 109A is set to 1'. It is possible to suppress disturbances in the conveyance of the photosensitive material PM due to curvature of the photosensitive material PM when it is caught in the process. Therefore, disturbances in the liquid level in the processing tank caused by disturbances in the conveyance of the photosensitive material PM can be suppressed. Therefore, uneven development (irregular streaks occurring on the surface of the photosensitive material) due to turbulence (waves) in the liquid level does not occur.Furthermore, in this embodiment, a scraper 150 is provided on the aperture roller pair 90.9OA. , the sludge adhering to each roller of the aperture roller pair 90.9OA is scraped off.Therefore, sludge does not adhere to or accumulate on the rollers, resulting in poor aperture.Furthermore, in this embodiment, the developing processing tank When supplying a new developer to 96, the new developer is supplied to the loading side of the photosensitive material PM, that is, the development process start side, so the new developer is used preferentially to process the photosensitive material PM. The development process can be performed with high efficiency and uniformity, and the development quality is further improved.The same applies to the stabilization process in the stabilizing section 72.The embodiments of the present invention have been described above, and the present invention is applicable to such embodiments. It goes without saying that the present invention is not equally limited to the above, and can be implemented in various ways without departing from the gist of the present invention. Each processing solution (developing solution, developer,
We have explained a configuration in which the photosensitive material is continuously processed using a stabilizer) even before reaching each aperture roller pair 109, 109A. (It can also be applied to a configuration of an immersion type developing treatment type in which the material is transported slowly.) Effects of the Invention As detailed above, according to the photosensitive material processing apparatus of the present invention,
When squeezing out excess processing liquid from the surface of a photosensitive material using a pair of rollers pressed against each other (a pair of squeezing rollers), the conveyance direction of the photosensitive material conveyed from the processing tank at a predetermined angle of elevation is controlled by the pair of rollers. '' The photosensitive material is conveyed while being curved downward by an angle corresponding to the amount of deviation of the second roller and upward in front of the upper roller. Therefore, the old processing liquid squeezed from the surface of the photosensitive material is transferred to the space formed by the curved surface of the photosensitive material (transported downward) and the outer periphery of the upper roller of the roller pair. To,
The photosensitive material is held in place until it passes through the pair of rollers. As a result, the old processing solution does not return to the processing tank and cause deterioration of the processing solution performance, nor does it travel along the ablated surface during transportation and cause processing problems, improving the quality of photosensitive material processing. can be done.

[Brief explanation of the drawing]

FIG. 1 is a block diagram of a developing processing apparatus 40 which is an embodiment of the present invention, FIG. 2 is a schematic block diagram showing a slit exposure type copying camera 1 incorporating the developing processing apparatus of the embodiment, and FIG. FIG. 4 is a perspective view of the main parts of the processing tank 96, FIG. 4 is a perspective view of the developer supply roller 98 and the developer storage section 100, and FIG.
FIG. 6 is a block diagram showing the configuration of the electronic control device 60, and FIG. 7 shows the processing routine executed by the electronic control device 60. FIG. 8 is a timing chart showing the conveyance of the photosensitive material PM and the operation timing of each part. ■...Slit exposure type copying camera 10...Original holder 20...Sensitive material transport device 3
0... Projection optical system 40... Development processing device 50
...Drying unit 60...Electronic control device 96.
...Development processing tank 96A...Stabilization processing tank 98...
・Developer supply roller 98A... Stabilizing agent supply roller 109, 109A... Squeezing roller pair 110, ll0A... Guide plate 112... Planar heater 150... Scraper P
M...Sensitive material

Claims (1)

[Scope of Claims] 1. A processing device for processing a silver salt type sensitive material such as photographic paper, photosensitive paper or film for direct plate making, wherein a processing tank storing a processing solution for the photosensitive material is It is equipped with a photosensitive material conveying means for carrying in the material and conveying the photosensitive material from the processing tank at a predetermined angle of elevation, and is capable of sandwiching the photosensitive material transported from the processing tank between a pair of rollers that are pressed against each other. The upper roller of the pair of rollers is arranged to be offset to the downstream side with respect to the conveying direction of the photosensitive material, and the roller pair is rotated in the feeding direction of the photosensitive material to apply the roller to the surface of the photosensitive material. A sensitive material processing apparatus characterized by being provided with a processing liquid removal means for squeezing out the attached processing liquid. 2. The sensitive material processing apparatus according to claim 1, further comprising a scraper that comes into contact with the outer periphery of at least one of the roller pair and scrapes deposits such as processing liquid and sludge on the surface of the roller. .