JPH04194935A - Processing device for photosensitive material - Google Patents

Abstract

PURPOSE:To reduce the amt. of processing liquid while maintaining the carrying speed of a photosensitive material by maintaining the photosensitive material to be carried in a specified distance from a processing tank to a removing means to remove the processing liquid on the photosensitive material in a manner that the reaction between the processing liquid depositing on the photosensitive material and the photosensitive material can be effected by a reaction maintaining means. CONSTITUTION:In each processing tank 96, the processing liquid is uniformly supplied to the feeding side of the photosensitive material PM by rotation of a developer supply roller 98 or a stabilizer supply roller 98A to start development and stabilization, respectively. Processing of the photosensitive material PM is continued during the photosensitive material PM is carried out from each processing tank 96 and traveled along guide plates 110, 110A. Therefore, processing of the photosensitive material PM can be enough done even when the period to pass through the processing tank 96 is short, so that the traveling speed of the photosensitive material PM can be enough raised. Thus, the amt. of the processing liquid stored in the tank 96 can be decreased.

Description

[Detailed description of the invention] [Industrial application field] The present invention relates to a photosensitive material processing apparatus for processing silver salt type photosensitive materials such as photographic paper, photosensitive paper for direct plate making, or film. [Conventional technology]

Conventionally, copy cameras that directly make printing plates for light printing use
The exposed photosensitive material was processed using a static developer. The photosensitive materials used for these purposes include, for example, a water-resistant treated base (paper), a layer to prevent halation, and a silver salt emulsion layer that is sensitive to light. A hydrophilic layer mainly made of gelatin in which physical development nuclei such as silver are dispersed is formed. An emulsion layer changes its properties when exposed to light, but in an emulsion layer exposed to light, diffusion of reduced silver to the surface layer is inhibited even when a developer is applied. On the other hand, in the emulsion layer that has not been irradiated with light, silver halide is complexed and diffused into the surface layer, where it is physically developed to precipitate metallic silver and is sensitized. After that, if a stabilization treatment and a desensitization treatment are performed, only the areas where the metallic silver is deposited will show lipophilicity and the printing ink will be applied, so that a printing plate will be obtained. It is known that the reaction of these sensitive materials with processing solutions such as developing solutions proceeds in an extremely short period of time, so even if they are stopped in the processing solution for a short period of time, or even if the processing solution is rippled, uneven processing can occur. There is. Therefore, conventionally, an apparatus has been used which performs an immersion type development process in which a large tank is filled with a large amount of processing solution and the photosensitive material is slowly conveyed through the stationary developer solution without causing any ripples.

[Problem to be solved by the invention]

However, in devices using immersion development, it is necessary to store a large amount of processing solution in a processing tank. There was a problem that changes in performance were unavoidable. However, if the processing tank is simply made smaller and the amount of processing solution stored is reduced, the speed at which the sensitive material is transported must be extremely slow in order to complete the processing within the processing tank. Therefore, it is impossible to avoid the problem that it takes a considerable amount of time to process the photosensitive material, and this is not a practical solution. Further, in the method of storing a large amount of processing liquid, there is a problem in that it takes time for so-called warm-up to raise the temperature of the processing liquid to a temperature suitable for processing at the beginning of use of the apparatus. In order to shorten the warm-up time, it is necessary to use a high-power heater for temperature adjustment. Furthermore, in the immersion type development that stores a large amount of processing solution, there are problems such as it takes time for the processing solution to warm up, and sludge accumulates on the bottom of the processing tank and turns into sludge.Sludge that turns into sludge The present invention solves the above problems and reduces the amount of processing liquid required. The purpose of this invention was to make it possible and to complete processing of photosensitive materials in a short time.The configuration of the present invention that achieves the purpose of darning will be described below.[Means for Solving the Problems] This invention The photosensitive material processing device of the invention is a processing device for processing a silver salt type photosensitive material such as photographic paper, photosensitive paper or film for direct plate making, and includes a processing tank for storing a processing solution for the photosensitive material; , processing liquid supply means for supplying a new processing liquid to the processing tank; carrying the sensitive material into the processing tank and carrying it out from the processing tank before the processing of the sensitive material with the processing liquid is completed; The sensitive material conveyed over a predetermined distance from the processing tank to the removal means for removing the processing liquid adhering to the surface of the sensitive material can react with the adhering processing liquid. The gist of the invention is that it is equipped with a reaction maintenance means for maintaining the reaction state.

[Effect]

The photosensitive material processing apparatus of the present invention having the above-mentioned configuration transports the photosensitive material into the processing tank in which the processing liquid for the photosensitive material is supplied and stored by the processing liquid supplying means, and is processed by the processing liquid. The sensitive material is taken out of the processing tank before the processing of the material is completed. Therefore, at the stage of being carried out from the treatment tank, the treatment of sensitivity H has not been completed. After that, the processing liquid on the surface of the sensitive material is removed from the processing tank.
- the photosensitive material being transported over a predetermined distance to the removing means;
The reaction maintaining means maintains a state in which reaction with the attached processing liquid is possible. As a result, the processing of the photosensitive material continues even during transportation to the removal means, making it possible to reduce the amount of processing liquid while maintaining the transportation speed of the photosensitive material. Note that the photosensitive materials processed by the photosensitive material processing apparatus of the present invention include:
In addition to silver halide photosensitive paper for plate making and silver halide film for plate making, silver halide photographic paper is also covered.

[Examples] In order to further clarify the structure and operation of the present invention described above, preferred embodiments of the photosensitive material processing apparatus of the present invention will be described below. FIG. 1 is a block diagram of a developing processing apparatus which is an embodiment of a photosensitive material processing apparatus, and FIG. 2 is a schematic block diagram showing a slit exposure type copying camera 1 incorporating this developing processing apparatus. The slit exposure type copying camera 1 is a device that copies an original to produce a printing plate for light printing. First, the overall configuration of the slit exposure type copying camera 1 will be explained with reference to FIG. As shown in the figure, this slit exposure type copying camera 1 incorporates a projection optical system and a developing processing device, which will be described later, in a housing 2, and a console panel provided on the side of the housing 2. 4
, a document holder 10 configured to be able to reciprocate in the horizontal direction (horizontal direction in the figure) along the top surface of the housing 2, and a photosensitive material transport device 20 that transports the sheet-like paper +A' P M to the exposure position. Then, the original held in the original holder 10 is irradiated with light and the light reflected by the original is sensed +'('P
A projection optical system 30 that projects onto the upper surface of M and exposes it; a development processing device 40 that performs development and stabilization processing on the exposed photosensitive material PM; It includes a drying unit 50 for drying, and an electronic control device 60 for controlling the drive of various motors, electromagnetic valves, etc. to be described later. The console panel 4 is provided with various setting switches for setting exposure conditions, a power switch, a start switch, etc., and is operated by an operator. Each switch on the console panel 4 is connected to an electronic control device 60. The document holder 10 includes a document table 11 made of a transparent glass plate and a document cover 12 that can be opened and closed, and the document is held downward between the document table 11 and the document cover 12. The document holder 10 is reciprocated in the horizontal direction by a motor J3 provided in the housing 2 via a drive system (not shown) such as a sprocket, chain, belt, etc., and conveys the document to an irradiation light source for exposure. . The +A conveyance device 20 includes a first photosensitive material roll 21, a second photosensitive material roll 22, and a pair of rollers 23. A pair of rollers 24 dedicated to feeding the photosensitive material from the second photosensitive material roll 22 and two pairs of rollers 2 commonly used for feeding the photosensitive material from each photosensitive material roll.
5.26, and feeds out the sheet-like photosensitive material PM from one of the photosensitive material rolls 21 or 22 as required. In this example, the photosensitive material PM was Silver Master (product name 2, manufactured by Mitsubishi Paper Mills Co., Ltd., model number SLM-R2).
), but if it is a silver salt-based plate-making photosensitive paper, Super Master (product name: manufactured by Agfagewald, model 5P) is used.
P) etc. can also be used. FIG. 2 shows a state in which the photosensitive material PM is sequentially conveyed downstream from the first photosensitive material roll 21 by three pairs of rollers 23, 25, and 26. When using the sensitivity U'PM of the second photosensitive material roll 22, the photosensitive material PM is transferred to the second photosensitive material roll 22 by a roller pair 24 replacing the roller pair 23 and two roller pairs 25 and 26. Transported from. Note that the first photosensitive material roll 21 or the second photosensitive material roll 2
The feeding of the photosensitive material PM from 2 is performed in synchronization with the horizontal movement of the document holder 10. The photosensitive material PM conveyed in this manner is transported by two pairs of rollers 25.
The cutting device 2 is exposed at an exposure position set between 26 and 26, and is provided on the back side of the photosensitive material PM at this exposure position.
7, the console panel 4 is used to cut into the set dimensions. The projection optical system 30 that exposes the photosensitive material PM is connected to the original holder 10.
A light source 31 for irradiating light across the width of the document held within the document, a mirror group 32 consisting of three mirrors 32a, 32b, and 32c for reflecting light LB from the document, and a mirror group 32 for sensing the exposure position. It includes a projection lens 33 that forms an image of the original on the upper surface of the material PM, and a slit 34 that limits the width of the reflected light LB projected onto the upper surface of the sensitive material PM. Projection lens 33
And the mirrors 32b and 32c that constitute the mirror group 32 are:
The projection optical system 30 is fixed to a mirror support plate 36 and a lens support 37, respectively, which are attached to a tilting table 35'', and the projection magnification in this projection optical system 30 is set to a value of 1. Note that the mirror support plate 36 and lens support stand 37
Its position is adjusted on the tilt table 35 during projection magnification alignment, and is fixed on the tilt table 35 after the alignment is completed. The light irradiated from the light source 31 toward the original is reflected on the lower surface of the original, and this reflected light LB is sequentially reflected by each mirror of the mirror group 32, passes through the projection lens 33 and the slit 34, and then is reflected on the photosensitive material PM. The image is formed on the photosensitive surface. Therefore, a slit-shaped image extending across the width of the document is projected onto the photosensitive surface of the photosensitive material PM that is being transported. Since the conveyance of the photosensitive material PM is synchronized with the horizontal movement of the original holder 10, when the horizontal movement of the original holder 10 is completed, the exposure of the entire original is completed. Note that a plurality of LEDs 38 are provided in a line below the roller pair 26 to uniformly expose the photosensitive material PM. Reflected light LB from the original when exposing
In this method, the peripheral portion of the photosensitive material PM that cannot be exposed to light is burned off as an unnecessary portion for image formation. After that, the photosensitive material PM is cut into the cutting device 2.
cut by 7. The development processing device 40 is installed below the projection optical system 30 and performs development processing and stabilization processing on the photosensitive material PM introduced via the introduction roller 41. This development processing apparatus 40 can be equipped with a developer main tank 42 for storing a developer and a stabilizer main tank 43 for storing a stabilizer, and a processing unit 44 in which rollers and the like are integrally driven by a motor (not shown). configured as,
It is housed within the housing 2. The details of the configuration of the developing processing device 40 will be described later. A drying unit 50 is disposed downstream of the development processing device 40 along the conveyance path of the photosensitive material PM. The drying unit 50 includes two pairs of rollers 51 and 52 that convey the photosensitive material PM processed in the development processing device 40 while applying tension, and a conveyance tray 53 that is provided between the pair of rollers 51 and 52. , a heater 54 and a fan 55 for drying the photosensitive material, which are provided at positions facing the transfer tray 53 across the transfer path for the photosensitive material PM, and an external heater 54 and a fan 55, which are attached to the outside of the housing 2 and which store the dried photosensitive material PM. A tray 56 is provided. Therefore, the exposed photosensitive material PM undergoes development and stabilization processing in the development processing device 40, is dried by the photosensitive material drying heater 54, and is sent to an external tray 56 outside the housing 2. In this way, the printing plate for offset printing is reproduced from the manuscript.
Created. Next, a description will be given of the development processing device 40 that performs development and stabilization processing on the photosensitive material PM. In the description of the development processing apparatus 40, in addition to FIG. 1 showing its schematic configuration, perspective views (FIGS. 3 and 3)
4) and a cross-sectional view (FIG. 5) as appropriate. As shown in FIG. 1, this developing processing apparatus 40 includes a developing section 70 that develops exposed photosensitive material PM introduced from an introduction roller 41 using a developer in a developer main tank 42.
Then, the stabilizer in the stabilizer main tank 43 is used to perform stabilization treatment on the developed photosensitive material PM, and the stabilizer is sent to the roller pair 51 of the drying unit 50.
(referred to as a stable part) 72. The developing section 70 includes a developer main tank 42 as a developer supply system, as well as a liquid level management cylinder 74 to which the developer main tank 42 is attached and detached, receives the developer from the main tank 42, and manages the liquid level at a constant level. and a conduit pipe 76 from the liquid level management cylinder 74.
A developer distern tank 78 into which the developer flows through
, an inflow electromagnetic valve 80 that opens and closes a conduit 79 for outflowing the developer from the developer distern tank 78, and a developer nozzle 82 that discharges the developer. This developer nozzle 82 includes a constriction portion (see FIG. 5), which limits the amount of developer discharged from the tip of the developer nozzle 82 during the opening period of the inflow electromagnetic valve 80. The amount of developer discharged from the tip of the developer nozzle 82 is approximately determined by the pressure applied to the constricted portion, that is, the height of the liquid level in the liquid level management tube 74 and the diameter of the constricted portion. In this embodiment, since the liquid level is kept constant, the flow rate of the developer when the inflow solenoid valve 80 is opened is constant regardless of the amount of developer in the developer main tank 42. It is maintained. A partition plate 84 is provided upright from the bottom of the developer solution distern tank 78 to divide the inside thereof into a liquid inflow chamber 78a and a liquid temperature retention chamber 78b, and a conductive pipe 76 is opened in the liquid inflow chamber 78a. has been done. On the other hand, the upper surface of the liquid temperature retention chamber 78b has a heater 86 inserted toward the bottom and a float 87 that moves up and down according to the amount of liquid in the tank, and controls the amount of liquid in the developer disturn tank 78. A float sensor 88 for detection is provided. Further, a mesh filter 90 for removing dust and the like from the outflowing developer is provided at the large opening of the conduit 79 communicating with the bottom of the developer distern tank 78. Therefore, the cold developer flowing from the developer main tank 42 through the conduit pipe 76 first flows into the liquid inflow chamber 78a, passes over the two ends of the partition plate 84'', and flows into the liquid warming chamber 78bl. The developer in the liquid reservoir chamber 78b is heated by the heater 86. The temperature of the developer by the heater 86 is controlled to a predetermined temperature by an electronic control device, which will be described later. The developer maintained at a predetermined temperature flows out from the developer nozzle 82 when the inflow solenoid valve 80 opens. Next, a developing tank 9 where the development of the photosensitive material PM is actually performed.
The general structure and function of the parts around 6 will be explained. Below the introduction roller 41 that introduces the photosensitive material PM into the developing section 70, there is provided a pair of inlet rollers 92 that rotates in the direction of the arrow X in FIG. 5 and feeds the photosensitive material PM;
A free roller 94 is provided in contact with the fed-in photosensitive material PM to guide the photosensitive material PM and give so-called stiffness to the photosensitive material PM during conveyance. The developing tank 96 has a substantially U-shaped cross section, has a width corresponding to the width of the photosensitive material PM, and forms a developer reservoir 95, as shown in FIG. A developer supply roller 98 is disposed in the developing tank 96 at a position that extends in the width direction of the developing tank 96 and leaves a slight distance from the bottom surface of the developing tank 96 . Therefore, when the developer is stored in the storage section 95 of the development processing tank 96, the lower part of the developer supply roller 98 is partially immersed in the developer. The surface of the developer supply roller 98 is made of a spongy material, and the bubbles constituting the spongy material are individually independent bubbles (single bubbles). As shown in FIG. 4, the developer supply roller 98 has a developer storage section 100 that temporarily stores the developer dripping from the top between the developer supply roller 98 and the developer supply roller 98. There is. Furthermore, as shown in FIGS. 3 and 5, a bottom liquid reservoir chamber 101 is formed at the bottom of the developing tank 96, and a plurality of communication holes 102 opened at the bottom of the developing tank 96 form a bottom liquid storage chamber 101. , the developer can flow in. Bottom liquid reservoir chamber 101
Two rod-shaped heaters 103 for heating the developer are disposed inside. At the center bottom of the bottom liquid reservoir chamber 101 is a developer discharge pipe that is connected to the bottom liquid reservoir chamber 101 via a discharge solenoid valve 104 that opens and closes the pipe line and discharges the used developer to a tray 106 as a waste liquid receiver. 108 are arranged in series. A guide plate 110 having a predetermined elevation angle α toward the stable portion 72 is disposed on the side of the developing tank 96 from which the photosensitive material PM is taken out. The guide plate 110 is formed of a corrugated plate in order to reduce the contact resistance with the photosensitive material PM (see FIG. 3), and guides the developed photosensitive material PM toward the squeeze roller pair 109 of the stabilizing section 72. Form an approach route. A planar heater 112 is attached to the lower surface of the guide plate 110 and has a self-temperature adjustment function. As shown in FIG.
The guide plate 1.
It is integrally fixed to 10. The heater 112 generates heat when energized, and maintains the ambient temperature above the guide plate 110 near a predetermined temperature. The timing of energization and the like will be described later together with the configuration of the electric circuit. The detailed structure of the developing tank 96 will be explained. As shown in FIG. 3, the storage section 95 of the development processing tank 96 is
Approximately half-moon-shaped side plates 12 are provided on both sides of the curved peripheral plate 120.
2 (in the figure, the side plate on the left side is omitted) are respectively joined and fixed. A through hole 126 passing through the circumferential plate 120 is provided approximately at the center of the circumferential plate 120 on the guide plate 110 side. When the developer is supplied from the developer nozzle 82 and the amount of the developer in the reservoir 95 increases, the developer flows out from the through hole 126. Therefore, the liquid level of the developer in the storage section 95 is lower than that in the through hole 126.
is held at a height of Note that the discharge solenoid valve 104 directly below the development processing tank 96 has the following:
As shown in FIG. 1, a drip-proof cover 114 is provided to prevent the developer from falling from the developing tank 96 or the guide plate 110 from accidentally landing. As shown in detail in FIGS. 4 and 5, the developer storage unit lOO includes two end plates 134 that abut against both end surfaces of the developer supply roller 98 while allowing the roller to rotate.
and a support plate 136 having a V-shaped cross section and having the end plate 134 fixed to both ends thereof. Further, a liquid passage hole 138 is provided at the center of the upper plate 136a constituting the support plate 136 at a position corresponding to the tip of the developer nozzle 82.
A back plate 136b constituting the support plate 136 is provided with a plate spring 140 made of a thin stainless steel plate that is biased toward the developer supply roller 98 and comes into contact with the outer periphery of the roller 98. Directly below the liquid passage hole 138, this leaf spring 14. A plate 142 is connected to the liquid receiver toward O. The liquid receiver is the tip of the plate 142 and the plate spring 140.
There is a small gap between them. The area surrounded by the developer supply roller 98, the end plate 134 that is in contact with both end faces of the developer supply roller 98, and the leaf spring 140 that is in contact with the outer circumferential surface of the roller 98 is such that the developer supply roller 98 is in one direction. Coupled with the fact that the developer nozzle 82
The developer dripping from the tank can be temporarily stored. This part is called a liquid pool part 143. Note that the liquid receiver plate 142 supplies the developer to the developer supply roller 9.
However, even if the plate 142 is not used for the liquid receiver, the developer is temporarily accumulated in the liquid reservoir 143, so it spreads in the axial direction of the developer supply roller 98. The developer dripping from the developer nozzle 82 passes through the liquid passage hole 138 and reaches the plate 142, as shown in FIGS. 4 and 5. spring 140
It flows down along the surface of the leaf spring 140 through a small gap formed between the two. In other words, the developer spreads along the axial direction of the developer supply roller 98 and reaches the reservoir 143, where it is temporarily stored. A part of the developer stored in the liquid reservoir 143 is
The developer is held uniformly in the axial direction of the developer supply roller 98 by individual bubbles in a single cell layer on the surface of the developer supply roller 98, and pumped out as the developer supply roller 98 rotates in the direction of arrow Y in FIG. It can be done. Since the lower part of the developer supply roller 98 is immersed in the developer stored in the development processing tank 96, the new developer pumped out as the developer supply roller 98 rotates is already stored. It is supplied into the developer solution. The new developer will be unevenly distributed (diffused) on the side where the photosensitive material PM is carried into the development processing tank 96.
When the amount of developer in the peripheral plate 120 increases, an amount of developer (old developer) corresponding to the newly supplied developer minus the developer lost when the photosensitive material PM is carried out (old developer) is transferred to the peripheral plate 120. The amount of developer in the developing tank 96 is balanced. The developer also flows into the bottom liquid storage chamber 101, and is heated by two rod-shaped heaters 103 built therein. The heated developer fluid convects between the reservoirs 957 through the communication holes 102. Coupled with the fact that the energization of the rod-shaped heater 103 is feedback-controlled based on the developer temperature detected by the temperature detector, the developer in the development processing tank 96 is heated to a predetermined temperature in an extremely short time. maintained. When the photosensitive material PM passes through the developer reservoir 95 of the development processing tank 96, sludge mixes into the developer as the photosensitive material PM is developed. Such sludge flows from the storage section 95 into the bottom liquid storage chamber 101, and when the discharge solenoid valve 104 is opened, the waste liquid receiver is discharged together with the developer into the tray 106 via the developer discharge pipe 108. . Next, conveyance of the photosensitive material PM will be explained. The exposed photosensitive material PM sent by the incoming roller pair 92 enters the storage section 95 while being guided by the free roller 94.
It passes through the storage portion 95 along the inner circumferential surface of the circumferential plate 120 . While passing through the storage section 95, as described above, the new developer diffused from the bubble layer of the developer supply roller 98 reacts with the developer stored in the development processing tank 96, and the photosensitive material PM Development processing for the image is started. After the photosensitive material PM passes through the gap between the developer supply roller 98 and the peripheral plate 120 and passes through the storage section 95, the photosensitive material PM passes through the squeezing roller pair 1 provided at the entrance of the stable section 72 along the inclined upper surface of the guide plate 110.
It will be sent out towards 09. Since the atmosphere above the guide plate 110 is heated to a predetermined temperature by the planar heater 112 having a temperature control function, the atmosphere on the guide plate 110 is heated to a predetermined temperature.
Even while the photosensitive material PM is being conveyed, the developing process of the photosensitive material PM continues due to the developer attached to the surface of the photosensitive material PM. Sense+A' P The developer on the surface of M is
The aperture roller pair 109 squeezes and removes the photosensitive material PM, and the development process of the photosensitive material PM is completed. Next, the stabilizing section 72, which is a stabilizing system for the stabilizer, will be explained with reference to FIG. Regarding members having functions, the explanation thereof will be omitted, and the auxiliary symbol A will be added to the symbols (numerical values) used in the explanation of the developing section 70.
We will add and express it. The stabilizing section 72 serves as a stabilizer supply system for the developing section 7.
Similar to the developer supply system of No. 0, the stabilizer main tank 43
．． A stabilizer distern tank 78A has a liquid level management cylinder 74A to which the stabilizer main tank 43 is attached and detached, and a partition plate 84A erected inside. Liquid level management FG174 A and stabilizer distern tank 7
8A, a stabilizer nozzle 82A interposed with an inflow solenoid valve 80A, and the like. In the stabilizer distern tank 78A, similarly to the developer distern tank 78, a float sensor 88A having a float 87A and a mesh filter 90A are also provided. When the stabilizer flows out from the stabilizer distern tank 78A via the inflow electromagnetic valve 80A and the stabilizer nozzle 82A, the stabilizer flows in the same amount from the conduction pipe 76A. Regarding other components of the stable part 72, feel 4'J'P
A brief explanation will be given along with the transport of M. The photosensitive material PM, which has passed through the aperture roller pair 109 disposed at the upper end of the guide plate 110 of the developing section 70, is placed along the transport path of the photosensitive material PM, but is guided by the ID cover 144 and the free roller 146, and stabilized. It is carried into the chemical treatment tank 96A. At the entrance of the stabilization treatment tank 96A, the so-called waist is placed on the photosensitive material PM]
A free roller 94A is provided. Similar to the development processing tank 96, the stabilization processing tank 96A forming the stabilization agent storage section 95A includes a sponge-like stabilization agent supply roller 9.
8A and this stabilizer supply roller 98A form a stabilizer liquid reservoir 143A.
0A is provided, and the stabilizing agent is supplied to the inlet side of the storage section 9'5A. On the other hand, stabilization treatment tank 96
At the bottom of A, similar to the development processing tank 96, there is a bottom liquid storage chamber 10.
1A is provided. When the discharge solenoid valve 104A with the drip-proof cover 114A is opened, the used stabilizer is discharged from the other stabilizer discharge pipe]-
The waste liquid receiver is discharged from the bottom liquid storage chamber 101A to the tray 106A via 08A. Note that since the stabilizer does not require temperature control, no heater is provided in the bottom liquid reservoir chamber 101A. A guide plate 110A forming an entry path for the stabilized photosensitive material PM is arranged downstream of the stabilization treatment tank 96A along the conveyance path of the photosensitive material PM so as to be inclined upward from the stabilization treatment tank 96A. The upper end of the guide plate 110A has a first
Squeezing roller rotates in the direction of the arrow Z in the figure to convey the stabilized photosensitive material PM toward the roller pair 51 of the drying unit l-50 (see FIG. 2) and squeezes out excess stabilizer from the surface of the photosensitive material. Pair 109A is provided. Note that the stabilizer supply roller 98A and each squeezing roller pair 109. ]09A is
The rollers are driven by a common drive source and rotated in synchronization with the rollers of the developing tank 96 described above. FIG. 1 Diaphragm pairs 109 rotate in the Z direction of arrow Z to convey the developed and stabilized photosensitive material PM while squeezing excess developer and stabilizer from the surface of the photosensitive material PM.
．． As shown in the figure, the LO9A is provided so that a plane passing through the center of each roller is inclined by an angle β in the counterclockwise direction in the figure from a vertical plane passing through the center of the roller. Therefore, when the photosensitive material PM is sandwiched between the aperture roller pair 109 and 109A, the photosensitive material PM at the aperture roller pair 109 and 109A portion
The conveying direction of is downward by an angle corresponding to the angle β. As a result, the squeezed developer or stabilizer is mixed with the photosensitive material PM and the squeezing roller pair 109, 109 while the photosensitive material PM is passing through.
It stays between A and A and does not drip to the side of the photosensitive material PM. During the feeding of the photosensitive material PMIm, the developer or stabilizer that remains in each squeeze roller pair 109, 109A becomes 11jν when the cut end surface of the photosensitive material PM passes through the squeeze roller pair 109 or 109A. , and each squeezing roller pair 109,
The waste liquid that falls on the right squeezed liquid collection plate 152 or the left squeezed liquid collection plate 1541 located below 109A is placed in tray 1.
It flows into 06A. Each squeeze roller pair 109. ' 109 Ai: C. Two scrapers 150 are each provided at a position where their tips abut against the outer periphery of the roller. The scraper 150 is used to prevent scratches on the roller surface.
In order to extend its lifespan, it is made of a material that has contact resistance and elasticity, such as a stainless steel plate with a smoothly polished tip or a stainless steel plate whose tip is covered with plastic. As the plastic covering the tip of the scraper 150, a material having chemical resistance to processing liquids and wear resistance, such as fluororesin, polyester, and vinyl chloride, can be used. The sludge and waste liquid scraped off by the scraper 150 fall onto the right squeezed liquid collection plate 152 and the left squeezed liquid collection plate 154, and then fall onto the waste liquid receiving tray 106.
It is collected by A. Note that each waste liquid receiver of the developing section 70 and the stabilizing section 72 is provided with a waste liquid tank 156 in the tray 106.106A.
A pipe 158 is provided, and the waste liquid collected in each tray 106 and 106A is finally collected in a waste liquid tank 156 via the pipe 158. In the stabilizing section 72 configured as described above, the developed photosensitive material PM sent from the developing section 70 is transferred to the aperture roller pair 1.
09, the adhering developer is squeezed out, and the developer is transported into the storage section 95A while being guided by the free roller 94A and the like. When the photosensitive material PM enters the stabilizing agent in the storage section 95A, stabilization processing starts, and after passing through the storage section 95A, the stabilization processing continues even while being conveyed along the upper surface of the guide plate 110A. . When passing through the squeezing roller pair 109A, excess stabilizer is squeezed out from the upper surface of the photosensitive material PM, and the stabilization process is completed. After that, the photosensitive material PM is transferred to the roller pair 5I.
is transported to the drying unit 50 by. Next, the electronic control device i'260, which controls the temperature control in the developer displacer tank 78 and the like and the drive control of the developer supply roller 98 and the like, will be explained using the block diagram shown in FIG. As shown in FIG. 6, the electronic control device 60 includes a well-known CP
Ul62. ROM164. It is configured as an arithmetic and logic operation circuit mainly including a RAM 166 and a timer 168 that includes multiple self-running timer counters, and is connected to a common bus 17.
Exposure output ports 1-172 interconnected through 0
．． Manual port for development 174. A human output interface such as a developing output boat 176 is provided. Further, the common bus 170 of the electronic control device 60 includes a temperature adjustment circuit 1 that adjusts the temperature of the developer in the storage section 95 and the developer in the developer distern tank 78 that communicate with the bottom liquid reservoir chamber 101.
78 is connected to a console panel 4 on which an operator makes various settings. The exposure output port 172 includes a motor 13 for driving the original holder IO and a cutting device 2 for cutting the photosensitive material PM.
7, a light source 31 for irradiating light onto the document in the document holder 10, and a motor 28 for sending out the photosensitive material from the first photosensitive material roll 21 or the second photosensitive material roll 22. , an LED 38 for uniformly exposing the photosensitive material PM, and a drying unit 50 for drying the stabilized photosensitive material. On the other hand, the developer capo-h I-74 is connected to a float sensor 88 in the developer distern tank 78 and a float sensor 88A in the stabilizer distern tank 78A, and is connected to the developer output port 176. is a drive motor 180 that synchronously drives each roller of the processing unit 44.
, an inflow solenoid valve 80 provided in the developer nozzle 82, and an inflow solenoid valve 80 provided in the stabilizer nozzle 82A.
A and the discharge solenoid valve 1 provided in the developer discharge pipe 108
04, a discharge solenoid valve 104A provided on the stabilizing side discharge pipe 108A, and a planar heater 112 for heating the atmosphere near the guide plate 110 to a certain temperature. In addition, the temperature adjustment circuit 178 includes a heater 86 installed in the developer distern tank 78, a temperature sensor 85 that detects the temperature of the liquid in this tank, and two sensors installed in the bottom liquid storage chamber 101. A rod-shaped heater 103 and a temperature sensor LO3a that detects the temperature of the liquid in the liquid reservoir chamber 101 are connected. The temperature adjustment circuit 178 controls the heating of each of the heaters to maintain the temperature of the developer in the storage section 95 and the developer in the developer distern tank 78 within a predetermined temperature range. A signal indicating whether or not it is maintained within the range is output to CP0162. Next, the processing executed by the electronic control device 60 will be explained using a flowchart. The processes executed by the slit exposure type copying camera 1 of the embodiment include an initial processing routine executed when the power is turned on, a standby processing routine that waits until a state in which exposure and development is possible, and exposure and development of the photosensitive material PM. It can be divided into exposure and development processing routines. FIG. 7 is a flowchart showing the initial processing routine;
The figure is a flowchart 1 showing the standby processing routine, and FIG. 9 is a flowchart showing the exposure and development processing routine. When the slit exposure type copying camera 1 of this embodiment is powered on, the electronic control unit 60 first executes an initial processing routine shown in FIG. This process is executed only once when the slit exposure type copying camera starts to be used. When this routine is started, first the discharge solenoid valve 104.
104A is opened (step 510),
The developer or stabilizer remaining in the development processing tank 96 and the stabilization processing tank 96A (hereinafter, both may be collectively referred to as the processing tank 96 as necessary) (hereinafter, both may be processed together as necessary) Wait a sufficient drain time for all of the liquid (also referred to as liquid) to drain (step 520). Since the amount of processing liquid stored in the processing tank 96 is fixed, it is easy to set the discharge time in advance.
Step 530), then processing is performed to open the inflow solenoid valve 80.8OA (step 540), and further processing is performed to start operation of the drive motor 180 via the developing output port 176 (step 550). Inflow solenoid valve 8
When the 0.80A valve opens, the developer liquid turn tank 78
The processing solution is supplied from the stabilizer distern tank 78A to the developer nozzle 82. The stabilizer begins to flow out through the stabilizer nozzle 82A and the developer supply roller 98. is driven by the drive motor 180.
The processing liquid is supplied to the processing tank 96 by the rotation of the stabilizing side supply roller 98A. Since the processing liquid is gradually stored in the processing tank 96, after waiting for a preset storage time (time required for storage) (step 560), the process of closing the inflow solenoid valve 80.8OA is performed (step 560). Ste, knob 570) and drive motor 180
The process of stopping the rotation of each roller (step 5)
80). As a result, each processing tank 96 is filled with the amount of processing liquid necessary for development and stabilization processing. After the storage of the processing liquid is completed in this manner, an instruction to start adjusting the developer temperature is output to the temperature adjustment circuit 178, and energization to the planar heater 112 is started via the development output port 176 (step 590). Upon receiving the instruction, the temperature adjustment circuit 178 detects the temperature sensor 85.
While referring to the detection signal of 103a, heater 86.103
The temperature of the developer in the developer distern tank 78 and the development processing tank 96 is set to about 28°C to 31°C.
Controlled within a range of °C. When the temperature adjustment circuit 178 heats the developer and controls the temperature within this range, it outputs a signal to the CP0162 indicating that the temperature adjustment has been completed. On the other hand, the planar heater 112 has a low internal resistance and is rapidly heated with a large amount of power immediately after the start of energization, but as it approaches the specific control temperature, the internal resistance increases and the power consumption decreases. The temperature is self-controlled to near the control temperature. Therefore, around the time the temperature adjustment by the temperature adjustment circuit 178 is completed, the temperature control of the planar heater 112 is also completed. Therefore, we wait until the adjustment completion signal is input from the temperature adjustment circuit 178 (step 5100), and when this signal is input, a display is made on the console panel 4 indicating that the plum-13 up has been completed (step 81). 10
), it is assumed that all initial processing is completed, and the process moves to the next standby processing. By executing the initial processing described above, the developing processing device 40 of the slit exposure type copying camera 1 operates in the developing processing tank 96. The processing solution (developer and stabilizer) remaining in the stabilization processing tank 96A is discharged together with sludge, etc., and a new processing solution is supplied, and the temperature of the developer is adjusted to an appropriate temperature required for processing. In the standby process that is executed after the initial process is completed, as shown in FIG. The size of the image, the degree of exposure, etc. are set (step 5210). next,
The status of each float sensor 88, 88A of the developer distern tank 78 and the stabilizer distern tank 78A is read (step 5220), and the float sensor 88.
88A is on (step 5).
230). If the float sensors 88, 88A are off, that is, the liquid level of the developer cistern tank 78 or the stabilizer cistern tank 78A is low, an instruction to replenish the developer or stabilizer main tank 42, 43 is sent to the console. Perform processing to display on panel 4 (step 5)
235), repeating the two consecutive processes from step 200. On the other hand, if both the float sensors 88 and 88A are on (step 5230), it is then determined whether the temperature of the developer is appropriate (step 5240), and if it is appropriate, the exposure on the console panel 4 is further performed. It is determined whether or not the start key instructing the start of is turned on (step 5250). The temperature of the developer is regulated by the temperature adjustment circuit 178, and should be at an appropriate temperature after the initial processing (Fig. 7) is completed, but the temperature may drop due to a malfunction of the heater 86° 103. This is also possible, so we are checking again here. If the temperature is not appropriate or the start key is not turned on, the process is repeated from step 200 described above. When the start key is pressed and turned on, the exposure and
Move on to development processing. When the development and exposure process starts,
As shown in FIG. 9, various processes necessary to start exposure are first performed (step 5300). In this case, the exposure start processing includes the transportation of the document holder 10 on which the document is placed, the feeding of the photosensitive material PM in synchronization with this, and furthermore, the transportation of each roller in the processing unit 44 by the drive motor 180 that is the drive source of the processing unit 44. This is the process of starting rotation, etc. Next, the drying unit 50 is turned on to start blowing out high-temperature air (step 5310), and the flag F indicating that exposure processing is in progress is set to the value 1 (step 5320).
), and the first timer power in the timer 168 that measures the time from the start of exposure = 37- Performs processing (Tl←O) to start the counter T1 (
step 5330). Next, timer counter T1 and developer inflow start timing T
In step 5340), the timer counter T1 waits until the developer inflow start timing TAON is reached. When T1=TAON, the electromagnetic valve 80 for developer inflow is opened (step 5350), and supply of new developer to the developer supply roller 98 of the development processing tank 96 is started. That is, as shown in the timing chart of FIG. 10, the supply of the developer is started later than the start of the exposure process and before the photosensitive U'PM is carried into the developing process tank 96. Next, the timer counter T1 activates the stabilizer inflow solenoid valve 8.
It is determined whether the valve opening timing TSON of 0A has been reached (step 5360). When the timer counter TI reaches the valve opening timing TSON, processing is performed to open the stabilizer inflow solenoid valve 80A (step 5370). Note that until the valve opening timing TSON is reached, the process of opening the stabilizing side flow-38= required solenoid valve 80A is not performed, and the process moves to the next process. As a result, as shown in FIG. 10, the stabilizing agent is not supplied after a predetermined period of time has elapsed since the developer inflow electromagnetic valve 80 was opened and before the photosensitive material PM is carried into the stabilization treatment tank 96A. Begins. Next, it is determined whether the flag F indicating that exposure is in progress is 1 (step 5380). During the exposure process, the flag F has a value of 1 (step 532
In this case, it is subsequently determined whether the exposure has ended (step 5390). When the document holder 10 has been conveyed a distance corresponding to the length of the document and the necessary exposure processing has been completed, an exposure termination process (step 5400) is executed. Here, the exposure end processing is
Processing such as finishing the conveyance of the original holder 10 and returning the original holder 10 to the initial position, and processing such as stopping feeding of the photosensitive material PM and driving the cutting device 27 to cut the photosensitive material PM at the end of its exposure area. be. After the exposure completion process (step 5400) is executed, the exposure process is deemed to have been completed and the flag F is reset to the value O (step 5410). Thereafter, a process (T2←0) is performed to start the second timer counter T2 in the timer 168 that measures the time from the end of exposure (step 5420). In addition, in the following description, the manuscript has a length longer than the specified length,
Before the exposure process is completed, the tip of the photosensitive material PM is stabilized in the processing tank 96.
Although the description has been made on the assumption that the length of the document reaches A, there may be a case where the length of the document is short and the tip of the +A' P M does not reach the stabilization processing tank 96A when the exposure process is completed. In this case, before the determination in step 8360 becomes I"YES", the determination in step 5390 becomes rYEsJ, and the second timer counter T2 starts before the stabilizer inflow solenoid valve 80A opens. I will do it. After starting timer counter T2 (step 542
0), the timer counter T2 is the solenoid valve 80 for developer inflow.
It is determined whether the valve closing timing TAOFF has been reached (step 8430). Valve closing timing T AOF
If F has not been reached, step 836 is performed via connection point ■.
The above process is repeated from 0. On the other hand, when the timer counter T2 reaches the timing TAOFF, processing is performed to close the developer inflow solenoid valve 80 (step 5440). The valve closing timing T AOFF is a timing to ensure a time during which the developer supply roller 98 can supply the developer necessary for the terminal end of the photosensitive material PM to undergo development processing in the development processing tank 96 . Therefore, as shown in FIG. 10, the developer inflow solenoid valve 80 is closed after the exposure process is completed and before the end of the exposed photosensitive material PM leaves the development tank 96. Ru. After the inflow solenoid valve 80 is closed or the timer counter T2
After the timer exceeds the timing TA[lFF, it is determined whether the timer counter T2 has reached the closing timing TSOFF of the stabilizer inflow solenoid valve 80A (
step 5450). If the timer counter T2 has not reached the valve closing timing TAOFF, step 430
Similar to the case determined in , step 8 via the connection point ■
The above-described process is repeated from 360. On the other hand, when the timer counter T2 becomes OFF at timing T5,
A process of closing the stabilizer inflow solenoid valve 80A is performed (step 8460). At the valve closing timing T5OFF, the stabilizing agent necessary for the terminal end of the photosensitive material PM to undergo stabilization processing in the stabilization processing tank 96A is transferred to the stabilization processing tank roller 98A.
Now is the time to secure the time that can be supplied. Therefore, as shown in FIG. 10, the stabilizer inflow solenoid valve 80A is closed at a timing prior to the end of the exposed image +A'PM exiting the stabilization treatment tank 96A. After closing the stabilizer inflow solenoid valve 80A, time T3
(Step 5470), waiting for the kidnapped PM to pass the drying unit 50, the drying unit 5
0, the drive motor 180, etc. are turned off (step 5480). After that, return to the standby process (Figure 8),
The process is repeated starting from inputting the key power on the console panel 4. As explained above, according to the developing processing apparatus 40 of the embodiment incorporated in the slit exposure type copying=42-camera 1, in each processing tank 96, the developer supply roller 98.
Development and stabilization processing is started using the processing liquid uniformly supplied to the loading side of the photosensitive material PM by the rotation of the stabilizing side supply roller 98A, and even after being carried out from each processing tank 96, the photosensitive material P
While M is transported along the guide plate 110, ll0A,
Processing of the photosensitive material PM continues. Therefore, even if the time for the photosensitive material PM to pass through the processing tank 96 is short, the processing of the photosensitive material PM can be carried out sufficiently, and the conveyance speed of the photosensitive material PM can be made sufficiently high. The amount of processing liquid stored in the processing tank 96 can also be reduced to a small amount. Moreover, in this embodiment, since the new developer is supplied to the inlet side of the photosensitive material PM, that is, to the development processing start side, the new developer is supplied at the initial stage of development where the sensitivity of sensitivity +A'PM is highest. It can be made to act efficiently on the photosensitive material PM, and the development quality can be further improved. Also, transfer the processing liquid to the roller 9.
8, the storage section 95 of the processing tank 96
There should be no disturbances such as ripples on the surface of the developing solution in the developer. streaks)
It does not occur. As a result, each of the processing tanks 96, 96A can be made smaller, and the developing processing apparatus 40 and, by extension, the slit exposure type copying camera 1 can be made smaller. Further, according to this embodiment, there is no need to store a large amount of developer and stabilizer as in the conventional case, so the development processing tank 9
The developing ability does not decrease or change due to deterioration of the developer in the plate 6 due to development or oxidation over time, and the plate-making quality can always be kept stable. The amount of processing liquid used can also be reduced overall. Furthermore, since a large amount of developer and the like is not stored, sludge does not remain for a long period of time and become sludge. Therefore, there is no need to clean the developing tank 96, etc., and maintenance efforts such as washing with water, which are conventionally required, are also no longer necessary. Since sludge does not stick to the bottom of the developing tank 96 and obstruct the conveyance of the photosensitive material PM, there is a problem that the conveyance of the photosensitive material PM is obstructed and uneven development occurs on the developed photosensitive material PM. Nor. In addition, the problem of time loss during warm-up required to adjust a large amount of developer to a processable temperature is also resolved.
Since only a small amount of processing liquid needs to be heated, power consumption can also be reduced. Note that the stabilization treatment tank 96A has a similar configuration except that it is not provided with a heater for heating, and it goes without saying that the treatment quality can be improved by increasing the efficiency and stabilizing the treatment. Although two embodiments of the present invention have been described below, the present invention is not limited to these embodiments; for example, a configuration applied only to one of development processing or stabilization processing,
A configuration that feedback-controls the amount of developer supplied, a configuration in which the total length of the guide plate is made longer than the total length of the exposed photosensitive material and the photosensitive material is stopped on the guide plate for a predetermined time, or The configuration applied to the developing device, etc.
It goes without saying that the invention can be implemented in various ways without departing from the gist of the invention. -Abe-

【Effect of the invention】

As described in detail above, in the photosensitive material processing apparatus of the present invention, processing of the photosensitive material carried into the processing tank is started using the processing liquid supplied to the processing tank, and even after being carried out from the processing tank, the processing of the photosensitive material is continued. The sensitive material is maintained in a state capable of reacting with the processing solution for a predetermined distance until the processing solution is removed from the material. Therefore, even if the time for the photosensitive material to pass through the processing liquid in the processing tank is short, the processing of the photosensitive material can be sufficiently performed, and the excellent effect that the conveyance speed of the photosensitive material can be made sufficiently high can be achieved. Furthermore, since only a small amount of processing liquid can be stored in the processing tank, there is no need to store a large amount of processing liquid, and problems such as sticking of sludge that has turned into sludge can be avoided. As a result, there is also the advantage that maintenance of the processing tank becomes unnecessary.

[Brief explanation of the drawing]

FIG. 1 is a block diagram of a developing processing apparatus according to an embodiment of the present invention, FIG. 2 is a schematic block diagram showing a slit exposure type copying camera 1 incorporating the developing processing apparatus of the embodiment, and FIG. 4 is a perspective view of the developer supply roller 98 and the developer storage section 100, and FIG. 5 is a perspective view of the developer supply roller 98 in the development treatment tank 96.
6 is a block diagram showing the configuration of the electronic control device 60, FIG. 7 is a flowchart showing the initial processing routine executed by the electronic control device 60, FIG. 8 is a flowchart showing the standby processing routine, FIG. 9 is a flowchart 1 showing the exposure/development processing routine, and FIG. 10 is a timing chart showing the conveyance of the sensor +J'PM and the operation timing of each part. be. ■...Slit exposure type copying camera 4...Console panel 10...Document holder 30...Projection optical system 40...
...Development processing device 42...Developer main tank 43...Stabilizer main tank 44...Processing unit 50...Drying unit 60
...Electronic control device 70...Developing section 72...Stabilizing section 82...
Developer nozzle 82A...Stabilizer nozzle 96...
Development processing tank 96A...Stabilization processing tank 98...Developer supply roller 98A...Stabilization processing tank roller 100...Developer-time storage section 100A...Stabilizer-time storage section 162 ...CPU PM...Sensitive material agent Patent attorney Takashi Igarashi M1:

Claims (1)

[Scope of Claims] 1. A processing device for processing a silver salt type sensitive material such as photographic paper, photosensitive paper for direct plate making, or film, comprising: a processing tank for storing a processing solution for the sensitive material; A processing liquid supply means for supplying a new processing liquid to the processing tank; A means for transporting the photosensitive material, and a means for reacting the photosensitive material with the adhering processing liquid over a predetermined distance from the processing tank to a removal device for removing the processing liquid adhering to the surface of the photosensitive material. A sensitive material processing device comprising a reaction maintaining means for maintaining the condition.