JPH04168128A - Prepreg and its use - Google Patents
Prepreg and its useInfo
- Publication number
- JPH04168128A JPH04168128A JP29673190A JP29673190A JPH04168128A JP H04168128 A JPH04168128 A JP H04168128A JP 29673190 A JP29673190 A JP 29673190A JP 29673190 A JP29673190 A JP 29673190A JP H04168128 A JPH04168128 A JP H04168128A
- Authority
- JP
- Japan
- Prior art keywords
- prepreg
- layer
- fep
- ptfe
- circuit board
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004810 polytetrafluoroethylene Substances 0.000 claims abstract description 38
- 229920001343 polytetrafluoroethylene Polymers 0.000 claims abstract description 38
- 229920001577 copolymer Polymers 0.000 claims abstract description 7
- -1 polytetrafluoroethylene Polymers 0.000 claims abstract description 4
- 239000000463 material Substances 0.000 claims description 32
- 239000002184 metal Substances 0.000 claims description 13
- 229910052751 metal Inorganic materials 0.000 claims description 13
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 claims 1
- 239000004744 fabric Substances 0.000 abstract description 11
- 239000000758 substrate Substances 0.000 abstract description 4
- 238000010030 laminating Methods 0.000 abstract description 2
- 229920000573 polyethylene Polymers 0.000 abstract 1
- 238000004904 shortening Methods 0.000 abstract 1
- 239000002585 base Substances 0.000 description 28
- 239000000835 fiber Substances 0.000 description 14
- 238000010438 heat treatment Methods 0.000 description 13
- 238000004519 manufacturing process Methods 0.000 description 13
- 238000005470 impregnation Methods 0.000 description 10
- 229920002120 photoresistant polymer Polymers 0.000 description 10
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 9
- 239000011889 copper foil Substances 0.000 description 9
- 239000006185 dispersion Substances 0.000 description 8
- 239000011521 glass Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 238000007598 dipping method Methods 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- 230000008018 melting Effects 0.000 description 4
- 238000000059 patterning Methods 0.000 description 4
- 238000003825 pressing Methods 0.000 description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 229910052582 BN Inorganic materials 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- 239000004699 Ultra-high molecular weight polyethylene Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000004760 aramid Substances 0.000 description 1
- 229920006231 aramid fiber Polymers 0.000 description 1
- 229920003235 aromatic polyamide Polymers 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 239000010425 asbestos Substances 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 239000012784 inorganic fiber Substances 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229910052895 riebeckite Inorganic materials 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 229920000785 ultra high molecular weight polyethylene Polymers 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
Landscapes
- Organic Insulating Materials (AREA)
- Reinforced Plastic Materials (AREA)
- Laminated Bodies (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野]
本発明は電子機器、通信機器、コンピュータ等の高周波
域を利用する各種機器の製造に好適なプリプレグ、この
プリプレグを用いて成る積層板、回路板および多層回路
板に関する。[Detailed Description of the Invention] [Field of Industrial Application] The present invention relates to a prepreg suitable for manufacturing various devices that utilize high frequency ranges such as electronic devices, communication devices, and computers, and a laminate and a circuit using this prepreg. Concerning boards and multilayer circuit boards.
従来、高周波域を利用する各種機器には、ガラスクロス
にポリテトラフルオロエチレン(以下、PTFEと称す
)を含浸せしめたプリプレグの表面に銅箔を配置し、加
熱加圧によりこれらを一体化した積層板を得、この積層
板の銅箔をパターン化した回路板が用いられている(特
開昭60−248346号公報)。Conventionally, various types of equipment that utilize high frequency ranges have been manufactured by laminating a prepreg made of glass cloth impregnated with polytetrafluoroethylene (hereinafter referred to as PTFE), with copper foil placed on the surface of the prepreg, and then integrated by heat and pressure. A circuit board is used in which the copper foil of this laminated board is patterned (Japanese Patent Laid-Open No. 60-248346).
また、この回路板を内層用として用い、該内層用回路板
の表面に上記と同様なプリプレグを介して銅箔パターン
を設けることにより、多層回路板とすることもある。Further, this circuit board may be used as an inner layer circuit board, and a multilayer circuit board may be obtained by providing a copper foil pattern on the surface of the inner layer circuit board via a prepreg similar to that described above.
ところで、上記積層板あるいは多層回路板の製造に際し
ては、PTFEと銅箔あるいはPTFEと内層用回路板
を接着しなければならず、従って、加熱加圧作業時の温
度は当然のことながらPTFEの融点以上、実際的には
約380〜400°Cという高温を必要とし、また、圧
力も約10〜80)cg/cidと高いものである。こ
のため、複雑高価な製造設備を設置しなければならなか
った。更に、接着を十分に行うため長時間を要し、生産
性も悪いという問題もあった。By the way, when manufacturing the above-mentioned laminate board or multilayer circuit board, it is necessary to bond PTFE and copper foil or PTFE and the inner layer circuit board, and therefore, the temperature during the heating and pressing operation is naturally the melting point of PTFE. As mentioned above, in practice, a high temperature of about 380 to 400°C is required, and the pressure is also high, about 10 to 80) cg/cid. For this reason, complicated and expensive manufacturing equipment had to be installed. Furthermore, there was also the problem that it took a long time to sufficiently bond and the productivity was poor.
本発明者は上記問題を解決するため鋭意研究の結果、布
状基材にPTFEを含浸せしめたプリプレグと、布状基
材に複層のフッ素樹脂層を形成したプリプレグを組み合
わせることにより、所期の目的が達成できること見い出
し、本発明を完成するに至ったものである。As a result of intensive research in order to solve the above problem, the present inventor has found that by combining a prepreg in which a cloth-like base material is impregnated with PTFE and a prepreg in which a multi-layered fluororesin layer is formed on a cloth-like base material, the desired result can be achieved. The inventors have discovered that the object of the invention can be achieved, and have completed the present invention.
即ち、本発明に係るプリプレグは布状基材にテトラフル
オロエチレン−へキサフルオロプロピレン共重合体(以
下、FEPと称す)またはテトラフルオロエチレン−パ
ーフルオロアルキルビニルエーテル共重合体(以下、P
FAと称す)による層が形成されており、更に該層上に
PTFE層およびFEP層が設けられて成る第1プリプ
レグが、布状基材にPTFEを含浸させた第2プリプレ
グの両面に重ね合わされて成ることを特徴とするもので
ある。That is, the prepreg according to the present invention has a cloth-like base material containing a tetrafluoroethylene-hexafluoropropylene copolymer (hereinafter referred to as FEP) or a tetrafluoroethylene-perfluoroalkyl vinyl ether copolymer (hereinafter referred to as P
A first prepreg is formed with a layer made of FA (referred to as FA), and a PTFE layer and an FEP layer are further provided on the layer, and is superimposed on both sides of a second prepreg, which is a fabric-like base material impregnated with PTFE. It is characterized by consisting of:
本発明には従来からプリプレグ材料として使用されてい
た布状基材をそのまま用いることができ、る。かような
布状基材の具体例としてはガラス繊維、アスベスト繊維
、アルミナ繊維、ボロン繊維、窒化ホウ素繊維、シリコ
ーンカーバイト繊維、チタニア繊維等の無機繊維、ある
いは芳香族ポリアミド繊維(アラミド繊維)、PTFE
繊維、超高分子量ポリエチレン繊維、芳香族ポリエステ
ル繊維等の有機繊維の単独糸またはこれらの2種以上を
用いた複合糸から成る織布や不織布を挙げることができ
る。この基材の厚さは適宜選択するが、通常、約50〜
200μmである。In the present invention, cloth-like base materials conventionally used as prepreg materials can be used as they are. Specific examples of such cloth-like base materials include inorganic fibers such as glass fiber, asbestos fiber, alumina fiber, boron fiber, boron nitride fiber, silicone carbide fiber, and titania fiber, or aromatic polyamide fiber (aramid fiber). PTFE
Examples include woven fabrics and non-woven fabrics consisting of single threads of organic fibers such as fibers, ultra-high molecular weight polyethylene fibers, and aromatic polyester fibers, or composite threads using two or more of these fibers. The thickness of this base material is selected appropriately, but is usually about 50~
It is 200 μm.
本発明に係る複層タイプのプリプレグは第1および第2
の二つの異なるタイプのプリプレグから構成される。The multi-layer prepreg according to the present invention has two
It is composed of two different types of prepreg.
第1プリプレグは布状基材にFEP層(以下、この層を
第1 FEP層と称す)またはPFA層が形成され、更
に該層上にPTFE層およびFEP層(以下、この層を
第2FEP層と称す)が形成されたものである。In the first prepreg, an FEP layer (hereinafter referred to as the first FEP layer) or a PFA layer is formed on a cloth-like base material, and a PTFE layer and a FEP layer (hereinafter referred to as the second FEP layer) are formed on the layer. ) was formed.
この第1プリプレグを得るため布状基材に第1FEP層
またはPFA層を形成するには、含浸法を採用できる。An impregnation method can be employed to form the first FEP layer or PFA layer on the cloth-like base material to obtain the first prepreg.
布状基材へのFEPまたはPFAの含浸量が多い場合、
これらは基材を構成する繊維に浸透すると共に基材表面
に比較的厚手の層を形成し、また、基材が網目を有する
ときはこの網目を閉塞することもある。一方、FEPま
たはPFAの含浸量が少ない場合、これらは基材を構成
する繊維に浸透すると共にその表面に比較薄手の層を形
成する。When the amount of FEP or PFA impregnated into the fabric base material is large,
These penetrate into the fibers constituting the base material and form a relatively thick layer on the surface of the base material, and when the base material has a network, they may block this network. On the other hand, when the amount of FEP or PFA impregnated is small, they penetrate into the fibers constituting the base material and form a relatively thin layer on the surface thereof.
布状基材へのFEPまたはPFAの含浸は、例えば、(
イ)布状基材をFEPまたはPFAディスバージョン中
に浸漬して引上げ、次いで、FEPまたはPFAの融点
以上の温度で加熱する方法(所望により、浸漬および加
熱を繰り返す)、(ロ)布状基材にFEPまたはPFA
ディスバージョンをスプレー塗布し、次いで、FEPま
たはPFAの融点以上の温度で加熱する方法(所望によ
り、塗布および加熱を繰り返す)、(ハ)布状基材とF
EPまたはPFAシートを重ね合わせ、次いで、FEP
またはPFAの融点以上の温度で加熱する方法、等によ
って行うことができる。Impregnation of FEP or PFA into a fabric-like substrate can be achieved, for example, by (
(b) A method of dipping the cloth-like base material in FEP or PFA dispersion, pulling it up, and then heating it at a temperature equal to or higher than the melting point of FEP or PFA (repeating dipping and heating if desired); (b) cloth-like base material; FEP or PFA material
A method of spraying dispersion and then heating at a temperature equal to or higher than the melting point of FEP or PFA (if desired, repeating the application and heating), (c) fabric-like base material and FEP
Overlap EP or PFA sheets, then FEP
Alternatively, it can be carried out by a method of heating at a temperature higher than the melting point of PFA.
そして、布状基材に形成された第1 FEP層またはP
FA層上には、更にPTFE層および第2FEP層が順
次形成される。これらPTFE層または第2FEP層の
形成は、PTFEまたはFEPのディスバージョンやシ
ートを用い、上記(イ)〜(ハ)の方法に準じて行うこ
とができる。Then, the first FEP layer or P
A PTFE layer and a second FEP layer are further sequentially formed on the FA layer. The PTFE layer or the second FEP layer can be formed using a PTFE or FEP dispersion or sheet according to the methods (a) to (c) above.
布状基材へのこれらフッ素樹脂の含浸率は種々の要因に
応じて適宜設定するが、通常、約55〜85%である。The impregnation rate of these fluororesins into the cloth-like base material is appropriately set depending on various factors, but is usually about 55 to 85%.
この含浸率は布状基材のフッ素樹脂含浸前の重量M0、
第1 FEP層またはPFA層、PTFE層および第2
FEP層形成後の布状基材の重量M、を用い、下記の式
(I)により算出した値である。This impregnation rate is the weight M0 of the fabric base material before being impregnated with fluororesin,
First FEP layer or PFA layer, PTFE layer and second
This is a value calculated using the following formula (I) using the weight M of the cloth-like base material after forming the FEP layer.
なお、第1プリプレグにおける第1 FEP層またはP
FA層、PTFE層および第2FEP層を形成するため
のFEPまたはPFA、PTFEおよびFEPの含浸比
率は含浸フッ素樹脂総重量中に占める第1FEP層ある
いはPFA層形成用FEPまたはPFAの割合が約5〜
25重量%、PTFE層形成用PTFEの割合が約60
〜93重量%、第2FEP層形成用FEPの割合が約2
〜15重量%になるように設定することができる。Note that the first FEP layer or P
The impregnation ratio of FEP or PFA, PTFE and FEP for forming the FA layer, PTFE layer and second FEP layer is such that the ratio of FEP or PFA for forming the first FEP layer or PFA layer to the total weight of impregnated fluororesin is about 5 to
25% by weight, the proportion of PTFE for forming the PTFE layer is approximately 60%
~93% by weight, the proportion of FEP for forming the second FEP layer is approximately 2
It can be set to 15% by weight.
本発明のプリプレグは第2プリプレグの両面に上記第1
1リブレグを重ね合わせたものであり、第2プリプレグ
としては布状基材にPTFEを含浸させて該基材表面に
層形成したものを用いることができる。第2プリプレグ
における布状基材へのPTFEの含浸率も該基材のPT
FE含浸前および含浸後の重量を用い、前述の式(I)
と同様にして算出できる。この含浸率は、通常、約55
〜85%である。The prepreg of the present invention has the above first prepreg on both sides of the second prepreg.
The second prepreg is a fabric-like base material impregnated with PTFE and a layer formed on the surface of the base material can be used as the second prepreg. The impregnation rate of PTFE into the cloth-like base material in the second prepreg is also
Using the weight before and after impregnation with FE, the formula (I)
It can be calculated in the same way. This impregnation rate is usually about 55
~85%.
第1図は本発明に係る複層タイプのプリプレグの実例を
示し、第2プリプレグ2の両面に第1プリプレグ1が各
々重ね合わされ、これらが加熱加圧により一体化されて
いる。FIG. 1 shows an example of a multilayer type prepreg according to the present invention, in which first prepregs 1 are stacked on both sides of a second prepreg 2, and these are integrated by heating and pressing.
上記第1図に示した本発明に係るプリプレグには、第1
プリプレグとして第2図に示すように、布状基材3に先
ず第1 FEP層(またはPFA層)4を形成し、更に
該層4上にPTFE層5および第2FEP層6をこの順
で形成したものを用いた二また、第2プリプレグとして
は第3図に示すように布状基材3にPTFE層5を形成
したものを用いた。The prepreg according to the present invention shown in FIG.
As a prepreg, as shown in FIG. 2, first a first FEP layer (or PFA layer) 4 is formed on a cloth-like base material 3, and then a PTFE layer 5 and a second FEP layer 6 are formed on the layer 4 in this order. The second prepreg used was one in which a PTFE layer 5 was formed on a cloth-like base material 3 as shown in FIG.
この実例では第2プリプレグとして布状基材にPTFE
層を形成したものを1枚で用いたが、本発明においては
、これらの所定枚を重ね合わせて用いることもできる。In this example, PTFE is used as the second prepreg for the cloth-like base material.
Although a single layered layer is used, in the present invention, these predetermined layers can also be used in a stacked manner.
また、第2プリプレグの両面に各々第1プリプレグの複
数枚を重ね合わせることもできる。Moreover, a plurality of sheets of the first prepreg can be stacked on both sides of the second prepreg.
本発明は積層板も提供する。この積層板は、例えば、第
4図に示すように第2プリプレグ20両面に第1プリプ
レグ1を重ね合わせた複層タイププリプレグを用い、該
プリプレグの両面に銅箔等から成る金属層7を設けた構
造を有する。The invention also provides a laminate. This laminate uses, for example, a multilayer type prepreg in which the first prepreg 1 is superimposed on both sides of the second prepreg 20 as shown in FIG. 4, and a metal layer 7 made of copper foil or the like is provided on both sides of the prepreg. It has a unique structure.
更に、本発明は回路板も提供する。この回路板は、例え
ば、第5図に示すように第2プリプレグ2の両面に第1
プリプレグ1を重ね合わせた複層プリプレグの表面(図
では両面)に金属パターン8を設けた構造を有する。Additionally, the present invention also provides a circuit board. For example, as shown in FIG.
It has a structure in which a metal pattern 8 is provided on the surface (both sides in the figure) of a multilayer prepreg made by overlapping prepregs 1.
かような回路板は第4図に示すような積層板を用い、そ
の金属層をパターン加工することによって得ることがで
きる。Such a circuit board can be obtained by using a laminated board as shown in FIG. 4 and patterning the metal layer thereof.
そして、金属層のパターン化は従来からのプリント回路
板の製造と同様に剥離現像型フォトレジスト、溶剤現像
型フォトレジストまたはアルカリ現像型フォトレジスト
を用いる方法で行うことができる。例えば、積層板の金
属層表面にアルカリ現像型フォトレジスト層を形成し、
その上からフォトマスクを介してパターン状に露光せし
め、次いでフォトレジスト未露光部を溶解除去して金属
層を部分的に露出せしめ、その後金属層の露出部をエツ
チングにより除去し、更に、フォトレジストの露光部を
溶剤により゛除去すれば、フォトレジストの露光パター
ンに対応する金属パターンを有する回路板を得ることが
できる。Patterning of the metal layer can be carried out using a peel-off developing type photoresist, a solvent developing type photoresist, or an alkali developing type photoresist, as in the conventional manufacturing of printed circuit boards. For example, an alkali-developable photoresist layer is formed on the surface of the metal layer of a laminate,
The photoresist is then exposed to light in a pattern through a photomask, the unexposed portions of the photoresist are then dissolved and removed to partially expose the metal layer, the exposed portions of the metal layer are removed by etching, and the photoresist is further removed by etching. By removing the exposed portions with a solvent, a circuit board having a metal pattern corresponding to the exposed pattern of the photoresist can be obtained.
また、本発明は第5図に示すような回路板を内層用とし
て用いた多層回路板も擢供する。この多層回路板は、例
えば、第6図に示すように第2プリプレグ2の両面に第
1プリプレグを介して金属パターン8を有する回路板を
内層用として用い、この表面に更に第1プリプレグ1を
介して金属パターン8を設けた構造とすることができる
。The present invention also provides a multilayer circuit board using a circuit board as shown in FIG. 5 as an inner layer. For example, as shown in FIG. 6, this multilayer circuit board uses a circuit board having metal patterns 8 on both sides of the second prepreg 2 via the first prepreg as an inner layer, and further coats the first prepreg 1 on the surface of the circuit board. A structure may be provided in which the metal pattern 8 is provided therebetween.
本発明はこのように布状基材にPTFE層を形成した第
2プリプレグの両面に、布状基材にFEP層またはPF
A層、PTFE層およびFEP層を順に設けた第1プリ
プレグを重ね合わせた構成としてあり、最外層がFEP
であるので、その接着に際し低温低圧で作業できるばか
りでなく、作業時間も短縮できる。In the present invention, a PTFE layer is formed on the cloth-like base material on both sides of the second prepreg in which a PTFE layer is formed on the cloth-like base material.
It has a structure in which first prepregs are layered with A layer, PTFE layer, and FEP layer in this order, and the outermost layer is FEP.
Therefore, not only can the bonding be performed at low temperature and pressure, but also the working time can be shortened.
以下、実施例により本発明を更に詳細に説明する。 Hereinafter, the present invention will be explained in more detail with reference to Examples.
実施例
(第1プリプレグの製造)
厚さ約50μmのガラスクロスをFEP粉末濃度40重
量%の水性ディスバージョン中に浸漬して引上げ、温度
320°Cで2分間加熱することにより、第1 FEP
層を形成する。Example (Manufacture of the first prepreg) A glass cloth with a thickness of about 50 μm is immersed in an aqueous dispersion having a FEP powder concentration of 40% by weight, pulled up, and heated at a temperature of 320°C for 2 minutes to produce the first FEP.
form a layer.
次に、これをPTFE粉末濃度60重量%の水性ディス
バージョン中に浸漬して引上げ、温度380℃で2分間
加熱する。そして、この浸漬および加熱を更に3回繰り
返し行うことによりPTFE層を形成する。Next, this is immersed in an aqueous dispersion having a PTFE powder concentration of 60% by weight, pulled up, and heated at a temperature of 380° C. for 2 minutes. Then, this dipping and heating are repeated three more times to form a PTFE layer.
次いで、これを上記と同じFEPディスバージョン中に
浸漬して引上げ、温度320°Cで2分間加熱すること
により第2FEP層を形成することにより、厚さ72μ
mの第1プリプレグを得る。This was then immersed in the same FEP dispersion as above, pulled up, and heated at a temperature of 320°C for 2 minutes to form a second FEP layer to a thickness of 72 μm.
m first prepregs are obtained.
第1プリプレグにおけるフッ素樹脂の含浸率は70%で
あり、ガラスクロスに含浸されたフッ素樹脂の総重量中
に占める第1 FEP層形成用FEP、PTFE層形成
用PTFEおよび第2FEP層形成用FEPの割合は、
14.5重量%、78.5重量%および7重量%であっ
た。The impregnation rate of fluororesin in the first prepreg is 70%, and the percentage of FEP for forming the first FEP layer, PTFE for forming the PTFE layer, and FEP for forming the second FEP layer is 70% in the total weight of the fluororesin impregnated into the glass cloth. The percentage is
They were 14.5% by weight, 78.5% by weight, and 7% by weight.
(第2プリプレグの製造)
上記と同じガラスクロスおよびPTFEディスバージョ
ンを用い、ガラスクロスをディスバージョン中に浸漬し
て引上げ、温度380°Cで2分間加熱する。(Manufacture of second prepreg) Using the same glass cloth and PTFE dispersion as above, the glass cloth is immersed in the dispersion, pulled up, and heated at a temperature of 380° C. for 2 minutes.
そして、この浸漬および加熱を更に4回繰り返し行うこ
とによりガラスクロスにPTFE層を形成した第2プリ
プレグを得る。この第2プリプレグは厚さが約70μm
、PTFE含浸率が68%であった。Then, by repeating this dipping and heating four more times, a second prepreg in which a PTFE layer is formed on the glass cloth is obtained. This second prepreg has a thickness of approximately 70 μm.
, the PTFE impregnation rate was 68%.
(積層板の製造)
第2プリプレグ9枚を重ね合わせ、この重ね合わせ体の
両面に第1プリプレグおよび厚さ18μmの&PI箔を
各々配置する。(Manufacture of laminate) Nine second prepregs are stacked, and the first prepreg and 18 μm thick &PI foil are placed on both sides of the stack.
そして、温度385°C1圧力50kg/ cdの条件
で30分間加熱加圧することにより積層板を得る。Then, a laminate is obtained by heating and pressing for 30 minutes at a temperature of 385° C. and a pressure of 50 kg/cd.
(回路板の製造)゛
積層板における両銅箔をアルカリ現像型フォトレジスト
を用いてパターン加工することにより、回路板を得る。(Manufacture of circuit board) ``A circuit board is obtained by patterning both copper foils in the laminate using an alkali-developable photoresist.
(多層回路板の製造)
上記回路板の両面に第1プリプレグおよび厚さ18μm
の銅箔を各々配置し、温度300°C1圧力15kg/
C11の低温低圧条件で15分間加熱加圧して、これら
を一体化する。(Manufacture of multilayer circuit board) A first prepreg with a thickness of 18 μm is coated on both sides of the above circuit board.
Copper foils were placed on each side at a temperature of 300°C and a pressure of 15kg/
These are integrated by heating and pressurizing them for 15 minutes under C11 low temperature and low pressure conditions.
次に、両外面の銅箔をアルカリ現像型フォトレジストを
用いてパターン加工することにより、多層回路板を得た
。Next, a multilayer circuit board was obtained by patterning the copper foils on both outer surfaces using an alkali-developable photoresist.
比較例
(積層板の製造)
第1プリプレグを用いないこと以外は実施例と同様に作
業して積層板を得た。Comparative Example (Manufacture of Laminate) A laminate was obtained in the same manner as in the Example except that the first prepreg was not used.
なお、この際の温度は385 ’C1圧力は50kg/
cd、加熱加圧時間は30分間であった。In addition, the temperature at this time is 385'C1 pressure is 50kg/
cd, heating and pressurizing time was 30 minutes.
(回路板の製造)
この積層板を用いること以外は実施例と同様に作業して
、回路板を得た。(Manufacture of circuit board) A circuit board was obtained in the same manner as in the example except for using this laminate.
(多層回路板の製造)
この回路板の両面に第2プリプレグおよび厚さ18μm
の銅箔を各々配置し、温度390°C1圧力50kg/
cdの高温高圧条件で、45分間加熱加圧することに
より、多層回路板を得た。(Manufacture of multilayer circuit board) A second prepreg with a thickness of 18 μm is coated on both sides of this circuit board.
Copper foils were placed respectively at a temperature of 390°C and a pressure of 50kg/
A multilayer circuit board was obtained by heating and pressurizing for 45 minutes under CD high temperature and high pressure conditions.
第1図は本発明に係るプリプレグの実例を示す断面図、
第2図および第3図は第1図に示すプリプレグの製造に
用いた第1プリプレグおよび第2プリプレグの構造を模
式的に示す断面図、第4図、第5図および第6図は本発
明に係る積層板、回路板および多層回路板の実例を示す
断面図である。FIG. 1 is a sectional view showing an example of prepreg according to the present invention,
2 and 3 are cross-sectional views schematically showing the structures of the first and second prepregs used to manufacture the prepreg shown in FIG. 1, and FIGS. FIG. 2 is a cross-sectional view showing an example of a laminate, a circuit board, and a multilayer circuit board according to the invention.
Claims (4)
オロプロピレン共重合体またはテトラフルオロエチレン
−パーフルオロアルキルビニルエーテル共重合体による
層が形成されており、更に該層上にポリテトラフルオロ
エチレン層およびテトラフルオロエチレン−ヘキサフル
オロプロピレン共重合体層が設けられて成る第1プリプ
レグが、布状基材にポリテトラフルオロエチレンを含浸
させた第2プリプレグの両面に重ね合わされて成るプリ
プレグ。(1) A layer made of a tetrafluoroethylene-hexafluoropropylene copolymer or a tetrafluoroethylene-perfluoroalkyl vinyl ether copolymer is formed on a cloth-like base material, and a polytetrafluoroethylene layer and a tetrafluoroethylene layer are further formed on the layer. A prepreg in which a first prepreg provided with a fluoroethylene-hexafluoropropylene copolymer layer is laminated on both sides of a second prepreg in which a cloth-like base material is impregnated with polytetrafluoroethylene.
られて成る積層板。(2) A laminate comprising the prepreg according to claim 1 with a metal layer provided on the surface thereof.
設けられて成る回路板。(3) A circuit board comprising a metal pattern provided on the surface of the prepreg according to claim 1.
リプレグを介して金属パターンが設けられて成る多層回
路板。(4) A multilayer circuit board comprising a metal pattern provided on the surface of the circuit board according to claim 3 via the prepreg according to claim 1.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP29673190A JPH04168128A (en) | 1990-10-31 | 1990-10-31 | Prepreg and its use |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP29673190A JPH04168128A (en) | 1990-10-31 | 1990-10-31 | Prepreg and its use |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04168128A true JPH04168128A (en) | 1992-06-16 |
Family
ID=17837366
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP29673190A Pending JPH04168128A (en) | 1990-10-31 | 1990-10-31 | Prepreg and its use |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04168128A (en) |
-
1990
- 1990-10-31 JP JP29673190A patent/JPH04168128A/en active Pending
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