JPH04165097A - アルマイト製造工程中の化学研磨処理の際の過剰研磨防止方法 - Google Patents
アルマイト製造工程中の化学研磨処理の際の過剰研磨防止方法Info
- Publication number
- JPH04165097A JPH04165097A JP28589690A JP28589690A JPH04165097A JP H04165097 A JPH04165097 A JP H04165097A JP 28589690 A JP28589690 A JP 28589690A JP 28589690 A JP28589690 A JP 28589690A JP H04165097 A JPH04165097 A JP H04165097A
- Authority
- JP
- Japan
- Prior art keywords
- chemical polishing
- tank
- fine
- water droplets
- treated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005498 polishing Methods 0.000 title claims abstract description 41
- 239000000126 substance Substances 0.000 title claims abstract description 30
- 238000000034 method Methods 0.000 title claims abstract description 15
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 title abstract 2
- 229910052782 aluminium Inorganic materials 0.000 title abstract 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 37
- 238000005507 spraying Methods 0.000 claims abstract description 12
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 239000000463 material Substances 0.000 claims description 5
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 4
- 229920002554 vinyl polymer Polymers 0.000 claims description 4
- 238000012546 transfer Methods 0.000 claims description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 abstract description 10
- 229910000147 aluminium phosphate Inorganic materials 0.000 abstract description 5
- 238000007747 plating Methods 0.000 abstract 3
- 238000000889 atomisation Methods 0.000 abstract 2
- 239000007921 spray Substances 0.000 description 6
- 238000002474 experimental method Methods 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 2
- 238000007517 polishing process Methods 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 238000007743 anodising Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
Landscapes
- ing And Chemical Polishing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28589690A JPH04165097A (ja) | 1990-10-25 | 1990-10-25 | アルマイト製造工程中の化学研磨処理の際の過剰研磨防止方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28589690A JPH04165097A (ja) | 1990-10-25 | 1990-10-25 | アルマイト製造工程中の化学研磨処理の際の過剰研磨防止方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH04165097A true JPH04165097A (ja) | 1992-06-10 |
| JPH0518914B2 JPH0518914B2 (OSRAM) | 1993-03-15 |
Family
ID=17697425
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP28589690A Granted JPH04165097A (ja) | 1990-10-25 | 1990-10-25 | アルマイト製造工程中の化学研磨処理の際の過剰研磨防止方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04165097A (OSRAM) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2313605A (en) * | 1996-06-01 | 1997-12-03 | Cope Chapman B | Application of ultrasonic wave energy to electrolytic cell to reduce fume emission |
| KR100951313B1 (ko) * | 2007-09-18 | 2010-04-05 | 삼성전기주식회사 | 도금용 바렐의 수막제거장치 |
-
1990
- 1990-10-25 JP JP28589690A patent/JPH04165097A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2313605A (en) * | 1996-06-01 | 1997-12-03 | Cope Chapman B | Application of ultrasonic wave energy to electrolytic cell to reduce fume emission |
| KR100951313B1 (ko) * | 2007-09-18 | 2010-04-05 | 삼성전기주식회사 | 도금용 바렐의 수막제거장치 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0518914B2 (OSRAM) | 1993-03-15 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |