JPH04165097A - Method for preventing overpolishing in chemical polishing in process for producing anodized aluminum - Google Patents
Method for preventing overpolishing in chemical polishing in process for producing anodized aluminumInfo
- Publication number
- JPH04165097A JPH04165097A JP28589690A JP28589690A JPH04165097A JP H04165097 A JPH04165097 A JP H04165097A JP 28589690 A JP28589690 A JP 28589690A JP 28589690 A JP28589690 A JP 28589690A JP H04165097 A JPH04165097 A JP H04165097A
- Authority
- JP
- Japan
- Prior art keywords
- chemical polishing
- tank
- fine
- water droplets
- treated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005498 polishing Methods 0.000 title claims abstract description 41
- 239000000126 substance Substances 0.000 title claims abstract description 30
- 238000000034 method Methods 0.000 title claims abstract description 15
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 title abstract 2
- 229910052782 aluminium Inorganic materials 0.000 title abstract 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 37
- 238000005507 spraying Methods 0.000 claims abstract description 12
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 239000000463 material Substances 0.000 claims description 5
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 4
- 229920002554 vinyl polymer Polymers 0.000 claims description 4
- 238000012546 transfer Methods 0.000 claims description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 abstract description 10
- 229910000147 aluminium phosphate Inorganic materials 0.000 abstract description 5
- 238000007747 plating Methods 0.000 abstract 3
- 238000000889 atomisation Methods 0.000 abstract 2
- 239000007921 spray Substances 0.000 description 6
- 238000002474 experimental method Methods 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 2
- 238000007517 polishing process Methods 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 238000007743 anodising Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
Landscapes
- ing And Chemical Polishing (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、アルマイト製造工程中の化学研磨処理の際の
過剰研磨防止方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a method for preventing excessive polishing during chemical polishing during an alumite manufacturing process.
従来の技術
通常アルマイト製品の光沢性を必要とする場合、陽極酸
化前の工程において被処理体を１００℃程度の高温のり
ん酸に短時間浸漬する処理を行う。BACKGROUND OF THE INVENTION Usually, when the glossiness of an alumite product is required, the object to be treated is immersed in phosphoric acid at a high temperature of about 100° C. for a short time in a step before anodizing.
これを化学研磨処理と称する。This is called chemical polishing treatment.
しかし前記の処理を従来の技術に従って行った場合には
次の問題が起こる。すなわち、化学研磨浴から被処理体
を取出し、次の水洗工程に行くまでの短時間に、しばし
ば被処理体に付着したりん酸により過剰研磨されたり、
またはまだらに研磨されたりして製品の不良化の一因と
なっていた。However, when the above-mentioned processing is performed according to the conventional technique, the following problem occurs. In other words, in the short time between removing the object from the chemical polishing bath and going to the next washing process, the object is often overpolished due to phosphoric acid adhering to the object.
Otherwise, the surface was polished in spots, which contributed to the quality of the product.
アルマイト自動化工装置で前記工程を行う場合に前記問
題がよく発注するので、化学研磨槽より被処理体が次の
水洗工程に行く途中で、たとえば水洗シャワーを行う等
の工夫がなされているが、従来は、確実に効果的な過剰
研磨防止法はなかった。Since the above-mentioned problem often occurs when the above-mentioned process is carried out using automated alumite processing equipment, measures have been taken to perform a washing shower while the object to be processed is leaving the chemical polishing tank for the next washing process. Until now, there has been no reliable and effective method for preventing excessive polishing.
前記の欠点の解消のために本発明者は種々研究を行い、
その結果、今までの欠点を一挙に解消した全く新しい画
期的な過剰研磨防止方法の開発に成功した。In order to eliminate the above-mentioned drawbacks, the present inventor conducted various studies,
As a result, we succeeded in developing a completely new, revolutionary method for preventing excessive polishing that eliminates all of the drawbacks of the past.
発明の構成
本発明は、アル上イト製造工程において、化学研磨槽よ
り被処理体を次の工程に移行のために化学研磨槽から引
き上げる際に、化学研磨槽上またはその近傍の適当な場
所に設置された超音波発信器を備えた水槽からなる微細
水滴噴霧装置から微過剰研磨防止方法に関するものであ
る。Components of the Invention The present invention provides a process for producing alkali metal, when a workpiece to be treated is pulled up from the chemical polishing tank for transfer to the next step, at an appropriate place on or near the chemical polishing tank. The present invention relates to a method for preventing excessive polishing from a fine water droplet spraying device consisting of a water tank equipped with an ultrasonic transmitter.
前記の噴霧操作によって、微細な蒸気状の水滴が多量に
被処理体のあらゆる個所にまんべんなく接触付着し、高
温で処理された被処理体を冷却すると同時に、被処理体
に付着したりん酸を希釈し、過剰の研磨や研磨液のダレ
によるまだらな研磨を防ぐことができる。Through the above-mentioned spraying operation, a large amount of fine vapor-like water droplets evenly contact and adhere to all parts of the object to be processed, cooling the object that has been processed at high temperatures, and at the same time diluting the phosphoric acid adhering to the object. This can prevent uneven polishing due to excessive polishing or dripping of the polishing liquid.
本発明方法を実施した場合には、今まで発生していたま
だらな研磨状態や過剰研磨による製品不良は全くない。When the method of the present invention is carried out, there are no product defects due to uneven polishing or excessive polishing that have occurred up to now.
化学研磨工程を入れた処理装置の自動化は今まで困難と
いわれていたが、本発明により、連続自動化によっても
均質なアルマイト製品の製造が可能になった。Until now, it was said to be difficult to automate processing equipment that includes a chemical polishing process, but the present invention has made it possible to manufacture homogeneous alumite products through continuous automation.
なお、微細水滴発生器置は、好ましくは化学研磨槽の両
サイドに設置するのであるが、その効率を一層よくする
ためには、化学研磨槽をたとえば軟質ビニルシートで上
部より四面を囲うのが一般に好ましいであろう。Note that the fine water droplet generator is preferably installed on both sides of the chemical polishing tank, but in order to further improve its efficiency, it is recommended to surround the chemical polishing tank on all four sides from the top with, for example, a soft vinyl sheet. would generally be preferred.
好ましい実施態様の記述
本発明の一実施例について添付図面参照下に詳細に説明
する。第１図は、本発明に使用される装置の一例の略式
斜視図であり、第２図はその断面図である。DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the present invention will now be described in detail with reference to the accompanying drawings. FIG. 1 is a schematic perspective view of an example of a device used in the present invention, and FIG. 2 is a sectional view thereof.
が、本発明によれば、酸槽（１）の上部の両サイドに水
槽（２）、 （３）を取り付ける。水槽（２）。However, according to the present invention, water tanks (2) and (3) are attached to both sides of the upper part of the acid tank (1). Water tank (2).
（３）にそれぞれ超音波発信器（４）、（ＹＳを設置す
る。さらに、圧縮空気取入口（６）、（７）を設ける。(3) are respectively provided with ultrasonic transmitters (4) and (YS).Furthermore, compressed air intake ports (6) and (7) are provided.
水槽（２）、 （３）の各々の内側の側部に、横向き
噴霧口（８）、 （９）および斜上向き噴霧口（１０
） 、 （１））を設け、微細水滴が、ｌ化学研磨槽
（１）から引上げ中の被処理体（１４）のあらゆる個所
に士んべんなくかかるようにする。On the inner side of each of the water tanks (2), (3) are horizontal spray ports (8), (9) and obliquely upward spray ports (10).
), (1)) are provided so that fine water droplets are evenly applied to all parts of the object to be processed (14) being pulled up from the chemical polishing tank (1).
超音波発信器（４）、 （５）を備えた水槽（２）。A water tank (2) equipped with ultrasonic transmitters (4) and (5).
（３）は微細水滴噴霧装置として使用されるものであっ
て、その基本的構造はいわゆる加湿器のごとき周知の微
細水滴発生器の構造と実質的に同じであるから、その詳
細な説明は省略する。しかしながら、本発明では噴霧方
向を前記のごとく調節することが重要である。(3) is used as a fine water droplet spraying device, and its basic structure is substantially the same as that of a well-known fine water droplet generator such as a so-called humidifier, so a detailed explanation thereof will be omitted. do. However, in the present invention, it is important to adjust the spray direction as described above.
さらに、水槽（２）、 （３）には常法に従って水取
入口（１６） 、 （１７）およびドレン抜き口（１
８）を設ける。なお、化学研磨槽（１）から引上げ中の
被処理体（１４）に微細水滴（１３）を噴霧する際には
、噴霧区域を、覆い材たとえば軟質ビニルシートで覆い
、これによって、被処理体が充分な量の微細水滴で確実
に包囲されるようにするのが有利である。Furthermore, the water tanks (2), (3) are equipped with water intake ports (16), (17) and drain ports (1) according to the usual method.
8). In addition, when spraying fine water droplets (13) onto the object to be processed (14) being pulled up from the chemical polishing tank (1), the spray area is covered with a covering material such as a soft vinyl sheet, and thereby the object to be processed is It is advantageous to ensure that the water is surrounded by a sufficient amount of fine water droplets.
微細水滴の噴霧量、噴霧時間等の諸条件は個々の場合に
よって種々異なるであろうが、これらの条件は簡単な予
備実験によって容易に決定できる。Conditions such as the amount of fine water droplets sprayed and the spraying time will vary depending on the individual case, but these conditions can be easily determined by simple preliminary experiments.
実施例
１、化学研磨処理路の液組成
りん酸 ９８％
硝酸 ２％
２、温度 ９８−１００℃
３、処理時間 ４５秒４、処理
対象の材質 （ｉ）１）００（ｉｉ）２０２４
実験１ （比較実験）
化学研磨処理後、従来の技術に従って空気中に６０秒さ
らして放置し、次いで通常のアルマイト処理（１０μｍ
）を行った。しかしいずれの材質も、材質表面に光沢の
バラツキが多く、また表面の平滑性も悪く、不所望の空
気中研磨が進行したことが明白であった。Example 1, Liquid composition of chemical polishing treatment path Phosphoric acid 98% Nitric acid 2% 2. Temperature 98-100°C 3. Processing time 45 seconds 4. Material to be treated (i) 1) 00 (ii) 2024 Experiment 1 ( Comparative experiment) After chemical polishing, it was exposed to air for 60 seconds according to the conventional technique, and then normal alumite treatment (10 μm
) was carried out. However, in all the materials, there were many variations in gloss on the surface of the material, and the surface smoothness was also poor, and it was clear that undesired in-air polishing had progressed.
実験２（本発明）
化学研磨処理後、該研磨浴から被処理体を出すと同時に
、超音波発信器を備えた水槽からなる微細水滴噴霧装置
から噴霧された微細水滴を充満した空中に６０秒または
１００秒間さらして放置し、次いで通常のアルマイト処
理（１０μｍ）を行った。結果はいずれも良好であって
、均一な光沢であり、表面もきれいな滑らかさであった
。このように、超微細水滴が充満した中では、被処理体
があたかも水中にあるがごとく過剰化学研磨の進行を確
実に抑制することができた。Experiment 2 (present invention) After the chemical polishing process, the object to be processed was taken out of the polishing bath, and at the same time, it was placed in the air filled with fine water droplets sprayed from a fine water droplet spraying device consisting of a water tank equipped with an ultrasonic transmitter for 60 seconds. Alternatively, it was exposed for 100 seconds and left to stand, and then normal alumite treatment (10 μm) was performed. The results were all good, with uniform gloss and a clean, smooth surface. In this manner, in the environment filled with ultrafine water droplets, the progress of excessive chemical polishing could be reliably suppressed as if the object to be processed were in water.
第１図は、本発明に従って使用される微細水滴噴霧装置
を備えた化学研磨槽の一例の略式斜視図である。
第２図は、第１図記載の化学研磨槽の略式断面図である
。
ｌ・・・化学研磨槽；２，３・・・水槽；４，５・・・
超音波発信器；６，７・・・圧縮空気取入口；８，９・
・・横向き噴霧０．１０．１）・・・噴霧口；１２・・
・水；１３・・・水滴；１４・・・被処理体；１５・・
・化学研磨液；１６，１７・・・水取入口；１８・・・
ドレン抜き口；１９・・・軟質ビニルシート。FIG. 1 is a schematic perspective view of an example of a chemical polishing tank equipped with a fine water droplet spraying device used in accordance with the present invention. FIG. 2 is a schematic cross-sectional view of the chemical polishing bath shown in FIG. 1. l...Chemical polishing tank; 2, 3...Water tank; 4, 5...
Ultrasonic transmitter; 6, 7... Compressed air intake; 8, 9.
・・Horizontal spray 0.10.1)・・Spray port; 12・・
・Water; 13...Water droplet; 14...Object to be treated; 15...
・Chemical polishing liquid; 16, 17... Water intake; 18...
Drain outlet; 19... Soft vinyl sheet.
Claims (3)
処理体を次の工程に移行のために化学研磨槽から引き上
げる際に、化学研磨槽上またはその近傍の適当な場所に
設置された超音波発信器を備えた水槽からなる微細水滴
噴霧装置から微細な蒸気状水滴を被処理体に噴霧するこ
とを特徴とする、アルマイト製造工程中の化学研磨処理
の際の過剰研磨防止方法。(1) In the alumite manufacturing process, an ultrasonic transmitter installed at an appropriate location on or near the chemical polishing tank is used when the object to be treated is pulled up from the chemical polishing tank for transfer to the next process. A method for preventing excessive polishing during chemical polishing during an alumite manufacturing process, which comprises spraying fine vaporized water droplets onto an object to be treated from a fine water droplet spraying device consisting of a water tank equipped with a water tank.
イドである請求項１に記載のアルマイト製造工程中の化
学研磨処理の際の過剰研磨防止方法。(2) The method for preventing excessive polishing during chemical polishing during the alumite production process according to claim 1, wherein the fine water droplet spraying device is installed on both sides of the chemical polishing tank.
上部より四面を囲って微細水滴噴霧操作を行う請求項１
に記載のアルマイト製造工程中の化学研磨処理の際の過
剰研磨防止方法。(3) Claim 1 in which the chemical polishing tank is surrounded on all four sides from the top with a covering material such as a soft vinyl sheet, and the fine water droplet spraying operation is carried out.
A method for preventing excessive polishing during chemical polishing during the alumite manufacturing process described in .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28589690A JPH04165097A (en) | 1990-10-25 | 1990-10-25 | Method for preventing overpolishing in chemical polishing in process for producing anodized aluminum |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28589690A JPH04165097A (en) | 1990-10-25 | 1990-10-25 | Method for preventing overpolishing in chemical polishing in process for producing anodized aluminum |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH04165097A true JPH04165097A (en) | 1992-06-10 |
| JPH0518914B2 JPH0518914B2 (en) | 1993-03-15 |
Family
ID=17697425
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP28589690A Granted JPH04165097A (en) | 1990-10-25 | 1990-10-25 | Method for preventing overpolishing in chemical polishing in process for producing anodized aluminum |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04165097A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2313605A (en) * | 1996-06-01 | 1997-12-03 | Cope Chapman B | Application of ultrasonic wave energy to electrolytic cell to reduce fume emission |
| KR100951313B1 (en) * | 2007-09-18 | 2010-04-05 | 삼성전기주식회사 | Water film removal apparatus of barrel for plating |
-
1990
- 1990-10-25 JP JP28589690A patent/JPH04165097A/en active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2313605A (en) * | 1996-06-01 | 1997-12-03 | Cope Chapman B | Application of ultrasonic wave energy to electrolytic cell to reduce fume emission |
| KR100951313B1 (en) * | 2007-09-18 | 2010-04-05 | 삼성전기주식회사 | Water film removal apparatus of barrel for plating |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0518914B2 (en) | 1993-03-15 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |