JPH04162037A - Sensitive material processing device - Google Patents

Abstract

PURPOSE:To accomplish a sensitive material processing device which is maintenance- free and facilitate management of the temp. of processing liquid by forming a processing trough for storing the processing liquid with such a length as admitting immersion of sensitive material only partially, and thereby lessening the stored quantity of processing liquid. CONSTITUTION:A sensitive material PM after exposure is fed from a roller couple 92 to intrude into a storage part 95, and during passage through it, the material reacts with the stored developing solution to commence the developing process. After passage of the storage part 95, the material moves on the oversurface of an inclined guide plate 110 and is sent to a throttle roller couple 109 installed at the inlet to a stabilizer part 72. Because a specified temp. is prepared on the guide plate 110, development of the sensitive material PM is continued by the attached developing solution even during transportation. The sensitive material PM sent from the development part 70 gets rid of attached solution by the roller couple 109 and is transported to storage part 95A, and in a stabilizing agent, the stabilization process is started. After passage of this part, stabilization process will proceeds even during the period of being transported on the oversurface of a guide plate 110A. Surplus stabilizing agent is squeezed off during passage of a throttle roller couple 109A, and thereafter the material is sent to a drying unit 50 by a roller couple 51.

Description

[Detailed description of the invention] [Industrial application field] The present invention relates to a photosensitive material processing apparatus for processing silver salt type photosensitive materials such as photographic paper, photosensitive paper for direct plate making, or film. [Conventional technology]

Conventionally, copy cameras that directly make printing plates for light printing use
The exposed photosensitive material was processed using a static developer. The sensitive materials used for these purposes include, for example, a layer to prevent halesilon on the surface of a base (paper) that has been treated to be water-resistant, a silver salt emulsion layer that is sensitive to light, and gelatin in which physical development nuclei such as silver are dispersed. A hydrophilic layer is formed. The emulsion layer changes its properties when exposed to light, and in the emulsion layer exposed to light, diffusion of reduced silver to the surface layer is inhibited even when a developer is applied. On the other hand, in the emulsion layer that has not been irradiated with light, silver halide is complexed and diffused into the surface layer, where it is physically developed to precipitate metallic silver and is sensitized. After that, if a stabilization treatment and a desensitization treatment are performed, only the areas where the metallic silver is deposited will show lipophilicity and the printing ink will be applied, so that a printing plate will be obtained. The reaction of these sensitive materials with processing solutions such as developing solutions proceeds in an extremely short period of time, so even if they are stopped in the developing solution for a short period of time, or even if the developing solution is rippled, unevenness may occur in processing such as development. Are known. Therefore, conventionally, a large tank is filled with a large amount of developer, and an immersion type developing apparatus has been used in which the photosensitive material is slowly conveyed through the developer without causing any ripples.

[Problem to be solved by the invention]

However, in devices using immersion development, it is necessary to store a large amount of developing solution for use in a developing processing tank. Sludge accumulates on the bottom of the photosensitive material and turns into sludge.Sludge is caused by the generation of chips from the photosensitive material during the cutting process in which a roll of photosensitive material is cut into predetermined dimensions, and by the formation of sludge from the gelatin that forms the surface layer of the photosensitive material. This is caused by the elution of sludge.If left for a long time, sludge accumulates and turns into sludge, so simply draining the treatment liquid will not allow it to flow out from inside the tank, and there is a problem that the treatment tank needs to be washed with water.Negating water washing When the tip of the photosensitive material being carried into the processing tank hits the sludge that has accumulated on the bottom of the processing tank, its transport is obstructed, causing the photosensitive material to stop in the processing solution or the processing solution to ripple, resulting in uneven development. In addition, in immersion development, in which a large amount of developer is stored, it is difficult to maintain a constant developer temperature.Furthermore, when the device is first used, There was a problem in that it took a considerable amount of time to warm up the liquid to a temperature suitable for processing.In order to shorten the warm-up time, it was necessary to use a high-power heater to adjust the temperature. The purpose of the photosensitive material processing apparatus of the present invention is to make the apparatus maintenance-free and to facilitate the management of the temperature of the processing liquid. explain.

[Means for Solving the Problems J] The photosensitive material processing apparatus of the present invention is a processing apparatus for processing a silver salt type photosensitive material such as photographic paper, photosensitive paper for direct plate making, or film, wherein a processing tank that stores a processing solution and has a length such that the sensitive material carried into the processing solution is only partially immersed along the transport direction; , a processing liquid supply means for supplying new processing liquid; a groove provided at the bottom of the processing tank across the width direction of the processing tank; and a processing liquid supply means disposed inside the groove for controlling the temperature of the processing liquid. The gist of the invention is to include a temperature control means for controlling the temperature. Furthermore, in this sensitive material processing apparatus, it is also possible to provide a valve in the groove provided at the bottom of the processing tank to discharge the processing liquid in the processing tank when the valve is opened, in order to make the processing of the processing liquid easier. suitable. [Function] In the sensitive material processing apparatus of the present invention having the above-mentioned configuration, the processing tank that stores the processing solution has a length such that the sensitive material is only partially immersed along the transport direction, and the processing solution is stored in the processing tank. The amount of processing liquid is kept small. Further, the processing liquid in the groove is warmed by the temperature control means provided in the groove at the bottom of the processing tank, and the warmed processing liquid convects inside the processing tank. In this way, the processing solution in the processing tank is controlled uniformly and at a predetermined temperature within a short period of time, and when the sensitive material passes through this processing tank,
New processing liquid is supplied by the processing liquid supply means. Therefore, the sensitive material can be sufficiently processed with a small amount of processing liquid. In addition, since the photosensitive material processing apparatus of the present invention collects sludge in the processing liquid into this groove, there is no problem of sludge interfering with the transportation of the photosensitive material. Note that if a valve is provided at the bottom of this groove, the sludge that has settled in the groove can be easily discharged from this valve along with the processing liquid. [Embodiments] In order to further clarify the structure and operation of the present invention described above, preferred embodiments of the photosensitive material processing apparatus of the present invention will be described below. FIG. 1 is a block diagram of a developing processing apparatus which is an embodiment of a photosensitive material processing apparatus, and FIG. 2 is a schematic block diagram showing a slit exposure type copying camera 1 incorporating this developing processing apparatus. The slit exposure type copying camera 1 is a device that copies an original to produce a printing plate for light printing. First, the overall structure of the slit exposure type copying camera 1 will be explained with reference to FIG. As shown in the figure, this slit exposure type copying camera 1 incorporates a projection optical system and a sensitive material processing device, which will be described later, in a housing 2, and a console panel 4 provided on the top surface of the housing 2; A document holder 10 configured to be able to reciprocate in the horizontal direction (horizontal direction in the figure) along the upper surface, a photosensitive material conveying device 20 that conveys a sheet-like photosensitive material PM to an exposure position, and a document holder 1
a projection optical system 30 that irradiates light onto a document held within zero and projects the light reflected by the document onto the upper surface of the photosensitive material PM to expose it; and a development and stabilization process for the exposed photosensitive material PM. A developing processing device 40 and a developing processing device 4o
A drying unit for drying the photosensitive material PM that has been carried out in bulk) 50
and an electronic control device 60 that controls the drive of various motors, electromagnetic valves, etc. to be described later. The console panel 4 is provided with various setting switches for setting exposure conditions, a power switch, a start switch, etc., and is operated by an operator. Each switch on the console panel 4 is connected to an electronic control device 60. The document holder 10 includes a document table 11 made of a transparent glass plate and a document cover 12 that can be opened and closed, and the document is held downward between the document table 11 and the document cover 12. This document holder 1° is reciprocated in the horizontal direction by a motor 13 provided in the housing 2 via a drive system (not shown) such as a sprocket, a chain, a belt, etc.
The original is conveyed to an irradiation light source for exposure. The photosensitive material conveying device 20 includes a first photosensitive material roll 21 , a second photosensitive material roll 22 , and a pair of rollers 23 . A pair of rollers 24 dedicated to feeding the photosensitive material from the second photosensitive material roll 22 and two pairs of rollers 25 commonly used for feeding the photosensitive material from each photosensitive material roll.
．． 26, and a sheet-like photosensitive material PM is sent out from either one of the photosensitive material rolls 21 and 22 as required. In this example, Silver Master (product name: Mitsubishi Paper Mills Co., Ltd., Model SLM-R, 2) was used as the photosensitive material PM. Name: manufactured by Agfagewald, model 5PP) etc. can also be used. FIG. 2 shows a state in which the photosensitive material PM is sequentially conveyed downstream from the first photosensitive material roll 21 by three pairs of rollers 23, 25, and 26. When using the photosensitive material PM of the second photosensitive material roll 22, the photosensitive material PM is transferred to the second photosensitive material roll 22 by a roller pair 24 replacing the roller pair 23 and two roller pairs 25 and 26.
Transported from. Note that the first photosensitive material roll 21 or the second photosensitive material roll 2
The feeding of the photosensitive material PM from 2 is performed in synchronization with the horizontal movement of the document holder 10. The photosensitive material PM conveyed in this manner is transported by two pairs of rollers 25.
The cutting device 2 is exposed at an exposure position set between 26 and 26, and is provided on the back side of the photosensitive material PM at this exposure position.
7, the console panel 4 is cut to the set dimensions. The projection optical system 3o that exposes the photosensitive material PM is connected to the original holder 10.
A light source 3I for irradiating light across the width of the document held in the interior, a mirror group 32 consisting of three mirrors 32a, 32b, and 32c for reflecting light LB from the document, and a mirror group 32 for sensing the exposure position. It includes a projection lens 33 that forms an image of the original on the upper surface of the photosensitive material PM, and a slit 34 that limits the width of the reflected light LB projected onto the upper surface of the photosensitive material PM. Projection lens 33
And the mirrors 32b and 32c that constitute the mirror group 32 are:
The projection optical system 3o is fixed to a mirror support plate 36 and a lens support 37 mounted on a tilting table 35, and the projection magnification in this projection optical system 3o is set to a value of 1. The positions of the mirror support plate 36 and the lens support stand 37 are adjusted on the tilt table 35 during projection magnification alignment, and are fixed to the tilt table 35 after the alignment is completed. The light irradiated from the light source 31 toward the original is reflected on the lower surface of the original, and this reflected light LB is sequentially reflected by each mirror of the mirror group 32, passes through the projection lens 33 and the slit 34, and then is reflected on the photosensitive material PM. The image is formed on the photosensitive surface. Therefore, a slit-shaped image extending across the width of the document is projected onto the photosensitive surface of the photosensitive material PM that is being transported. Since the conveyance of the photosensitive material PM is synchronized with the horizontal movement of the original holder 10, when the horizontal movement of the original holder 10 is completed, the exposure of the entire original is completed. Note that a plurality of LE038 are provided in a line below the roller pair 26 in order to uniformly expose the photosensitive material PM, and by driving this LED 38 and irradiating the photosensitive material PM, reduction Reflected light LB from the original when exposing
The peripheral portion of the photosensitive material PM that cannot be exposed to light is burned off as an unnecessary area for image formation. After that, the photosensitive material PM is cut into the cutting device 27.
disconnected by. The development processing device 40 is installed below the projection optical system 30 and performs development processing and stabilization processing on the photosensitive material PM introduced via the introduction roller 41. This development processing bag fff40 can be equipped with a developer main tank 42 for storing a developer and a stabilizer main tank 43 for storing a stabilizer, and a processing unit 44 in which rollers and the like are integrally driven by a motor (not shown). It is housed in a housing 2. The details of the configuration of the developing processing device 4o will be described later. A drying unit 50 is disposed downstream of the development processing device 40 along the conveyance path of the photosensitive material PM. The drying unit 50 includes two pairs of rollers 51 and 52 that convey the photosensitive material PM processed in the development processing device 4o while applying tension, and a conveyance tray 53 provided between the pair of rollers 51 and 52. , a heater 54 and a fan 55 for drying the photosensitive material, which are provided at positions facing the transfer tray 53 across the transfer path for the photosensitive material PM, and an external heater 54 and a fan 55, which are attached to the outside of the housing 2 and which store the dried photosensitive material PM. A tray 56 is provided. Therefore, the exposed photosensitive material PM undergoes development and stabilization processing in the development processing device 40, is dried by the photosensitive material drying heater 54, and is sent to an external tray 56 outside the housing 2. In this way, a printing plate for offset printing is produced from the original document. Next, a description will be given of the development processing device 40 that performs development and stabilization processing on the photosensitive material PM. In the description of the development processing apparatus 40, in addition to FIG. 1 showing its schematic configuration, perspective views (FIGS. 3 and 3)
4) and a cross-sectional view (FIG. 5) as appropriate. As shown in FIG. 1, this developing processing apparatus 40 includes a developing section 70 that develops exposed photosensitive material PM introduced from an introduction roller 41 using a developer in a developer main tank 42.
Then, a stabilization processing section (hereinafter referred to as
(referred to as a stable part) 72. The developing section 70 includes a developer main tank 42 as a developer supply system, as well as a liquid level management cylinder 74 to which the developer main tank 42 is attached and detached, receives the developer from the main tank 42, and manages the liquid level at a constant level. and a conduit pipe 76 from the liquid level management cylinder 74.
A developer distern tank 78 into which the developer flows through
, an inflow electromagnetic valve 80 that opens and closes a conduit 79 for outflowing the developer from the developer distern tank 78, and a developer nozzle 82 that discharges the developer. An orifice (see FIG. 5) is incorporated into the developer nozzle 82, and limits the amount of developer discharged from the tip of the developer nozzle 82 during the opening period of the inflow electromagnetic valve 80. The amount of developer discharged from the tip of the developer nozzle 82 is determined by the pressure applied to the orifice, that is, the height of the liquid level in the liquid level management tube 74 and the diameter of the orifice. In this embodiment, since the height of the liquid level is kept constant, the flow rate of the developer when the inflow solenoid valve 80 is opened is kept constant. A partition plate 84 is provided upright from the bottom of the developer solution distern tank 78 to divide the inside thereof into a liquid inflow chamber 78a and a liquid temperature retention chamber 78b, and a conductive pipe 76 is opened in the liquid inflow chamber 78a. has been done. On the other hand, the upper surface of the liquid temperature retention chamber 78b has a heater 86 inserted toward the bottom and a float 87 that moves up and down according to the amount of liquid in the tank, and controls the amount of liquid in the developer disturn tank 78. A float sensor 88 for detection is provided. Further, a mesh filter 90 is provided at the entrance of a conduit 79 communicating with the bottom of the developer distern tank 78 to remove dust and the like from the developer flowing out. Therefore, the cold developer flowing from the developer main tank 42 through the conduit pipe 76 first flows into the liquid inlet chamber 78a, passes over the upper end of the partition plate 84, and flows into the upper part of the liquid warming chamber 78b. The developer in the solution warming chamber 78b is warmed by the heater 86. The temperature of the developer by the heater 86 is controlled to a predetermined temperature by an electronic control device 60, which will be described later. The developing solution maintained at a predetermined temperature in this way flows through the inflow solenoid valve 80.
When the valve is opened, the developer flows out from the developer nozzle 82. Next, a developing tank 9 where the development of the photosensitive material PM is actually performed.
The general structure and function of the parts around 6 will be explained. Below the introducing roller 41 that introduces the photosensitive material PM into the developing section 70, there is provided an inlet roller pair 92 that rotates in the direction of the arrow X in FIG. A free roller 9 that guides the photosensitive material PM in contact with the photosensitive material PM and gives so-called stiffness to the photosensitive material PM during conveyance.
4 are arranged. The developing tank 96 has a substantially U-shaped cross section, has a width corresponding to the width of the photosensitive material PM, and forms a developer reservoir 95, as shown in FIG. A developer supply roller 98 is disposed within the developing tank 96 at a position that extends in the width direction of the developing tank 96 and leaves a slight distance from the bottom surface of the developing tank 96 . Therefore, when the developer is stored in the storage section 95 of the development processing tank 96, the lower part of the developer supply roller 98 is partially immersed in the developer. The surface of the developer supply roller 98 is made of a spongy material, and the bubbles constituting the spongy material are individually independent bubbles (single bubbles). As shown in FIG. 4, the developer supply roller 98 is assembled with a developer storage section 100 that temporarily stores the developer dripping from above between the developer supply roller 98 and the developer supply roller 98 . Furthermore, as shown in FIGS. 3 and 5, a bottom liquid reservoir chamber 101 is formed at the bottom of the developing tank 96, and a plurality of communication holes 102 opened at the bottom of the developing tank 96 form a bottom liquid storage chamber 101. , the developer can flow in. Bottom liquid storage chamber lO1
Two rod-shaped heaters 103 for heating the developer are disposed inside. At the center bottom of the bottom liquid reservoir chamber 101 is a developer discharge pipe that is connected to the bottom liquid reservoir chamber 101 via a discharge solenoid valve 104 that opens and closes the pipe line and discharges the used developer to a tray 106 as a waste liquid receiver. 108 are arranged in series. A guide plate 110 is disposed at a predetermined angle of elevation α toward the stable portion 72 on the side from which the photosensitive material PM is taken out of the developing tank 96 . The guide plate 110 is formed of a corrugated plate in order to reduce the contact area with the photosensitive material PM (see FIG. 3), and guides the developed photosensitive material PM toward the squeeze roller pair 109 of the stabilizing section 72. Form an approach route. A planar heater 112 having a self-temperature control function is attached to the lower surface of the guide plate 110. As shown in FIG. 3, the planar heater 112 is integrally fixed to the guide plate 110 by a mounting metal fitting 113 provided on the developing tank 96 side and other metal fittings (not shown). The detailed structure of the developing tank 96 will be explained. As shown in FIG. 3, the storage section 95 of the development processing tank 96 is
Approximately half-moon-shaped side plates 1 are provided on both sides of the curved peripheral plate 1.20.
22 (in the figure, the side plate on the left side is omitted) are respectively joined and fixed. A through hole 126 passing through the circumferential plate 1.20 is provided approximately at the center of the circumferential plate 120 on the guide plate 110 side. When the developer is supplied from the developer nozzle 82 and the amount of the developer in the reservoir 95 increases, the developer flows out from the through hole 126. Therefore, the liquid level of the developer in the storage section 95 is lower than that of the through hole 1.
It is held in a socket of 26. Note that the discharge solenoid valve 104 directly below the development processing tank 96 has the following:
As shown in FIG. 1, a drip-proof cover 114 is provided to prevent the developer from falling from the developing tank 96 and the guide plate 110 from adhering. As shown in detail in FIGS. 4 and 5, the developer storage unit 100 includes two end plates 134 that abut against both end surfaces of the developer supply roller 98 while allowing the roller to rotate.
and a support plate 136 having a V-shaped cross section and having the end plate 134 fixed to both ends thereof. Further, a liquid passage hole 138 is provided at the center of the upper plate 136a constituting the support plate 136 at a position corresponding to the tip of the developer nozzle 82.
A back plate 136b constituting the support plate 136 is provided with a plate spring 140 made of a thin stainless steel plate that is urged toward the developer supply roller 98 and comes into contact with the outer periphery of the roller 98. Directly below the liquid passage hole 138, a liquid receiving plate 142 is connected from the center of the front end of the soil plate 136a toward the leaf spring 140. A small gap is provided between the tip of the plate 142 and the plate spring 140 in the liquid receiver. The developer supply roller 98, the end plate 134 in contact with both end surfaces thereof, and the roller 9
The area surrounded by the plate spring 140 that is in contact with the outer circumferential surface of 8 is caused by the fact that the developer supply roller 98 rotates upward in this area, so that the developer is not dripped from the developer nozzle 82. The developing solution can be temporarily stored. This part is called a liquid pool part 143. Note that the liquid receiver plate 142 supplies the developer to the developer supply roller 9.
However, even if the plate 142 is not used for the liquid receiver, the developer is temporarily accumulated in the liquid reservoir 143, so it spreads in the axial direction of the developer supply roller 98. The developer dripping from the developer nozzle 82 passes through the liquid passage hole 138 and reaches the plate 142, as shown in FIGS. 4 and 5. spring 140
It flows down along the surface of the leaf spring 140 through a small gap formed between the two. In other words, the developer spreads along the axial direction of the developer supply roller 98 and reaches the reservoir 143, where it is temporarily stored. A part of the developer stored in the liquid reservoir 143 is
The arrow Y in FIG.
It is pumped out as it rotates in the direction. Since the lower part of the developer supply roller 98 is immersed in the developer stored in the development processing tank 96, the new developer pumped out as the roller 98 rotates is already drained. Supplied into the stored developer. The new developer will be diffused to the side of the development processing tank 96 into which the photosensitive material PM is introduced. When the developer is supplied and the developer in the reservoir 95 increases, an amount of the developer (the amount corresponding to the newly supplied developer minus the developer lost when the photosensitive material PM is carried out) is increased. The old developing solution) flows out from the through hole 126 of the peripheral plate 120, and the amount of the developing solution in the developing processing tank 96 is balanced. The developer also flows into the bottom liquid storage chamber 101, and is heated by two rod-shaped heaters 103 built therein. The heated developer fluid convects with the reservoir 95 through the communication hole 102 . Coupled with the fact that the energization of the rod-shaped heater 103 is feedback-controlled based on the temperature of the developer detected by a temperature sensor, the temperature of the developer in the development processing tank 96 is raised in an extremely short time and maintained at a predetermined temperature. be done. When the photosensitive material PM passes through the developer storage section 95 of the development processing tank 96, sludge is mixed into the developer as the photosensitive material PM is developed. Such sludge settles from the storage section 95 into the bottom liquid storage chamber 101 via the communication hole 102. When the discharge solenoid valve 104 is opened, the sludge accumulated in the bottom liquid storage chamber 101 is discharged together with the developer into the developer discharge pipe 1.
The waste liquid receiver is discharged to the tray 106 via the tray 106. Next, the conveyance of the sensor ItPM will be explained. The exposed photosensitive material PM sent by the input roller pair 92 is
It enters the storage section 95 while being guided by the free rollers 94 and passes through the storage section 95 along the inner circumferential surface of the circumferential plate 120 . While passing through the storage section 95, it reacts with the developer stored there, and the development process is started. After passing through the gap between the developer supply roller 98 and the peripheral plate 120 and passing through the storage section 95, the developer is sent out along the inclined upper surface of the guide plate 110 toward a squeeze roller pair 109 provided at the entrance of the stable section 72. It can be done. Since the atmosphere above the guide plate 110 is heated to a predetermined temperature by the planar heater 112 having a temperature control function, the surface of the photosensitive material PM coating remains constant even while being conveyed on the guide plate 11.0. The developing process of the photosensitive material PM continues with the adhering developer. Sensitive material PM
The developer adhering to the surface is squeezed out and removed by a squeeze roller pair 109. Next, the stabilizing section 72, which is a system for stabilizing the photosensitive material PM using a stabilizer, will be briefly explained using FIG. In addition,
The description of the same members or members having the same functions as those of the developing section 70 described above will be omitted, and the symbols (numerical values) used in the description of the developing section 70 will be represented by adding an auxiliary symbol A. The stabilizing section 72 serves as a stabilizer supply system for the developing section 7.
Similar to the developer supply system of No. 0, the stabilizer main tank 43
．． A stabilizer distern tank 78A has a liquid level management cylinder 74A to which the stabilizer main tank 43 is attached and detached, and a partition plate 84A erected inside. Liquid level management cylinder 74A and stabilizer distern tank 78A
It is provided with a conduction pipe 76A that communicates with the main body, a stabilizer nozzle 82A interposed with an inflow solenoid valve 80A, and the like. In the stabilizer distern tank 78A, similarly to the developer distern tank 78, a float sensor 88A including a float 87A and a mesh filter 90A are also provided. When the stabilizer flows out from the stabilizer distern tank 78A via the inflow electromagnetic valve 80A and the stabilizer nozzle 82A, the stabilizer flows in the same amount from the conduction pipe 76A. The other components of the stabilizing section 72 will be briefly explained along the conveyance of the photosensitive material PM. The photosensitive material P that has passed through the squeezing roller pair 109 arranged at the upper end of the guide plate 110 of the developing section 70
M is guided by a guide cover 144 and a free roller 146 arranged along the transport path of the paulownia PM, and is carried into the stabilization treatment tank 96A. Stabilization treatment tank 96A
A free roller 94A for applying so-called stiffness to the photosensitive material PM is provided in the opening. Stabilizer storage section 95A
Similar to the development processing tank 96, the stabilization processing tank 96A that forms the stabilization processing tank 96A includes a sponge-like stabilization agent supply roller 98A, and the stabilization processing tank 96A that forms the stabilization agent liquid pool 1.
A stabilizing agent storage section 100A forming the storage section 43A is provided, and the stabilizing agent is supplied to the storage section 95A on the loading side of the photosensitive material PM. On the other hand, like the development processing tank 96, a bottom liquid storage chamber 101A is provided at the bottom of the stabilization processing tank 96A. When the discharge solenoid valve 1-04A with the drip-proof cover 1.14A is opened, the used stabilizer is drained from the bottom liquid storage chamber 101A through the stabilizing side discharge pipe 108A to the waste liquid receiving tray. It is discharged to 106A. In addition, since the stabilizer does not require temperature control, the bottom liquid storage chamber 1. O
IA is not equipped with a heater. A guide plate 110A forming an entry path for the stabilized photosensitive material PM is arranged downstream of the stabilization treatment tank 96A along the conveyance path of the photosensitive material PM so as to be inclined upward from the stabilization treatment tank 96A. The upper end of the guide plate 110A has a first
Squeezing roller pair 109A rotates in the direction of arrow Z in the figure to convey the stabilized photosensitive material PM toward the roller pair 51 of the drying unit 50 (see FIG. 2) and squeezes out excess stabilizer from the surface of the photosensitive material. is installed. In addition, the stabilizer supply roller 98A and each squeezing roller pair 1.09, 109A are as follows:
The rollers are driven by a common drive source and rotated in synchronization with the rollers of the developing tank 96 described above. Pairs of squeezing rollers 109, 109 rotate in the direction of arrow Z in FIG. 1 to convey the developed and stabilized photosensitive material PM while squeezing excess developer and stabilizer from the surface of the photosensitive material PM.
As shown in the drawing, A is provided so that a plane passing through the center of each roller is inclined by an angle β in the counterclockwise direction in the drawing from a vertical plane passing through the center of the roller. Therefore, when the photosensitive material PM is sandwiched between the pair of squeeze rollers 109 and 109A, the conveyance direction of the ablated PM at the pair of squeeze rollers 109 and 109A becomes downward by an angle corresponding to the angle β. As a result, the squeezed developer or stabilizer remains between the photosensitive material PM and the aperture roller pair 109, 109A while the photosensitive material PM is passing through, and does not drip onto the side of the photosensitive material PM. . During feeding of the photosensitive material PMm, the developer or stabilizer remaining in each squeeze roller pair 109, 109A is removed from the squeeze roller pair 109°1 at the same time that the cut end surface of the photosensitive material PM passes through the squeeze roller pair 1.09 or 109A. Along the lower roller surface at .09A, each squeezing roller pair 109,109
It falls onto the right squeeze fluid collection plate 152 or the left squeeze fluid collection plate 154 disposed below A, and the waste fluid receiver is placed on the tray 106.
Flows into A. In addition, each squeeze roller pair 109, 1.0
9A, two scrapers 150 are provided at positions where the leaf springs at the tips of the scrapers contact the rollers, and the sludge and waste liquid scraped off by the scrapers are also collected on the right side squeezed liquid collection plate 152 and the left side squeezed liquid collection plate 152. It falls onto the plate 154, and the waste liquid receiver is collected in the tray 106A. Note that the waste liquid receivers of the developing section 70 and the stabilizing section 72 are provided with trays 106 and 106.
A is provided with a pipe 158 leading to a waste liquid tank 156, and the waste liquid collected in each tray 106, 106A is finally collected in the waste liquid tank 156 via the pipe 158. In the stable section 72 configured as described above, the developed photosensitive material U' P M fed from the developing section 70 is squeezed out of the developer attached thereto by a pair of squeezing rollers 109, and is guided by a free roller 94A and the like. The storage unit 95A is then transported to the storage section 95A. When the photosensitive material PM enters the stabilizing agent in the storage section 95A, stabilization processing starts, and after passing through the storage section 95A, the stabilization processing continues even while being conveyed along the upper surface of the guide plate 110A. . When passing through the squeeze roller pair 109A, excess stabilizer is squeezed out from the upper surface of the photosensitive material PM.
Thereafter, the photosensitive material PM is conveyed to the drying unit 50 by the roller pair 51. Next, the electronic control device 60, which controls the temperature control in the developer displacer tank 78 and the like and the drive control of the developer supply roller 98 and the like, will be explained using the block diagram shown in FIG. As shown in FIG. 6, the electronic control device 60 includes a well-known CP
U162. ROM164. It is configured as an arithmetic and logic operation circuit mainly including a RAM 166 and a timer 168 that includes multiple self-running timer counters, and is connected to a common bus 17.
exposure output ports 172 .
Development input port 174. An input/output interface such as a developing output boat 176 is provided. In addition, the electronic control device 6
The common bus 170 of No. 0 includes a temperature adjustment circuit 17 that adjusts the temperature of the developer in the storage section 95 and the developer in the developer distern tank 78 that communicates with the bottom liquid storage chamber 101.
8 is connected to a console panel 4 on which an operator makes various settings. The exposure output port 172 includes a motor 13 for driving the document holder 1° and a cutting device 2 for cutting the photosensitive material PM.
7, a light source 31 for irradiating light onto the original in the original holder 10, a motor 28 for sending out the photosensitive material PM from the first photosensitive material roll 21 or the second photosensitive material roll 22, and a photosensitive material PM. An LED 38 for uniformly exposing the photosensitive material and a drying unit 50 for drying the stabilized photosensitive material are connected. On the other hand, the developer capo 174 is connected to a float sensor 88 in the developer distern tank 78 and a float sensor 88A in the stabilizer distern tank 78A, and to the developer output port 176, Processing unit 4
A drive motor 180 that synchronously drives each roller of No. 4;
An inflow solenoid valve 80 provided in the developer nozzle 82, an inflow solenoid valve 80A provided in the stabilizer nozzle 82A, and a discharge solenoid valve 104 provided in the developer discharge pipe 108.
A discharge electromagnetic valve 104A provided on the stabilizing agent discharge pipe 108A is connected to a planar heater 112 for heating the atmosphere near the guide plate 110 to a certain temperature. In addition, the temperature adjustment circuit 178 includes a heater 86 installed in the developer distern tank 78, a temperature sensor 85 that detects the temperature of the liquid in this tank, and two sensors installed in the bottom liquid storage chamber 101. A rod-shaped heater 103 and a temperature sensor 103a that detects the temperature of the liquid in the liquid reservoir chamber 101 are connected. This temperature adjustment circuit 178 controls the heating of each of the heaters to maintain the temperature of the developer in the storage section 95 and the developer in the developer distern tank 78 within a predetermined temperature range, and keeps the temperature of the developer within a predetermined temperature range. A signal indicating whether or not the current state is maintained is output to the CPU 162. Next, of the processing executed by the electronic control device 60, the portion directly related to the present invention will be described using a flowchart. FIG. 7 is a flowchart showing an initial processing routine executed when the power is turned on, and FIG. 8 is a flowchart showing a standby-development processing routine for controlling the device to a state where exposure and development are possible and executing development processing. When the slit exposure copying camera of this embodiment is powered on, the electronic control unit 60 first executes an initial processing routine shown in FIG. This process is executed only once when the slit exposure type copying camera starts to be used. When this routine is started, first the discharge solenoid valve 104.
Perform processing to open valve 104A (step 5IO),
The developer or stabilizer (hereinafter, both may be referred to collectively as the processing tank 96 as necessary) remaining in the development processing tank 96 and the stabilization processing tank 96A (hereinafter, both may be collectively referred to as the processing tank 96 as necessary) (collectively referred to as processing liquid) is waited for a sufficient draining time to drain all (step 520). Since the amount of processing liquid stored in the processing tank 96 is fixed, it is easy to set the discharge time in advance. After waiting for a predetermined discharge time, the discharge solenoid valve 104.10
After closing valve 4A (step 530), processing is then performed to open inflow solenoid valves 80 and 80A (step 54).
0), and further performs processing for starting the operation of the drive motor 180 via the developing output boat 176 (step 550).
). When the inflow solenoid valve 80.8OA opens, the developer distern tank 78 and the stabilizer distern tank 7
8A, the processing liquid flows to the developer nozzle 82. Stabilizer nozzle 8
2A, and the developer supply roller 98. The processing liquid is supplied to the processing tank 96 as the stabilizing side supply roller 98A rotates. Since the processing liquid is gradually stored in the processing tank 96, the process of closing the inflow solenoid valve 80.8OA after waiting for a preset storage time (time required for storage) (step 560) is performed (step 560). step 570) and a process of stopping the drive motor 180 to stop the rotation of each roller (step 58).
0). As a result, each processing tank 96 stores processing liquid necessary for development and stabilization processing. After the storage of the processing liquid is completed in this way, an instruction to start adjusting the developer temperature is output to the temperature adjustment circuit 178 (step 59
0). Upon receiving this instruction, the temperature adjustment circuit 178 refers to the detection signals of the temperature sensors 85 and 103a and adjusts the temperature of the heater 8.
6,103, and the temperature of the developer in the developer distern tank 78 and the development processing tank 96 is set to approximately 28°C.
The temperature should be kept within the range of 31 to 31 degrees Celsius. When the temperature adjustment circuit 178 heats the developer and controls the temperature within this range, it outputs a signal to the CP tJ 182 indicating that the temperature adjustment has been completed. Therefore, we wait until this adjustment completion signal is input (Step 5100), and when this signal is input, a display is made on the console panel 4 to indicate that warm-up has been completed (Step 5110), and all initial processing is completed. Then, the process moves to the next standby process. FIG. 9 shows the timing of opening and closing of each electromagnetic valve and the output of a warm-up signal as described above. By executing this initial processing, the development processing device 40 of the slit exposure type copying camera 1 can be installed in the development processing tank 96. Stabilization treatment tank 96A
The remaining processing solution (developing solution and stabilizer) is discharged together with sludge, etc., and new processing solution is supplied.
Adjust the temperature of the developer to the appropriate temperature required for processing. In the standby/development process executed after the initial process, the eighth
As shown in the figure, first, keys are pressed manually for various settings from the console panel 4 (step 5200), and various settings, such as the size of the document and the degree of exposure, are made according to the input keys (step S2). , 0). Next, the state of each float sensor 88, 88A of the developer distern tank 78 and the stabilizer distern tank 78A is read (step 5220), and it is determined whether the float sensors 88, 88A are on. (step 5230). If the float sensor 88° 88A is off, that is, the liquid level of the developer cistern tank 78 or the stabilizer cistern tank 78A is low, an instruction to replenish the developer or stabilizer main tank 42, 43 is issued. The processing for displaying on the console panel 4 is performed (step 5235), and the above-described processing is repeated from step 200. On the other hand, if both float sensors 88 and 88A are on (step 5230), it is then determined whether or not the temperature of the developer is appropriate (step 5240). It is determined whether the start key for instructing the start of exposure has been turned on (step 5250). The temperature of the developer is regulated by the temperature adjustment circuit 178, and should be at an appropriate temperature after the initial processing (Fig. 7) is completed, but due to a failure of the heater 86° 103, the temperature of the developer drops. This is possible, so I am checking again here. If the liquid temperature is not appropriate or the start key is not turned on, the process is repeated from step 200 described above. When the start key is pressed and turned on, the exposure/
After performing the development process (step 5260), rEND
Exit to J to end this routine. Here, the exposure and development processing includes transportation of the document holder 10 on which the document is placed, exposure of the photosensitive material PM by the projection optical system 30,
Feeding the photosensitive material PM in synchronization with the conveyance of the document holder 10,
These processes include development and stabilization processing in the development processing device 40, cutting of the photosensitive material PM by the cutting device 27, and drying of the photosensitive material PM by the planar heater 112 and the drying unit 50. The sensitive material PM exposed by the projection optical system 30 is developed while passing through the development processing tank 96, is stabilized while passing through the stabilization processing tank 96A, and is then dried.
The printing plate is sent to an external tray 56 outside the housing 2 as a printing plate for offset printing. - As explained above, the development processing device 40 of this embodiment incorporated in the slit exposure type copying camera I is capable of processing the photosensitive material PM.
During the conveyance, a new developer is supplied to the developing tank 96, and the developing process is continued even after the photosensitive material PM is carried out from the developing tank 96. Therefore, it has become possible to develop the photosensitive material PM by simply storing a small amount of developer. Moreover, there is no need to store a large amount of developer for a long period of time (there is no need to do so), and a bottom reservoir chamber 1. Since the sludge settles in the OI, the sludge does not stick to the bottom of the storage section 95 of the development processing tank 96 and turn into sludge.Therefore, the tip of the photosensitive material PM hits the sludge that has turned into sludge, inhibiting smooth conveyance. Therefore, the photosensitive material P
The problem of uneven development of M does not occur. Furthermore, in this embodiment, a small amount of the developer stored in the development processing tank 96 is transferred to the rod-shaped heater 103 in the bottom liquid storage chamber 101.
The heated developer is heated by convection. Therefore, the developer in the storage section 95 through which the photosensitive material PM is transported is uniformly heated to a predetermined temperature easily and in a short time. As a result, the problem of time loss during warm-up until the developing solution is adjusted to a processable temperature is solved, and power consumption is also reduced. In this embodiment, when the slit exposure type copying camera starts to be used, the bottom liquid storage chambers 101, 101. The developer and stabilizer stored in each processing tank 96, 96A are discharged through A. Therefore, the sludge in the used processing liquid is easily discharged together with the processing liquid. As a result, processing tank 9
6 does not particularly require washing with water, making it possible to make the device maintenance-free. In addition, in this embodiment, the developing solution discharged from the developing solution nozzle 82 is spread along the axial direction of the developing solution supply roller 98, that is, uniformly accumulated in the liquid reservoir portion 143 over the width direction of the photosensitive material PM. Then, the developer (new developer) held in the individual bubbles in the single bubble layer on the surface of the developer supply roller 98 is transferred to the storage section 9 based on the rotation of the developer supply roller 98.
5, the liquid surface of the developer in the storage section 95 will not be disturbed such as ripples. As a result, uneven development due to turbulence (waves) in the level of the developer (irregular streaks that occur on the surface of the photosensitive material due to turbulence in the level of the developer) does not occur. The stabilization treatment tank 96A has the same configuration except that it is not provided with a heater for heating.The stabilization treatment tank 96A has the same configuration except that it is not provided with a heater for heating, and the effect of improving treatment quality through sludge discharge, treatment efficiency, and stabilization is Of course. Although the embodiments of the present invention have been described above, the present invention is not limited to these embodiments. For example, if the stabilizer used is a drug that requires maintaining the liquid temperature due to its nature, stabilization treatment may be necessary. The present invention may be implemented in various ways without departing from the gist of the present invention, such as being equipped with a heater for heating, or applying it to a developing device [a] for silver halide photographic paper or plate-making film. Of course it is possible. [Effects of the Invention] As described in detail below, according to the sensitive material processing apparatus of the present invention, only a small amount of processing liquid is stored in the processing tank for processing the sensitive material, and a groove is provided at the bottom of the processing tank. This prevents sludge in the processing liquid from sticking to the bottom of the processing tank and turning into sludge. Therefore, the fixed sludge does not interfere with the conveyance of the photosensitive material and have a negative effect on the processing of f and Q44, and there is no need to maintain the treatment tank, significantly reducing the labor required for maintenance of conventional equipment. It has the excellent effect of being able to Further, since the temperature of the processing liquid stored in a small amount is controlled by the humidity control means provided in the groove, the temperature of the processing liquid can be easily and uniformly controlled in a short time. Furthermore, if the used processing liquid is discharged through a valve provided at the bottom of the groove, it becomes possible to discharge the sludge even more easily.

[Brief explanation of the drawing]

Fig. 1 is a block diagram of a developing processing device according to an embodiment of the present invention, Fig. 2 is a schematic block diagram showing a slit exposure type copying camera 1 incorporating the developing processing device of the embodiment, and Fig. 3 is a developing processing device. FIG. 4 is a perspective view of the main parts of the tank 96, FIG. 4 is a perspective view of the developer supply roller 98 and the developer storage section 100, and FIG.
and developer storage section 1. 6 is a cross-sectional view showing the arrangement of OO, etc., FIG. 6 is a diagram mainly showing the configuration of the electronic control unit 60, FIG. 7 is a flowchart 1 showing an initial processing routine that the electronic control unit 60 does not execute, and FIG.・A flowchart showing the development processing routine. FIG. 9 is a timing chart showing the timing of opening and closing of each electromagnetic valve in the initial processing. 1...Slit exposure type copying camera 10...Original holder 20...Sensitive material transport device 21, . 22...Sensitive material roll 30...Projection optical system 40...Development processing device 50
...Drying unit 60...Electronic control device 95.9
5A...Reservoir 96...Development processing tank 96A...Stabilization processing tank 98...Developer supply roller 98A...Stabilizing agent supply roller 100...Developer storage section 1. 0OA...Stabilizer-time storage section 101...Bottom liquid reservoir chamber 10], A...Bottom liquid reservoir chamber 102...Communication hole 103...Rod-shaped heater 1
43.143A...Liquid pool PM...Sensitive material

Claims (1)

[Scope of Claims] 1. A processing device for processing a silver salt type sensitive material such as photographic paper, photosensitive paper for direct plate making, or film, which stores a processing solution for the photosensitive material and stores a processing solution in the processing solution. a processing tank having a length such that the photosensitive material carried into the processing tank is partially immersed along the conveying direction; and a processing liquid supply supplying a new processing liquid to the processing tank at least while the photosensitive material is passing through the processing tank. a groove provided at the bottom of the processing tank in the width direction of the processing tank; and a temperature control means disposed inside the groove for controlling the temperature of the processing liquid. . 2. The sensitive material processing apparatus according to claim 1, wherein a groove provided at the bottom of the processing tank is provided with a valve for discharging the processing liquid in the processing tank when the valve is opened.