JPH04160195A - Sealing treating solution and its method - Google Patents
Sealing treating solution and its methodInfo
- Publication number
- JPH04160195A JPH04160195A JP28416490A JP28416490A JPH04160195A JP H04160195 A JPH04160195 A JP H04160195A JP 28416490 A JP28416490 A JP 28416490A JP 28416490 A JP28416490 A JP 28416490A JP H04160195 A JPH04160195 A JP H04160195A
- Authority
- JP
- Japan
- Prior art keywords
- sealing
- gold
- plating
- plated
- denotes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007789 sealing Methods 0.000 title claims abstract description 58
- 238000000034 method Methods 0.000 title claims description 20
- 238000007747 plating Methods 0.000 claims abstract description 31
- 229910052751 metal Inorganic materials 0.000 claims abstract description 20
- 239000002184 metal Substances 0.000 claims abstract description 20
- -1 phthalic acid ester Chemical class 0.000 claims abstract description 19
- 235000019271 petrolatum Nutrition 0.000 claims abstract description 16
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 claims abstract description 11
- XDOFQFKRPWOURC-UHFFFAOYSA-N 16-methylheptadecanoic acid Chemical compound CC(C)CCCCCCCCCCCCCCC(O)=O XDOFQFKRPWOURC-UHFFFAOYSA-N 0.000 claims abstract description 10
- 229910001020 Au alloy Inorganic materials 0.000 claims abstract description 10
- 150000001412 amines Chemical class 0.000 claims abstract description 10
- 239000004264 Petrolatum Substances 0.000 claims abstract description 8
- 239000012188 paraffin wax Substances 0.000 claims abstract description 8
- 229940066842 petrolatum Drugs 0.000 claims abstract description 8
- 239000001993 wax Substances 0.000 claims abstract description 7
- 150000001875 compounds Chemical class 0.000 claims abstract description 6
- 238000009713 electroplating Methods 0.000 claims abstract description 6
- 239000000344 soap Substances 0.000 claims abstract description 5
- 239000003960 organic solvent Substances 0.000 claims abstract description 4
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims abstract description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 30
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 21
- 229910052737 gold Inorganic materials 0.000 claims description 21
- 239000010931 gold Substances 0.000 claims description 21
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 20
- 239000007788 liquid Substances 0.000 claims description 15
- 229910052759 nickel Inorganic materials 0.000 claims description 15
- 239000007769 metal material Substances 0.000 claims description 12
- 239000011148 porous material Substances 0.000 claims description 12
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 11
- 229910052802 copper Inorganic materials 0.000 claims description 11
- 239000010949 copper Substances 0.000 claims description 11
- 229910052742 iron Inorganic materials 0.000 claims description 10
- 239000003353 gold alloy Substances 0.000 claims description 9
- 229910017464 nitrogen compound Inorganic materials 0.000 claims description 6
- 239000000463 material Substances 0.000 claims description 5
- PSZYNBSKGUBXEH-UHFFFAOYSA-M naphthalene-1-sulfonate Chemical class C1=CC=C2C(S(=O)(=O)[O-])=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-M 0.000 claims description 5
- 235000011187 glycerol Nutrition 0.000 claims description 4
- 239000003963 antioxidant agent Substances 0.000 claims description 3
- 238000003825 pressing Methods 0.000 claims description 2
- 150000008301 phosphite esters Chemical class 0.000 claims 1
- 230000007797 corrosion Effects 0.000 abstract description 23
- 238000005260 corrosion Methods 0.000 abstract description 23
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 abstract description 6
- 125000000217 alkyl group Chemical group 0.000 abstract description 5
- 239000003795 chemical substances by application Substances 0.000 abstract description 5
- 238000004519 manufacturing process Methods 0.000 abstract description 2
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 abstract 1
- 239000010953 base metal Substances 0.000 abstract 1
- 239000013522 chelant Substances 0.000 abstract 1
- 150000002148 esters Chemical class 0.000 abstract 1
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical class C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 abstract 1
- XNGIFLGASWRNHJ-UHFFFAOYSA-N o-dicarboxybenzene Natural products OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 abstract 1
- 230000003647 oxidation Effects 0.000 abstract 1
- 238000007254 oxidation reaction Methods 0.000 abstract 1
- 235000002639 sodium chloride Nutrition 0.000 description 21
- 150000003839 salts Chemical class 0.000 description 20
- 239000001257 hydrogen Substances 0.000 description 16
- 229910052739 hydrogen Inorganic materials 0.000 description 16
- 230000000694 effects Effects 0.000 description 12
- 150000002431 hydrogen Chemical group 0.000 description 11
- 238000012360 testing method Methods 0.000 description 8
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 7
- SIKJAQJRHWYJAI-UHFFFAOYSA-N Indole Chemical compound C1=CC=C2NC=CC2=C1 SIKJAQJRHWYJAI-UHFFFAOYSA-N 0.000 description 6
- 239000002199 base oil Substances 0.000 description 6
- JNYAEWCLZODPBN-JGWLITMVSA-N (2r,3r,4s)-2-[(1r)-1,2-dihydroxyethyl]oxolane-3,4-diol Chemical compound OC[C@@H](O)[C@H]1OC[C@H](O)[C@H]1O JNYAEWCLZODPBN-JGWLITMVSA-N 0.000 description 5
- 239000002253 acid Substances 0.000 description 5
- 238000003780 insertion Methods 0.000 description 5
- 230000037431 insertion Effects 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- OJMIONKXNSYLSR-UHFFFAOYSA-N phosphorous acid Chemical compound OP(O)O OJMIONKXNSYLSR-UHFFFAOYSA-N 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 239000002585 base Substances 0.000 description 4
- 239000011575 calcium Substances 0.000 description 4
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 4
- PAFZNILMFXTMIY-UHFFFAOYSA-N cyclohexylamine Chemical compound NC1CCCCC1 PAFZNILMFXTMIY-UHFFFAOYSA-N 0.000 description 4
- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 4
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 4
- HVLLSGMXQDNUAL-UHFFFAOYSA-N triphenyl phosphite Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)OC1=CC=CC=C1 HVLLSGMXQDNUAL-UHFFFAOYSA-N 0.000 description 4
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 3
- BAXOFTOLAUCFNW-UHFFFAOYSA-N 1H-indazole Chemical compound C1=CC=C2C=NNC2=C1 BAXOFTOLAUCFNW-UHFFFAOYSA-N 0.000 description 3
- 229910000906 Bronze Inorganic materials 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 3
- 230000002411 adverse Effects 0.000 description 3
- 239000010974 bronze Substances 0.000 description 3
- JQCXWCOOWVGKMT-UHFFFAOYSA-N diheptyl phthalate Chemical compound CCCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCC JQCXWCOOWVGKMT-UHFFFAOYSA-N 0.000 description 3
- PZOUSPYUWWUPPK-UHFFFAOYSA-N indole Natural products CC1=CC=CC2=C1C=CN2 PZOUSPYUWWUPPK-UHFFFAOYSA-N 0.000 description 3
- RKJUIXBNRJVNHR-UHFFFAOYSA-N indolenine Natural products C1=CC=C2CC=NC2=C1 RKJUIXBNRJVNHR-UHFFFAOYSA-N 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 2
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 2
- RZRNAYUHWVFMIP-KTKRTIGZSA-N 1-oleoylglycerol Chemical compound CCCCCCCC\C=C/CCCCCCCC(=O)OCC(O)CO RZRNAYUHWVFMIP-KTKRTIGZSA-N 0.000 description 2
- LWCOSGCLJGQXIV-UHFFFAOYSA-N 2,3-di(nonyl)naphthalene-1-sulfonic acid;ethane-1,2-diamine Chemical compound NCCN.C1=CC=C2C(S(O)(=O)=O)=C(CCCCCCCCC)C(CCCCCCCCC)=CC2=C1 LWCOSGCLJGQXIV-UHFFFAOYSA-N 0.000 description 2
- TWJNQYPJQDRXPH-UHFFFAOYSA-N 2-cyanobenzohydrazide Chemical compound NNC(=O)C1=CC=CC=C1C#N TWJNQYPJQDRXPH-UHFFFAOYSA-N 0.000 description 2
- LVAGMBHLXLZJKZ-UHFFFAOYSA-N 2-o-decyl 1-o-octyl benzene-1,2-dicarboxylate Chemical compound CCCCCCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCCC LVAGMBHLXLZJKZ-UHFFFAOYSA-N 0.000 description 2
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 2
- HNNQYHFROJDYHQ-UHFFFAOYSA-N 3-(4-ethylcyclohexyl)propanoic acid 3-(3-ethylcyclopentyl)propanoic acid Chemical compound CCC1CCC(CCC(O)=O)C1.CCC1CCC(CCC(O)=O)CC1 HNNQYHFROJDYHQ-UHFFFAOYSA-N 0.000 description 2
- CMGDVUCDZOBDNL-UHFFFAOYSA-N 4-methyl-2h-benzotriazole Chemical compound CC1=CC=CC2=NNN=C12 CMGDVUCDZOBDNL-UHFFFAOYSA-N 0.000 description 2
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 2
- 229910000881 Cu alloy Inorganic materials 0.000 description 2
- MHZGKXUYDGKKIU-UHFFFAOYSA-N Decylamine Chemical compound CCCCCCCCCCN MHZGKXUYDGKKIU-UHFFFAOYSA-N 0.000 description 2
- MQIUGAXCHLFZKX-UHFFFAOYSA-N Di-n-octyl phthalate Chemical compound CCCCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCCC MQIUGAXCHLFZKX-UHFFFAOYSA-N 0.000 description 2
- NIQCNGHVCWTJSM-UHFFFAOYSA-N Dimethyl phthalate Chemical compound COC(=O)C1=CC=CC=C1C(=O)OC NIQCNGHVCWTJSM-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- 235000021360 Myristic acid Nutrition 0.000 description 2
- TUNFSRHWOTWDNC-UHFFFAOYSA-N Myristic acid Natural products CCCCCCCCCCCCCC(O)=O TUNFSRHWOTWDNC-UHFFFAOYSA-N 0.000 description 2
- 239000005642 Oleic acid Substances 0.000 description 2
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 2
- 239000004147 Sorbitan trioleate Substances 0.000 description 2
- PRXRUNOAOLTIEF-ADSICKODSA-N Sorbitan trioleate Chemical compound CCCCCCCC\C=C/CCCCCCCC(=O)OC[C@@H](OC(=O)CCCCCCC\C=C/CCCCCCCC)[C@H]1OC[C@H](O)[C@H]1OC(=O)CCCCCCC\C=C/CCCCCCCC PRXRUNOAOLTIEF-ADSICKODSA-N 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- GSBLJNMZWBPOPI-UHFFFAOYSA-N [2-(9,9-diphenylnonyl)phenyl] dihydrogen phosphite Chemical compound OP(O)OC1=CC=CC=C1CCCCCCCCC(C=1C=CC=CC=1)C1=CC=CC=C1 GSBLJNMZWBPOPI-UHFFFAOYSA-N 0.000 description 2
- YSIQDTZQRDDQNF-UHFFFAOYSA-L barium(2+);2,3-di(nonyl)naphthalene-1-sulfonate Chemical compound [Ba+2].C1=CC=C2C(S([O-])(=O)=O)=C(CCCCCCCCC)C(CCCCCCCCC)=CC2=C1.C1=CC=C2C(S([O-])(=O)=O)=C(CCCCCCCCC)C(CCCCCCCCC)=CC2=C1 YSIQDTZQRDDQNF-UHFFFAOYSA-L 0.000 description 2
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 2
- 239000012964 benzotriazole Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- SPBMDAHKYSRJFO-UHFFFAOYSA-N didodecyl hydrogen phosphite Chemical compound CCCCCCCCCCCCOP(O)OCCCCCCCCCCCC SPBMDAHKYSRJFO-UHFFFAOYSA-N 0.000 description 2
- FLKPEMZONWLCSK-UHFFFAOYSA-N diethyl phthalate Chemical compound CCOC(=O)C1=CC=CC=C1C(=O)OCC FLKPEMZONWLCSK-UHFFFAOYSA-N 0.000 description 2
- WDNQRCVBPNOTNV-UHFFFAOYSA-N dinonylnaphthylsulfonic acid Chemical class C1=CC=C2C(S(O)(=O)=O)=C(CCCCCCCCC)C(CCCCCCCCC)=CC2=C1 WDNQRCVBPNOTNV-UHFFFAOYSA-N 0.000 description 2
- POULHZVOKOAJMA-UHFFFAOYSA-N dodecanoic acid Chemical compound CCCCCCCCCCCC(O)=O POULHZVOKOAJMA-UHFFFAOYSA-N 0.000 description 2
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- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 2
- 229910003002 lithium salt Inorganic materials 0.000 description 2
- 159000000002 lithium salts Chemical class 0.000 description 2
- 239000000314 lubricant Substances 0.000 description 2
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 2
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- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
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- XNGIFLGASWRNHJ-UHFFFAOYSA-L phthalate(2-) Chemical compound [O-]C(=O)C1=CC=CC=C1C([O-])=O XNGIFLGASWRNHJ-UHFFFAOYSA-L 0.000 description 2
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- DHQIJSYTNIUZRY-UHFFFAOYSA-M sodium;2,3-di(nonyl)naphthalene-1-sulfonate Chemical compound [Na+].C1=CC=C2C(S([O-])(=O)=O)=C(CCCCCCCCC)C(CCCCCCCCC)=CC2=C1 DHQIJSYTNIUZRY-UHFFFAOYSA-M 0.000 description 2
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- CUNWUEBNSZSNRX-RKGWDQTMSA-N (2r,3r,4r,5s)-hexane-1,2,3,4,5,6-hexol;(z)-octadec-9-enoic acid Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO.OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO.CCCCCCCC\C=C/CCCCCCCC(O)=O.CCCCCCCC\C=C/CCCCCCCC(O)=O.CCCCCCCC\C=C/CCCCCCCC(O)=O CUNWUEBNSZSNRX-RKGWDQTMSA-N 0.000 description 1
- ZORQXIQZAOLNGE-UHFFFAOYSA-N 1,1-difluorocyclohexane Chemical compound FC1(F)CCCCC1 ZORQXIQZAOLNGE-UHFFFAOYSA-N 0.000 description 1
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- OAZHXZJUWHKFMP-UHFFFAOYSA-N 2-methylindazole Chemical compound C1=CC=CC2=NN(C)C=C21 OAZHXZJUWHKFMP-UHFFFAOYSA-N 0.000 description 1
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- IYFATESGLOUGBX-YVNJGZBMSA-N Sorbitan monopalmitate Chemical compound CCCCCCCCCCCCCCCC(=O)OC[C@@H](O)[C@H]1OC[C@H](O)[C@H]1O IYFATESGLOUGBX-YVNJGZBMSA-N 0.000 description 1
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- 235000021355 Stearic acid Nutrition 0.000 description 1
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- QCIGHKFGWASDAN-UHFFFAOYSA-N azanium;2,3-di(nonyl)naphthalene-1-sulfonate Chemical compound [NH4+].C1=CC=C2C(S([O-])(=O)=O)=C(CCCCCCCCC)C(CCCCCCCCC)=CC2=C1 QCIGHKFGWASDAN-UHFFFAOYSA-N 0.000 description 1
- IYVBKVVOHXVKRD-UHFFFAOYSA-N benzimidazol-1-yl(phenyl)methanone Chemical compound C1=NC2=CC=CC=C2N1C(=O)C1=CC=CC=C1 IYVBKVVOHXVKRD-UHFFFAOYSA-N 0.000 description 1
- DMFGNRRURHSENX-UHFFFAOYSA-N beryllium copper Chemical compound [Be].[Cu] DMFGNRRURHSENX-UHFFFAOYSA-N 0.000 description 1
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 1
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- 229940043253 butylated hydroxyanisole Drugs 0.000 description 1
- CZBZUDVBLSSABA-UHFFFAOYSA-N butylated hydroxyanisole Chemical compound COC1=CC=C(O)C(C(C)(C)C)=C1.COC1=CC=C(O)C=C1C(C)(C)C CZBZUDVBLSSABA-UHFFFAOYSA-N 0.000 description 1
- 235000019282 butylated hydroxyanisole Nutrition 0.000 description 1
- MKFUUBCXQNCPIP-UHFFFAOYSA-L calcium;2,3-di(nonyl)naphthalene-1-sulfonate Chemical compound [Ca+2].C1=CC=C2C(S([O-])(=O)=O)=C(CCCCCCCCC)C(CCCCCCCCC)=CC2=C1.C1=CC=C2C(S([O-])(=O)=O)=C(CCCCCCCCC)C(CCCCCCCCC)=CC2=C1 MKFUUBCXQNCPIP-UHFFFAOYSA-L 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- IUYOGGFTLHZHEG-UHFFFAOYSA-N copper titanium Chemical compound [Ti].[Cu] IUYOGGFTLHZHEG-UHFFFAOYSA-N 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- 125000004177 diethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- HBGGXOJOCNVPFY-UHFFFAOYSA-N diisononyl phthalate Chemical compound CC(C)CCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCC(C)C HBGGXOJOCNVPFY-UHFFFAOYSA-N 0.000 description 1
- FBSAITBEAPNWJG-UHFFFAOYSA-N dimethyl phthalate Natural products CC(=O)OC1=CC=CC=C1OC(C)=O FBSAITBEAPNWJG-UHFFFAOYSA-N 0.000 description 1
- 229960001826 dimethylphthalate Drugs 0.000 description 1
- POULHZVOKOAJMA-UHFFFAOYSA-M dodecanoate Chemical compound CCCCCCCCCCCC([O-])=O POULHZVOKOAJMA-UHFFFAOYSA-M 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- CJMZLCRLBNZJQR-UHFFFAOYSA-N ethyl 2-amino-4-(4-fluorophenyl)thiophene-3-carboxylate Chemical compound CCOC(=O)C1=C(N)SC=C1C1=CC=C(F)C=C1 CJMZLCRLBNZJQR-UHFFFAOYSA-N 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 1
- 239000004519 grease Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 150000002473 indoazoles Chemical class 0.000 description 1
- UTWGRMYWDUMKNY-UHFFFAOYSA-N indole-1-carboxylic acid Chemical compound C1=CC=C2N(C(=O)O)C=CC2=C1 UTWGRMYWDUMKNY-UHFFFAOYSA-N 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 1
- 229940039717 lanolin Drugs 0.000 description 1
- 235000019388 lanolin Nutrition 0.000 description 1
- 229940070765 laurate Drugs 0.000 description 1
- 244000144972 livestock Species 0.000 description 1
- 230000001050 lubricating effect Effects 0.000 description 1
- 238000005461 lubrication Methods 0.000 description 1
- 230000013011 mating Effects 0.000 description 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000002480 mineral oil Substances 0.000 description 1
- 235000010446 mineral oil Nutrition 0.000 description 1
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 description 1
- GPJPBLLWYCLERP-UHFFFAOYSA-N n-(benzotriazol-1-ylmethyl)-n-octyloctan-1-amine Chemical compound C1=CC=C2N(CN(CCCCCCCC)CCCCCCCC)N=NC2=C1 GPJPBLLWYCLERP-UHFFFAOYSA-N 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 239000002530 phenolic antioxidant Substances 0.000 description 1
- 238000005554 pickling Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 229940035044 sorbitan monolaurate Drugs 0.000 description 1
- 235000011069 sorbitan monooleate Nutrition 0.000 description 1
- 239000001593 sorbitan monooleate Substances 0.000 description 1
- 229940035049 sorbitan monooleate Drugs 0.000 description 1
- 235000011071 sorbitan monopalmitate Nutrition 0.000 description 1
- 239000001570 sorbitan monopalmitate Substances 0.000 description 1
- 229940031953 sorbitan monopalmitate Drugs 0.000 description 1
- 235000011076 sorbitan monostearate Nutrition 0.000 description 1
- 239000001587 sorbitan monostearate Substances 0.000 description 1
- 229940035048 sorbitan monostearate Drugs 0.000 description 1
- 229960005078 sorbitan sesquioleate Drugs 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- UBOXGVDOUJQMTN-UHFFFAOYSA-N trichloroethylene Natural products ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 description 1
- 150000003751 zinc Chemical class 0.000 description 1
- COGHWIKGZJHSAG-UHFFFAOYSA-L zinc;2,3-di(nonyl)naphthalene-1-sulfonate Chemical compound [Zn+2].C1=CC=C2C(S([O-])(=O)=O)=C(CCCCCCCCC)C(CCCCCCCCC)=CC2=C1.C1=CC=C2C(S([O-])(=O)=O)=C(CCCCCCCCC)C(CCCCCCCCC)=CC2=C1 COGHWIKGZJHSAG-UHFFFAOYSA-L 0.000 description 1
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は、金めつき電気接点の封孔処理液、封孔処理方
法及び封孔処理されたコネクタ接触子に関する。特には
繰返し挿抜や振動により摩耗と腐食が同時進行するよう
な過酷な使用条件において、電気的接点の潤滑、防錆及
び電気的接続性か長期的に安定して優れる封孔処理液、
封孔処理方法及び封孔処理されたコネクタに関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a sealing liquid for gold-plated electrical contacts, a sealing method, and a sealed connector contact. In particular, sealing liquids that provide excellent lubrication, rust prevention, and electrical connectivity for electrical contacts in a stable manner over a long period of time, especially under harsh usage conditions where wear and corrosion progress simultaneously due to repeated insertion and removal and vibration.
The present invention relates to a sealing method and a sealed connector.
[従来の技術]
電子機器用接続部品としてコネクタは最も代表的なもの
であり多種多様のコネクタか実用化されている。電算機
や通信用機器等高度の信頼性が要求される、いわゆる産
業用電子機器に使用されるコネクタは、りん青銅、ベリ
リウム銅等のバネ用銅合金を母材とし、接点用金属被膜
としてニッケル下地めっき後その上に金めつきを施した
ものが一般に利用されている。[Prior Art] Connectors are the most typical connecting parts for electronic devices, and a wide variety of connectors have been put into practical use. Connectors used in so-called industrial electronic devices that require a high degree of reliability, such as computers and communication equipment, are made of spring copper alloys such as phosphor bronze and beryllium copper, and nickel is used as the metal coating for the contacts. Generally used is a base plating followed by gold plating.
金は貴金属の中でも極めて耐食性か高く、表面に酸化物
や他の被膜を形成しないため電気的接続性に優れ、接点
用金属として広く使用されている。しかし、金は高価で
あるため、コネクタの製造コストを下げる目的で様々な
畜舎化策が採られてきた。その代表的方法か金めつきの
厚みを薄くする方法であるが、金めつきの厚みを薄くす
るとともに、被膜のピンホールの数か指数関数的に増え
、耐食性が著しく低下するという問題を抱えている。こ
の問題を解決する方法のひとつに封孔処理かある。すな
わち、各種の無機性、あるいは有機性の薬品で金めつき
面を処理し、ピンホールを塞ぎ耐食性を向上させようと
するものであった。Gold has extremely high corrosion resistance among noble metals, and because it does not form oxides or other films on its surface, it has excellent electrical connectivity and is widely used as a contact metal. However, since gold is expensive, various methods have been adopted to reduce the cost of manufacturing connectors. The typical method is to reduce the thickness of the gold plating, but as the thickness of the gold plating becomes thinner, the number of pinholes in the coating increases exponentially, resulting in a significant decrease in corrosion resistance. . One way to solve this problem is through sealing. That is, attempts were made to treat the gold-plated surface with various inorganic or organic chemicals to close pinholes and improve corrosion resistance.
[発明が解決しようとする課題]
封孔処理、特に有機性の薬品による封孔処理は、金めつ
き被膜の厚み低減に対し、耐食性を維持する効果に優れ
ている。ところが従来の封孔処理液は鉄系金属材料や銅
系金属材料の防錆剤として知られていた化合物を中心と
して選択されたものか、あるいは畜舎化以前にも金めつ
き接点の潤滑を目的として使用されていた潤滑剤をその
まま使用したものか一般的であった。[Problems to be Solved by the Invention] A pore sealing treatment, particularly a pore sealing treatment using an organic chemical, is excellent in maintaining corrosion resistance while reducing the thickness of a gold plating film. However, conventional sealing liquids were mainly selected from compounds known as rust preventive agents for iron-based metal materials and copper-based metal materials, or they were used for the purpose of lubricating gold-plated contacts even before the use of livestock housing. It was commonly used as a lubricant that was used as a lubricant.
封孔処理された金めつきに要求される特性としては、
■ 潤滑性がよいこと、
■ 耐食性か優れていること、
■ 接触抵抗が低く安定していること、■ はんだ付性
かよいこと、及び
■ それらの特性か各種の環境、使用条件下で長期に亘
り持続すること、
である。The properties required for sealed gold plating are: ■ Good lubricity, ■ Excellent corrosion resistance, ■ Low and stable contact resistance, ■ Good solderability, and ■ Their characteristics are that they last for a long time under various environments and usage conditions.
ところが従来の封孔処理液は、そのような総合的観点か
ら必ずしも満足できるものではなく、なんらかの品質面
で劣っているものが一般的であった。However, conventional sealing liquids are not necessarily satisfactory from such a comprehensive viewpoint, and are generally inferior in some quality aspect.
特にICカードの電気接点(あるいはコネクタ)のよう
に1万回も挿抜後もその電気的接続性を保証しなければ
ならないというように電気接点に要求される品質はます
ます高度化してきている。ところか、長い時間をかけて
1万回にも及び挿抜を受けると、初期には潤滑性の優れ
ていた封孔処理であっても、繰返し挿抜中に封孔処理皮
膜に大気中の塵埃等が付着し、摩耗を促進するという問
題かあった。In particular, the quality required of electrical contacts (or connectors) for IC cards, which must guarantee electrical connectivity even after 10,000 insertions and removals, is becoming increasingly sophisticated. However, after being inserted and removed 10,000 times over a long period of time, even if the sealing treatment initially had excellent lubricity, dust and other particles in the atmosphere can form on the sealing film during repeated insertion and removal. There was a problem that it would adhere and accelerate wear.
又、自動車の電子機器化、いわゆるカーエレクトロニク
ス化の急激な進展とともに自動車に使用される電子回路
用コネクタの材料で金めつきされたものか増えている。Furthermore, with the rapid development of electronic equipment in automobiles, so-called car electronics, the number of gold-plated connectors for electronic circuits used in automobiles is increasing.
自動車用コネクタの接点は、車体による振動によって生
じる微摺動摩耗を受けるとともに、工業地帯における各
種の大気中の腐食性ガス、海岸地帯における海塩粒子、
あるいは寒冷地における融雪剤など極めて過酷な腐食環
境に晒される。The contacts of automotive connectors are subject to slight sliding wear caused by vibrations caused by the vehicle body, as well as various corrosive gases in the atmosphere in industrial areas, sea salt particles in coastal areas,
Or exposed to extremely harsh corrosive environments such as snow melting agents in cold regions.
すなわち、従来の封孔処理では、摩耗と腐食か共存する
過酷な環境において、長期にわたり上述の電気接点に要
求される特性を満足させることはできなかった。That is, the conventional sealing process has not been able to satisfy the above-mentioned characteristics required for electrical contacts over a long period of time in a harsh environment where wear and corrosion coexist.
本発明は、このような要求を満たすことのできる改善さ
れた封孔処理液及びそれを用いる封孔処理方法を提供す
ることを目的とし、あわせてそれにより処理されたコネ
クタを提供することを目的とするものである。An object of the present invention is to provide an improved sealing liquid that can meet such demands and a sealing method using the same, and also to provide a connector treated with the same. That is.
[課題を解決するための手段]
かかる状況に鑑み、本発明者等は鋭意研究を行った結果
、以下に示す封孔処理液、方法及び封孔処理されたコネ
クタを発明するに至った。[Means for Solving the Problems] In view of this situation, the inventors of the present invention conducted extensive research, and as a result, they came up with the following sealing liquid, method, and sealed connector.
すなわち、本発明は、
(1)銅系または鉄系金属材料に中間層としてニッケル
をめっき後、金または金合金をめっきした材料を処理す
る封孔処理液であって、(A)パラフィンワックス0.
1〜3wt%及び(B)以下の(a)〜(e)の各群の
うちの2種以上の群からそれぞれ1種又は2種以上選択
された化合物を含む有機溶剤溶液よりなることを特徴と
する封孔処理液。That is, the present invention provides: (1) A sealing solution for treating a copper-based or iron-based metal material plated with nickel as an intermediate layer and then plated with gold or a gold alloy, comprising: (A) paraffin wax 0; ..
1 to 3 wt% and (B) an organic solvent solution containing one or more compounds selected from two or more of the following groups (a) to (e). A pore sealing solution.
(a)イソステアリン酸、酸化ワックス、及び酸化ペト
ロラタム0.05〜3wt%、(b)アルキル置換ナフ
タレンスルフォン酸塩0.05〜3wt%、
(c) アミン0.05〜3wt%、
(d)金属石けん0.05〜3wt%、(e)フタル酸
エステル、亜りん酸エステル、グリセリン七ノエステル
、及びソルビタンエステル、0.01〜3wt%。(a) 0.05-3 wt% isostearic acid, oxidized wax, and petrolatum oxide, (b) 0.05-3 wt% alkyl-substituted naphthalene sulfonate, (c) 0.05-3 wt% amine, (d) Metal Soap 0.05-3 wt%, (e) phthalate, phosphite, glycerin heptanoester, and sorbitan ester, 0.01-3 wt%.
(2)キレート形成性環状窒素化合物の1種もしくは2
種以上0.05〜31%をさらに含有することを特徴と
する前記(1)記載の封孔処理液。(2) One or two chelate-forming cyclic nitrogen compounds
The pore-sealing treatment liquid according to (1) above, further containing 0.05 to 31% of a species or more.
(3)アミン系又はフェノール系酸化防止剤の1種もし
くは2種以上0.001〜tvt%を、さらに含有する
ことを特徴とする前記(1)又は(2)記載の封孔処理
液。(3) The sealing solution according to (1) or (2) above, further comprising 0.001 to tvt% of one or more amine-based or phenol-based antioxidants.
(4)銅系又は鉄系金属材料に中間層としてニッケルを
めっきし、さらにその上に金または金合金を電気めっき
後、前記(1)、(2)または(3)記載の封孔処理液
で処理することを特徴とする封孔処理方法。(4) After plating nickel as an intermediate layer on a copper-based or iron-based metal material and further electroplating gold or a gold alloy thereon, the sealing solution described in (1), (2), or (3) above is applied. A pore sealing method characterized by processing.
(5)ニッケル及び金または金合金めっきされた銅系ま
たは鉄系金属材料をプレス加工後、前記(1)、(2)
または(3)に記載の封孔処理液で処理することを特徴
とする封孔処理方法。(5) After pressing the copper-based or iron-based metal material plated with nickel and gold or gold alloy, the above (1) and (2) are applied.
Or a pore sealing method characterized by treating with the pore sealing solution according to (3).
(6)銅系または鉄系金属材料に中間層としてニッケル
をめっき後、金又は金合金をめっきしためっき材よりな
り、前記(1)、(2)または(3)記載の封孔処理液
で封孔処理したことを特徴とするコネクタである。(6) Made of a plating material in which a copper-based or iron-based metal material is plated with nickel as an intermediate layer, and then gold or gold alloy is plated, and the sealing solution described in (1), (2) or (3) above is used. This connector is characterized by being sealed.
本発明の封孔処理液の必須成分であるパラフィンワック
スは、平均炭素数20〜35程度の直鎖状炭化水素を主
成分とする分子量300〜500程度の飽和炭化水素混
合物である。本発明においてはパラフィンワックスは基
油としての機能を有する、すなわちそれ自体、多数のピ
ンホールの存在する金めつき表面に皮膜を形成し、ピン
ホール等金めっきの微視的な欠陥を通して、大気中の水
分、酸素、及び各種の腐食媒が下地ニッケルと接触する
のを防いでいる。そして本発明の目的である、腐食と摩
耗の共存する環境において、長期間にわたり、電気接点
の性能を安定的に維持する上で最も重要な効果を奏する
。Paraffin wax, which is an essential component of the pore-sealing solution of the present invention, is a saturated hydrocarbon mixture with a molecular weight of about 300 to 500, whose main component is a linear hydrocarbon with an average carbon number of about 20 to 35. In the present invention, paraffin wax has a function as a base oil, that is, it forms a film on the gold-plated surface where many pinholes are present, and through microscopic defects in the gold plating such as pinholes, the paraffin wax acts as a base oil. This prevents moisture, oxygen, and various corrosive media from coming into contact with the nickel base. The most important effect is achieved in stably maintaining the performance of electrical contacts over a long period of time in an environment where corrosion and wear coexist, which is the objective of the present invention.
すなわち、鉄鋼等ではラノリン、ペトロラタム、グリー
ス、鉱油等が防錆剤の用途で知られているが、この様な
軟調の基油ではべとつきが有るため、大気中の塵埃粒子
が付着し、電気接点が繰返し摩擦される際に、金めつき
の摩耗を促進し、同時に封孔機能か低下し、腐食が進行
するため電気接点の寿命を大幅に低下させる。本発明に
おいて、パラフィンワックスがそれらの欠陥を有しない
金めつき接点用の封孔処理液の基油としてきわめて好適
であることを見出したものである。In other words, lanolin, petrolatum, grease, mineral oil, etc. are known to be used as rust preventives in steel, etc., but these soft base oils are sticky, so dust particles in the atmosphere can adhere to them, causing damage to electrical contacts. When it is repeatedly rubbed, it accelerates the wear of the gold plating, and at the same time, the sealing function deteriorates and corrosion progresses, which significantly shortens the life of the electrical contacts. In the present invention, it has been discovered that paraffin wax does not have these defects and is extremely suitable as a base oil for a sealing liquid for gold-plated contacts.
本発明において、この基油の選択は他の成分の作用と相
俟って相剰的に前述の耐食性、耐久性を向上させるうえ
で重要な成分である。特に鉄鋼等の防錆剤とは異なり、
場合によっては、マイクロアンペアオーダーの微弱電流
を確実に相手端子と接続しなければならないコネクタ等
電子部品の接点表面の封孔処理剤であるから、基油の選
択は防錆効果のみではなく、電気的接統性が極めて重要
となる。そして、その濃度は0.1wt%より小さいと
、耐食性、耐久性が小さくなり、所望の効果を得ること
ができない。−方3wt%より大きいと接触抵抗が上昇
し接点用の封孔処理として価値かなくなるので好ましく
ない。In the present invention, the selection of this base oil is an important component in improving the above-mentioned corrosion resistance and durability in combination with the effects of other components. Especially unlike rust inhibitors for steel, etc.
In some cases, the base oil is used as a sealing agent for the contact surfaces of electronic components such as connectors that must reliably connect a weak current on the order of microamperes to a mating terminal. Inheritance is extremely important. If the concentration is less than 0.1 wt%, corrosion resistance and durability will decrease, making it impossible to obtain the desired effects. If the amount is more than 3 wt%, the contact resistance increases and the sealing treatment for contacts becomes useless, which is not preferable.
本発明の封孔処理液のもう一つの必須成分は、以下の(
a)〜(e)で示される群のうちの2種以上の群から選
択される。Another essential component of the sealing solution of the present invention is the following (
selected from two or more of the groups a) to (e).
すなわち、
(a)イソステアリン酸、酸化ワックス、及び酸化ペト
ロラタム0.05〜3wt%
(b)アルキル置換ナフタレンスルフォン酸塩0.1〜
3wt%
(c)アミン(1,05〜3w1%
(d)金属石けん0.05〜3νt%
(e)フタル酸エステル、亜りん酸エステル、グリセリ
ン七ノエステル、及びソルビタンエステル0,01〜3
wt%であり、これらは2種以上の群からそれぞれ1種
又は2種以上混合して添加され、耐食性向上に寄与する
。上記(a) 〜(d)成分の添加量は0.0!+−
3wt%である。0.05wt%未満ては防錆効果が低
く、3wt%を越えると、接触抵抗への悪影響が認めら
れる。That is, (a) 0.05-3 wt% of isostearic acid, oxidized wax, and petrolatum oxide (b) 0.1-3 wt% of alkyl-substituted naphthalene sulfonate
3wt% (c) Amine (1,05-3w1%) (d) Metal soap 0.05-3vt% (e) Phthalate, phosphite, glycerin heptanoester, and sorbitan ester 0,01-3
wt%, and these are added singly or in a mixture of two or more from two or more groups, and contribute to improving corrosion resistance. The amount of the above components (a) to (d) added is 0.0! +-
It is 3wt%. If it is less than 0.05 wt%, the antirust effect is low, and if it exceeds 3 wt%, an adverse effect on contact resistance is observed.
又、(e)成分の添加量は、0.01〜3wt%の範囲
であり、0.01vt%未満ては耐食性向上効果が、
得られず、3νt%を越えると接触抵抗への悪影響か認
められる。In addition, the amount of component (e) added is in the range of 0.01 to 3 wt%, and if it is less than 0.01 wt%, the corrosion resistance improvement effect will be reduced.
If it exceeds 3vt%, it is recognized that it has an adverse effect on the contact resistance.
本発明において使用する(b)成分のアルキル置換ナフ
タレンスルフォン酸塩は次式で表される。The alkyl-substituted naphthalene sulfonate as the component (b) used in the present invention is represented by the following formula.
(Rは炭素数6〜12のアルキル基;Mは塩形成成分;
nは1〜2の整数、mはMの価数に一致する整数)
アルキル置換ナフタレンスルフォン酸塩として好ましい
ものを具体的に例示すれば、たとえば、ジノニルナフタ
レンスルフオン酸バリウム塩、ジノニルナフタレンスル
フオン酸カルシウム塩、ジノニルナフタレンスルフオン
酸亜鉛塩、ジノニルナフタレンスルフオン酸バリウム塩
基性塩、ジノニルナフタレンスルフオン酸エチレンジア
ミン塩、ジノニルナフタレンスルフオン酸ナトリウム塩
、及びジノニルナフタレンスルフォン酸リチウム塩、ジ
ノニルナフタレンスルフォン酸鉛塩、ジノニルナフタレ
ンスルフォン酸アンモニウム塩、ジノニルナフタレンス
ルフオン酸トリエタノールアミン塩等を挙げることがで
きる。これらは1種又は2種以上混合して添加され、耐
食性向上に寄与する。添加量は0.05〜3wt%であ
る。0.(15i%未満では耐食性向上効果が得られず
、3wt%を越えると、接触抵抗への悪影響が認められ
る。(R is an alkyl group having 6 to 12 carbon atoms; M is a salt-forming component;
(n is an integer of 1 to 2, m is an integer that matches the valence of M) Preferred examples of the alkyl-substituted naphthalene sulfonate include, for example, dinonylnaphthalene sulfonate barium salt, dinonylnaphthalene Sulfonate calcium salt, dinonylnaphthalenesulfonate zinc salt, dinonylnaphthalenesulfonate barium basic salt, dinonylnaphthalenesulfonate ethylenediamine salt, dinonylnaphthalenesulfonate sodium salt, and dinonylnaphthalenesulfonic acid Examples include lithium salt, dinonylnaphthalenesulfonic acid lead salt, dinonylnaphthalenesulfonic acid ammonium salt, and dinonylnaphthalenesulfonic acid triethanolamine salt. These are added singly or in a mixture of two or more, and contribute to improving corrosion resistance. The amount added is 0.05 to 3 wt%. 0. (If it is less than 15i%, no effect of improving corrosion resistance can be obtained, and if it exceeds 3wt%, an adverse effect on contact resistance is observed.
本発明において使用する上記(C)成分のアミンとして
は脂肪族アミン又は環状脂肪族アミンが好ましく、特に
好ましいものとしては、オクタデシルアミン、ドデシル
アミン、デシルアミン、オクチルアミン、及びシクロへ
キシルアミン等を挙げることかできる。The amine of component (C) used in the present invention is preferably an aliphatic amine or a cycloaliphatic amine, and particularly preferred include octadecylamine, dodecylamine, decylamine, octylamine, and cyclohexylamine. I can do it.
又、本発明において使用する上記(d)成分の金属石け
んとして特に好ましいものとしては、たとえば、酸化ペ
トロラタム金属塩、酸化ワックス金属塩、ステアリン酸
金属塩、ラウリン酸金属塩、リシルシン酸金属塩、ミリ
スチン酸金属塩、オレイン酸金属塩、ナフテン酸金属塩
、及びラノリン酸金属塩等を挙げることができ、又、そ
の金属塩としては、特に制限はないが、好ましくはCa
、AI、Ba5Pb塩等である。Particularly preferred metal soaps as component (d) used in the present invention include, for example, petrolatum oxide metal salts, oxidized wax metal salts, stearate metal salts, laurate metal salts, lysylsinate metal salts, myristic acid. Examples include acid metal salts, oleic acid metal salts, naphthenic acid metal salts, lanolic acid metal salts, etc. The metal salts are not particularly limited, but preferably Ca
, AI, Ba5Pb salt, etc.
本発明において使用する上記(e)成分のフタル酸エス
テルとしては、例えば、フタル酸ジメチル、フタル酸ジ
エチル、フタル酸ジブチル、フタル酸ジヘブチル、フタ
ル酸ジ−n−オクチル、フタル酸ジー2−エチルヘキシ
ル、フタル酸ジイソノニル、フタル酸オクチルデシル、
フタル酸ジイソデシル等を挙げることができる。Examples of the phthalate ester of component (e) used in the present invention include dimethyl phthalate, diethyl phthalate, dibutyl phthalate, diheptyl phthalate, di-n-octyl phthalate, di-2-ethylhexyl phthalate, Diisononyl phthalate, octyldecyl phthalate,
Examples include diisodecyl phthalate.
亜りん酸エステルとしては、例えば、トリフェニルホス
ファイト、トリクレジルホスファイト、ジフェニルノニ
ルフェニルホスファイト、トリラウリルホスファイト、
ジラウリルハイドロゼンホスファイト等を挙げることが
できる。Examples of the phosphite include triphenyl phosphite, tricresyl phosphite, diphenylnonylphenyl phosphite, trilauryl phosphite,
Examples include dilauryl hydrogen phosphite.
グリセリンモノエステルとしては、例えば、グリセリン
モノオレイン酸エステルを挙げることができる。Examples of glycerin monoester include glycerin monooleate.
ソルビタンエステルとしては、例えば、ソルビタンモノ
・ラウレート、ソルビタンモノ・ステアレート、ソルビ
タンモノ・パルミテート、ソルビタンモノ・オレエート
、ソルビタンセスキ・オレエート、ソルビタントリ豐オ
レエート等を挙げることができる。Examples of the sorbitan ester include sorbitan mono-laurate, sorbitan mono-stearate, sorbitan mono-palmitate, sorbitan mono-oleate, sorbitan sesqui-oleate, and sorbitan tri-oleate.
本発明の封孔処理液には必要に応じてキレート形成性環
状窒素化合物:アミン系又はフェノール系酸化防止剤を
添加することができる。キレート形成性環状窒素化合物
は、銅、ニッケル等に配位して安定なキレートを形成す
る化合物で、特にベンゼン環を有する環状窒素化合物、
あるいはトリアジン系化合物が好ましい。具体例を挙げ
れば、ベンゼン環を有する環状窒素化合物としては、た
とえば、
ベンゾトリアゾール系
インダゾール系
ベンズイミダゾール系
インドール系
(上記各式中、R1は水素、アルキル、置換アルキルを
表わし、R2はアルカリ金属、水素、アルキル、置換ア
ルキルを表わす)
等を挙げることができる。A chelate-forming cyclic nitrogen compound: an amine-based or phenol-based antioxidant may be added to the pore-sealing solution of the present invention, if necessary. Chelate-forming cyclic nitrogen compounds are compounds that form stable chelates by coordinating with copper, nickel, etc., and in particular, cyclic nitrogen compounds having a benzene ring,
Alternatively, triazine compounds are preferred. To give specific examples, cyclic nitrogen compounds having a benzene ring include, for example, benzotriazole, indazole, benzimidazole, indole (in each of the above formulas, R1 represents hydrogen, alkyl, substituted alkyl, R2 represents an alkali metal, (representing hydrogen, alkyl, substituted alkyl), etc.
ヘンシトリアゾール系としては、例えばベンゾトリアゾ
ール(R1、R2ともに水素)、■−メチルベンゾトリ
アゾール(R+か水素、R2かメチル)、1−(N、N
−ジオクチルアミノメチル)ベンゾトリアゾール(R+
か水素、R2がN、N−ジオクチルアミノメチル)、ト
リルトリアゾール(R+がメチル、R2か水素)、ソジ
ウムトリルトリアゾール(R+かメチル、R2がナトリ
ウム)等が好ましい。Examples of the henctriazole type include benzotriazole (both R1 and R2 are hydrogen), ■-methylbenzotriazole (R+ is hydrogen, R2 is methyl), 1-(N, N
-dioctylaminomethyl)benzotriazole (R+
or hydrogen, R2 is N, N-dioctylaminomethyl), tolyltriazole (R+ is methyl, R2 is hydrogen), sodium tolyltriazole (R+ is methyl, R2 is sodium), and the like.
インダゾール系としては、例えばインダゾール(R1、
R2ともに水素)、2−メチルインダゾール(R+が水
素、R2がメチル)、2−ベンジルインダゾール(R+
が水素、R2が(:6 I5 CH2)、■−アセチル
インダゾール(R+が水素、R2がC0CH5)等が好
ましい。Examples of indazole series include indazole (R1,
R2 is hydrogen), 2-methylindazole (R+ is hydrogen, R2 is methyl), 2-benzylindazole (R+
is hydrogen, R2 is (:6 I5 CH2), and ■-acetylindazole (R+ is hydrogen, R2 is C0CH5), etc. are preferable.
ベンズイミダゾール系としては、例えばベンズイミダゾ
ール(R1、R2ともに水素)、N−アセチイベンズイ
ミダゾール(R+か水素、R2かC0CH2)、N−ベ
ンゾイルベンズイミダゾール(R+か水素、R2がC0
C6H3)等か好ましい。Examples of benzimidazole systems include benzimidazole (both R1 and R2 are hydrogen), N-acetiibenzimidazole (R+ or hydrogen, R2 or C0CH2), N-benzoylbenzimidazole (R+ or hydrogen, R2 is C0
C6H3) etc. are preferred.
インドール系としては、例えばインドール(R1,R2
ともに水素)、インドール−1−カルボン酸(R+が水
素、R2がC00H)、■−メチルインドール(R+が
水素、R2がCH3)等が好ましい。As an indole type, for example, indole (R1, R2
(both are hydrogen), indole-1-carboxylic acid (R+ is hydrogen, R2 is C00H), and -methylindole (R+ is hydrogen, R2 is CH3).
また、トリアジン系化合物の好ましい具体例を挙げれば
、例えば、6−置換−1,3,5−トリアジン−2,4
−ジチオール−ナトリウム塩(Rはアルキル基で置換さ
れたアミノ基で、好ましくは−N(C4I9 ) 2、
−N(C8Hrr) 2、−N(CI2 H29) 2
、−NHO2H16CH−CHCs Hrt等である)
、
シアヌル酸(2,4,6−トリオキシ−1,3,5−ト
リアジン)、
H
メラミン(2,4,6−トリアミノ−1,3,5−トリ
アジン)、
等を挙げることができる。これらは1種または2種以上
混合して添加され、バラフィ”ンヮックスと共に耐食性
、耐久性を向上させる。その濃度は総量で0.05〜3
wt%である。0.05vt%より小さいと耐食性、耐
久性が低く、また、3wt%より大きいと電気的接続性
に支障が生じる。Further, preferable specific examples of triazine compounds include, for example, 6-substituted-1,3,5-triazine-2,4
-dithiol-sodium salt (R is an amino group substituted with an alkyl group, preferably -N(C4I9) 2,
-N(C8Hrr) 2, -N(CI2H29) 2
, -NHO2H16CH-CHCs Hrt, etc.)
, cyanuric acid (2,4,6-trioxy-1,3,5-triazine), H melamine (2,4,6-triamino-1,3,5-triazine), and the like. These are added singly or as a mixture of two or more to improve corrosion resistance and durability together with rosefinx.The total concentration is 0.05 to 3.
It is wt%. If it is less than 0.05 wt%, corrosion resistance and durability will be low, and if it is more than 3 wt%, electrical connectivity will be impaired.
又、本発明の封孔処理液に、必要に応して添加される上
記のアミン系又はフェノール系酸化防止剤としては、た
とえば、
P、P’−ジオクチルジフェニルアミン4.4′−テト
ラメチルジアミノジフェニルメタ4.4゛−メチレン−
ビス−(2,6−シーt−ブチルフェノール)
(CH3) 30 C(CHx ) 32.2”
−メチレン−ビス−(4−メチル−8−t−ブチルフェ
ノール)
CH3CHy
2.2゛−メチレン−ビス−(4−エチル−e−t−ブ
チルフェノール)
CH2CH3CH2CH3
2,6−ジーt−ブチル−p−クレゾールH
CH3
ブチル化ヒドロキシアニソール
0CHz 0CR3
2,6−ジーt−ブチル−4−エチルフェノ−H2CH
3
等を挙げることができる。In addition, examples of the above-mentioned amine-based or phenolic antioxidants that may be added to the sealing solution of the present invention as needed include P,P'-dioctyldiphenylamine 4.4'-tetramethyldiaminodiphenyl Meta 4.4゛-methylene-
Bis-(2,6-sheet-t-butylphenol) (CH3) 30 C(CHx) 32.2”
-Methylene-bis-(4-methyl-8-t-butylphenol) CH3CHy 2.2'-methylene-bis-(4-ethyl-et-butylphenol) CH2CH3CH2CH3 2,6-di-t-butyl-p-cresol H CH3 Butylated hydroxyanisole 0CHz 0CR3 2,6-di-t-butyl-4-ethylpheno-H2CH
3 etc. can be mentioned.
これらは、1種又は2種以上を0.001〜1νt%添
加することができる。One or more of these can be added in an amount of 0.001 to 1 νt%.
これらの成分を添加することにより、耐久性を一層向上
させることができる。すなわち、封孔処理皮膜の機能を
長期に亘り安定させ、また高温環境における皮膜の劣化
を抑制する効果を有する。0.001vt%未満てはそ
の効果を得ることはできず、1νt 96を越えると接
触抵抗の低下現象が認められる。By adding these components, durability can be further improved. That is, it has the effect of stabilizing the function of the sealing film over a long period of time and suppressing deterioration of the film in a high-temperature environment. If it is less than 0.001 vt %, the effect cannot be obtained, and if it exceeds 1 νt 96, a decrease in contact resistance is observed.
封孔処理液は上述の成分を有するか、溶媒としては特に
制限されず、公知の有機溶媒より適宜選択することかで
きる。例えばトルエン、キンレン等の石油系溶媒、トリ
クロロエチレン、トリクロロエタン等のハロゲン系溶媒
、あるいはフロン系溶媒等である。The pore-sealing liquid may have the above-mentioned components, or the solvent may be appropriately selected from known organic solvents without any particular limitations. Examples include petroleum-based solvents such as toluene and quinoa, halogen-based solvents such as trichloroethylene and trichloroethane, and fluorocarbon-based solvents.
処理方法としては、めっき品を封孔処理液中に浸漬する
か、封孔処理液をスプレー、あるいは塗布するなど、何
れの方法によることもできる。しかし本発明において、
めっき品の形状が板・条、プレス部品であるを問わす、
めっき直後すなわち連続ラインであれば、そのラインの
中で処理することが、封孔処理の各種機能を高める効果
が高いことを見いたした。As a treatment method, any method can be used, such as immersing the plated product in a pore sealing solution, or spraying or applying the pore sealing solution. However, in the present invention,
Regardless of whether the shape of the plated product is a plate, strip, or pressed part,
It has been found that performing the treatment immediately after plating, that is, in a continuous line, is highly effective in enhancing various functions of the sealing treatment.
さらに、めっき品をプレス加工後に本発明の封孔処理液
て封孔処理する事も有効である。めっき後封孔処理した
金属材料であっても、その後のプレス加工で付着したプ
レス浦を洗浄する工程において、封孔処理の機能の多く
は喪失する、そこて再度の封孔処理が有効となる。Furthermore, it is also effective to seal the plated product using the sealing solution of the present invention after press working. Even with metal materials that have been sealed after plating, many of the functions of the sealing process are lost in the process of cleaning the press pores that have adhered during subsequent press working, so re-sealing is effective. .
その後のコネクタの加工工程においても、最終の電子機
器の組み立てまで、めっき品の洗浄工程があれば同様に
封孔処理機能は喪失するため、適宜本発明により封孔処
理する事が有効である。さらには電子機器にコネクタと
して組み込まれ実使用に際しても、使用にともない接点
性能か低下するなどの場合は、適宜本封孔処理液により
処理することかできる。従って、本発明は本発明封孔処
理液により処理されたコネクタをも包含するものである
。In the subsequent connector processing steps as well, if there is a cleaning step for the plated product until the final assembly of the electronic device, the hole sealing function will be similarly lost, so it is effective to perform hole sealing according to the present invention as appropriate. Furthermore, even when it is incorporated into an electronic device as a connector and used in actual use, if the contact performance deteriorates with use, it can be treated with the present sealing treatment liquid as appropriate. Therefore, the present invention also includes connectors treated with the sealing solution of the present invention.
なお、本発明における、めっき母材となる金属材料は、
銅及び、黄銅、りん青銅、チタン銅等の各種銅合金、鉄
、ステンレス鋼、高ニッケル合金等、コネクタの要求性
能に従い適宜選択でき、同等制限されない。中間層とし
てのニッケルめっきは、ワット浴、スルファミン酸浴等
からの電気めっき、無電解めっき等の公知のものを適用
でき、めっき方法は制限されない。またニッケルめっき
は金属母材に直接施すほか、その中間にさらに他の金属
層を有することもてきる。金めつきは各種のアルカリ性
浴、酸性浴から純金めっきの他、コバルト等の合金成分
を含有する金合金めっきも包含するものである。In addition, in the present invention, the metal material serving as the plating base material is:
Copper, various copper alloys such as brass, phosphor bronze, and titanium copper, iron, stainless steel, high nickel alloys, etc. can be selected as appropriate according to the required performance of the connector, and there are no equal restrictions. For the nickel plating as the intermediate layer, known methods such as electroplating from a Watt bath, sulfamic acid bath, etc., electroless plating, etc. can be applied, and the plating method is not limited. In addition to applying nickel plating directly to the metal base material, it is also possible to have another metal layer in between. Gold plating includes pure gold plating from various alkaline baths and acidic baths, as well as gold alloy plating containing alloy components such as cobalt.
[実施例] 以下に実施例を挙げて本発明をさらに詳細に説明する。[Example] The present invention will be explained in more detail with reference to Examples below.
ばね用りん青銅(C5210)の厚み0.2aa+の冷
間圧延材を用い、雄、及び雌の連続端子をそれぞれプレ
ス成形した。これらをリール・ツウ・リールの連続電気
めっきラインを通して電気めっきを施した。めっきライ
ンにおいては、脱脂、酸洗後ワット浴により 1μmの
ニッケルめっき後、酸性めっき浴により金を0.2
μ■の厚みて接点部に部分めっきした。また、連続めっ
きラインでは、金めつき後に封孔処理工程を設け、同工
程ではトリクロロエタンを溶媒とした各種封孔処理液に
連続端子を通人することにより封孔処理を施した。Male and female continuous terminals were each press-molded using cold-rolled spring material of phosphor bronze (C5210) with a thickness of 0.2 aa+. These were electroplated through a reel-to-reel continuous electroplating line. In the plating line, after degreasing and pickling, 1 μm nickel plating is applied in Watt bath, and then 0.2 μm gold plating is applied in acid plating bath.
The contacts are partially plated with a thickness of μ■. In addition, in the continuous plating line, a sealing process was provided after gold plating, and in this process, the continuous terminal was passed through various sealing solutions using trichloroethane as a solvent to perform the sealing process.
こうして表面処理した雄と雌の端子をキャリア一部から
切断しリード線を圧着した後、それぞれを嵌合し評価試
験に供した。After the male and female terminals thus surface-treated were cut from a portion of the carrier and the lead wires were crimped, they were fitted together and subjected to an evaluation test.
接触抵抗は直流10aiA 、開放電圧50mmVで測
定した。腐食試験は次の条件で行った。The contact resistance was measured at a direct current of 10 aiA and an open circuit voltage of 50 mmV. The corrosion test was conducted under the following conditions.
ガス組成:H2S 3±1ppa+502 10±
3ppm
温度 =40±2℃
湿度 ニア5±5%RH
時間 :96時間
複合試験は、雄と雌の端子を自動繰返し挿抜装置で10
0回の挿抜を繰返し行う摩耗試験を行った後、上記腐食
試験に供し、さらに接触抵抗を測定した。結果を第1表
に示す。Gas composition: H2S 3±1ppa+502 10±
3ppm Temperature = 40±2℃ Humidity Near 5±5% RH Time: 96 hours The combined test was conducted using an automatic repeating insertion/extraction device for male and female terminals.
After conducting a wear test in which insertion and removal were repeated 0 times, the test piece was subjected to the corrosion test described above, and the contact resistance was further measured. The results are shown in Table 1.
第1表
第1表つづき(1)
第1表つづき(2)
第1表つづき(3)
注1) ただし、表中封孔処理液の略号は以下の通りで
ある。Table 1 Table 1 continued (1) Table 1 continued (2) Table 1 continued (3) Note 1) However, the abbreviations of the sealing liquids in the table are as follows.
A パラフィンワツクス
B−1イソステアリン酸
−2酸化ワックス
−3酸化ペトロラタム
−4ジノニルナフタレンスルフオン酸バリウム塩−5ジ
ノニルナフタレンスルフォン酸カルンウム塩−6ジノニ
ルナフタレンスルフオン酸亜鉛塩−7ジノニルナフタレ
ンスルフオン酸バリウム塩基性塩−8ジノニルナフタレ
ンスルフオン酸エチレンジアミン塩−9ジノニルナフタ
レンスルフォン酸ナトリウム塩B−10ツノニルナフタ
レンスルフォン酸リチウム塩−11オクタデ/ルアミン
−12ドデシルアミン
−13デシルアミン
−14オクチルアミン
−15シクロヘキンルアミン
−18酸化ペトロラタムCa塩
−17酸化ワックスCa塩
−18ステアリン酸Ca塩
−19ラウリン酸A1塩
−20リンルン酸AI塩
−21ミリスチン酸Ca塩
−22オレイン酸Ba塩
−23ナフテン酸Ba塩
−24ラノリン酸A1塩
−257タル酸ツメチル
=26 7タル酸ジエチル
=27 フタル酸ジブチル
−287タル酸ジヘブチル
−297タル酸ジーn−オクチル
−30フタル酸ノー2−エチルヘキシル−317タル酸
ジイソノニル
−327タル酸オクチルデンル
−337タル酸ジイソデンル
=34トリフェニルホスファイト
一35トリクレジルホスファイト
−36ジフェニルノニルフェニルホスファイト−37ト
リラウリルホスフアイト
ー38 ジラウリルハイドロゼンホスファイト−39
グリセリンモノオレイン酸エステルB−40ソルビタン
モノ・ラウレート
−41ソルビタンモノ・ステアレート
−42ソルビタンモノ・パルミテート
−43ソルビタンモノ・オレエート
−44ソルビタノセスキφオレエート
−45ソルビタントリ・オレエート
C−1ベンゾトリアゾール
−2インダゾール
−3ベンズイミダゾール
−4インドール
−51−メチルベンゾトリアゾール
−6トリルトリアゾール
−7ソノラムトリルトリアゾール
=8 メラミン
D−I P、P’−ジオクチルノフェニルアミン−2
4,4°−テトラメチルジアミノジフェニルメタン−3
4,4’−メチレン−ビス−(2,6−ノーt−ブチル
フェノール)−42,2’−メチレン−ビス−(4−メ
チル−6−t−ブチルフェノール)
−52,2’−メチレン−ビス−(4−エチル−a−t
−ブチルフェノール)
−62,6−ノーt−ブチル−p−クレゾール−7ブチ
ル化ヒドロキンアニソール
−82,6−ジーt−ブチル−4−エチルフェノール注
2) 試験の判定基準は次の通りである。A Paraffin wax B-1 Isostearic acid - Wax 2 oxide - Petrolatum 3 oxide - 4 Barium dinonylnaphthalene sulfonate salt - 5 Carunium dinonylnaphthalene sulfonate salt - 6 Zinc salt of dinonylnaphthalene sulfonate - 7 Dinonyl Naphthalenesulfonate barium basic salt -8 Dinonylnaphthalenesulfonate ethylenediamine salt -9 Dinonylnaphthalenesulfonate sodium salt B-10 Tunonylnaphthalenesulfonate lithium salt -11 Octade/Lamine -12 Dodecylamine -13 Decylamine - 14 Octylamine - 15 Cyclohexylamine - 18 Petrolatum oxide Ca salt - 17 Oxidized wax Ca salt - 18 Stearic acid Ca salt - 19 Lauric acid A1 salt - 20 Phosphoruric acid AI salt - 21 Myristic acid Ca salt - 22 Oleic acid Ba salt -23 Naphthenic acid Ba salt -24 Lanolic acid A1 salt -257 Tumethyl talate = 26 7 Diethyl talate = 27 Dibutyl phthalate - 287 Dihebutyl talate - 297 Di-n-octyl talate - 30 No-2-ethylhexyl phthalate - 317 Diisononyl tallate - 327 Octyldenyl tallate - 337 Diisodenyl tallate - 34 Triphenyl phosphite - 35 Tricresyl phosphite - 36 Diphenylnonylphenyl phosphite - 37 Trilauryl phosphite 38 Dilauryl hydrogen phosphite - 39
Glycerin monooleate B-40 Sorbitan mono-laurate-41 Sorbitan mono-stearate-42 Sorbitan mono-palmitate-43 Sorbitan mono-oleate-44 Sorbitan sesqui φ oleate-45 Sorbitan tri-oleate C-1 Benzotriazole-2 Indazole -3 Benzimidazole-4 Indole-51-Methylbenzotriazole-6 Tolyltriazole-7 Sonolamtolyltriazole = 8 Melamine D-I P, P'-dioctylnophenylamine-2
4,4°-tetramethyldiaminodiphenylmethane-3
4,4'-methylene-bis-(2,6-not-t-butylphenol)-42,2'-methylene-bis-(4-methyl-6-t-butylphenol) -52,2'-methylene-bis- (4-ethyl-a-t
-butylphenol) -62,6-not-t-butyl-p-cresol-7-butylated hydroquinanisole-82,6-di-t-butyl-4-ethylphenol Note 2) The test criteria are as follows: .
■初期接触抵抗、複合試験後接触抵抗(n−5の平均値
)○=25曹濡Ω以下
△、25〜50ssΩ
X:50nΩ↓辻
■腐食試験後外観
◎ 腐食生成物全く認められず
○ 腐食生成物痕跡あり
△ 腐食生成物点在
X、腐食点が全面に認められる
〔発明の効果〕
以上述べたように、本発明により封孔処理されたニッケ
ル下地、金めつきの接点は、処理直後の接触抵抗か低く
、過酷な腐食環境においても優れた耐食性を示し、また
熱履歴によっても接触抵抗が上昇せず、接触性能か安定
しているという利点を有する。■Initial contact resistance, contact resistance after combined test (average value of n-5) ○ = 25 soda wet Ω or less △, 25 to 50 ssΩ Traces of products are present △ Corrosion products are scattered X, corrosion points are observed on the entire surface [Effects of the invention] As described above, the nickel-based, gold-plated contacts sealed according to the present invention are It has low contact resistance, exhibits excellent corrosion resistance even in harsh corrosive environments, and has the advantage that contact resistance does not increase even with thermal history and contact performance is stable.
特許出願人 日 本 鉱 業 株 式 会 社特許出願
人 株式会社 共石製品技術研究所代理人 弁理士 小
松 秀 岳Patent Applicant: Japan Mining Co., Ltd. Patent Applicant: Kyoseki Product Technology Institute Co., Ltd. Agent Patent Attorney: Hidetake Komatsu
Claims (6)
をめっき後、金または金合金をめっきした材料を処理す
る封孔処理液であって、(A)パラフィンワックス0.
1〜3wt%及び(B)以下の(a)〜(e)の各群の
うちの2種以上の群からそれぞれ1種又は2種以上選択
された化合物を含む有機溶剤溶液よりなることを特徴と
する封孔処理液。 (a)イソステアリン酸、酸化ワックス、及び酸化ペト
ロラタム0.05〜3wt%、 (b)アルキル置換ナフタレンスルフォン酸塩0.05
〜3wt%、 (c)アミン0.05〜3wt%、 (d)金属石けん0.05〜3wt%、 (e)フタル酸エステル、亜りん酸エステル、グリセリ
ンモノエステル、及びソルビタンエステル0.01〜3
wt%。(1) A sealing solution for treating a copper-based or iron-based metal material plated with nickel as an intermediate layer and then plated with gold or gold alloy, comprising: (A) paraffin wax 0.
1 to 3 wt% and (B) an organic solvent solution containing one or more compounds selected from two or more of the following groups (a) to (e). A pore sealing solution. (a) 0.05-3 wt% of isostearic acid, oxidized wax, and petrolatum oxide; (b) 0.05 alkyl-substituted naphthalene sulfonate;
~3wt%, (c) amine 0.05~3wt%, (d) metal soap 0.05~3wt%, (e) phthalate ester, phosphite ester, glycerin monoester, and sorbitan ester 0.01~ 3
wt%.
種以上0.05〜3wt%をさらに含有することを特徴
とする請求項(1)記載の封孔処理液。(2) One or two chelate-forming cyclic nitrogen compounds
The pore-sealing treatment liquid according to claim 1, further comprising 0.05 to 3 wt% of at least one species.
くは2種以上0.001〜1wt%を、さらに含有する
ことを特徴とする請求項(1)又は(2)記載の封孔処
理液。(3) The pore-sealing treatment liquid according to claim (1) or (2), further comprising 0.001 to 1 wt % of one or more amine-based or phenol-based antioxidants.
めっきし、さらにその上に金または金合金を電気めっき
後、請求項(1)、(2)または(3)記載の封孔処理
液で処理することを特徴とする封孔処理方法。(4) After plating nickel as an intermediate layer on a copper-based or iron-based metal material and further electroplating gold or a gold alloy thereon, the sealing treatment according to claim (1), (2) or (3) is performed. A pore sealing method characterized by treatment with a liquid.
たは鉄系金属材料をプレス加工後、請求項(1)、(2
)または(3)に記載の封孔処理液で処理することを特
徴とする封孔処理方法。(5) After pressing a copper-based or iron-based metal material plated with nickel and gold or a gold alloy, claims (1) and (2)
) or (3).
をめっき後、金又は金合金をめっきしためっき材よりな
り、請求項(1)、(2)または(3)記載の封孔処理
液で封孔処理したことを特徴とするコネクタ。(6) The sealing treatment liquid according to claim (1), (2) or (3), which is made of a plating material in which a copper-based or iron-based metal material is plated with nickel as an intermediate layer and then plated with gold or a gold alloy. A connector characterized in that the pores are sealed with.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP28416490A JPH04160195A (en) | 1990-10-24 | 1990-10-24 | Sealing treating solution and its method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP28416490A JPH04160195A (en) | 1990-10-24 | 1990-10-24 | Sealing treating solution and its method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04160195A true JPH04160195A (en) | 1992-06-03 |
Family
ID=17675014
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP28416490A Pending JPH04160195A (en) | 1990-10-24 | 1990-10-24 | Sealing treating solution and its method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04160195A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2142485A1 (en) * | 2007-04-18 | 2010-01-13 | Enthone, Inc. | Metallic surface enhancement |
-
1990
- 1990-10-24 JP JP28416490A patent/JPH04160195A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2142485A1 (en) * | 2007-04-18 | 2010-01-13 | Enthone, Inc. | Metallic surface enhancement |
EP2142485A4 (en) * | 2007-04-18 | 2014-10-22 | Enthone | Metallic surface enhancement |
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