JPH0415924B2 - - Google Patents

Info

Publication number
JPH0415924B2
JPH0415924B2 JP58024202A JP2420283A JPH0415924B2 JP H0415924 B2 JPH0415924 B2 JP H0415924B2 JP 58024202 A JP58024202 A JP 58024202A JP 2420283 A JP2420283 A JP 2420283A JP H0415924 B2 JPH0415924 B2 JP H0415924B2
Authority
JP
Japan
Prior art keywords
lens group
positive lens
reticle
alignment
light beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58024202A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59149317A (ja
Inventor
Makoto Uehara
Akira Anzai
Kyoichi Suwa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kogaku KK filed Critical Nippon Kogaku KK
Priority to JP58024202A priority Critical patent/JPS59149317A/ja
Publication of JPS59149317A publication Critical patent/JPS59149317A/ja
Publication of JPH0415924B2 publication Critical patent/JPH0415924B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Microscoopes, Condenser (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58024202A 1983-02-16 1983-02-16 投影型露光装置のアライメント光学系 Granted JPS59149317A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58024202A JPS59149317A (ja) 1983-02-16 1983-02-16 投影型露光装置のアライメント光学系

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58024202A JPS59149317A (ja) 1983-02-16 1983-02-16 投影型露光装置のアライメント光学系

Publications (2)

Publication Number Publication Date
JPS59149317A JPS59149317A (ja) 1984-08-27
JPH0415924B2 true JPH0415924B2 (de) 1992-03-19

Family

ID=12131728

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58024202A Granted JPS59149317A (ja) 1983-02-16 1983-02-16 投影型露光装置のアライメント光学系

Country Status (1)

Country Link
JP (1) JPS59149317A (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3165711B2 (ja) * 1991-08-02 2001-05-14 キヤノン株式会社 像投影方法及び該方法を用いた半導体デバイスの製造方法
JPH0536586A (ja) * 1991-08-02 1993-02-12 Canon Inc 像投影方法及び該方法を用いた半導体デバイスの製造方法

Also Published As

Publication number Publication date
JPS59149317A (ja) 1984-08-27

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