JPH0414339B2 - - Google Patents

Info

Publication number
JPH0414339B2
JPH0414339B2 JP60221225A JP22122585A JPH0414339B2 JP H0414339 B2 JPH0414339 B2 JP H0414339B2 JP 60221225 A JP60221225 A JP 60221225A JP 22122585 A JP22122585 A JP 22122585A JP H0414339 B2 JPH0414339 B2 JP H0414339B2
Authority
JP
Japan
Prior art keywords
light
thin film
film
photomask
taox
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60221225A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6280655A (ja
Inventor
Takehiro Taihichi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Priority to JP60221225A priority Critical patent/JPS6280655A/ja
Publication of JPS6280655A publication Critical patent/JPS6280655A/ja
Publication of JPH0414339B2 publication Critical patent/JPH0414339B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/40—Electrostatic discharge [ESD] related features, e.g. antistatic coatings or a conductive metal layer around the periphery of the mask substrate

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP60221225A 1985-10-04 1985-10-04 フオトマスクブランクおよびフオトマスク Granted JPS6280655A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60221225A JPS6280655A (ja) 1985-10-04 1985-10-04 フオトマスクブランクおよびフオトマスク

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60221225A JPS6280655A (ja) 1985-10-04 1985-10-04 フオトマスクブランクおよびフオトマスク

Publications (2)

Publication Number Publication Date
JPS6280655A JPS6280655A (ja) 1987-04-14
JPH0414339B2 true JPH0414339B2 (OSRAM) 1992-03-12

Family

ID=16763427

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60221225A Granted JPS6280655A (ja) 1985-10-04 1985-10-04 フオトマスクブランクおよびフオトマスク

Country Status (1)

Country Link
JP (1) JPS6280655A (OSRAM)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07111946B2 (ja) * 1987-05-29 1995-11-29 株式会社日立製作所 Ｘ線露光マスクのパターン検査方法
JP2788649B2 (ja) * 1989-05-30 1998-08-20 ホーヤ株式会社 フォトマスクブランク及びフォトマスク
JP5997530B2 (ja) * 2011-09-07 2016-09-28 Hoya株式会社 マスクブランク、転写用マスク、および半導体デバイスの製造方法
JP6297321B2 (ja) * 2013-12-09 2018-03-20 Hoya株式会社 機能膜付き基板の製造方法、多層膜付き基板の製造方法、マスクブランクの製造方法、及び転写用マスクの製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55161240A (en) * 1979-06-04 1980-12-15 Dainippon Printing Co Ltd Photomask
JPS57205342A (en) * 1981-06-15 1982-12-16 Seiko Epson Corp Glass photomask

Also Published As

Publication number Publication date
JPS6280655A (ja) 1987-04-14

Similar Documents

Publication Publication Date Title
US4440841A (en) Photomask and photomask blank
TWI442170B (zh) 光罩板及光罩
JP2658966B2 (ja) フォトマスク及びその製造方法
US4873163A (en) Photomask material
EP3373067B1 (en) Photomask blank
JP2017076152A (ja) マスクブランク、位相シフトマスクおよび半導体デバイスの製造方法
JP2008090254A (ja) フォトマスク用基板及びフォトマスク並びにその製造方法
US4556608A (en) Photomask blank and photomask
JPH0255933B2 (OSRAM)
JPH0435743B2 (OSRAM)
JP7558861B2 (ja) マスクブランク、位相シフトマスク及び半導体デバイスの製造方法
JPH0469933B2 (OSRAM)
JPH0414339B2 (OSRAM)
JPS63214755A (ja) フオトマスク
JP2018045257A (ja) マスクブランク、位相シフトマスクおよび半導体デバイスの製造方法
JPS584338B2 (ja) レジスト剥離防止方法
JPH0463349A (ja) フォトマスクブランクおよびフォトマスク
JPS649617B2 (OSRAM)
JPS645288B2 (OSRAM)
JP6557381B1 (ja) 位相反転ブランクマスク及びフォトマスク
JPS6251460B2 (OSRAM)
JPH061367B2 (ja) フオトマスク
JP2500526B2 (ja) フォトマスクブランクおよびフォトマスク
JPS61198156A (ja) 改良されたフオトマスクブランク
JPS6237382B2 (OSRAM)

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term